SG136134A1 - Lithographic apparatus and device manufacturing method - Google Patents

Lithographic apparatus and device manufacturing method

Info

Publication number
SG136134A1
SG136134A1 SG200706660-8A SG2007066608A SG136134A1 SG 136134 A1 SG136134 A1 SG 136134A1 SG 2007066608 A SG2007066608 A SG 2007066608A SG 136134 A1 SG136134 A1 SG 136134A1
Authority
SG
Singapore
Prior art keywords
device manufacturing
lithographic apparatus
lithographic
manufacturing
Prior art date
Application number
SG200706660-8A
Other languages
English (en)
Inventor
Erik Roelof Loopstra
Marcel Mathijs Theodo Dierichs
Johannes Christiaan Mar Jasper
Hendricus Johanne Maria Meijer
Uwe Mickan
Johannes Catharinus Hu Mulkens
Mathew Lipson
Tammo Uitterdijk
Johannes Jacobus Mat Baselmans
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of SG136134A1 publication Critical patent/SG136134A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/162—Protective or antiabrasion layer

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Microscoopes, Condenser (AREA)
SG200706660-8A 2003-08-29 2004-08-23 Lithographic apparatus and device manufacturing method SG136134A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP03255377 2003-08-29

Publications (1)

Publication Number Publication Date
SG136134A1 true SG136134A1 (en) 2007-10-29

Family

ID=34924204

Family Applications (2)

Application Number Title Priority Date Filing Date
SG200706660-8A SG136134A1 (en) 2003-08-29 2004-08-23 Lithographic apparatus and device manufacturing method
SG2011034329A SG173309A1 (en) 2003-08-29 2004-08-23 Lithographic apparatus and device manufacturing method

Family Applications After (1)

Application Number Title Priority Date Filing Date
SG2011034329A SG173309A1 (en) 2003-08-29 2004-08-23 Lithographic apparatus and device manufacturing method

Country Status (6)

Country Link
US (6) US8208124B2 (ja)
EP (1) EP2261740B1 (ja)
JP (3) JP4586032B2 (ja)
KR (1) KR100659259B1 (ja)
SG (2) SG136134A1 (ja)
TW (1) TWI254189B (ja)

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US7324185B2 (en) 2005-03-04 2008-01-29 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8248577B2 (en) 2005-05-03 2012-08-21 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
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NL2017128A (en) * 2015-07-16 2017-01-23 Asml Netherlands Bv A lithographic apparatus, a projection system, a last lens element, a liquid control member and a device manufacturing method
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US11966165B2 (en) * 2021-01-22 2024-04-23 Taiwan Semiconductor Manufacturing Company, Ltd. Immersion exposure tool

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JP4510494B2 (ja) 2004-03-29 2010-07-21 キヤノン株式会社 露光装置

Also Published As

Publication number Publication date
US20140071420A1 (en) 2014-03-13
JP5170790B2 (ja) 2013-03-27
US20070201012A1 (en) 2007-08-30
EP2261740A2 (en) 2010-12-15
US20170160650A1 (en) 2017-06-08
JP4586032B2 (ja) 2010-11-24
US8804097B2 (en) 2014-08-12
KR100659259B1 (ko) 2006-12-19
JP2010153923A (ja) 2010-07-08
KR20050021872A (ko) 2005-03-07
EP2261740B1 (en) 2014-07-09
JP5414839B2 (ja) 2014-02-12
US10146142B2 (en) 2018-12-04
TWI254189B (en) 2006-05-01
US20140347642A1 (en) 2014-11-27
EP2261740A3 (en) 2011-04-27
US20120013868A1 (en) 2012-01-19
JP2007165934A (ja) 2007-06-28
JP2012151513A (ja) 2012-08-09
US20190086819A1 (en) 2019-03-21
TW200519529A (en) 2005-06-16
US8208124B2 (en) 2012-06-26
US9606448B2 (en) 2017-03-28
SG173309A1 (en) 2011-08-29
US9442388B2 (en) 2016-09-13

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