KR101848983B1 - 유리 재생 처리 방법 및 재생 유리 기판과 그것을 사용한 포토마스크 블랭크와 포토마스크 - Google Patents

유리 재생 처리 방법 및 재생 유리 기판과 그것을 사용한 포토마스크 블랭크와 포토마스크 Download PDF

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Publication number
KR101848983B1
KR101848983B1 KR1020157005441A KR20157005441A KR101848983B1 KR 101848983 B1 KR101848983 B1 KR 101848983B1 KR 1020157005441 A KR1020157005441 A KR 1020157005441A KR 20157005441 A KR20157005441 A KR 20157005441A KR 101848983 B1 KR101848983 B1 KR 101848983B1
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KR
South Korea
Prior art keywords
photomask
glass substrate
thin film
metal thin
pattern
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KR1020157005441A
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English (en)
Korean (ko)
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KR20150050557A (ko
Inventor
가즈키 기노시타
사토루 니시마
요스케 아오키
게이지로 이타쿠라
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다이니폰 인사츠 가부시키가이샤
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Publication of KR20150050557A publication Critical patent/KR20150050557A/ko
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B09—DISPOSAL OF SOLID WASTE; RECLAMATION OF CONTAMINATED SOIL
    • B09B—DISPOSAL OF SOLID WASTE NOT OTHERWISE PROVIDED FOR
    • B09B5/00—Operations not covered by a single other subclass or by a single other group in this subclass
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/60—Substrates
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/30—Aspects of methods for coating glass not covered above
    • C03C2218/32—After-treatment
    • C03C2218/328—Partly or completely removing a coating
    • C03C2218/33—Partly or completely removing a coating by etching
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/72—Repair or correction of mask defects

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Organic Chemistry (AREA)
  • Environmental & Geological Engineering (AREA)
  • Surface Treatment Of Glass (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
KR1020157005441A 2012-09-26 2013-09-19 유리 재생 처리 방법 및 재생 유리 기판과 그것을 사용한 포토마스크 블랭크와 포토마스크 KR101848983B1 (ko)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JPJP-P-2012-211636 2012-09-26
JP2012211636 2012-09-26
JPJP-P-2013-116166 2013-05-31
JP2013116166 2013-05-31
PCT/JP2013/075314 WO2014050700A1 (ja) 2012-09-26 2013-09-19 ガラス再生処理方法および再生ガラス基板とそれを用いたフォトマスクブランクスとフォトマスク

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1020177031593A Division KR101963996B1 (ko) 2012-09-26 2013-09-19 유리 재생 처리 방법 및 재생 유리 기판과 그것을 사용한 포토마스크 블랭크와 포토마스크

Publications (2)

Publication Number Publication Date
KR20150050557A KR20150050557A (ko) 2015-05-08
KR101848983B1 true KR101848983B1 (ko) 2018-04-13

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Family Applications (3)

Application Number Title Priority Date Filing Date
KR1020157005441A KR101848983B1 (ko) 2012-09-26 2013-09-19 유리 재생 처리 방법 및 재생 유리 기판과 그것을 사용한 포토마스크 블랭크와 포토마스크
KR1020187034398A KR102085058B1 (ko) 2012-09-26 2013-09-19 유리 재생 처리 방법 및 재생 유리 기판과 그것을 사용한 포토마스크 블랭크와 포토마스크
KR1020177031593A KR101963996B1 (ko) 2012-09-26 2013-09-19 유리 재생 처리 방법 및 재생 유리 기판과 그것을 사용한 포토마스크 블랭크와 포토마스크

Family Applications After (2)

Application Number Title Priority Date Filing Date
KR1020187034398A KR102085058B1 (ko) 2012-09-26 2013-09-19 유리 재생 처리 방법 및 재생 유리 기판과 그것을 사용한 포토마스크 블랭크와 포토마스크
KR1020177031593A KR101963996B1 (ko) 2012-09-26 2013-09-19 유리 재생 처리 방법 및 재생 유리 기판과 그것을 사용한 포토마스크 블랭크와 포토마스크

Country Status (5)

Country Link
JP (2) JP6256344B2 (ja)
KR (3) KR101848983B1 (ja)
CN (2) CN109298594B (ja)
TW (1) TWI558677B (ja)
WO (1) WO2014050700A1 (ja)

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* Cited by examiner, † Cited by third party
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CN104932194A (zh) * 2015-07-22 2015-09-23 京东方科技集团股份有限公司 一种掩膜板及其制备方法、掩膜板的回收方法
CN112404100A (zh) * 2020-11-03 2021-02-26 福建晶安光电有限公司 一种滤波器基片的回收工艺

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JP2004089807A (ja) * 2002-08-30 2004-03-25 Central Glass Co Ltd 洗浄装置および洗浄方法
JP2007069339A (ja) 2005-09-09 2007-03-22 Sharp Corp 基板表面の薄膜除去方法

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JP2004089807A (ja) * 2002-08-30 2004-03-25 Central Glass Co Ltd 洗浄装置および洗浄方法
JP2007069339A (ja) 2005-09-09 2007-03-22 Sharp Corp 基板表面の薄膜除去方法

Also Published As

Publication number Publication date
JPWO2014050700A1 (ja) 2016-08-22
TW201427918A (zh) 2014-07-16
KR101963996B1 (ko) 2019-03-29
CN104620176A (zh) 2015-05-13
CN104620176B (zh) 2019-02-26
JP2018045253A (ja) 2018-03-22
TWI558677B (zh) 2016-11-21
KR20150050557A (ko) 2015-05-08
KR102085058B1 (ko) 2020-03-05
KR20180129996A (ko) 2018-12-05
CN109298594B (zh) 2021-12-24
KR20170125119A (ko) 2017-11-13
CN109298594A (zh) 2019-02-01
JP6256344B2 (ja) 2018-01-10
WO2014050700A1 (ja) 2014-04-03

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