KR20120018200A - 기판을 포토이미징하기 위한 방법 및 장치 - Google Patents

기판을 포토이미징하기 위한 방법 및 장치 Download PDF

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Publication number
KR20120018200A
KR20120018200A KR1020117030564A KR20117030564A KR20120018200A KR 20120018200 A KR20120018200 A KR 20120018200A KR 1020117030564 A KR1020117030564 A KR 1020117030564A KR 20117030564 A KR20117030564 A KR 20117030564A KR 20120018200 A KR20120018200 A KR 20120018200A
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KR
South Korea
Prior art keywords
speed
mask
light beam
substrate
image
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
KR1020117030564A
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English (en)
Korean (ko)
Inventor
다니엘 제이 테이스
레벤트 비이클리
제프리 에이치 토키
데이비드 엘 호펠트
Original Assignee
쓰리엠 이노베이티브 프로퍼티즈 컴파니
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Application filed by 쓰리엠 이노베이티브 프로퍼티즈 컴파니 filed Critical 쓰리엠 이노베이티브 프로퍼티즈 컴파니
Publication of KR20120018200A publication Critical patent/KR20120018200A/ko
Abandoned legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/52—Details
    • G03B27/54—Lamp housings; Illuminating means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G03F7/704—Scanned exposure beam, e.g. raster-, rotary- and vector scanning
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70791—Large workpieces, e.g. glass substrates for flat panel displays or solar panels

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
KR1020117030564A 2009-05-27 2010-05-13 기판을 포토이미징하기 위한 방법 및 장치 Abandoned KR20120018200A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US12/472,618 US8339573B2 (en) 2009-05-27 2009-05-27 Method and apparatus for photoimaging a substrate
US12/472,618 2009-05-27

Publications (1)

Publication Number Publication Date
KR20120018200A true KR20120018200A (ko) 2012-02-29

Family

ID=43220644

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020117030564A Abandoned KR20120018200A (ko) 2009-05-27 2010-05-13 기판을 포토이미징하기 위한 방법 및 장치

Country Status (7)

Country Link
US (1) US8339573B2 (enExample)
EP (1) EP2435881A1 (enExample)
JP (1) JP5690334B2 (enExample)
KR (1) KR20120018200A (enExample)
CN (1) CN102460306B (enExample)
SG (1) SG175986A1 (enExample)
WO (1) WO2010138312A1 (enExample)

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CN103057256B (zh) * 2012-06-21 2015-12-09 深圳市众立生包装科技有限公司 一种高精度印刷系统和印刷方法
JP5963194B2 (ja) * 2012-07-17 2016-08-03 株式会社ブイ・テクノロジー 露光装置
CN106415193B (zh) * 2014-03-21 2019-08-09 卡尔佩迪姆技术有限公司 用于在柔性基板上制造微型结构的系统和方法
JP6510768B2 (ja) * 2014-05-23 2019-05-08 株式会社オーク製作所 露光装置
CN110297403B (zh) * 2014-09-04 2023-07-28 株式会社尼康 处理系统
CN107077080B (zh) * 2015-01-15 2019-04-26 株式会社村田制作所 曝光装置
KR102288354B1 (ko) * 2015-08-10 2021-08-11 삼성디스플레이 주식회사 플렉서블 디스플레이 장치의 제조 방법
CN105549340B (zh) * 2016-02-24 2017-10-24 上海大学 卷对卷柔性衬底光刻方法和装置
JP6332482B2 (ja) * 2017-01-13 2018-05-30 株式会社ニコン 基板処理装置
CN110275388A (zh) * 2018-03-17 2019-09-24 深圳市深龙杰科技有限公司 一种固体介质光学成像的方法
JP7089920B2 (ja) * 2018-03-29 2022-06-23 株式会社オーク製作所 露光装置
DE102019128198B3 (de) * 2019-10-18 2021-02-25 Laser Imaging Systems Gmbh Vorrichtung zur Mustereinbringung mittels Strahlung an einem aufgewickelten Endlossubstrat

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Also Published As

Publication number Publication date
CN102460306A (zh) 2012-05-16
CN102460306B (zh) 2015-08-12
WO2010138312A1 (en) 2010-12-02
US20100304309A1 (en) 2010-12-02
JP5690334B2 (ja) 2015-03-25
EP2435881A1 (en) 2012-04-04
JP2012528357A (ja) 2012-11-12
SG175986A1 (en) 2011-12-29
US8339573B2 (en) 2012-12-25

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