WO2012167886A1 - Entschichtungsverfahren für harte kohlenstoffschichten - Google Patents

Entschichtungsverfahren für harte kohlenstoffschichten Download PDF

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Publication number
WO2012167886A1
WO2012167886A1 PCT/EP2012/002305 EP2012002305W WO2012167886A1 WO 2012167886 A1 WO2012167886 A1 WO 2012167886A1 EP 2012002305 W EP2012002305 W EP 2012002305W WO 2012167886 A1 WO2012167886 A1 WO 2012167886A1
Authority
WO
WIPO (PCT)
Prior art keywords
gas
substrate
stripping
reactive
carbon
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/EP2012/002305
Other languages
German (de)
English (en)
French (fr)
Other versions
WO2012167886A8 (de
Inventor
Jürgen RAMM
Beno Widrig
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oerlikon Surface Solutions AG Pfaeffikon
Original Assignee
Oerlikon Trading AG Truebbach
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to MX2013014404A priority Critical patent/MX346032B/es
Priority to KR1020147000018A priority patent/KR20140019018A/ko
Priority to SG2014001168A priority patent/SG2014001168A/en
Priority to KR1020167002198A priority patent/KR101784638B1/ko
Priority to CA2846434A priority patent/CA2846434C/en
Priority to JP2014513932A priority patent/JP5933701B2/ja
Priority to RU2013158315A priority patent/RU2606899C2/ru
Priority to BR112013031584-9A priority patent/BR112013031584B1/pt
Priority to EP12725315.1A priority patent/EP2718481B1/de
Priority to PH1/2014/500059A priority patent/PH12014500059A1/en
Application filed by Oerlikon Trading AG Truebbach filed Critical Oerlikon Trading AG Truebbach
Priority to CN201280038683.9A priority patent/CN103717788B/zh
Priority to US14/124,394 priority patent/US9230778B2/en
Publication of WO2012167886A1 publication Critical patent/WO2012167886A1/de
Anticipated expiration legal-status Critical
Publication of WO2012167886A8 publication Critical patent/WO2012167886A8/de
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G5/00—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02—Pretreatment of the material to be coated

Definitions

  • a final process variant C is shown schematically in Figure 3.
  • the DC low-voltage arc discharge is operated against an additional electrode 15 in the chamber, which is connected as an anode.
  • the space of this auxiliary anode 15 is preferably within the substrate arrangement, that is, for example, in the center of the vacuum chamber.
  • the substrates are floated again and no sputtering occurs again, as in variant B, because the negative substrate voltage is too small for sputtering processes.
  • the substrates can be subjected to a negative voltage if it should be necessary to additionally sputter etch the substrates after stripping.
  • a discharge current of 150 A was set with an argon flow of 60 sccm. Subsequently, 200 sccm of N 2 was introduced into the vacuum chamber as a reactive gas, resulting in a total pressure of 0.68 Pa in the vacuum chamber (corresponding to Process 3 in Table 1). After 4 hours, a ta-C layer with a layer thickness of 2 ⁇ m has been completely removed from a hard metal forming tool. It could be confirmed with this example that ta-C layers, despite their very high proportion of tetrahedral diamond-like bonds according to the present invention, very rapidly with a decoction rate of about 0.5 ⁇ / h is removed from the tool surface. The stripping took place at 500 ° C substrate temperature.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Vapour Deposition (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Physical Vapour Deposition (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • ing And Chemical Polishing (AREA)
  • Cutting Tools, Boring Holders, And Turrets (AREA)
  • Analytical Chemistry (AREA)
  • Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
PCT/EP2012/002305 2011-06-07 2012-05-31 Entschichtungsverfahren für harte kohlenstoffschichten Ceased WO2012167886A1 (de)

Priority Applications (12)

Application Number Priority Date Filing Date Title
EP12725315.1A EP2718481B1 (de) 2011-06-07 2012-05-31 Entschichtungsverfahren für harte kohlenstoffschichten
SG2014001168A SG2014001168A (en) 2011-06-07 2012-05-31 Method for removing hard carbon layers
KR1020167002198A KR101784638B1 (ko) 2011-06-07 2012-05-31 경질 탄소층을 박리하기 위한 방법
CA2846434A CA2846434C (en) 2011-06-07 2012-05-31 Stripping process for hard carbon coatings
JP2014513932A JP5933701B2 (ja) 2011-06-07 2012-05-31 硬質の炭素層のためのコーティング除去方法
RU2013158315A RU2606899C2 (ru) 2011-06-07 2012-05-31 Способ удаления слоев для твердых углеродных слоев
BR112013031584-9A BR112013031584B1 (pt) 2011-06-07 2012-05-31 processo para remoção reativa de camadas de carbono de um substrato, e seu uso
MX2013014404A MX346032B (es) 2011-06-07 2012-05-31 Proceso para retirar capas duras de carbono.
KR1020147000018A KR20140019018A (ko) 2011-06-07 2012-05-31 경질 탄소층을 박리하기 위한 방법
PH1/2014/500059A PH12014500059A1 (en) 2011-06-07 2012-05-31 Method for removing hard carbon layers
CN201280038683.9A CN103717788B (zh) 2011-06-07 2012-05-31 硬质碳层的脱层方法
US14/124,394 US9230778B2 (en) 2011-06-07 2012-05-31 Method for removing hard carbon layers

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102011105654.2 2011-06-07
DE102011105645A DE102011105645A1 (de) 2011-06-07 2011-06-07 Entschichtungsverfahren für harte Kohlenstoffschichten
DE102011105645.2 2011-06-07

Publications (2)

Publication Number Publication Date
WO2012167886A1 true WO2012167886A1 (de) 2012-12-13
WO2012167886A8 WO2012167886A8 (de) 2014-01-23

Family

ID=47220581

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2012/002305 Ceased WO2012167886A1 (de) 2011-06-07 2012-05-31 Entschichtungsverfahren für harte kohlenstoffschichten

Country Status (11)

Country Link
EP (1) EP2718481B1 (enExample)
JP (1) JP5933701B2 (enExample)
KR (2) KR20140019018A (enExample)
CN (1) CN103717788B (enExample)
BR (1) BR112013031584B1 (enExample)
CA (1) CA2846434C (enExample)
DE (1) DE102011105645A1 (enExample)
PH (1) PH12014500059A1 (enExample)
RU (1) RU2606899C2 (enExample)
SG (1) SG2014001168A (enExample)
WO (1) WO2012167886A1 (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
RU2632702C1 (ru) * 2016-10-28 2017-10-09 Арчил Важаевич Цискарашвили Антиадгезивное антибактериальное покрытие для ортопедических имплантатов из титана и нержавеющей стали
CN114207178A (zh) * 2019-07-31 2022-03-18 欧瑞康表面处理解决方案股份公司普费菲孔 涂覆于基材上的梯级无氢碳基硬材料层

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JP6381984B2 (ja) * 2014-06-13 2018-08-29 学校法人 芝浦工業大学 脱膜方法及び脱膜装置
KR101864877B1 (ko) * 2015-04-08 2018-06-07 신메이와 고교 가부시키가이샤 이온 조사에 의한 피복재의 탈막 방법 및 탈막 장치
CN107923030A (zh) * 2015-08-18 2018-04-17 塔塔钢铁荷兰科技有限责任公司 用于清洁和涂覆金属带材的方法和设备
US10347463B2 (en) * 2016-12-09 2019-07-09 Fei Company Enhanced charged particle beam processes for carbon removal
CN108987255A (zh) * 2018-06-19 2018-12-11 广东先导先进材料股份有限公司 类金刚石膜表面处理工艺
CN108754520A (zh) * 2018-06-29 2018-11-06 四川大学 硬质合金表面涂层去除方法和设备
JP7422540B2 (ja) * 2019-12-26 2024-01-26 東京エレクトロン株式会社 成膜方法および成膜装置
CN111871973A (zh) * 2020-07-30 2020-11-03 成都光明光电股份有限公司 Dlc膜的脱膜方法及脱膜机
CN114645281B (zh) * 2022-04-06 2023-11-24 岭南师范学院 一种褪除金属工件表面碳膜的方法
CN115954269B (zh) * 2022-12-20 2024-08-16 西安理工大学 实现离子轰击和电子轰击辅助转换的氧等离子体刻蚀方法

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EP0652301A1 (en) 1993-11-09 1995-05-10 Minnesota Mining And Manufacturing Company Method for producing diamond-like coatings and coated articles made thereby
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EP0652301A1 (en) 1993-11-09 1995-05-10 Minnesota Mining And Manufacturing Company Method for producing diamond-like coatings and coated articles made thereby
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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
RU2632702C1 (ru) * 2016-10-28 2017-10-09 Арчил Важаевич Цискарашвили Антиадгезивное антибактериальное покрытие для ортопедических имплантатов из титана и нержавеющей стали
CN114207178A (zh) * 2019-07-31 2022-03-18 欧瑞康表面处理解决方案股份公司普费菲孔 涂覆于基材上的梯级无氢碳基硬材料层
CN114207178B (zh) * 2019-07-31 2024-06-04 欧瑞康表面处理解决方案股份公司普费菲孔 涂覆于基材上的梯级无氢碳基硬材料层

Also Published As

Publication number Publication date
CN103717788A (zh) 2014-04-09
KR101784638B1 (ko) 2017-10-11
BR112013031584A8 (pt) 2018-02-06
EP2718481B1 (de) 2017-04-05
WO2012167886A8 (de) 2014-01-23
RU2013158315A (ru) 2015-07-20
JP2014525982A (ja) 2014-10-02
RU2606899C2 (ru) 2017-01-10
KR20160017662A (ko) 2016-02-16
PH12014500059A1 (en) 2014-03-24
DE102011105645A1 (de) 2012-12-13
CA2846434C (en) 2019-01-15
EP2718481A1 (de) 2014-04-16
CA2846434A1 (en) 2013-12-13
SG2014001168A (en) 2014-05-29
CN103717788B (zh) 2016-06-29
BR112013031584B1 (pt) 2020-11-03
BR112013031584A2 (pt) 2016-12-13
JP5933701B2 (ja) 2016-06-15
KR20140019018A (ko) 2014-02-13

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