CN102460306B - 对基底进行感光成像的方法和设备 - Google Patents

对基底进行感光成像的方法和设备 Download PDF

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Publication number
CN102460306B
CN102460306B CN201080032175.0A CN201080032175A CN102460306B CN 102460306 B CN102460306 B CN 102460306B CN 201080032175 A CN201080032175 A CN 201080032175A CN 102460306 B CN102460306 B CN 102460306B
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CN
China
Prior art keywords
mask
light beam
speed
substrate
photosensitive material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN201080032175.0A
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English (en)
Chinese (zh)
Other versions
CN102460306A (zh
Inventor
丹尼尔·J·泰斯
利文特·伯耶克勒
杰弗里·H·托奇
大卫·L·霍费尔特
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3M Innovative Properties Co
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3M Innovative Properties Co
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Publication date
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Publication of CN102460306A publication Critical patent/CN102460306A/zh
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Expired - Fee Related legal-status Critical Current
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/52—Details
    • G03B27/54—Lamp housings; Illuminating means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G03F7/704—Scanned exposure beam, e.g. raster-, rotary- and vector scanning
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70791—Large workpieces, e.g. glass substrates for flat panel displays or solar panels

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
CN201080032175.0A 2009-05-27 2010-05-13 对基底进行感光成像的方法和设备 Expired - Fee Related CN102460306B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US12/472,618 US8339573B2 (en) 2009-05-27 2009-05-27 Method and apparatus for photoimaging a substrate
US12/472,618 2009-05-27
PCT/US2010/034707 WO2010138312A1 (en) 2009-05-27 2010-05-13 Method and apparatus for photoimaging a substrate

Publications (2)

Publication Number Publication Date
CN102460306A CN102460306A (zh) 2012-05-16
CN102460306B true CN102460306B (zh) 2015-08-12

Family

ID=43220644

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201080032175.0A Expired - Fee Related CN102460306B (zh) 2009-05-27 2010-05-13 对基底进行感光成像的方法和设备

Country Status (7)

Country Link
US (1) US8339573B2 (enExample)
EP (1) EP2435881A1 (enExample)
JP (1) JP5690334B2 (enExample)
KR (1) KR20120018200A (enExample)
CN (1) CN102460306B (enExample)
SG (1) SG175986A1 (enExample)
WO (1) WO2010138312A1 (enExample)

Families Citing this family (13)

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JP6056770B2 (ja) * 2011-12-20 2017-01-11 株式会社ニコン 基板処理装置、デバイス製造システム、及びデバイス製造方法
CN103057256B (zh) * 2012-06-21 2015-12-09 深圳市众立生包装科技有限公司 一种高精度印刷系统和印刷方法
JP5963194B2 (ja) * 2012-07-17 2016-08-03 株式会社ブイ・テクノロジー 露光装置
CN106415193B (zh) * 2014-03-21 2019-08-09 卡尔佩迪姆技术有限公司 用于在柔性基板上制造微型结构的系统和方法
JP6510768B2 (ja) * 2014-05-23 2019-05-08 株式会社オーク製作所 露光装置
CN110297403B (zh) * 2014-09-04 2023-07-28 株式会社尼康 处理系统
CN107077080B (zh) * 2015-01-15 2019-04-26 株式会社村田制作所 曝光装置
KR102288354B1 (ko) * 2015-08-10 2021-08-11 삼성디스플레이 주식회사 플렉서블 디스플레이 장치의 제조 방법
CN105549340B (zh) * 2016-02-24 2017-10-24 上海大学 卷对卷柔性衬底光刻方法和装置
JP6332482B2 (ja) * 2017-01-13 2018-05-30 株式会社ニコン 基板処理装置
CN110275388A (zh) * 2018-03-17 2019-09-24 深圳市深龙杰科技有限公司 一种固体介质光学成像的方法
JP7089920B2 (ja) * 2018-03-29 2022-06-23 株式会社オーク製作所 露光装置
DE102019128198B3 (de) * 2019-10-18 2021-02-25 Laser Imaging Systems Gmbh Vorrichtung zur Mustereinbringung mittels Strahlung an einem aufgewickelten Endlossubstrat

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Also Published As

Publication number Publication date
CN102460306A (zh) 2012-05-16
KR20120018200A (ko) 2012-02-29
WO2010138312A1 (en) 2010-12-02
US20100304309A1 (en) 2010-12-02
JP5690334B2 (ja) 2015-03-25
EP2435881A1 (en) 2012-04-04
JP2012528357A (ja) 2012-11-12
SG175986A1 (en) 2011-12-29
US8339573B2 (en) 2012-12-25

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