KR950032718A - 구리 호일용 결절상 구리/니켈 합금 처리법 - Google Patents

구리 호일용 결절상 구리/니켈 합금 처리법 Download PDF

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KR950032718A
KR950032718A KR1019950000902A KR19950000902A KR950032718A KR 950032718 A KR950032718 A KR 950032718A KR 1019950000902 A KR1019950000902 A KR 1019950000902A KR 19950000902 A KR19950000902 A KR 19950000902A KR 950032718 A KR950032718 A KR 950032718A
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foil
copper
metallic
current density
metallic foil
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첸 쭈챠인
유코프 니나
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폴 와인스타인
올린 코포레이션
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    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/38Improvement of the adhesion between the insulating substrate and the metal
    • H05K3/382Improvement of the adhesion between the insulating substrate and the metal by special treatment of the metal
    • H05K3/384Improvement of the adhesion between the insulating substrate and the metal by special treatment of the metal by plating
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/38Electroplating: Baths therefor from solutions of copper
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60Electroplating characterised by the structure or texture of the layers
    • C25D5/605Surface topography of the layers, e.g. rough, dendritic or nodular layers
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/627Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/18Electroplating using modulated, pulsed or reversing current
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/03Conductive materials
    • H05K2201/0332Structure of the conductor
    • H05K2201/0335Layered conductors or foils
    • H05K2201/0355Metal foils
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/03Metal processing
    • H05K2203/0307Providing micro- or nanometer scale roughness on a metal surface, e.g. by plating of nodules or dendrites
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/03Metal processing
    • H05K2203/0392Pretreatment of metal, e.g. before finish plating, etching
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/07Treatments involving liquids, e.g. plating, rinsing
    • H05K2203/0703Plating
    • H05K2203/0723Electroplating, e.g. finish plating
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/02Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/06Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
    • H05K3/07Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process being removed electrolytically
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S428/00Stock material or miscellaneous articles
    • Y10S428/922Static electricity metal bleed-off metallic stock
    • Y10S428/9335Product by special process
    • Y10S428/934Electrical process
    • Y10S428/935Electroplating
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/12All metal or with adjacent metals
    • Y10T428/12431Foil or filament smaller than 6 mils
    • Y10T428/12438Composite
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/12All metal or with adjacent metals
    • Y10T428/12472Microscopic interfacial wave or roughness
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/12All metal or with adjacent metals
    • Y10T428/12493Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
    • Y10T428/12771Transition metal-base component
    • Y10T428/12861Group VIII or IB metal-base component
    • Y10T428/12903Cu-base component
    • Y10T428/1291Next to Co-, Cu-, or Ni-base component
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/12All metal or with adjacent metals
    • Y10T428/12993Surface feature [e.g., rough, mirror]

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Parts Printed On Printed Circuit Boards (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Laminated Bodies (AREA)

Abstract

호일(10)의 에칭 특성을 변성시키지 않으면서 호일(10)에 어두운 색상을 부여하고 유전 기판(22)에 대한 호일(10)의 결합강도를 개성시키는 구리 호일(10)용 화학처리법이 기재되어 있다. 처리법은 호일(10)의 표면에 결정상 구리/니켈 합금층(14)을 전착시키는 것을 포함한다. 결절상 피복층(14)은 구리가 50중량% 이상이고 펄스 전력 조절기를 사용하여 전착된다.

Description

구리 호일용 결절상 구리/니켈 합금 처리법
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 본 발명의 방법에 따라 처리한 금속성 호일의 단면도이고, 제3도는 제2도의 적층 구조물을 금속성 호일의 사진영상화(photoimaging)시킨 단면도이고, 제4도는 본 발명에 따른 금속성 호일을 처리하기 위한 다수의 전해 셀을 개략적으로 나타낸 것이다.

Claims (16)

  1. 금속성 기판(12)과 금속성 기판(12)의 적어도 한쪽 표면에 인접하며 구리를 50중량% 이상 함유하는 구리와 니켈의 합금인 결절상 피복층(14)을 특징으로 하는 복합 호일(10).
  2. 유전 기판(22)과 유전 기판의 적어도 한쪽 면에 결합된 제1항의 복합 호일(10)을 특징으로 하는 인쇄 회로 기판(20).
  3. 제1항 또는 제2항에 있어서, 금속성 기판(12)이 구리 또는 구리 기본 합금임을 특징으로 하는 복합 호일(10).
  4. 제3항에 있어서, 결절상 피복층(14)이 구리를 약 55 내지 99중량% 함유함을 특징으로 하는 복합 호일(10).
  5. 제4항에 있어서, 결절상 피복층(14)이 구리를 약 70 내지 95중량% 함유함을 특징으로 하는 복합 호일(10).
  6. 제4항에 있어서, 결절상 피복층(14)을 형성하는 결절의 평균 가로방향 폭(W)이 약 0.05 내지 약 5μ이고 평균 높이가 약 0.5 내지 약 3μ임을 특징으로 하는 복합 호일(10).
  7. 제6항에 있어서, 결절의 평균 가로방향 폭(W)이 약 0.1내지 약 1μ이고 평균 높이가 약 0.7 내지 약 0.5μ임을 특징으로 하는 복합 호일(10).
  8. 구리 이온과 니켈 이온의 수용액을 함유하는 다량의 전해질(60)과 양극(64)을 갖는 전해 셀(48)에 금속성 호일(42)을 침지시키는 단계(a), 음극으로서 금속성 호일(42)을 사용하여 제1전류밀도를 제1시간 동안 전해질(60)을 통해 인가하는 단계(b), 음극으로서 금속성 호일(42)을 사용하여 제2전류밀도를 제2시간 동안 전해질(60)을 통해 인가하는 단계(c)(이때, 제1전류밀도와 제2전류밀도는 둘 다 0보다 크다)및 단계(b) 와 단계(c)를 연속적으로 반복하여 박리강도를 증가시키기에 유효한 두께로 어두운 색 피막을 전착시키는 단계(d)를 특징으로 하여, 금속성 기판(42)에 어두운 색 피막을 전착시키는 방법.
  9. 제8항에 있어서, 제1전류밀도가 약 100 내지 400mA/㎠이고, 제1시간이 약 10 내지 50msec이며, 제2전류 밀도가 약 10 내지 100mA/㎠이고, 제2시간이 약 5 내지 20msec임을 특징으로 하는 방법.
  10. 제9항에 있어서, 단계(b)와 단계(c)가 약 5 내지 약 400sec동안 반복됨을 특징으로 하는 방법.
  11. 제10항에 있어서, 전해질(60)이 금속성 구리의 형태로 구리 약 3 내지 약 20g/ℓ, 금속성 니켈의 형태로 약 3 내지 약 20g/ℓ및 시르트산나트륨.2수화물 약 40 내지 약 210g/ℓ를 함유하도록 선택되고, 작동 pH가 약 4내지 9이며, 작동온도가 약 30 내지 60℃임을 특징으로 하는 방법.
  12. 제11항에 있어서, 단계(a)에 앞서 금속성 호일(42)을 세정함을 특징으로 하는 방법.
  13. 제12항에 있어서, 세정단계가, 음극으로서 금속성 호일(42)을 사용하여 전류밀도 약 10 내지 40mA/㎠에서 약 10 내지 약 40sec동안 금속성 호일(42)을 알칼리성 수용액(52)에 침지시킨 다음 세정된 금속성 호일(42)을 전기적으로 에칭시키는 단계를 포함함을 특징으로 하는 방법.
  14. 제12항에 있어서, 제정단계가, 금속성 호일(42)을 알칼리성 수용액(52)에 침지시키고, 양극으로서 금속성 호일을 사용하여 전류밀도 약 10 내지 약 100mA/㎠에서 약 10 내지 약 40sec동안 전해질 온도 약 40 내지 60℃에서 알칼리성 수용액을 톡해 전류를 인가하는 단계를 포함함을 특징으로 하는 방법.
  15. 제12항에 있어서, 단계(d)후에 처리된 금속성 호일(44)이 변색방지층으로 피복됨을 특징으로 하는 방법.
  16. 제15항에 있어서, 변색방지 피복물(66)이, 아연 대 크롬의 중량비가 약 4:1을 초과하는 크롬과 아연의 혼합물임을 특징으로 하는 방법.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019950000902A 1994-01-21 1995-01-20 결절상구리/니켈합금피막을포함하는복합호일,이를포함하는인쇄회로기판및결절상구리/니켈합금피막의전착방법 KR100407732B1 (ko)

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US18453494A 1994-01-21 1994-01-21
US08/184534 1994-01-21

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KR100407732B1 KR100407732B1 (ko) 2004-03-25

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JP (1) JP3459964B2 (ko)
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HK (1) HK1006065A1 (ko)
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JPH07243088A (ja) 1995-09-19
KR100407732B1 (ko) 2004-03-25
GB2285813B (en) 1997-12-10
MY111671A (en) 2000-10-31
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US5800930A (en) 1998-09-01
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