JP5933701B2 - 硬質の炭素層のためのコーティング除去方法 - Google Patents

硬質の炭素層のためのコーティング除去方法 Download PDF

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Publication number
JP5933701B2
JP5933701B2 JP2014513932A JP2014513932A JP5933701B2 JP 5933701 B2 JP5933701 B2 JP 5933701B2 JP 2014513932 A JP2014513932 A JP 2014513932A JP 2014513932 A JP2014513932 A JP 2014513932A JP 5933701 B2 JP5933701 B2 JP 5933701B2
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layer
substrate
gas
carbon
reactive
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Japanese (ja)
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JP2014525982A5 (enExample
JP2014525982A (ja
Inventor
ラム,ユルゲン
ビドリッヒ,ベノ
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Oerlikon Surface Solutions AG Pfaeffikon
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Oerlikon Surface Solutions AG Pfaeffikon
Oerlikon Trading AG Truebbach
Oerlikon Surface Solutions AG Truebbach
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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23GCLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G5/00Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02Pretreatment of the material to be coated

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Vapour Deposition (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Physical Vapour Deposition (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • ing And Chemical Polishing (AREA)
  • Cutting Tools, Boring Holders, And Turrets (AREA)
  • Analytical Chemistry (AREA)
  • Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
JP2014513932A 2011-06-07 2012-05-31 硬質の炭素層のためのコーティング除去方法 Expired - Fee Related JP5933701B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102011105645A DE102011105645A1 (de) 2011-06-07 2011-06-07 Entschichtungsverfahren für harte Kohlenstoffschichten
DE102011105645.2 2011-06-07
PCT/EP2012/002305 WO2012167886A1 (de) 2011-06-07 2012-05-31 Entschichtungsverfahren für harte kohlenstoffschichten

Publications (3)

Publication Number Publication Date
JP2014525982A JP2014525982A (ja) 2014-10-02
JP2014525982A5 JP2014525982A5 (enExample) 2015-07-16
JP5933701B2 true JP5933701B2 (ja) 2016-06-15

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JP2014513932A Expired - Fee Related JP5933701B2 (ja) 2011-06-07 2012-05-31 硬質の炭素層のためのコーティング除去方法

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Country Link
EP (1) EP2718481B1 (enExample)
JP (1) JP5933701B2 (enExample)
KR (2) KR20140019018A (enExample)
CN (1) CN103717788B (enExample)
BR (1) BR112013031584B1 (enExample)
CA (1) CA2846434C (enExample)
DE (1) DE102011105645A1 (enExample)
PH (1) PH12014500059A1 (enExample)
RU (1) RU2606899C2 (enExample)
SG (1) SG2014001168A (enExample)
WO (1) WO2012167886A1 (enExample)

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KR101864877B1 (ko) * 2015-04-08 2018-06-07 신메이와 고교 가부시키가이샤 이온 조사에 의한 피복재의 탈막 방법 및 탈막 장치
CN107923030A (zh) * 2015-08-18 2018-04-17 塔塔钢铁荷兰科技有限责任公司 用于清洁和涂覆金属带材的方法和设备
RU2632702C1 (ru) * 2016-10-28 2017-10-09 Арчил Важаевич Цискарашвили Антиадгезивное антибактериальное покрытие для ортопедических имплантатов из титана и нержавеющей стали
US10347463B2 (en) * 2016-12-09 2019-07-09 Fei Company Enhanced charged particle beam processes for carbon removal
CN108987255A (zh) * 2018-06-19 2018-12-11 广东先导先进材料股份有限公司 类金刚石膜表面处理工艺
CN108754520A (zh) * 2018-06-29 2018-11-06 四川大学 硬质合金表面涂层去除方法和设备
US12163213B2 (en) * 2019-07-31 2024-12-10 Oerlikon Surface Solutions Ag, Pfäffikon Graded hydrogen-free carbon-based hard material layer coated onto a substrate
JP7422540B2 (ja) * 2019-12-26 2024-01-26 東京エレクトロン株式会社 成膜方法および成膜装置
CN111871973A (zh) * 2020-07-30 2020-11-03 成都光明光电股份有限公司 Dlc膜的脱膜方法及脱膜机
CN114645281B (zh) * 2022-04-06 2023-11-24 岭南师范学院 一种褪除金属工件表面碳膜的方法
CN115954269B (zh) * 2022-12-20 2024-08-16 西安理工大学 实现离子轰击和电子轰击辅助转换的氧等离子体刻蚀方法

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JPS63211630A (ja) * 1988-01-29 1988-09-02 Hitachi Ltd プラズマ処理装置
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Also Published As

Publication number Publication date
CN103717788A (zh) 2014-04-09
KR101784638B1 (ko) 2017-10-11
BR112013031584A8 (pt) 2018-02-06
EP2718481B1 (de) 2017-04-05
WO2012167886A8 (de) 2014-01-23
RU2013158315A (ru) 2015-07-20
JP2014525982A (ja) 2014-10-02
RU2606899C2 (ru) 2017-01-10
KR20160017662A (ko) 2016-02-16
PH12014500059A1 (en) 2014-03-24
DE102011105645A1 (de) 2012-12-13
CA2846434C (en) 2019-01-15
EP2718481A1 (de) 2014-04-16
CA2846434A1 (en) 2013-12-13
SG2014001168A (en) 2014-05-29
WO2012167886A1 (de) 2012-12-13
CN103717788B (zh) 2016-06-29
BR112013031584B1 (pt) 2020-11-03
BR112013031584A2 (pt) 2016-12-13
KR20140019018A (ko) 2014-02-13

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