WO2009132758A1 - Verfahren zum entschichten von werkstücken und entschichtungslösung - Google Patents
Verfahren zum entschichten von werkstücken und entschichtungslösung Download PDFInfo
- Publication number
- WO2009132758A1 WO2009132758A1 PCT/EP2009/002631 EP2009002631W WO2009132758A1 WO 2009132758 A1 WO2009132758 A1 WO 2009132758A1 EP 2009002631 W EP2009002631 W EP 2009002631W WO 2009132758 A1 WO2009132758 A1 WO 2009132758A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- solution
- workpiece
- weight percent
- alkaline
- treatment
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims abstract description 18
- 239000000243 solution Substances 0.000 claims abstract description 49
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims abstract description 19
- 239000000463 material Substances 0.000 claims abstract description 14
- 239000000203 mixture Substances 0.000 claims abstract description 12
- 239000000126 substance Substances 0.000 claims abstract description 11
- 239000012670 alkaline solution Substances 0.000 claims abstract description 6
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 5
- 239000000956 alloy Substances 0.000 claims abstract description 5
- 150000001247 metal acetylides Chemical class 0.000 claims abstract description 3
- 150000004767 nitrides Chemical class 0.000 claims abstract description 3
- 239000012286 potassium permanganate Substances 0.000 claims abstract 2
- 238000011282 treatment Methods 0.000 claims description 8
- 238000005422 blasting Methods 0.000 claims description 4
- 238000004381 surface treatment Methods 0.000 claims description 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical class [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 2
- 230000001680 brushing effect Effects 0.000 claims description 2
- 238000004140 cleaning Methods 0.000 claims description 2
- 238000001035 drying Methods 0.000 claims description 2
- 238000010438 heat treatment Methods 0.000 claims description 2
- 238000003776 cleavage reaction Methods 0.000 claims 1
- 230000007017 scission Effects 0.000 claims 1
- KWYUFKZDYYNOTN-UHFFFAOYSA-M potassium hydroxide Substances [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 abstract description 11
- 238000000576 coating method Methods 0.000 abstract description 10
- 239000011248 coating agent Substances 0.000 abstract description 5
- 229910052751 metal Inorganic materials 0.000 description 8
- 239000002184 metal Substances 0.000 description 8
- 150000002739 metals Chemical class 0.000 description 7
- 229910000831 Steel Inorganic materials 0.000 description 5
- 239000011230 binding agent Substances 0.000 description 5
- 239000010959 steel Substances 0.000 description 5
- 239000000758 substrate Substances 0.000 description 5
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 238000002474 experimental method Methods 0.000 description 4
- 229910010037 TiAlN Inorganic materials 0.000 description 3
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 239000002585 base Substances 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- MTPVUVINMAGMJL-UHFFFAOYSA-N trimethyl(1,1,2,2,2-pentafluoroethyl)silane Chemical compound C[Si](C)(C)C(F)(F)C(F)(F)F MTPVUVINMAGMJL-UHFFFAOYSA-N 0.000 description 3
- UONOETXJSWQNOL-UHFFFAOYSA-N tungsten carbide Chemical compound [W+]#[C-] UONOETXJSWQNOL-UHFFFAOYSA-N 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- RHBRWKIPYGZNMP-UHFFFAOYSA-N [O--].[O--].[O--].[Al+3].[Cr+3] Chemical class [O--].[O--].[O--].[Al+3].[Cr+3] RHBRWKIPYGZNMP-UHFFFAOYSA-N 0.000 description 2
- 230000006399 behavior Effects 0.000 description 2
- 239000003153 chemical reaction reagent Substances 0.000 description 2
- 239000010941 cobalt Substances 0.000 description 2
- 229910017052 cobalt Inorganic materials 0.000 description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 238000002149 energy-dispersive X-ray emission spectroscopy Methods 0.000 description 2
- LBSANEJBGMCTBH-UHFFFAOYSA-N manganate Chemical compound [O-][Mn]([O-])(=O)=O LBSANEJBGMCTBH-UHFFFAOYSA-N 0.000 description 2
- NUJOXMJBOLGQSY-UHFFFAOYSA-N manganese dioxide Chemical compound O=[Mn]=O NUJOXMJBOLGQSY-UHFFFAOYSA-N 0.000 description 2
- NFFIWVVINABMKP-UHFFFAOYSA-N methylidynetantalum Chemical compound [Ta]#C NFFIWVVINABMKP-UHFFFAOYSA-N 0.000 description 2
- 239000007800 oxidant agent Substances 0.000 description 2
- 230000035484 reaction time Effects 0.000 description 2
- 239000003381 stabilizer Substances 0.000 description 2
- 229910003468 tantalcarbide Inorganic materials 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 229910000997 High-speed steel Inorganic materials 0.000 description 1
- 238000003723 Smelting Methods 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- MEOSMFUUJVIIKB-UHFFFAOYSA-N [W].[C] Chemical compound [W].[C] MEOSMFUUJVIIKB-UHFFFAOYSA-N 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 230000016571 aggressive behavior Effects 0.000 description 1
- 229910001854 alkali hydroxide Inorganic materials 0.000 description 1
- 150000008044 alkali metal hydroxides Chemical class 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000007853 buffer solution Substances 0.000 description 1
- 239000008139 complexing agent Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000004042 decolorization Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 230000032798 delamination Effects 0.000 description 1
- 230000001066 destructive effect Effects 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 239000000383 hazardous chemical Substances 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 239000011572 manganese Substances 0.000 description 1
- -1 manganese anhydride Chemical class 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000005555 metalworking Methods 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 239000000546 pharmaceutical excipient Substances 0.000 description 1
- 238000012805 post-processing Methods 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000003014 reinforcing effect Effects 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 238000010257 thawing Methods 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/44—Compositions for etching metallic material from a metallic material substrate of different composition
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/10—Etching compositions
- C23F1/14—Aqueous compositions
- C23F1/32—Alkaline compositions
- C23F1/36—Alkaline compositions for etching aluminium or alloys thereof
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/10—Etching compositions
- C23F1/14—Aqueous compositions
- C23F1/32—Alkaline compositions
- C23F1/38—Alkaline compositions for etching refractory metals
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
- C23G1/14—Cleaning or pickling metallic material with solutions or molten salts with alkaline solutions
- C23G1/20—Other heavy metals
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
- C23G1/14—Cleaning or pickling metallic material with solutions or molten salts with alkaline solutions
- C23G1/20—Other heavy metals
- C23G1/205—Other heavy metals refractory metals
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
- C23G1/14—Cleaning or pickling metallic material with solutions or molten salts with alkaline solutions
- C23G1/22—Light metals
Definitions
- the present invention relates to the field of chemical wet delamination of workpieces, in particular of tools and components, which are coated with a hard material layer.
- a particular focus is on the stripping of hard material layers containing oxides, in particular chromium aluminum oxides (AlCrO layers).
- Coated and hard-optimized coatings are also used on other components that have comparable conditions in use are exposed and therefore require similar properties; Examples include bearing parts and components for the automotive industry such as coated pistons, injection nozzles, etc.
- the diverse application requirements result in a whole range of specialized layers and layer systems, which in turn entail different stripping requirements.
- the stripping should be economical (fast, no complicated equipment, low-cost consumables, applicable for as many layers as possible), safe (as few hazardous substances as possible), environmentally friendly and last but not least, the layer-bearing tool or component should not be damaged by stripping.
- EP 1 029 117 proposes a stripping process in which hydrogen peroxide, a base and at least one acid or the salt of an acid are used.
- the patent application DE 4339502 describes the non-destructive stripping of carbide substrates coated with i.a. TiAlN layers.
- the advantages over previous methods are indicated by the fact that in addition to the conventional complexing agents and stabilizers, inhibitors for the purpose of corrosion protection, other excipients are used, and the solution is adjusted to a pH, in conjunction with the other reagents, a draw of Co prevented from the workpiece. Disadvantages of this solution are the comparatively long stripping time for TiAlN and other coatings, the relatively high use of chemicals and the associated costs, the relatively complicated (because precisely to be observed) formulations and reaction conditions and the use of fluorine-containing reagents.
- WO 2005/073433 proposes applying a chromium- or aluminum-containing layer to a substrate in order to improve the stripping behavior and to provide the workpiece with an alkaline solution containing a strong oxidizing agent, eg. B. a Perranan- ganatlosung to decoat.
- a strong oxidizing agent eg. B. a Perranan- ganatlosung to decoat.
- Example 5 with the main components 20g / l NaOH and 20g / l KMnO 4 , are not optimal for modern AlCrN layers such as the market known Balinit Alcrona. Since these layers allow a maximum application temperature of over 1000 ° C, it is assumed that, depending on the actual use, oxygen is incorporated into the AlCrN layer and this compresses as a result. As a result, the stripping behavior deteriorates markedly. Basically the same problem occurs with AlCrO layers (aluminum-chromium oxides), which can not be stripped with a solution according to Example 5 as described above.
- AlCrO layers aluminum-chromium oxides
- the object of the invention to provide a method for EntSchichtung or a Ent harshungslosung, which allow to economically remove hard material layers of at least AlCr, AlCrN and / or AlCrO from a workpiece, without damaging the workpiece itself substantially.
- Substance mixture as aqueous, alkaline solution can be represented with 3 to 8 weight percent KMnO 4 , preferably between 3 and 5 weight percent KMnO 4 and at the same time has an alkaline content of 6 to 15 weight percent, preferably 6 and 12 weight percent.
- the solution contains 4 weight percent KMnO 4 , wherein at the same time the alkaline fraction between 8 and 11 weight percent, preferably at 10 weight percent.
- the alkaline fraction is formed in one embodiment by KOH or NaOH, the pH of the solution being above 13, preferably above 13.5.
- a work piece which is to be subjected to a method according to the invention has a layer system on the work piece which comprises at least one layer which in turn comprises at least one of the following materials: metallic AlCr, TiAlCr and other AlCr alloys; or one of their nitrides, carbides, borides, oxides or their combination and aluminum oxides.
- the erfmdungsgemasse method for shedding this layer system provides to introduce the workpiece in a Ent Harungslosung gemass above description and treat it there for a predetermined time.
- the solution can be moved during the treatment, e.g. B. by stirring or moving the workpiece.
- the treatment is preferably carried out at room temperature, eg between 15 and 30 ° C., but is also up to 60 or 70 ° C. at higher temperatures
- the z. B. include chemical or mechanical surface treatments. This includes at least one of the following treatment options: spooling, cleaning, ultrasonic bath treatment, drying, blasting, brushing, heat treatment.
- the materials 1.2379, ASP2023 (1.3343), 1.2344, SDK (1.3344) and QRS (1.2842) denote different types of steel, including high-alloy steels and high-speed steels.
- TTX, THM and TTR are indexable tungsten carbide inserts of different composition.
- Helicore refers to an AlCr-based layer material known on the market under the trade name Balinit® Helica.
- Alcrona refers to an AlCrN coating that is marketed as Balinit® Alcrona. As decoating solutions were used:
- the stripping times were determined under standardized, comparable conditions for different sample bodies and different layers.
- the table indicates in which time (mm) a 4 ⁇ m thick layer is completely removed from the workpiece.
- Specimens (flask) with a 0.8 ⁇ m high carbon tungsten carbide coating were stripped at 4K / 10Na and 4K / 10K. After 12 hours reaction time with 4K / 10K the sample was decoated, with 4K / 10Na not yet.
- Conventional hard metals or sintered carbide metals consist of 90-94% tungsten carbide as reinforcing phase and 6-10% cobalt as binder / binder phase. In the smelting process, the binder melts due to its lower (compared to carbide) melting point and bonds the carbide grains.
- materials besides TiC (titanium carbide), TiN (titanium nitride) or TaC (tantalum carbide) with tungsten carbide having a binder phase of Ni, Co or Mo are the TTX and TTR listed in this application Materials (TTX: 60% WC, 31% TiC + Ta (Nb) C + 9% Co).
- the state of the art proposes to avoid a strong alkaline environment when removing hard-material layers of hard metals.
- Table 7 shows that although the initial application of the 4K / 10Na and 4K / 10K solutions results in a greater removal from the substrate than in the solution according to the prior art, over time it appears that in particular the 4K / 10K solution only insignificantly higher removal caused than 4K / 10Na. This is surprising, since actually the high proportion of potassium hydroxide should attack the base material more strongly than the otherwise comparable solution with sodium hydroxide.
- Table 1 shows that the solutions according to the invention are on average twice as effective and permit significantly shorter reaction times (Table 6).
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- Chemical & Material Sciences (AREA)
- Metallurgy (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- ing And Chemical Polishing (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
- Chemical Treatment Of Metals (AREA)
- Weting (AREA)
- Physical Vapour Deposition (AREA)
- Chemically Coating (AREA)
Abstract
Description
Claims
Priority Applications (10)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
RU2010149274/02A RU2507311C2 (ru) | 2008-05-02 | 2009-04-09 | Способ удаления покрытия с деталей и раствор для удаления покрытия |
US12/989,727 US9057134B2 (en) | 2008-05-02 | 2009-04-09 | Process for the stripping of workpieces and stripping solution |
JP2011506589A JP5730189B2 (ja) | 2008-05-02 | 2009-04-09 | 被膜除去法および被膜除去液 |
CN2009801156527A CN102016122A (zh) | 2008-05-02 | 2009-04-09 | 从工件上脱层的方法及脱层溶液 |
PL09737802T PL2276875T3 (pl) | 2008-05-02 | 2009-04-09 | Sposób usuwania powłok z obrabianych przedmiotów i roztwór do usuwania powłok |
ES09737802T ES2764249T3 (es) | 2008-05-02 | 2009-04-09 | Procedimiento para decapar piezas de trabajo y solución de decapado |
CA2723136A CA2723136C (en) | 2008-05-02 | 2009-04-09 | Process for the stripping of workpieces and stripping solution |
EP09737802.0A EP2276875B1 (de) | 2008-05-02 | 2009-04-09 | Verfahren zum entschichten von werkstücken und entschichtungslösung |
MX2010011871A MX347701B (es) | 2008-05-02 | 2009-04-09 | Procedimiento para decapar piezas de trabajo y solucion de decapado. |
BRPI0911617-6A BRPI0911617B1 (pt) | 2008-05-02 | 2009-04-09 | Processo para remover um sistema de camadas de uma peça |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US4989008P | 2008-05-02 | 2008-05-02 | |
US61/049,890 | 2008-05-02 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2009132758A1 true WO2009132758A1 (de) | 2009-11-05 |
Family
ID=40810251
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2009/002631 WO2009132758A1 (de) | 2008-05-02 | 2009-04-09 | Verfahren zum entschichten von werkstücken und entschichtungslösung |
Country Status (14)
Country | Link |
---|---|
US (1) | US9057134B2 (de) |
EP (1) | EP2276875B1 (de) |
JP (1) | JP5730189B2 (de) |
KR (1) | KR101599085B1 (de) |
CN (1) | CN102016122A (de) |
BR (1) | BRPI0911617B1 (de) |
CA (1) | CA2723136C (de) |
ES (1) | ES2764249T3 (de) |
MX (1) | MX347701B (de) |
PL (1) | PL2276875T3 (de) |
PT (1) | PT2276875T (de) |
RU (1) | RU2507311C2 (de) |
SG (1) | SG188875A1 (de) |
WO (1) | WO2009132758A1 (de) |
Cited By (3)
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DE102011105645A1 (de) | 2011-06-07 | 2012-12-13 | Oerlikon Trading Ag, Trübbach | Entschichtungsverfahren für harte Kohlenstoffschichten |
WO2015139731A1 (de) * | 2014-03-18 | 2015-09-24 | Platit Ag | Verfahren zum entschichten von keramischen hartstoffschichten von stahl- und hartmetall-substraten |
US9230778B2 (en) | 2011-06-07 | 2016-01-05 | Oerlikon Surface Solutions Ag, Trubbach | Method for removing hard carbon layers |
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US20110086914A1 (en) * | 2009-10-13 | 2011-04-14 | Bailes Julian E | Methods for Treating Traumatic Brain Injury |
CN102277587B (zh) * | 2011-07-29 | 2013-06-05 | 沈阳大学 | 一种多组元氮化物硬质反应膜的退除方法 |
US9406534B2 (en) * | 2014-09-17 | 2016-08-02 | Lam Research Corporation | Wet clean process for cleaning plasma processing chamber components |
JP6334500B2 (ja) * | 2015-11-19 | 2018-05-30 | 株式会社ジーテクト | アルミニウムめっき鋼板の溶接方法 |
CN106884168A (zh) * | 2017-04-07 | 2017-06-23 | 苏州星蓝纳米技术有限公司 | 一种硬质合金退涂液及其配制和使用方法 |
CN107829090A (zh) * | 2017-11-15 | 2018-03-23 | 温州职业技术学院 | Dlc涂层的脱除方法 |
CN110541169B (zh) * | 2018-06-29 | 2021-12-28 | 蓝思科技股份有限公司 | 一种用于脱除工件表面镀层的褪镀液及褪镀方法 |
EP3841228A1 (de) * | 2018-08-21 | 2021-06-30 | Oerlikon Surface Solutions AG, Pfäffikon | Abtragen von beschichtungen auf al-basis |
CN111676448A (zh) * | 2020-06-12 | 2020-09-18 | 艾瑞森表面技术(苏州)股份有限公司 | 一种可褪涂的TiAlCrN纳米复合涂层的制备方法 |
CN112323136A (zh) * | 2020-10-26 | 2021-02-05 | 深圳市裕展精密科技有限公司 | 退镀液以及退镀方法 |
CN115637433A (zh) * | 2022-09-28 | 2023-01-24 | 国营川西机器厂 | Al/BN封严涂层去除方法 |
WO2024133016A1 (en) | 2022-12-20 | 2024-06-27 | Wolfram Bergbau Und Hütten Ag | Process for preparing cemented carbide scrap for recycling |
Citations (8)
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FR1369568A (fr) * | 1963-06-24 | 1964-08-14 | Purex Corp | Composition pour le nettoyage des métaux |
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2009
- 2009-04-09 JP JP2011506589A patent/JP5730189B2/ja active Active
- 2009-04-09 KR KR1020107024079A patent/KR101599085B1/ko active Active
- 2009-04-09 CN CN2009801156527A patent/CN102016122A/zh active Pending
- 2009-04-09 WO PCT/EP2009/002631 patent/WO2009132758A1/de active Application Filing
- 2009-04-09 PT PT97378020T patent/PT2276875T/pt unknown
- 2009-04-09 CA CA2723136A patent/CA2723136C/en active Active
- 2009-04-09 RU RU2010149274/02A patent/RU2507311C2/ru active
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- 2009-04-09 US US12/989,727 patent/US9057134B2/en active Active
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DE2339608A1 (de) * | 1972-09-05 | 1974-03-14 | Gen Electric | Verfahren zum entfernen einer aluminidschicht |
US4327134A (en) * | 1979-11-29 | 1982-04-27 | Alloy Surfaces Company, Inc. | Stripping of diffusion treated metals |
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Cited By (5)
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DE102011105645A1 (de) | 2011-06-07 | 2012-12-13 | Oerlikon Trading Ag, Trübbach | Entschichtungsverfahren für harte Kohlenstoffschichten |
WO2012167886A1 (de) | 2011-06-07 | 2012-12-13 | Oerlikon Trading Ag, Trübbach | Entschichtungsverfahren für harte kohlenstoffschichten |
US9230778B2 (en) | 2011-06-07 | 2016-01-05 | Oerlikon Surface Solutions Ag, Trubbach | Method for removing hard carbon layers |
WO2015139731A1 (de) * | 2014-03-18 | 2015-09-24 | Platit Ag | Verfahren zum entschichten von keramischen hartstoffschichten von stahl- und hartmetall-substraten |
US9879356B2 (en) | 2014-03-18 | 2018-01-30 | Platit Ag | Method for delamination of ceramic hard material layers from steel and cemented carbide substrates |
Also Published As
Publication number | Publication date |
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CN102016122A (zh) | 2011-04-13 |
BRPI0911617A2 (de) | 2017-07-25 |
BRPI0911617B1 (pt) | 2023-11-07 |
EP2276875A1 (de) | 2011-01-26 |
PT2276875T (pt) | 2020-01-17 |
EP2276875B1 (de) | 2019-10-09 |
CA2723136C (en) | 2017-11-07 |
US20110056914A1 (en) | 2011-03-10 |
JP5730189B2 (ja) | 2015-06-03 |
MX2010011871A (es) | 2010-11-30 |
JP2011520033A (ja) | 2011-07-14 |
RU2010149274A (ru) | 2012-06-10 |
SG188875A1 (en) | 2013-04-30 |
CA2723136A1 (en) | 2009-11-05 |
KR20110003507A (ko) | 2011-01-12 |
PL2276875T3 (pl) | 2020-06-01 |
MX347701B (es) | 2017-05-09 |
RU2507311C2 (ru) | 2014-02-20 |
ES2764249T3 (es) | 2020-06-02 |
US9057134B2 (en) | 2015-06-16 |
KR101599085B1 (ko) | 2016-03-14 |
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