KR20140019018A - 경질 탄소층을 박리하기 위한 방법 - Google Patents
경질 탄소층을 박리하기 위한 방법 Download PDFInfo
- Publication number
- KR20140019018A KR20140019018A KR1020147000018A KR20147000018A KR20140019018A KR 20140019018 A KR20140019018 A KR 20140019018A KR 1020147000018 A KR1020147000018 A KR 1020147000018A KR 20147000018 A KR20147000018 A KR 20147000018A KR 20140019018 A KR20140019018 A KR 20140019018A
- Authority
- KR
- South Korea
- Prior art keywords
- substrate
- gas
- layer
- oxygen
- reactive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
- 238000000034 method Methods 0.000 title claims abstract description 106
- 229910021385 hard carbon Inorganic materials 0.000 title description 5
- 239000000758 substrate Substances 0.000 claims abstract description 148
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims abstract description 71
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 68
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 65
- 239000007789 gas Substances 0.000 claims abstract description 58
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 42
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 40
- 239000001301 oxygen Substances 0.000 claims abstract description 40
- 238000004299 exfoliation Methods 0.000 claims abstract description 34
- 239000012495 reaction gas Substances 0.000 claims abstract description 28
- 229910052757 nitrogen Inorganic materials 0.000 claims abstract description 27
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims abstract description 26
- 238000010891 electric arc Methods 0.000 claims abstract description 26
- 239000001257 hydrogen Substances 0.000 claims abstract description 21
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 21
- 238000006243 chemical reaction Methods 0.000 claims abstract description 19
- 239000000376 reactant Substances 0.000 claims abstract description 14
- 230000008569 process Effects 0.000 claims description 36
- 238000000576 coating method Methods 0.000 claims description 23
- 229910001873 dinitrogen Inorganic materials 0.000 claims description 16
- 239000011248 coating agent Substances 0.000 claims description 15
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 claims description 11
- 229910001882 dioxygen Inorganic materials 0.000 claims description 11
- 230000003647 oxidation Effects 0.000 claims description 7
- 238000007254 oxidation reaction Methods 0.000 claims description 7
- 229910052796 boron Inorganic materials 0.000 claims description 4
- 229910052710 silicon Inorganic materials 0.000 claims description 4
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 3
- 229910052732 germanium Inorganic materials 0.000 claims description 3
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims description 3
- 229910052755 nonmetal Inorganic materials 0.000 claims description 3
- 239000010703 silicon Substances 0.000 claims description 3
- 150000002500 ions Chemical class 0.000 claims description 2
- 230000008901 benefit Effects 0.000 abstract description 4
- 230000004913 activation Effects 0.000 abstract description 2
- 239000010410 layer Substances 0.000 description 147
- 206010040844 Skin exfoliation Diseases 0.000 description 57
- 229910052751 metal Inorganic materials 0.000 description 17
- 239000002184 metal Substances 0.000 description 17
- 239000000463 material Substances 0.000 description 14
- 229910003460 diamond Inorganic materials 0.000 description 12
- 239000010432 diamond Substances 0.000 description 12
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 10
- 230000005284 excitation Effects 0.000 description 10
- 229910003481 amorphous carbon Inorganic materials 0.000 description 9
- 150000001875 compounds Chemical class 0.000 description 7
- 238000004544 sputter deposition Methods 0.000 description 7
- 229910052786 argon Inorganic materials 0.000 description 5
- 238000005530 etching Methods 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- 229910000831 Steel Inorganic materials 0.000 description 4
- 238000005260 corrosion Methods 0.000 description 4
- 230000007797 corrosion Effects 0.000 description 4
- 229910002804 graphite Inorganic materials 0.000 description 4
- 239000010439 graphite Substances 0.000 description 4
- 238000010849 ion bombardment Methods 0.000 description 4
- 238000010297 mechanical methods and process Methods 0.000 description 4
- 239000010959 steel Substances 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 3
- 238000005422 blasting Methods 0.000 description 3
- 125000004432 carbon atom Chemical group C* 0.000 description 3
- 238000005229 chemical vapour deposition Methods 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 3
- 238000005520 cutting process Methods 0.000 description 3
- 239000010419 fine particle Substances 0.000 description 3
- -1 hydrogen- Chemical class 0.000 description 3
- 229910021645 metal ion Inorganic materials 0.000 description 3
- MWUXSHHQAYIFBG-UHFFFAOYSA-N nitrogen oxide Inorganic materials O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- 238000004080 punching Methods 0.000 description 3
- 238000000992 sputter etching Methods 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 150000001722 carbon compounds Chemical class 0.000 description 2
- 230000032798 delamination Effects 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 150000002366 halogen compounds Chemical class 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 239000011241 protective layer Substances 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000007704 wet chemistry method Methods 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 238000005270 abrasive blasting Methods 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 239000010405 anode material Substances 0.000 description 1
- 238000000429 assembly Methods 0.000 description 1
- 230000000712 assembly Effects 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 238000002845 discoloration Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000008187 granular material Substances 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000007943 implant Substances 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
- 239000006115 industrial coating Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000005404 monopole Effects 0.000 description 1
- 229910052754 neon Inorganic materials 0.000 description 1
- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 238000012858 packaging process Methods 0.000 description 1
- 238000005240 physical vapour deposition Methods 0.000 description 1
- 239000010970 precious metal Substances 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 239000003039 volatile agent Substances 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G5/00—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Chemical Vapour Deposition (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Physical Vapour Deposition (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- General Physics & Mathematics (AREA)
- Inorganic Chemistry (AREA)
- Plasma & Fusion (AREA)
- ing And Chemical Polishing (AREA)
- Cutting Tools, Boring Holders, And Turrets (AREA)
- Analytical Chemistry (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102011105645A DE102011105645A1 (de) | 2011-06-07 | 2011-06-07 | Entschichtungsverfahren für harte Kohlenstoffschichten |
| DE102011105645.2 | 2011-06-07 | ||
| PCT/EP2012/002305 WO2012167886A1 (de) | 2011-06-07 | 2012-05-31 | Entschichtungsverfahren für harte kohlenstoffschichten |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020167002198A Division KR101784638B1 (ko) | 2011-06-07 | 2012-05-31 | 경질 탄소층을 박리하기 위한 방법 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR20140019018A true KR20140019018A (ko) | 2014-02-13 |
Family
ID=47220581
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020147000018A Ceased KR20140019018A (ko) | 2011-06-07 | 2012-05-31 | 경질 탄소층을 박리하기 위한 방법 |
| KR1020167002198A Expired - Fee Related KR101784638B1 (ko) | 2011-06-07 | 2012-05-31 | 경질 탄소층을 박리하기 위한 방법 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020167002198A Expired - Fee Related KR101784638B1 (ko) | 2011-06-07 | 2012-05-31 | 경질 탄소층을 박리하기 위한 방법 |
Country Status (11)
| Country | Link |
|---|---|
| EP (1) | EP2718481B1 (enExample) |
| JP (1) | JP5933701B2 (enExample) |
| KR (2) | KR20140019018A (enExample) |
| CN (1) | CN103717788B (enExample) |
| BR (1) | BR112013031584B1 (enExample) |
| CA (1) | CA2846434C (enExample) |
| DE (1) | DE102011105645A1 (enExample) |
| PH (1) | PH12014500059A1 (enExample) |
| RU (1) | RU2606899C2 (enExample) |
| SG (1) | SG2014001168A (enExample) |
| WO (1) | WO2012167886A1 (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20170013308A (ko) * | 2015-04-08 | 2017-02-06 | 신메이와 고교 가부시키가이샤 | 이온 조사에 의한 피복재의 탈막 방법 및 탈막 장치 |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6381984B2 (ja) * | 2014-06-13 | 2018-08-29 | 学校法人 芝浦工業大学 | 脱膜方法及び脱膜装置 |
| CN107923030A (zh) * | 2015-08-18 | 2018-04-17 | 塔塔钢铁荷兰科技有限责任公司 | 用于清洁和涂覆金属带材的方法和设备 |
| RU2632702C1 (ru) * | 2016-10-28 | 2017-10-09 | Арчил Важаевич Цискарашвили | Антиадгезивное антибактериальное покрытие для ортопедических имплантатов из титана и нержавеющей стали |
| US10347463B2 (en) * | 2016-12-09 | 2019-07-09 | Fei Company | Enhanced charged particle beam processes for carbon removal |
| CN108987255A (zh) * | 2018-06-19 | 2018-12-11 | 广东先导先进材料股份有限公司 | 类金刚石膜表面处理工艺 |
| CN108754520A (zh) * | 2018-06-29 | 2018-11-06 | 四川大学 | 硬质合金表面涂层去除方法和设备 |
| US12163213B2 (en) * | 2019-07-31 | 2024-12-10 | Oerlikon Surface Solutions Ag, Pfäffikon | Graded hydrogen-free carbon-based hard material layer coated onto a substrate |
| JP7422540B2 (ja) * | 2019-12-26 | 2024-01-26 | 東京エレクトロン株式会社 | 成膜方法および成膜装置 |
| CN111871973A (zh) * | 2020-07-30 | 2020-11-03 | 成都光明光电股份有限公司 | Dlc膜的脱膜方法及脱膜机 |
| CN114645281B (zh) * | 2022-04-06 | 2023-11-24 | 岭南师范学院 | 一种褪除金属工件表面碳膜的方法 |
| CN115954269B (zh) * | 2022-12-20 | 2024-08-16 | 西安理工大学 | 实现离子轰击和电子轰击辅助转换的氧等离子体刻蚀方法 |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| SU375326A1 (ru) * | 1971-02-01 | 1973-03-23 | ПОТОЧНАЯ ЛИНИЯ ДЛЯ очистки ДЕТАЛЕЙ | |
| SU1227280A1 (ru) * | 1984-06-26 | 1986-04-30 | Магнитогорский горно-металлургический институт им.Г.И.Носова | Способ очистки поверхности металлических изделий |
| JPS63211630A (ja) * | 1988-01-29 | 1988-09-02 | Hitachi Ltd | プラズマ処理装置 |
| JP3513811B2 (ja) * | 1988-08-11 | 2004-03-31 | 株式会社半導体エネルギー研究所 | 炭素または炭素を主成分とする被膜の形成方法 |
| JP2763172B2 (ja) * | 1990-03-19 | 1998-06-11 | 株式会社神戸製鋼所 | ダイヤモンド薄膜のエッチング方法 |
| DE59202116D1 (de) | 1991-04-23 | 1995-06-14 | Balzers Hochvakuum | Verfahren zur Abtragung von Material von einer Oberfläche in einer Vakuumkammer. |
| JPH0598412A (ja) * | 1991-10-07 | 1993-04-20 | Nippon Steel Corp | 被溶射材料の前処理方法 |
| JPH05339758A (ja) * | 1992-06-08 | 1993-12-21 | Nachi Fujikoshi Corp | ダイヤモンド被覆工具の再研磨・再被覆方法 |
| US5401543A (en) | 1993-11-09 | 1995-03-28 | Minnesota Mining And Manufacturing Company | Method for forming macroparticle-free DLC films by cathodic arc discharge |
| DE4401986A1 (de) | 1994-01-25 | 1995-07-27 | Dresden Vakuumtech Gmbh | Verfahren zum Betreiben eines Vakuumlichtbogenverdampfers und Stromversorgungseinrichtung dafür |
| US5993680A (en) * | 1996-08-15 | 1999-11-30 | Citizen Watch Co., Ltd. | Method of removing hard carbon film formed on inner circumferential surface of guide bush |
| DE19831914A1 (de) | 1998-07-16 | 2000-01-20 | Laser & Med Tech Gmbh | Verfahren und Vorrichtung zur Säuberung und Entschichtung transparenter Werkstücke |
| US6605175B1 (en) * | 1999-02-19 | 2003-08-12 | Unaxis Balzers Aktiengesellschaft | Process for manufacturing component parts, use of same, with air bearing supported workpieces and vacuum processing chamber |
| CN1138020C (zh) | 1999-09-29 | 2004-02-11 | 永源科技股份有限公司 | 阴极电弧蒸镀方式淀积类金刚石碳膜的制备方法 |
| JP3439423B2 (ja) * | 2000-04-11 | 2003-08-25 | オーエスジー株式会社 | ダイヤモンド被膜除去方法およびダイヤモンド被覆部材の製造方法 |
| JP3997084B2 (ja) | 2001-12-27 | 2007-10-24 | 株式会社不二越 | 硬質炭素被覆膜の脱膜方法及び再生方法並びに再生基材 |
| US6902774B2 (en) | 2002-07-25 | 2005-06-07 | Inficon Gmbh | Method of manufacturing a device |
| US7381311B2 (en) | 2003-10-21 | 2008-06-03 | The United States Of America As Represented By The Secretary Of The Air Force | Filtered cathodic-arc plasma source |
| JP4680066B2 (ja) * | 2004-01-28 | 2011-05-11 | 東京エレクトロン株式会社 | 基板処理装置の処理室清浄化方法、基板処理装置、および基板処理方法 |
| ATE453739T1 (de) | 2004-01-29 | 2010-01-15 | Oerlikon Trading Ag | Entschichtungsverfahren |
| DE112005002085A5 (de) * | 2004-09-23 | 2007-08-16 | Cemecon Ag | Zerspanungswerkzeug und Verfahren zu seiner Herstellung |
| JP2007134425A (ja) * | 2005-11-09 | 2007-05-31 | Sony Corp | 半導体装置および半導体装置の製造方法 |
| DE102006032568A1 (de) * | 2006-07-12 | 2008-01-17 | Stein, Ralf | Verfahren zur plasmagestützten chemischen Gasphasenabscheidung an der Innenwand eines Hohlkörpers |
| US7914692B2 (en) * | 2006-08-29 | 2011-03-29 | Ngk Insulators, Ltd. | Methods of generating plasma, of etching an organic material film, of generating minus ions, of oxidation and nitriding |
| CN101308764B (zh) | 2007-05-15 | 2011-03-23 | 中芯国际集成电路制造(上海)有限公司 | 消除蚀刻工序残留聚合物的方法 |
| WO2008149824A1 (ja) * | 2007-06-01 | 2008-12-11 | Onward Ceramic Coating Co., Ltd. | Ｄｌｃ被覆工具 |
| MX347701B (es) | 2008-05-02 | 2017-05-09 | Oerlikon Surface Solutions Ag Pfäffikon | Procedimiento para decapar piezas de trabajo y solucion de decapado. |
| DE102008053254A1 (de) * | 2008-10-25 | 2010-04-29 | Ab Solut Chemie Gmbh | Verfahren zum substratschonenden Entfernen von Hartstoffschichten |
-
2011
- 2011-06-07 DE DE102011105645A patent/DE102011105645A1/de not_active Withdrawn
-
2012
- 2012-05-31 SG SG2014001168A patent/SG2014001168A/en unknown
- 2012-05-31 CN CN201280038683.9A patent/CN103717788B/zh not_active Expired - Fee Related
- 2012-05-31 BR BR112013031584-9A patent/BR112013031584B1/pt not_active IP Right Cessation
- 2012-05-31 WO PCT/EP2012/002305 patent/WO2012167886A1/de not_active Ceased
- 2012-05-31 EP EP12725315.1A patent/EP2718481B1/de active Active
- 2012-05-31 CA CA2846434A patent/CA2846434C/en active Active
- 2012-05-31 JP JP2014513932A patent/JP5933701B2/ja not_active Expired - Fee Related
- 2012-05-31 RU RU2013158315A patent/RU2606899C2/ru active
- 2012-05-31 KR KR1020147000018A patent/KR20140019018A/ko not_active Ceased
- 2012-05-31 KR KR1020167002198A patent/KR101784638B1/ko not_active Expired - Fee Related
- 2012-05-31 PH PH1/2014/500059A patent/PH12014500059A1/en unknown
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20170013308A (ko) * | 2015-04-08 | 2017-02-06 | 신메이와 고교 가부시키가이샤 | 이온 조사에 의한 피복재의 탈막 방법 및 탈막 장치 |
| KR101864877B1 (ko) * | 2015-04-08 | 2018-06-07 | 신메이와 고교 가부시키가이샤 | 이온 조사에 의한 피복재의 탈막 방법 및 탈막 장치 |
Also Published As
| Publication number | Publication date |
|---|---|
| CN103717788A (zh) | 2014-04-09 |
| KR101784638B1 (ko) | 2017-10-11 |
| BR112013031584A8 (pt) | 2018-02-06 |
| EP2718481B1 (de) | 2017-04-05 |
| WO2012167886A8 (de) | 2014-01-23 |
| RU2013158315A (ru) | 2015-07-20 |
| JP2014525982A (ja) | 2014-10-02 |
| RU2606899C2 (ru) | 2017-01-10 |
| KR20160017662A (ko) | 2016-02-16 |
| PH12014500059A1 (en) | 2014-03-24 |
| DE102011105645A1 (de) | 2012-12-13 |
| CA2846434C (en) | 2019-01-15 |
| EP2718481A1 (de) | 2014-04-16 |
| CA2846434A1 (en) | 2013-12-13 |
| SG2014001168A (en) | 2014-05-29 |
| WO2012167886A1 (de) | 2012-12-13 |
| CN103717788B (zh) | 2016-06-29 |
| BR112013031584B1 (pt) | 2020-11-03 |
| BR112013031584A2 (pt) | 2016-12-13 |
| JP5933701B2 (ja) | 2016-06-15 |
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