TW202247367A - 半導體封裝及電子機器 - Google Patents

半導體封裝及電子機器 Download PDF

Info

Publication number
TW202247367A
TW202247367A TW111118463A TW111118463A TW202247367A TW 202247367 A TW202247367 A TW 202247367A TW 111118463 A TW111118463 A TW 111118463A TW 111118463 A TW111118463 A TW 111118463A TW 202247367 A TW202247367 A TW 202247367A
Authority
TW
Taiwan
Prior art keywords
semiconductor package
layer
bump
ubm
diameter
Prior art date
Application number
TW111118463A
Other languages
English (en)
Chinese (zh)
Inventor
安川浩永
五十嵐浩一
重田博幸
大平光
酒井清久
細川広陽
Original Assignee
日商索尼半導體解決方案公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商索尼半導體解決方案公司 filed Critical 日商索尼半導體解決方案公司
Publication of TW202247367A publication Critical patent/TW202247367A/zh

Links

Images

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00Package configurations
    • H10W90/701Package configurations characterised by the relative positions of pads or connectors relative to package parts
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W20/00Interconnections in chips, wafers or substrates
    • H10W20/40Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes
    • H10W20/482Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes for individual devices provided for in groups H10D8/00 - H10D48/00, e.g. for power transistors
    • H10W20/484Interconnections having extended contours, e.g. pads having mesh shape or interconnections comprising connected parallel stripes
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/60Insulating or insulated package substrates; Interposers; Redistribution layers
    • H10W70/62Insulating or insulated package substrates; Interposers; Redistribution layers characterised by their interconnections
    • H10W70/65Shapes or dispositions of interconnections
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/60Insulating or insulated package substrates; Interposers; Redistribution layers
    • H10W70/67Insulating or insulated package substrates; Interposers; Redistribution layers characterised by their insulating layers or insulating parts
    • H10W70/69Insulating materials thereof
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/01Manufacture or treatment
    • H10W72/012Manufacture or treatment of bump connectors, dummy bumps or thermal bumps
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/01Manufacture or treatment
    • H10W72/019Manufacture or treatment of bond pads
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/071Connecting or disconnecting
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/20Bump connectors, e.g. solder bumps or copper pillars; Dummy bumps; Thermal bumps
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/20Bump connectors, e.g. solder bumps or copper pillars; Dummy bumps; Thermal bumps
    • H10W72/221Structures or relative sizes
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/20Bump connectors, e.g. solder bumps or copper pillars; Dummy bumps; Thermal bumps
    • H10W72/231Shapes
    • H10W72/234Cross-sectional shape, i.e. in side view
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/20Bump connectors, e.g. solder bumps or copper pillars; Dummy bumps; Thermal bumps
    • H10W72/241Dispositions, e.g. layouts
    • H10W72/242Dispositions, e.g. layouts relative to the surface, e.g. recessed, protruding
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/20Bump connectors, e.g. solder bumps or copper pillars; Dummy bumps; Thermal bumps
    • H10W72/241Dispositions, e.g. layouts
    • H10W72/244Dispositions, e.g. layouts relative to underlying supporting features, e.g. bond pads, RDLs or vias
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/90Bond pads, in general
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W74/00Encapsulations, e.g. protective coatings
    • H10W74/10Encapsulations, e.g. protective coatings characterised by their shape or disposition
    • H10W74/111Encapsulations, e.g. protective coatings characterised by their shape or disposition the semiconductor body being completely enclosed
    • H10W74/121Encapsulations, e.g. protective coatings characterised by their shape or disposition the semiconductor body being completely enclosed by multiple encapsulations, e.g. by a thin protective coating and a thick encapsulation
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W74/00Encapsulations, e.g. protective coatings
    • H10W74/10Encapsulations, e.g. protective coatings characterised by their shape or disposition
    • H10W74/131Encapsulations, e.g. protective coatings characterised by their shape or disposition the semiconductor body being only partially enclosed
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/60Insulating or insulated package substrates; Interposers; Redistribution layers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/90Bond pads, in general
    • H10W72/941Dispositions of bond pads
    • H10W72/9415Dispositions of bond pads relative to the surface, e.g. recessed, protruding
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W80/00Direct bonding of chips, wafers or substrates
    • H10W80/701Direct bonding of chips, wafers or substrates characterised by the pads after the direct bonding
    • H10W80/743Direct bonding of chips, wafers or substrates characterised by the pads after the direct bonding having disposition changed during the connecting

Landscapes

  • Wire Bonding (AREA)
  • Physics & Mathematics (AREA)
  • Geometry (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
TW111118463A 2021-05-25 2022-05-18 半導體封裝及電子機器 TW202247367A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2021087821 2021-05-25
JP2021-087821 2021-05-25

Publications (1)

Publication Number Publication Date
TW202247367A true TW202247367A (zh) 2022-12-01

Family

ID=84229743

Family Applications (1)

Application Number Title Priority Date Filing Date
TW111118463A TW202247367A (zh) 2021-05-25 2022-05-18 半導體封裝及電子機器

Country Status (6)

Country Link
US (1) US20250096087A1 (https=)
JP (1) JPWO2022249526A1 (https=)
KR (1) KR20240012398A (https=)
CN (1) CN117397017A (https=)
TW (1) TW202247367A (https=)
WO (1) WO2022249526A1 (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US12582014B2 (en) * 2022-08-23 2026-03-17 Micron Technology, Inc. Semiconductor device assembly substrates with tunneled interconnects, and methods for making the same
KR20250018381A (ko) * 2023-07-21 2025-02-05 양쯔 메모리 테크놀로지스 씨오., 엘티디. 향상된 상호연결 볼 그리드 어레이 설계, 반도체 구조물 및 그 제조 방법
US20250300112A1 (en) * 2024-03-19 2025-09-25 Qualcomm Incorporated Integrated device comprising extended metallization region for pillar interconnects
WO2026078922A1 (ja) * 2024-10-08 2026-04-16 パナソニックIpマネジメント株式会社 電子部品

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6038839A (ja) * 1983-08-12 1985-02-28 Hitachi Ltd フリツプチツプ型半導体装置
JPH0513601A (ja) * 1991-07-02 1993-01-22 Matsushita Electron Corp 半導体装置およびその製造方法
JP3291368B2 (ja) * 1993-07-06 2002-06-10 シチズン時計株式会社 ボールグリッドアレイ型半導体パッケージの構造
JPH11111771A (ja) * 1997-10-07 1999-04-23 Matsushita Electric Ind Co Ltd 配線基板の接続方法、キャリア基板および配線基板
JP3532450B2 (ja) * 1999-04-15 2004-05-31 シャープ株式会社 Bga型半導体パッケージの実装構造およびその実装方法
JP2004207368A (ja) * 2002-12-24 2004-07-22 Fujikura Ltd 半導体装置とその製造方法及び電子装置
JP4722532B2 (ja) * 2005-04-07 2011-07-13 シャープ株式会社 半導体装置,電子機器および半導体装置の製造方法
JP2007048802A (ja) * 2005-08-08 2007-02-22 Tdk Corp 配線板
JP5065669B2 (ja) * 2006-12-27 2012-11-07 ローム株式会社 半導体装置
JP4959538B2 (ja) * 2007-12-17 2012-06-27 株式会社フジクラ 半導体装置とその製造方法及び電子装置
JP2010092974A (ja) * 2008-10-06 2010-04-22 Fujikura Ltd 半導体装置及びその製造方法、並びに電子装置
JP5544872B2 (ja) * 2009-12-25 2014-07-09 富士通セミコンダクター株式会社 半導体装置及びその製造方法
JP2012191123A (ja) * 2011-03-14 2012-10-04 Renesas Electronics Corp 半導体集積回路装置およびその製造方法ならびにそれを用いた電子システム
US8816505B2 (en) * 2011-07-29 2014-08-26 Tessera, Inc. Low stress vias
JP2013115336A (ja) * 2011-11-30 2013-06-10 Renesas Electronics Corp 半導体装置及びその製造方法
US10141202B2 (en) * 2013-05-20 2018-11-27 Qualcomm Incorporated Semiconductor device comprising mold for top side and sidewall protection
US9484291B1 (en) * 2013-05-28 2016-11-01 Amkor Technology Inc. Robust pillar structure for semicondcutor device contacts
JP6635328B2 (ja) * 2014-11-10 2020-01-22 ローム株式会社 半導体装置およびその製造方法
US9935072B2 (en) * 2015-11-04 2018-04-03 Sfa Semicon Co., Ltd. Semiconductor package and method for manufacturing the same
JP6705592B2 (ja) * 2016-06-20 2020-06-03 住友電工デバイス・イノベーション株式会社 半導体装置の製造方法
KR101901411B1 (ko) 2016-12-27 2018-09-28 한국철도기술연구원 도어 어셈블리
JP2020074352A (ja) * 2017-03-13 2020-05-14 三菱電機株式会社 半導体装置
JP7176169B2 (ja) * 2019-02-28 2022-11-22 住友電工デバイス・イノベーション株式会社 半導体装置の製造方法及び半導体装置

Also Published As

Publication number Publication date
KR20240012398A (ko) 2024-01-29
WO2022249526A1 (ja) 2022-12-01
US20250096087A1 (en) 2025-03-20
CN117397017A (zh) 2024-01-12
JPWO2022249526A1 (https=) 2022-12-01

Similar Documents

Publication Publication Date Title
TW202247367A (zh) 半導體封裝及電子機器
KR100596452B1 (ko) 볼 랜드와 솔더 볼 사이에 에어 갭을 갖는 웨이퍼 레벨 칩스케일 패키지와 그 제조 방법
JP4343296B2 (ja) 半導体デバイスの製造方法
CN107342277B (zh) 封装件及其形成方法
CN100355063C (zh) 芯片尺寸封装和制备晶片级的芯片尺寸封装的方法
KR101813787B1 (ko) Info 패키지 내의 집적 수동 디바이스를 본딩하기 위한 패드 내의 개구부
CN105185718B (zh) 使用重组晶圆的半导体器件制造的方法和设备
TWI509714B (zh) 半導體封裝及其製造方法
TWI598966B (zh) 半導體裝置及其形成方法
TWI387074B (zh) 晶粒堆疊結構及其形成方法
CN113380746B (zh) 半导体器件和结构及其制造方法
CN106558537B (zh) 集成多输出结构以及形成方法
TWI896941B (zh) 半導體裝置及其製造方法
JP5576885B2 (ja) 補強層を伴う半導体チップ
TWI596681B (zh) 半導體封裝及其製作方法
US7863740B2 (en) Semiconductor device having conductive bumps, metallic layers, covering layers and fabrication method thereof
TW201724415A (zh) 形成半導體元件的方法
CN106252299A (zh) 半导体器件
CN101414590A (zh) 用于半导体晶粒封装的互连结构及其方法
US20230420429A1 (en) Chip-on-wafer-on-board structure using spacer die and methods of forming the same
WO2022052072A1 (zh) 一种扇出型封装结构及其制备方法
US10804233B1 (en) Wafer-level chip-scale package device having bump assemblies configured to maintain standoff height
CN114388374A (zh) 形成半导体封装件的方法
CN107154391A (zh) 半导体封装
JP5895467B2 (ja) 電子装置及びその製造方法