RU2606899C2 - Способ удаления слоев для твердых углеродных слоев - Google Patents
Способ удаления слоев для твердых углеродных слоев Download PDFInfo
- Publication number
- RU2606899C2 RU2606899C2 RU2013158315A RU2013158315A RU2606899C2 RU 2606899 C2 RU2606899 C2 RU 2606899C2 RU 2013158315 A RU2013158315 A RU 2013158315A RU 2013158315 A RU2013158315 A RU 2013158315A RU 2606899 C2 RU2606899 C2 RU 2606899C2
- Authority
- RU
- Russia
- Prior art keywords
- substrate
- coating
- carbon
- reaction
- gas
- Prior art date
Links
- 238000000576 coating method Methods 0.000 title claims abstract description 193
- 238000000034 method Methods 0.000 title claims abstract description 112
- 230000008569 process Effects 0.000 title description 19
- 229910021385 hard carbon Inorganic materials 0.000 title 1
- 239000000758 substrate Substances 0.000 claims abstract description 150
- 239000011248 coating agent Substances 0.000 claims abstract description 129
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 80
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 78
- 238000006243 chemical reaction Methods 0.000 claims abstract description 45
- 239000012495 reaction gas Substances 0.000 claims abstract description 44
- 239000007789 gas Substances 0.000 claims abstract description 40
- 238000010891 electric arc Methods 0.000 claims abstract description 27
- 239000001257 hydrogen Substances 0.000 claims abstract description 21
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 21
- 229910052751 metal Inorganic materials 0.000 claims abstract description 13
- 238000004544 sputter deposition Methods 0.000 claims abstract description 12
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 claims abstract description 10
- 229910052796 boron Inorganic materials 0.000 claims abstract description 5
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 5
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims abstract description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 4
- 229910052732 germanium Inorganic materials 0.000 claims abstract description 4
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims abstract description 4
- 239000010703 silicon Substances 0.000 claims abstract description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 52
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 47
- 229910052760 oxygen Inorganic materials 0.000 claims description 46
- 239000001301 oxygen Substances 0.000 claims description 44
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 23
- 229910001873 dinitrogen Inorganic materials 0.000 claims description 14
- 230000003647 oxidation Effects 0.000 claims description 7
- 238000007254 oxidation reaction Methods 0.000 claims description 7
- 150000002500 ions Chemical class 0.000 claims description 5
- 238000007667 floating Methods 0.000 claims description 4
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 claims description 3
- 229910001882 dioxygen Inorganic materials 0.000 claims description 3
- 230000004936 stimulating effect Effects 0.000 claims 2
- 239000010410 layer Substances 0.000 abstract description 127
- 239000000463 material Substances 0.000 abstract description 12
- 239000000126 substance Substances 0.000 abstract description 8
- 230000000694 effects Effects 0.000 abstract description 4
- 125000004435 hydrogen atom Chemical class [H]* 0.000 abstract description 2
- 239000011247 coating layer Substances 0.000 abstract 1
- 229910052757 nitrogen Inorganic materials 0.000 description 19
- 229910003460 diamond Inorganic materials 0.000 description 11
- 239000010432 diamond Substances 0.000 description 11
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 10
- 238000005229 chemical vapour deposition Methods 0.000 description 10
- 238000009396 hybridization Methods 0.000 description 9
- 239000002184 metal Substances 0.000 description 9
- 229910003481 amorphous carbon Inorganic materials 0.000 description 8
- 239000000203 mixture Substances 0.000 description 8
- 238000011282 treatment Methods 0.000 description 7
- 125000004429 atom Chemical group 0.000 description 6
- 238000005240 physical vapour deposition Methods 0.000 description 6
- 229910052786 argon Inorganic materials 0.000 description 5
- 238000005530 etching Methods 0.000 description 5
- 230000005284 excitation Effects 0.000 description 5
- 229910021645 metal ion Inorganic materials 0.000 description 5
- 229910052782 aluminium Inorganic materials 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- 125000004432 carbon atom Chemical group C* 0.000 description 4
- 238000005520 cutting process Methods 0.000 description 4
- 229910002804 graphite Inorganic materials 0.000 description 4
- 239000010439 graphite Substances 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 238000003754 machining Methods 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- 239000011343 solid material Substances 0.000 description 4
- 238000005507 spraying Methods 0.000 description 4
- 229910000831 Steel Inorganic materials 0.000 description 3
- 238000005422 blasting Methods 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 3
- 230000007797 corrosion Effects 0.000 description 3
- 238000005260 corrosion Methods 0.000 description 3
- 229910052736 halogen Inorganic materials 0.000 description 3
- -1 halogen derivatives of nitrogen Chemical class 0.000 description 3
- MWUXSHHQAYIFBG-UHFFFAOYSA-N nitrogen oxide Inorganic materials O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 description 3
- 238000009832 plasma treatment Methods 0.000 description 3
- 238000000992 sputter etching Methods 0.000 description 3
- 239000010959 steel Substances 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 2
- 150000001722 carbon compounds Chemical class 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 230000002349 favourable effect Effects 0.000 description 2
- 150000002367 halogens Chemical class 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 150000002431 hydrogen Chemical class 0.000 description 2
- 238000010849 ion bombardment Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000001020 plasma etching Methods 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 238000002203 pretreatment Methods 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 238000004080 punching Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 230000035882 stress Effects 0.000 description 2
- 229910001209 Low-carbon steel Inorganic materials 0.000 description 1
- 238000002083 X-ray spectrum Methods 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 239000010405 anode material Substances 0.000 description 1
- 238000000889 atomisation Methods 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 239000003575 carbonaceous material Substances 0.000 description 1
- 229910052729 chemical element Inorganic materials 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 239000000446 fuel Substances 0.000 description 1
- 239000008187 granular material Substances 0.000 description 1
- 239000007943 implant Substances 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000011089 mechanical engineering Methods 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 229910052754 neon Inorganic materials 0.000 description 1
- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- 229910052755 nonmetal Inorganic materials 0.000 description 1
- 150000002843 nonmetals Chemical class 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000011253 protective coating Substances 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 125000002577 pseudohalo group Chemical group 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G5/00—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Chemical Vapour Deposition (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Physical Vapour Deposition (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- General Physics & Mathematics (AREA)
- Inorganic Chemistry (AREA)
- Plasma & Fusion (AREA)
- ing And Chemical Polishing (AREA)
- Cutting Tools, Boring Holders, And Turrets (AREA)
- Analytical Chemistry (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102011105645A DE102011105645A1 (de) | 2011-06-07 | 2011-06-07 | Entschichtungsverfahren für harte Kohlenstoffschichten |
| DE102011105645.2 | 2011-06-07 | ||
| PCT/EP2012/002305 WO2012167886A1 (de) | 2011-06-07 | 2012-05-31 | Entschichtungsverfahren für harte kohlenstoffschichten |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| RU2013158315A RU2013158315A (ru) | 2015-07-20 |
| RU2606899C2 true RU2606899C2 (ru) | 2017-01-10 |
Family
ID=47220581
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| RU2013158315A RU2606899C2 (ru) | 2011-06-07 | 2012-05-31 | Способ удаления слоев для твердых углеродных слоев |
Country Status (11)
| Country | Link |
|---|---|
| EP (1) | EP2718481B1 (enExample) |
| JP (1) | JP5933701B2 (enExample) |
| KR (2) | KR20140019018A (enExample) |
| CN (1) | CN103717788B (enExample) |
| BR (1) | BR112013031584B1 (enExample) |
| CA (1) | CA2846434C (enExample) |
| DE (1) | DE102011105645A1 (enExample) |
| PH (1) | PH12014500059A1 (enExample) |
| RU (1) | RU2606899C2 (enExample) |
| SG (1) | SG2014001168A (enExample) |
| WO (1) | WO2012167886A1 (enExample) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6381984B2 (ja) * | 2014-06-13 | 2018-08-29 | 学校法人 芝浦工業大学 | 脱膜方法及び脱膜装置 |
| KR101864877B1 (ko) * | 2015-04-08 | 2018-06-07 | 신메이와 고교 가부시키가이샤 | 이온 조사에 의한 피복재의 탈막 방법 및 탈막 장치 |
| CN107923030A (zh) * | 2015-08-18 | 2018-04-17 | 塔塔钢铁荷兰科技有限责任公司 | 用于清洁和涂覆金属带材的方法和设备 |
| RU2632702C1 (ru) * | 2016-10-28 | 2017-10-09 | Арчил Важаевич Цискарашвили | Антиадгезивное антибактериальное покрытие для ортопедических имплантатов из титана и нержавеющей стали |
| US10347463B2 (en) * | 2016-12-09 | 2019-07-09 | Fei Company | Enhanced charged particle beam processes for carbon removal |
| CN108987255A (zh) * | 2018-06-19 | 2018-12-11 | 广东先导先进材料股份有限公司 | 类金刚石膜表面处理工艺 |
| CN108754520A (zh) * | 2018-06-29 | 2018-11-06 | 四川大学 | 硬质合金表面涂层去除方法和设备 |
| US12163213B2 (en) * | 2019-07-31 | 2024-12-10 | Oerlikon Surface Solutions Ag, Pfäffikon | Graded hydrogen-free carbon-based hard material layer coated onto a substrate |
| JP7422540B2 (ja) * | 2019-12-26 | 2024-01-26 | 東京エレクトロン株式会社 | 成膜方法および成膜装置 |
| CN111871973A (zh) * | 2020-07-30 | 2020-11-03 | 成都光明光电股份有限公司 | Dlc膜的脱膜方法及脱膜机 |
| CN114645281B (zh) * | 2022-04-06 | 2023-11-24 | 岭南师范学院 | 一种褪除金属工件表面碳膜的方法 |
| CN115954269B (zh) * | 2022-12-20 | 2024-08-16 | 西安理工大学 | 实现离子轰击和电子轰击辅助转换的氧等离子体刻蚀方法 |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| SU375326A1 (ru) * | 1971-02-01 | 1973-03-23 | ПОТОЧНАЯ ЛИНИЯ ДЛЯ очистки ДЕТАЛЕЙ | |
| SU1227280A1 (ru) * | 1984-06-26 | 1986-04-30 | Магнитогорский горно-металлургический институт им.Г.И.Носова | Способ очистки поверхности металлических изделий |
| US5993680A (en) * | 1996-08-15 | 1999-11-30 | Citizen Watch Co., Ltd. | Method of removing hard carbon film formed on inner circumferential surface of guide bush |
| WO2008006856A1 (de) * | 2006-07-12 | 2008-01-17 | Stein, Ralf | Verfahren und vorrichtung zur plasmagestützten chemischen gasphasenabscheidung an der innenwand eines hohlkörpers |
| EP2180499A2 (de) * | 2008-10-25 | 2010-04-28 | EITEC Gesellschaft für metallisches Hartstoffbeschichten GmbH & Co. KG | Verfahren zum substratschonenden Entfernen von Hartstoffschichten |
Family Cites Families (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63211630A (ja) * | 1988-01-29 | 1988-09-02 | Hitachi Ltd | プラズマ処理装置 |
| JP3513811B2 (ja) * | 1988-08-11 | 2004-03-31 | 株式会社半導体エネルギー研究所 | 炭素または炭素を主成分とする被膜の形成方法 |
| JP2763172B2 (ja) * | 1990-03-19 | 1998-06-11 | 株式会社神戸製鋼所 | ダイヤモンド薄膜のエッチング方法 |
| DE59202116D1 (de) | 1991-04-23 | 1995-06-14 | Balzers Hochvakuum | Verfahren zur Abtragung von Material von einer Oberfläche in einer Vakuumkammer. |
| JPH0598412A (ja) * | 1991-10-07 | 1993-04-20 | Nippon Steel Corp | 被溶射材料の前処理方法 |
| JPH05339758A (ja) * | 1992-06-08 | 1993-12-21 | Nachi Fujikoshi Corp | ダイヤモンド被覆工具の再研磨・再被覆方法 |
| US5401543A (en) | 1993-11-09 | 1995-03-28 | Minnesota Mining And Manufacturing Company | Method for forming macroparticle-free DLC films by cathodic arc discharge |
| DE4401986A1 (de) | 1994-01-25 | 1995-07-27 | Dresden Vakuumtech Gmbh | Verfahren zum Betreiben eines Vakuumlichtbogenverdampfers und Stromversorgungseinrichtung dafür |
| DE19831914A1 (de) | 1998-07-16 | 2000-01-20 | Laser & Med Tech Gmbh | Verfahren und Vorrichtung zur Säuberung und Entschichtung transparenter Werkstücke |
| US6605175B1 (en) * | 1999-02-19 | 2003-08-12 | Unaxis Balzers Aktiengesellschaft | Process for manufacturing component parts, use of same, with air bearing supported workpieces and vacuum processing chamber |
| CN1138020C (zh) | 1999-09-29 | 2004-02-11 | 永源科技股份有限公司 | 阴极电弧蒸镀方式淀积类金刚石碳膜的制备方法 |
| JP3439423B2 (ja) * | 2000-04-11 | 2003-08-25 | オーエスジー株式会社 | ダイヤモンド被膜除去方法およびダイヤモンド被覆部材の製造方法 |
| JP3997084B2 (ja) | 2001-12-27 | 2007-10-24 | 株式会社不二越 | 硬質炭素被覆膜の脱膜方法及び再生方法並びに再生基材 |
| US6902774B2 (en) | 2002-07-25 | 2005-06-07 | Inficon Gmbh | Method of manufacturing a device |
| US7381311B2 (en) | 2003-10-21 | 2008-06-03 | The United States Of America As Represented By The Secretary Of The Air Force | Filtered cathodic-arc plasma source |
| JP4680066B2 (ja) * | 2004-01-28 | 2011-05-11 | 東京エレクトロン株式会社 | 基板処理装置の処理室清浄化方法、基板処理装置、および基板処理方法 |
| ATE453739T1 (de) | 2004-01-29 | 2010-01-15 | Oerlikon Trading Ag | Entschichtungsverfahren |
| DE112005002085A5 (de) * | 2004-09-23 | 2007-08-16 | Cemecon Ag | Zerspanungswerkzeug und Verfahren zu seiner Herstellung |
| JP2007134425A (ja) * | 2005-11-09 | 2007-05-31 | Sony Corp | 半導体装置および半導体装置の製造方法 |
| US7914692B2 (en) * | 2006-08-29 | 2011-03-29 | Ngk Insulators, Ltd. | Methods of generating plasma, of etching an organic material film, of generating minus ions, of oxidation and nitriding |
| CN101308764B (zh) | 2007-05-15 | 2011-03-23 | 中芯国际集成电路制造(上海)有限公司 | 消除蚀刻工序残留聚合物的方法 |
| WO2008149824A1 (ja) * | 2007-06-01 | 2008-12-11 | Onward Ceramic Coating Co., Ltd. | Ｄｌｃ被覆工具 |
| MX347701B (es) | 2008-05-02 | 2017-05-09 | Oerlikon Surface Solutions Ag Pfäffikon | Procedimiento para decapar piezas de trabajo y solucion de decapado. |
-
2011
- 2011-06-07 DE DE102011105645A patent/DE102011105645A1/de not_active Withdrawn
-
2012
- 2012-05-31 SG SG2014001168A patent/SG2014001168A/en unknown
- 2012-05-31 CN CN201280038683.9A patent/CN103717788B/zh not_active Expired - Fee Related
- 2012-05-31 BR BR112013031584-9A patent/BR112013031584B1/pt not_active IP Right Cessation
- 2012-05-31 WO PCT/EP2012/002305 patent/WO2012167886A1/de not_active Ceased
- 2012-05-31 EP EP12725315.1A patent/EP2718481B1/de active Active
- 2012-05-31 CA CA2846434A patent/CA2846434C/en active Active
- 2012-05-31 JP JP2014513932A patent/JP5933701B2/ja not_active Expired - Fee Related
- 2012-05-31 RU RU2013158315A patent/RU2606899C2/ru active
- 2012-05-31 KR KR1020147000018A patent/KR20140019018A/ko not_active Ceased
- 2012-05-31 KR KR1020167002198A patent/KR101784638B1/ko not_active Expired - Fee Related
- 2012-05-31 PH PH1/2014/500059A patent/PH12014500059A1/en unknown
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| SU375326A1 (ru) * | 1971-02-01 | 1973-03-23 | ПОТОЧНАЯ ЛИНИЯ ДЛЯ очистки ДЕТАЛЕЙ | |
| SU1227280A1 (ru) * | 1984-06-26 | 1986-04-30 | Магнитогорский горно-металлургический институт им.Г.И.Носова | Способ очистки поверхности металлических изделий |
| US5993680A (en) * | 1996-08-15 | 1999-11-30 | Citizen Watch Co., Ltd. | Method of removing hard carbon film formed on inner circumferential surface of guide bush |
| WO2008006856A1 (de) * | 2006-07-12 | 2008-01-17 | Stein, Ralf | Verfahren und vorrichtung zur plasmagestützten chemischen gasphasenabscheidung an der innenwand eines hohlkörpers |
| EP2180499A2 (de) * | 2008-10-25 | 2010-04-28 | EITEC Gesellschaft für metallisches Hartstoffbeschichten GmbH & Co. KG | Verfahren zum substratschonenden Entfernen von Hartstoffschichten |
Also Published As
| Publication number | Publication date |
|---|---|
| CN103717788A (zh) | 2014-04-09 |
| KR101784638B1 (ko) | 2017-10-11 |
| BR112013031584A8 (pt) | 2018-02-06 |
| EP2718481B1 (de) | 2017-04-05 |
| WO2012167886A8 (de) | 2014-01-23 |
| RU2013158315A (ru) | 2015-07-20 |
| JP2014525982A (ja) | 2014-10-02 |
| KR20160017662A (ko) | 2016-02-16 |
| PH12014500059A1 (en) | 2014-03-24 |
| DE102011105645A1 (de) | 2012-12-13 |
| CA2846434C (en) | 2019-01-15 |
| EP2718481A1 (de) | 2014-04-16 |
| CA2846434A1 (en) | 2013-12-13 |
| SG2014001168A (en) | 2014-05-29 |
| WO2012167886A1 (de) | 2012-12-13 |
| CN103717788B (zh) | 2016-06-29 |
| BR112013031584B1 (pt) | 2020-11-03 |
| BR112013031584A2 (pt) | 2016-12-13 |
| JP5933701B2 (ja) | 2016-06-15 |
| KR20140019018A (ko) | 2014-02-13 |
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