TW200816435A - Semiconductor device and method of manufacturing the same - Google Patents

Semiconductor device and method of manufacturing the same Download PDF

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Publication number
TW200816435A
TW200816435A TW096118100A TW96118100A TW200816435A TW 200816435 A TW200816435 A TW 200816435A TW 096118100 A TW096118100 A TW 096118100A TW 96118100 A TW96118100 A TW 96118100A TW 200816435 A TW200816435 A TW 200816435A
Authority
TW
Taiwan
Prior art keywords
wiring substrate
semiconductor device
chip
memory chip
memory
Prior art date
Application number
TW096118100A
Other languages
English (en)
Chinese (zh)
Inventor
Toshihiko Akiba
Takahiro Naito
Original Assignee
Renesas Tech Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Renesas Tech Corp filed Critical Renesas Tech Corp
Publication of TW200816435A publication Critical patent/TW200816435A/zh

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C29/00Checking stores for correct operation ; Subsequent repair; Testing stores during standby or offline operation
    • G11C29/04Detection or location of defective memory elements, e.g. cell constructio details, timing of test signals
    • G11C29/08Functional testing, e.g. testing during refresh, power-on self testing [POST] or distributed testing
    • G11C29/48Arrangements in static stores specially adapted for testing by means external to the store, e.g. using direct memory access [DMA] or using auxiliary access paths
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C29/00Checking stores for correct operation ; Subsequent repair; Testing stores during standby or offline operation
    • G11C29/04Detection or location of defective memory elements, e.g. cell constructio details, timing of test signals
    • G11C29/08Functional testing, e.g. testing during refresh, power-on self testing [POST] or distributed testing
    • G11C29/12Built-in arrangements for testing, e.g. built-in self testing [BIST] or interconnection details
    • G11C29/1201Built-in arrangements for testing, e.g. built-in self testing [BIST] or interconnection details comprising I/O circuitry
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C5/00Details of stores covered by group G11C11/00
    • G11C5/02Disposition of storage elements, e.g. in the form of a matrix array
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/01Manufacture or treatment
    • H10W70/05Manufacture or treatment of insulating or insulated package substrates, or of interposers, or of redistribution layers
    • H10W70/08Manufacture or treatment of insulating or insulated package substrates, or of interposers, or of redistribution layers by depositing layers on the chip or wafer, e.g. "chip-first" RDLs
    • H10W70/09Manufacture or treatment of insulating or insulated package substrates, or of interposers, or of redistribution layers by depositing layers on the chip or wafer, e.g. "chip-first" RDLs extending onto an encapsulation that laterally surrounds the chip or wafer, e.g. fan-out wafer level package [FOWLP] RDLs
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/60Insulating or insulated package substrates; Interposers; Redistribution layers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00Package configurations
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/60Insulating or insulated package substrates; Interposers; Redistribution layers
    • H10W70/62Insulating or insulated package substrates; Interposers; Redistribution layers characterised by their interconnections
    • H10W70/63Vias, e.g. via plugs
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/60Insulating or insulated package substrates; Interposers; Redistribution layers
    • H10W70/62Insulating or insulated package substrates; Interposers; Redistribution layers characterised by their interconnections
    • H10W70/65Shapes or dispositions of interconnections
    • H10W70/654Top-view layouts
    • H10W70/655Fan-out layouts
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/50Bond wires
    • H10W72/551Materials of bond wires
    • H10W72/552Materials of bond wires comprising metals or metalloids, e.g. silver
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/851Dispositions of multiple connectors or interconnections
    • H10W72/874On different surfaces
    • H10W72/884Die-attach connectors and bond wires
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/90Bond pads, in general
    • H10W72/921Structures or relative sizes of bond pads
    • H10W72/922Bond pads being integral with underlying chip-level interconnections
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/90Bond pads, in general
    • H10W72/921Structures or relative sizes of bond pads
    • H10W72/922Bond pads being integral with underlying chip-level interconnections
    • H10W72/9223Bond pads being integral with underlying chip-level interconnections with redistribution layers [RDL]
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/90Bond pads, in general
    • H10W72/921Structures or relative sizes of bond pads
    • H10W72/923Bond pads having multiple stacked layers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/90Bond pads, in general
    • H10W72/941Dispositions of bond pads
    • H10W72/9415Dispositions of bond pads relative to the surface, e.g. recessed, protruding
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/90Bond pads, in general
    • H10W72/941Dispositions of bond pads
    • H10W72/942Dispositions of bond pads relative to underlying supporting features, e.g. bond pads, RDLs or vias
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/90Bond pads, in general
    • H10W72/951Materials of bond pads
    • H10W72/952Materials of bond pads comprising metals or metalloids, e.g. PbSn, Ag or Cu
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W74/00Encapsulations, e.g. protective coatings
    • H10W74/10Encapsulations, e.g. protective coatings characterised by their shape or disposition
    • H10W74/15Encapsulations, e.g. protective coatings characterised by their shape or disposition on active surfaces of flip-chip devices, e.g. underfills
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00Package configurations
    • H10W90/20Configurations of stacked chips
    • H10W90/271Configurations of stacked chips the chips having passive surfaces facing each other, i.e. in a back-to-back arrangement
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00Package configurations
    • H10W90/701Package configurations characterised by the relative positions of pads or connectors relative to package parts
    • H10W90/721Package configurations characterised by the relative positions of pads or connectors relative to package parts of bump connectors
    • H10W90/724Package configurations characterised by the relative positions of pads or connectors relative to package parts of bump connectors between a chip and a stacked insulating package substrate, interposer or RDL
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00Package configurations
    • H10W90/701Package configurations characterised by the relative positions of pads or connectors relative to package parts
    • H10W90/731Package configurations characterised by the relative positions of pads or connectors relative to package parts of die-attach connectors
    • H10W90/732Package configurations characterised by the relative positions of pads or connectors relative to package parts of die-attach connectors between stacked chips
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00Package configurations
    • H10W90/701Package configurations characterised by the relative positions of pads or connectors relative to package parts
    • H10W90/731Package configurations characterised by the relative positions of pads or connectors relative to package parts of die-attach connectors
    • H10W90/734Package configurations characterised by the relative positions of pads or connectors relative to package parts of die-attach connectors between a chip and a stacked insulating package substrate, interposer or RDL
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00Package configurations
    • H10W90/701Package configurations characterised by the relative positions of pads or connectors relative to package parts
    • H10W90/751Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires
    • H10W90/754Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires between a chip and a stacked insulating package substrate, interposer or RDL

Landscapes

  • Semiconductor Integrated Circuits (AREA)
  • Structures For Mounting Electric Components On Printed Circuit Boards (AREA)
TW096118100A 2006-07-04 2007-05-22 Semiconductor device and method of manufacturing the same TW200816435A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006183993A JP5259059B2 (ja) 2006-07-04 2006-07-04 半導体装置

Publications (1)

Publication Number Publication Date
TW200816435A true TW200816435A (en) 2008-04-01

Family

ID=38918408

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096118100A TW200816435A (en) 2006-07-04 2007-05-22 Semiconductor device and method of manufacturing the same

Country Status (5)

Country Link
US (1) US7847413B2 (https=)
JP (1) JP5259059B2 (https=)
KR (1) KR20080004356A (https=)
CN (1) CN101101909A (https=)
TW (1) TW200816435A (https=)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI483363B (zh) * 2012-07-26 2015-05-01 臻鼎科技股份有限公司 晶片封裝基板、晶片封裝結構及其製作方法
TWI678747B (zh) * 2018-10-01 2019-12-01 點序科技股份有限公司 測試裝置及其晶片承載板

Families Citing this family (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4185499B2 (ja) * 2005-02-18 2008-11-26 富士通マイクロエレクトロニクス株式会社 半導体装置
TWI379363B (en) * 2007-04-24 2012-12-11 United Test & Assembly Ct Lt Bump on via-packaging and methodologies
US7759212B2 (en) * 2007-12-26 2010-07-20 Stats Chippac, Ltd. System-in-package having integrated passive devices and method therefor
US8258015B2 (en) * 2008-02-22 2012-09-04 Stats Chippac Ltd. Integrated circuit package system with penetrable film adhesive
US8304869B2 (en) * 2008-08-01 2012-11-06 Stats Chippac Ltd. Fan-in interposer on lead frame for an integrated circuit package on package system
JP5140565B2 (ja) * 2008-11-28 2013-02-06 三洋電機株式会社 素子搭載用基板、半導体モジュール、および携帯機器
US8097956B2 (en) * 2009-03-12 2012-01-17 Apple Inc. Flexible packaging for chip-on-chip and package-on-package technologies
JP2010238995A (ja) * 2009-03-31 2010-10-21 Sanyo Electric Co Ltd 半導体モジュールおよびこれを搭載したカメラモジュール
JP5521424B2 (ja) * 2009-07-28 2014-06-11 セイコーエプソン株式会社 集積回路装置、電子機器及び電子機器の製造方法
US8064202B2 (en) * 2010-02-24 2011-11-22 Monolithic Power Systems, Inc. Sandwich structure with double-sided cooling and EMI shielding
KR101686199B1 (ko) 2010-03-26 2016-12-14 삼성전자주식회사 반도체 패키지 구조물
KR101817159B1 (ko) 2011-02-17 2018-02-22 삼성전자 주식회사 Tsv를 가지는 인터포저를 포함하는 반도체 패키지 및 그 제조 방법
CN102157394A (zh) * 2011-03-22 2011-08-17 南通富士通微电子股份有限公司 高密度系统级封装方法
US8674516B2 (en) * 2011-06-22 2014-03-18 Stats Chippac Ltd. Integrated circuit packaging system with vertical interconnects and method of manufacture thereof
KR20130007049A (ko) * 2011-06-28 2013-01-18 삼성전자주식회사 쓰루 실리콘 비아를 이용한 패키지 온 패키지
US8816404B2 (en) * 2011-09-16 2014-08-26 Stats Chippac, Ltd. Semiconductor device and method of forming stacked semiconductor die and conductive interconnect structure through an encapsulant
KR101797079B1 (ko) * 2011-12-30 2017-11-14 삼성전자 주식회사 Pop 구조의 반도체 패키지
US8742597B2 (en) * 2012-06-29 2014-06-03 Intel Corporation Package substrates with multiple dice
US9368477B2 (en) * 2012-08-27 2016-06-14 Invensas Corporation Co-support circuit panel and microelectronic packages
US8860202B2 (en) * 2012-08-29 2014-10-14 Macronix International Co., Ltd. Chip stack structure and manufacturing method thereof
JP5996500B2 (ja) * 2013-09-11 2016-09-21 株式会社東芝 半導体装置および記憶装置
US9281284B2 (en) * 2014-06-20 2016-03-08 Freescale Semiconductor Inc. System-in-packages having vertically-interconnected leaded components and methods for the fabrication thereof
JP6543129B2 (ja) 2015-07-29 2019-07-10 ルネサスエレクトロニクス株式会社 電子装置
KR102438753B1 (ko) * 2015-10-01 2022-09-01 에스케이하이닉스 주식회사 반도체 장치
US11024757B2 (en) * 2016-01-15 2021-06-01 Sony Corporation Semiconductor device and imaging apparatus
US11487445B2 (en) * 2016-11-22 2022-11-01 Intel Corporation Programmable integrated circuit with stacked memory die for storing configuration data
CN108400117A (zh) * 2017-02-06 2018-08-14 钰桥半导体股份有限公司 三维整合的散热增益型半导体组件及其制作方法
US10475770B2 (en) 2017-02-28 2019-11-12 Amkor Technology, Inc. Semiconductor device having stacked dies and stacked pillars and method of manufacturing thereof
JP6679528B2 (ja) * 2017-03-22 2020-04-15 キオクシア株式会社 半導体装置
JP2020150145A (ja) * 2019-03-14 2020-09-17 キオクシア株式会社 半導体装置
US11443776B2 (en) * 2019-06-14 2022-09-13 Qualcomm Incorporated Memory system design for signal integrity crosstalk reduction with asymmetry

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001068617A (ja) * 1999-08-27 2001-03-16 Toshiba Corp 半導体装置
JP3853219B2 (ja) * 2002-01-18 2006-12-06 イビデン株式会社 半導体素子内蔵基板および多層回路基板
JP4069771B2 (ja) * 2003-03-17 2008-04-02 セイコーエプソン株式会社 半導体装置、電子機器および半導体装置の製造方法
JP2004281920A (ja) * 2003-03-18 2004-10-07 Seiko Epson Corp 半導体装置、電子デバイス、電子機器、半導体装置の製造方法および電子デバイスの製造方法
JP4419049B2 (ja) * 2003-04-21 2010-02-24 エルピーダメモリ株式会社 メモリモジュール及びメモリシステム
JP4174013B2 (ja) * 2003-07-18 2008-10-29 株式会社ルネサステクノロジ 半導体装置
JP3858854B2 (ja) 2003-06-24 2006-12-20 富士通株式会社 積層型半導体装置
JP2006032379A (ja) * 2004-07-12 2006-02-02 Akita Denshi Systems:Kk 積層半導体装置及びその製造方法
JP4199724B2 (ja) * 2004-12-03 2008-12-17 エルピーダメモリ株式会社 積層型半導体パッケージ
JP4408090B2 (ja) * 2005-03-01 2010-02-03 パナソニック株式会社 部品内蔵モジュールの製造方法
TWI267967B (en) * 2005-07-14 2006-12-01 Chipmos Technologies Inc Chip package without a core and stacked chip package structure using the same
US7550680B2 (en) * 2006-06-14 2009-06-23 Stats Chippac Ltd. Package-on-package system
US7667338B2 (en) * 2006-08-08 2010-02-23 Lin Paul T Package with solder-filled via holes in molding layers

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI483363B (zh) * 2012-07-26 2015-05-01 臻鼎科技股份有限公司 晶片封裝基板、晶片封裝結構及其製作方法
TWI678747B (zh) * 2018-10-01 2019-12-01 點序科技股份有限公司 測試裝置及其晶片承載板

Also Published As

Publication number Publication date
CN101101909A (zh) 2008-01-09
JP2008016519A (ja) 2008-01-24
US7847413B2 (en) 2010-12-07
JP5259059B2 (ja) 2013-08-07
KR20080004356A (ko) 2008-01-09
US20080006947A1 (en) 2008-01-10

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