PH12014500059A1 - Method for removing hard carbon layers - Google Patents
Method for removing hard carbon layersInfo
- Publication number
- PH12014500059A1 PH12014500059A1 PH1/2014/500059A PH12014500059A PH12014500059A1 PH 12014500059 A1 PH12014500059 A1 PH 12014500059A1 PH 12014500059 A PH12014500059 A PH 12014500059A PH 12014500059 A1 PH12014500059 A1 PH 12014500059A1
- Authority
- PH
- Philippines
- Prior art keywords
- substrate
- vacuum chamber
- coated
- low
- reactive gas
- Prior art date
Links
- 238000000034 method Methods 0.000 title abstract 2
- 229910021385 hard carbon Inorganic materials 0.000 title 1
- 239000000758 substrate Substances 0.000 abstract 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 abstract 3
- 229910052799 carbon Inorganic materials 0.000 abstract 3
- 239000007789 gas Substances 0.000 abstract 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 abstract 2
- 238000006243 chemical reaction Methods 0.000 abstract 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 abstract 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract 1
- 238000000576 coating method Methods 0.000 abstract 1
- 238000010891 electric arc Methods 0.000 abstract 1
- 239000001257 hydrogen Substances 0.000 abstract 1
- 229910052739 hydrogen Inorganic materials 0.000 abstract 1
- 229910052757 nitrogen Inorganic materials 0.000 abstract 1
- 239000001301 oxygen Substances 0.000 abstract 1
- 229910052760 oxygen Inorganic materials 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G5/00—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Chemical Vapour Deposition (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Physical Vapour Deposition (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Plasma & Fusion (AREA)
- Inorganic Chemistry (AREA)
- ing And Chemical Polishing (AREA)
- Cutting Tools, Boring Holders, And Turrets (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
- Analytical Chemistry (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102011105645A DE102011105645A1 (de) | 2011-06-07 | 2011-06-07 | Entschichtungsverfahren für harte Kohlenstoffschichten |
| PCT/EP2012/002305 WO2012167886A1 (de) | 2011-06-07 | 2012-05-31 | Entschichtungsverfahren für harte kohlenstoffschichten |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| PH12014500059A1 true PH12014500059A1 (en) | 2014-03-24 |
Family
ID=47220581
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PH1/2014/500059A PH12014500059A1 (en) | 2011-06-07 | 2012-05-31 | Method for removing hard carbon layers |
Country Status (11)
| Country | Link |
|---|---|
| EP (1) | EP2718481B1 (enExample) |
| JP (1) | JP5933701B2 (enExample) |
| KR (2) | KR20140019018A (enExample) |
| CN (1) | CN103717788B (enExample) |
| BR (1) | BR112013031584B1 (enExample) |
| CA (1) | CA2846434C (enExample) |
| DE (1) | DE102011105645A1 (enExample) |
| PH (1) | PH12014500059A1 (enExample) |
| RU (1) | RU2606899C2 (enExample) |
| SG (1) | SG2014001168A (enExample) |
| WO (1) | WO2012167886A1 (enExample) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6381984B2 (ja) * | 2014-06-13 | 2018-08-29 | 学校法人 芝浦工業大学 | 脱膜方法及び脱膜装置 |
| KR101864877B1 (ko) * | 2015-04-08 | 2018-06-07 | 신메이와 고교 가부시키가이샤 | 이온 조사에 의한 피복재의 탈막 방법 및 탈막 장치 |
| CN107923030A (zh) * | 2015-08-18 | 2018-04-17 | 塔塔钢铁荷兰科技有限责任公司 | 用于清洁和涂覆金属带材的方法和设备 |
| RU2632702C1 (ru) * | 2016-10-28 | 2017-10-09 | Арчил Важаевич Цискарашвили | Антиадгезивное антибактериальное покрытие для ортопедических имплантатов из титана и нержавеющей стали |
| US10347463B2 (en) * | 2016-12-09 | 2019-07-09 | Fei Company | Enhanced charged particle beam processes for carbon removal |
| CN108987255A (zh) * | 2018-06-19 | 2018-12-11 | 广东先导先进材料股份有限公司 | 类金刚石膜表面处理工艺 |
| CN108754520A (zh) * | 2018-06-29 | 2018-11-06 | 四川大学 | 硬质合金表面涂层去除方法和设备 |
| US12163213B2 (en) * | 2019-07-31 | 2024-12-10 | Oerlikon Surface Solutions Ag, Pfäffikon | Graded hydrogen-free carbon-based hard material layer coated onto a substrate |
| JP7422540B2 (ja) * | 2019-12-26 | 2024-01-26 | 東京エレクトロン株式会社 | 成膜方法および成膜装置 |
| CN111871973A (zh) * | 2020-07-30 | 2020-11-03 | 成都光明光电股份有限公司 | Dlc膜的脱膜方法及脱膜机 |
| CN114645281B (zh) * | 2022-04-06 | 2023-11-24 | 岭南师范学院 | 一种褪除金属工件表面碳膜的方法 |
| CN115954269B (zh) * | 2022-12-20 | 2024-08-16 | 西安理工大学 | 实现离子轰击和电子轰击辅助转换的氧等离子体刻蚀方法 |
Family Cites Families (28)
| Publication number | Priority date | Publication date | Assignee | Title |
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| SU375326A1 (ru) * | 1971-02-01 | 1973-03-23 | ПОТОЧНАЯ ЛИНИЯ ДЛЯ очистки ДЕТАЛЕЙ | |
| SU1227280A1 (ru) * | 1984-06-26 | 1986-04-30 | Магнитогорский горно-металлургический институт им.Г.И.Носова | Способ очистки поверхности металлических изделий |
| JPS63211630A (ja) * | 1988-01-29 | 1988-09-02 | Hitachi Ltd | プラズマ処理装置 |
| JP3513811B2 (ja) * | 1988-08-11 | 2004-03-31 | 株式会社半導体エネルギー研究所 | 炭素または炭素を主成分とする被膜の形成方法 |
| JP2763172B2 (ja) * | 1990-03-19 | 1998-06-11 | 株式会社神戸製鋼所 | ダイヤモンド薄膜のエッチング方法 |
| DE59202116D1 (de) | 1991-04-23 | 1995-06-14 | Balzers Hochvakuum | Verfahren zur Abtragung von Material von einer Oberfläche in einer Vakuumkammer. |
| JPH0598412A (ja) * | 1991-10-07 | 1993-04-20 | Nippon Steel Corp | 被溶射材料の前処理方法 |
| JPH05339758A (ja) * | 1992-06-08 | 1993-12-21 | Nachi Fujikoshi Corp | ダイヤモンド被覆工具の再研磨・再被覆方法 |
| US5401543A (en) | 1993-11-09 | 1995-03-28 | Minnesota Mining And Manufacturing Company | Method for forming macroparticle-free DLC films by cathodic arc discharge |
| DE4401986A1 (de) | 1994-01-25 | 1995-07-27 | Dresden Vakuumtech Gmbh | Verfahren zum Betreiben eines Vakuumlichtbogenverdampfers und Stromversorgungseinrichtung dafür |
| US5993680A (en) * | 1996-08-15 | 1999-11-30 | Citizen Watch Co., Ltd. | Method of removing hard carbon film formed on inner circumferential surface of guide bush |
| DE19831914A1 (de) | 1998-07-16 | 2000-01-20 | Laser & Med Tech Gmbh | Verfahren und Vorrichtung zur Säuberung und Entschichtung transparenter Werkstücke |
| US6605175B1 (en) * | 1999-02-19 | 2003-08-12 | Unaxis Balzers Aktiengesellschaft | Process for manufacturing component parts, use of same, with air bearing supported workpieces and vacuum processing chamber |
| CN1138020C (zh) | 1999-09-29 | 2004-02-11 | 永源科技股份有限公司 | 阴极电弧蒸镀方式淀积类金刚石碳膜的制备方法 |
| JP3439423B2 (ja) * | 2000-04-11 | 2003-08-25 | オーエスジー株式会社 | ダイヤモンド被膜除去方法およびダイヤモンド被覆部材の製造方法 |
| JP3997084B2 (ja) | 2001-12-27 | 2007-10-24 | 株式会社不二越 | 硬質炭素被覆膜の脱膜方法及び再生方法並びに再生基材 |
| US6902774B2 (en) | 2002-07-25 | 2005-06-07 | Inficon Gmbh | Method of manufacturing a device |
| US7381311B2 (en) | 2003-10-21 | 2008-06-03 | The United States Of America As Represented By The Secretary Of The Air Force | Filtered cathodic-arc plasma source |
| JP4680066B2 (ja) * | 2004-01-28 | 2011-05-11 | 東京エレクトロン株式会社 | 基板処理装置の処理室清浄化方法、基板処理装置、および基板処理方法 |
| ATE453739T1 (de) | 2004-01-29 | 2010-01-15 | Oerlikon Trading Ag | Entschichtungsverfahren |
| DE112005002085A5 (de) * | 2004-09-23 | 2007-08-16 | Cemecon Ag | Zerspanungswerkzeug und Verfahren zu seiner Herstellung |
| JP2007134425A (ja) * | 2005-11-09 | 2007-05-31 | Sony Corp | 半導体装置および半導体装置の製造方法 |
| DE102006032568A1 (de) * | 2006-07-12 | 2008-01-17 | Stein, Ralf | Verfahren zur plasmagestützten chemischen Gasphasenabscheidung an der Innenwand eines Hohlkörpers |
| US7914692B2 (en) * | 2006-08-29 | 2011-03-29 | Ngk Insulators, Ltd. | Methods of generating plasma, of etching an organic material film, of generating minus ions, of oxidation and nitriding |
| CN101308764B (zh) | 2007-05-15 | 2011-03-23 | 中芯国际集成电路制造(上海)有限公司 | 消除蚀刻工序残留聚合物的方法 |
| WO2008149824A1 (ja) * | 2007-06-01 | 2008-12-11 | Onward Ceramic Coating Co., Ltd. | Ｄｌｃ被覆工具 |
| MX347701B (es) | 2008-05-02 | 2017-05-09 | Oerlikon Surface Solutions Ag Pfäffikon | Procedimiento para decapar piezas de trabajo y solucion de decapado. |
| DE102008053254A1 (de) * | 2008-10-25 | 2010-04-29 | Ab Solut Chemie Gmbh | Verfahren zum substratschonenden Entfernen von Hartstoffschichten |
-
2011
- 2011-06-07 DE DE102011105645A patent/DE102011105645A1/de not_active Withdrawn
-
2012
- 2012-05-31 SG SG2014001168A patent/SG2014001168A/en unknown
- 2012-05-31 CN CN201280038683.9A patent/CN103717788B/zh not_active Expired - Fee Related
- 2012-05-31 BR BR112013031584-9A patent/BR112013031584B1/pt not_active IP Right Cessation
- 2012-05-31 WO PCT/EP2012/002305 patent/WO2012167886A1/de not_active Ceased
- 2012-05-31 EP EP12725315.1A patent/EP2718481B1/de active Active
- 2012-05-31 CA CA2846434A patent/CA2846434C/en active Active
- 2012-05-31 JP JP2014513932A patent/JP5933701B2/ja not_active Expired - Fee Related
- 2012-05-31 RU RU2013158315A patent/RU2606899C2/ru active
- 2012-05-31 KR KR1020147000018A patent/KR20140019018A/ko not_active Ceased
- 2012-05-31 KR KR1020167002198A patent/KR101784638B1/ko not_active Expired - Fee Related
- 2012-05-31 PH PH1/2014/500059A patent/PH12014500059A1/en unknown
Also Published As
| Publication number | Publication date |
|---|---|
| CN103717788A (zh) | 2014-04-09 |
| KR101784638B1 (ko) | 2017-10-11 |
| BR112013031584A8 (pt) | 2018-02-06 |
| EP2718481B1 (de) | 2017-04-05 |
| WO2012167886A8 (de) | 2014-01-23 |
| RU2013158315A (ru) | 2015-07-20 |
| JP2014525982A (ja) | 2014-10-02 |
| RU2606899C2 (ru) | 2017-01-10 |
| KR20160017662A (ko) | 2016-02-16 |
| DE102011105645A1 (de) | 2012-12-13 |
| CA2846434C (en) | 2019-01-15 |
| EP2718481A1 (de) | 2014-04-16 |
| CA2846434A1 (en) | 2013-12-13 |
| SG2014001168A (en) | 2014-05-29 |
| WO2012167886A1 (de) | 2012-12-13 |
| CN103717788B (zh) | 2016-06-29 |
| BR112013031584B1 (pt) | 2020-11-03 |
| BR112013031584A2 (pt) | 2016-12-13 |
| JP5933701B2 (ja) | 2016-06-15 |
| KR20140019018A (ko) | 2014-02-13 |
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