KR101842891B1 - 감광성 조성물, 그것으로 형성된 경화막 및 경화막을 갖는 소자 - Google Patents

감광성 조성물, 그것으로 형성된 경화막 및 경화막을 갖는 소자 Download PDF

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KR101842891B1
KR101842891B1 KR1020137006189A KR20137006189A KR101842891B1 KR 101842891 B1 KR101842891 B1 KR 101842891B1 KR 1020137006189 A KR1020137006189 A KR 1020137006189A KR 20137006189 A KR20137006189 A KR 20137006189A KR 101842891 B1 KR101842891 B1 KR 101842891B1
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South Korea
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group
compound
cured film
polysiloxane
alkali
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KR1020137006189A
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English (en)
Korean (ko)
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KR20130108289A (ko
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타케노리 후지와라
미츠히토 스와
케이이치 우치다
쇼 후쿠하라
마사히데 세노오
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도레이 카부시키가이샤
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/0226—Quinonediazides characterised by the non-macromolecular additives
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/04—Oxygen-containing compounds
    • C08K5/05—Alcohols; Metal alcoholates
    • C08K5/057—Metal alcoholates
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0751—Silicon-containing compounds used as adhesion-promoting additives or as means to improve adhesion

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Nonlinear Science (AREA)
  • Medicinal Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Optics & Photonics (AREA)
  • Materials For Photolithography (AREA)
  • Liquid Crystal (AREA)
KR1020137006189A 2010-09-02 2011-08-30 감광성 조성물, 그것으로 형성된 경화막 및 경화막을 갖는 소자 KR101842891B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2010-196348 2010-09-02
JP2010196348 2010-09-02
PCT/JP2011/069515 WO2012029734A1 (ja) 2010-09-02 2011-08-30 感光性組成物、それから形成された硬化膜および硬化膜を有する素子

Publications (2)

Publication Number Publication Date
KR20130108289A KR20130108289A (ko) 2013-10-02
KR101842891B1 true KR101842891B1 (ko) 2018-05-14

Family

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Family Applications (1)

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KR1020137006189A KR101842891B1 (ko) 2010-09-02 2011-08-30 감광성 조성물, 그것으로 형성된 경화막 및 경화막을 갖는 소자

Country Status (6)

Country Link
JP (1) JP5765235B2 (ja)
KR (1) KR101842891B1 (ja)
CN (1) CN103180784B (ja)
SG (1) SG188386A1 (ja)
TW (1) TWI490649B (ja)
WO (1) WO2012029734A1 (ja)

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KR20140058847A (ko) * 2012-11-07 2014-05-15 롬엔드하스전자재료코리아유한회사 유무기 복합 실록산계 고분자 및 이를 포함하는 포지티브형 감광성 수지 조성물
TWI484293B (zh) * 2012-11-07 2015-05-11 Chi Mei Corp 感光性樹脂組成物及其應用
JP6319082B2 (ja) * 2013-02-12 2018-05-09 東レ株式会社 感光性樹脂組成物、それを熱硬化させてなる保護膜又は絶縁膜、それを用いたタッチパネル及びその製造方法
JP6295950B2 (ja) * 2013-03-28 2018-03-20 東レ株式会社 感光性樹脂組成物、保護膜又は絶縁膜、タッチパネル及びその製造方法
KR102229661B1 (ko) * 2013-10-21 2021-03-18 닛산 가가쿠 가부시키가이샤 포지티브형 감광성 수지 조성물
JP6468853B2 (ja) * 2015-01-19 2019-02-13 東京応化工業株式会社 ポジ型感光性樹脂組成物及び硬化膜
WO2016133023A1 (ja) * 2015-02-19 2016-08-25 日本ゼオン株式会社 樹脂組成物、樹脂膜、及び電子部品
KR101881943B1 (ko) * 2015-02-26 2018-07-26 삼성에스디아이 주식회사 포지티브형 감광성 수지 조성물, 감광성 수지막 및 이를 이용한 표시 소자
CN104789041B (zh) * 2015-04-23 2017-02-01 湖北金三峡印务有限公司 锆螯合物改性的复合碱可溶乳液及其制备的高复溶性水性油墨及方法
KR20170053561A (ko) * 2015-11-06 2017-05-16 롬엔드하스전자재료코리아유한회사 감광성 수지 조성물 및 이로부터 제조된 경화막
CN105301916A (zh) * 2015-11-16 2016-02-03 北京中科紫鑫科技有限责任公司 一种光刻胶图案的形成方法
CN105301901A (zh) * 2015-11-16 2016-02-03 北京中科紫鑫科技有限责任公司 一种正性光刻胶组合物的制备方法
CN105301904B (zh) * 2015-11-16 2017-05-31 北京中科紫鑫科技有限责任公司 一种光刻胶组合物及其制备方法
CN105301903A (zh) * 2015-11-16 2016-02-03 北京中科紫鑫科技有限责任公司 一种形成光刻胶组合物
KR102399714B1 (ko) * 2016-09-30 2022-05-19 도레이 카부시키가이샤 감광성 수지 조성물, 도전성 패턴의 제조 방법, 기판, 터치 패널 및 디스플레이
JP6807226B2 (ja) * 2016-12-09 2021-01-06 東京応化工業株式会社 基材上に平坦化膜又はマイクロレンズを形成するために用いられるエネルギー感受性組成物、硬化体の製造方法、硬化体、マイクロレンズの製造方法、及びｃｍｏｓイメージセンサ
CN111837075A (zh) * 2018-03-23 2020-10-27 默克专利股份有限公司 负型超厚膜光刻胶
KR20190136248A (ko) * 2018-05-30 2019-12-10 롬엔드하스전자재료코리아유한회사 포지티브형 감광성 수지 조성물 및 이를 이용한 경화막

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Also Published As

Publication number Publication date
JPWO2012029734A1 (ja) 2013-10-28
TW201211697A (en) 2012-03-16
CN103180784B (zh) 2016-01-20
TWI490649B (zh) 2015-07-01
KR20130108289A (ko) 2013-10-02
SG188386A1 (en) 2013-04-30
WO2012029734A1 (ja) 2012-03-08
JP5765235B2 (ja) 2015-08-19
CN103180784A (zh) 2013-06-26

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