JP2014525982A5 - - Google Patents
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- Publication number
- JP2014525982A5 JP2014525982A5 JP2014513932A JP2014513932A JP2014525982A5 JP 2014525982 A5 JP2014525982 A5 JP 2014525982A5 JP 2014513932 A JP2014513932 A JP 2014513932A JP 2014513932 A JP2014513932 A JP 2014513932A JP 2014525982 A5 JP2014525982 A5 JP 2014525982A5
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- reactive
- gas
- layer
- gas containing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 claims 16
- 239000007789 gas Substances 0.000 claims 11
- 238000000034 method Methods 0.000 claims 11
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims 7
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 claims 7
- 229910052799 carbon Inorganic materials 0.000 claims 7
- 229910001882 dioxygen Inorganic materials 0.000 claims 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims 5
- 229910001873 dinitrogen Inorganic materials 0.000 claims 5
- 238000010891 electric arc Methods 0.000 claims 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims 3
- 238000006243 chemical reaction Methods 0.000 claims 3
- 239000011248 coating agent Substances 0.000 claims 3
- 238000000576 coating method Methods 0.000 claims 3
- 239000001301 oxygen Substances 0.000 claims 3
- 229910052760 oxygen Inorganic materials 0.000 claims 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 1
- 229910052796 boron Inorganic materials 0.000 claims 1
- 229910052732 germanium Inorganic materials 0.000 claims 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims 1
- 239000001257 hydrogen Substances 0.000 claims 1
- 229910052739 hydrogen Inorganic materials 0.000 claims 1
- 150000002500 ions Chemical class 0.000 claims 1
- 229910052751 metal Inorganic materials 0.000 claims 1
- 229910052710 silicon Inorganic materials 0.000 claims 1
- 239000010703 silicon Substances 0.000 claims 1
- 238000004544 sputter deposition Methods 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102011105645A DE102011105645A1 (de) | 2011-06-07 | 2011-06-07 | Entschichtungsverfahren für harte Kohlenstoffschichten |
| DE102011105645.2 | 2011-06-07 | ||
| PCT/EP2012/002305 WO2012167886A1 (de) | 2011-06-07 | 2012-05-31 | Entschichtungsverfahren für harte kohlenstoffschichten |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2014525982A JP2014525982A (ja) | 2014-10-02 |
| JP2014525982A5 true JP2014525982A5 (enExample) | 2015-07-16 |
| JP5933701B2 JP5933701B2 (ja) | 2016-06-15 |
Family
ID=47220581
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014513932A Expired - Fee Related JP5933701B2 (ja) | 2011-06-07 | 2012-05-31 | 硬質の炭素層のためのコーティング除去方法 |
Country Status (11)
| Country | Link |
|---|---|
| EP (1) | EP2718481B1 (enExample) |
| JP (1) | JP5933701B2 (enExample) |
| KR (2) | KR20140019018A (enExample) |
| CN (1) | CN103717788B (enExample) |
| BR (1) | BR112013031584B1 (enExample) |
| CA (1) | CA2846434C (enExample) |
| DE (1) | DE102011105645A1 (enExample) |
| PH (1) | PH12014500059A1 (enExample) |
| RU (1) | RU2606899C2 (enExample) |
| SG (1) | SG2014001168A (enExample) |
| WO (1) | WO2012167886A1 (enExample) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6381984B2 (ja) * | 2014-06-13 | 2018-08-29 | 学校法人 芝浦工業大学 | 脱膜方法及び脱膜装置 |
| KR101864877B1 (ko) * | 2015-04-08 | 2018-06-07 | 신메이와 고교 가부시키가이샤 | 이온 조사에 의한 피복재의 탈막 방법 및 탈막 장치 |
| CN107923030A (zh) * | 2015-08-18 | 2018-04-17 | 塔塔钢铁荷兰科技有限责任公司 | 用于清洁和涂覆金属带材的方法和设备 |
| RU2632702C1 (ru) * | 2016-10-28 | 2017-10-09 | Арчил Важаевич Цискарашвили | Антиадгезивное антибактериальное покрытие для ортопедических имплантатов из титана и нержавеющей стали |
| US10347463B2 (en) * | 2016-12-09 | 2019-07-09 | Fei Company | Enhanced charged particle beam processes for carbon removal |
| CN108987255A (zh) * | 2018-06-19 | 2018-12-11 | 广东先导先进材料股份有限公司 | 类金刚石膜表面处理工艺 |
| CN108754520A (zh) * | 2018-06-29 | 2018-11-06 | 四川大学 | 硬质合金表面涂层去除方法和设备 |
| US12163213B2 (en) * | 2019-07-31 | 2024-12-10 | Oerlikon Surface Solutions Ag, Pfäffikon | Graded hydrogen-free carbon-based hard material layer coated onto a substrate |
| JP7422540B2 (ja) * | 2019-12-26 | 2024-01-26 | 東京エレクトロン株式会社 | 成膜方法および成膜装置 |
| CN111871973A (zh) * | 2020-07-30 | 2020-11-03 | 成都光明光电股份有限公司 | Dlc膜的脱膜方法及脱膜机 |
| CN114645281B (zh) * | 2022-04-06 | 2023-11-24 | 岭南师范学院 | 一种褪除金属工件表面碳膜的方法 |
| CN115954269B (zh) * | 2022-12-20 | 2024-08-16 | 西安理工大学 | 实现离子轰击和电子轰击辅助转换的氧等离子体刻蚀方法 |
Family Cites Families (28)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| SU375326A1 (ru) * | 1971-02-01 | 1973-03-23 | ПОТОЧНАЯ ЛИНИЯ ДЛЯ очистки ДЕТАЛЕЙ | |
| SU1227280A1 (ru) * | 1984-06-26 | 1986-04-30 | Магнитогорский горно-металлургический институт им.Г.И.Носова | Способ очистки поверхности металлических изделий |
| JPS63211630A (ja) * | 1988-01-29 | 1988-09-02 | Hitachi Ltd | プラズマ処理装置 |
| JP3513811B2 (ja) * | 1988-08-11 | 2004-03-31 | 株式会社半導体エネルギー研究所 | 炭素または炭素を主成分とする被膜の形成方法 |
| JP2763172B2 (ja) * | 1990-03-19 | 1998-06-11 | 株式会社神戸製鋼所 | ダイヤモンド薄膜のエッチング方法 |
| DE59202116D1 (de) | 1991-04-23 | 1995-06-14 | Balzers Hochvakuum | Verfahren zur Abtragung von Material von einer Oberfläche in einer Vakuumkammer. |
| JPH0598412A (ja) * | 1991-10-07 | 1993-04-20 | Nippon Steel Corp | 被溶射材料の前処理方法 |
| JPH05339758A (ja) * | 1992-06-08 | 1993-12-21 | Nachi Fujikoshi Corp | ダイヤモンド被覆工具の再研磨・再被覆方法 |
| US5401543A (en) | 1993-11-09 | 1995-03-28 | Minnesota Mining And Manufacturing Company | Method for forming macroparticle-free DLC films by cathodic arc discharge |
| DE4401986A1 (de) | 1994-01-25 | 1995-07-27 | Dresden Vakuumtech Gmbh | Verfahren zum Betreiben eines Vakuumlichtbogenverdampfers und Stromversorgungseinrichtung dafür |
| US5993680A (en) * | 1996-08-15 | 1999-11-30 | Citizen Watch Co., Ltd. | Method of removing hard carbon film formed on inner circumferential surface of guide bush |
| DE19831914A1 (de) | 1998-07-16 | 2000-01-20 | Laser & Med Tech Gmbh | Verfahren und Vorrichtung zur Säuberung und Entschichtung transparenter Werkstücke |
| US6605175B1 (en) * | 1999-02-19 | 2003-08-12 | Unaxis Balzers Aktiengesellschaft | Process for manufacturing component parts, use of same, with air bearing supported workpieces and vacuum processing chamber |
| CN1138020C (zh) | 1999-09-29 | 2004-02-11 | 永源科技股份有限公司 | 阴极电弧蒸镀方式淀积类金刚石碳膜的制备方法 |
| JP3439423B2 (ja) * | 2000-04-11 | 2003-08-25 | オーエスジー株式会社 | ダイヤモンド被膜除去方法およびダイヤモンド被覆部材の製造方法 |
| JP3997084B2 (ja) | 2001-12-27 | 2007-10-24 | 株式会社不二越 | 硬質炭素被覆膜の脱膜方法及び再生方法並びに再生基材 |
| US6902774B2 (en) | 2002-07-25 | 2005-06-07 | Inficon Gmbh | Method of manufacturing a device |
| US7381311B2 (en) | 2003-10-21 | 2008-06-03 | The United States Of America As Represented By The Secretary Of The Air Force | Filtered cathodic-arc plasma source |
| JP4680066B2 (ja) * | 2004-01-28 | 2011-05-11 | 東京エレクトロン株式会社 | 基板処理装置の処理室清浄化方法、基板処理装置、および基板処理方法 |
| ATE453739T1 (de) | 2004-01-29 | 2010-01-15 | Oerlikon Trading Ag | Entschichtungsverfahren |
| DE112005002085A5 (de) * | 2004-09-23 | 2007-08-16 | Cemecon Ag | Zerspanungswerkzeug und Verfahren zu seiner Herstellung |
| JP2007134425A (ja) * | 2005-11-09 | 2007-05-31 | Sony Corp | 半導体装置および半導体装置の製造方法 |
| DE102006032568A1 (de) * | 2006-07-12 | 2008-01-17 | Stein, Ralf | Verfahren zur plasmagestützten chemischen Gasphasenabscheidung an der Innenwand eines Hohlkörpers |
| US7914692B2 (en) * | 2006-08-29 | 2011-03-29 | Ngk Insulators, Ltd. | Methods of generating plasma, of etching an organic material film, of generating minus ions, of oxidation and nitriding |
| CN101308764B (zh) | 2007-05-15 | 2011-03-23 | 中芯国际集成电路制造(上海)有限公司 | 消除蚀刻工序残留聚合物的方法 |
| WO2008149824A1 (ja) * | 2007-06-01 | 2008-12-11 | Onward Ceramic Coating Co., Ltd. | Ｄｌｃ被覆工具 |
| MX347701B (es) | 2008-05-02 | 2017-05-09 | Oerlikon Surface Solutions Ag Pfäffikon | Procedimiento para decapar piezas de trabajo y solucion de decapado. |
| DE102008053254A1 (de) * | 2008-10-25 | 2010-04-29 | Ab Solut Chemie Gmbh | Verfahren zum substratschonenden Entfernen von Hartstoffschichten |
-
2011
- 2011-06-07 DE DE102011105645A patent/DE102011105645A1/de not_active Withdrawn
-
2012
- 2012-05-31 SG SG2014001168A patent/SG2014001168A/en unknown
- 2012-05-31 CN CN201280038683.9A patent/CN103717788B/zh not_active Expired - Fee Related
- 2012-05-31 BR BR112013031584-9A patent/BR112013031584B1/pt not_active IP Right Cessation
- 2012-05-31 WO PCT/EP2012/002305 patent/WO2012167886A1/de not_active Ceased
- 2012-05-31 EP EP12725315.1A patent/EP2718481B1/de active Active
- 2012-05-31 CA CA2846434A patent/CA2846434C/en active Active
- 2012-05-31 JP JP2014513932A patent/JP5933701B2/ja not_active Expired - Fee Related
- 2012-05-31 RU RU2013158315A patent/RU2606899C2/ru active
- 2012-05-31 KR KR1020147000018A patent/KR20140019018A/ko not_active Ceased
- 2012-05-31 KR KR1020167002198A patent/KR101784638B1/ko not_active Expired - Fee Related
- 2012-05-31 PH PH1/2014/500059A patent/PH12014500059A1/en unknown
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