KR101835904B1 - 현상 처리 장치 - Google Patents

현상 처리 장치 Download PDF

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Publication number
KR101835904B1
KR101835904B1 KR1020130109787A KR20130109787A KR101835904B1 KR 101835904 B1 KR101835904 B1 KR 101835904B1 KR 1020130109787 A KR1020130109787 A KR 1020130109787A KR 20130109787 A KR20130109787 A KR 20130109787A KR 101835904 B1 KR101835904 B1 KR 101835904B1
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South Korea
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developer
substrate
positive
negative
cup body
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KR1020130109787A
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English (en)
Korean (ko)
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KR20140035281A (ko
Inventor
야스시 다키구치
다로 야마모토
요시노리 이케다
고키 요시무라
요시키 오카모토
마사히로 후쿠다
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도쿄엘렉트론가부시키가이샤
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Publication of KR20140035281A publication Critical patent/KR20140035281A/ko
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H10P76/20—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials
    • H10P76/204—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials of organic photoresist masks
    • H10P76/2041—Photolithographic processes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3021—Imagewise removal using liquid means from a wafer supported on a rotating chuck
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3092—Recovery of material; Waste processing
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Coating Apparatus (AREA)
KR1020130109787A 2012-09-13 2013-09-12 현상 처리 장치 Active KR101835904B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JPJP-P-2012-201117 2012-09-13
JP2012201117 2012-09-13
JPJP-P-2013-162536 2013-08-05
JP2013162536A JP6005604B2 (ja) 2012-09-13 2013-08-05 現像処理装置

Publications (2)

Publication Number Publication Date
KR20140035281A KR20140035281A (ko) 2014-03-21
KR101835904B1 true KR101835904B1 (ko) 2018-03-07

Family

ID=50232978

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020130109787A Active KR101835904B1 (ko) 2012-09-13 2013-09-12 현상 처리 장치

Country Status (4)

Country Link
US (2) US9304398B2 (https=)
JP (1) JP6005604B2 (https=)
KR (1) KR101835904B1 (https=)
TW (1) TWI569111B (https=)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9694545B2 (en) 2014-12-18 2017-07-04 Stratasys, Inc. Remotely-adjustable purge station for use in additive manufacturing systems
JP6473357B2 (ja) * 2015-03-18 2019-02-20 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置
WO2016194285A1 (ja) 2015-06-03 2016-12-08 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置、膜形成ユニット、基板処理方法および膜形成方法
JP6618334B2 (ja) 2015-06-03 2019-12-11 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置、膜形成ユニット、基板処理方法および膜形成方法
JP6603487B2 (ja) * 2015-06-22 2019-11-06 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置および基板処理方法
JP6742748B2 (ja) 2016-02-17 2020-08-19 株式会社Ｓｃｒｅｅｎホールディングス 現像ユニット、基板処理装置、現像方法および基板処理方法
TWI638394B (zh) 2016-07-25 2018-10-11 斯庫林集團股份有限公司 基板處理裝置
JP6920524B2 (ja) * 2016-08-24 2021-08-18 東京エレクトロン株式会社 基板処理装置及び基板処理方法
JP6778548B2 (ja) * 2016-08-24 2020-11-04 東京エレクトロン株式会社 基板処理装置及び基板処理方法
JP7027284B2 (ja) * 2018-09-07 2022-03-01 芝浦メカトロニクス株式会社 基板処理装置及び基板処理方法
KR102042362B1 (ko) * 2018-11-05 2019-11-07 세메스 주식회사 기판처리장치
JP7189733B2 (ja) * 2018-11-07 2022-12-14 株式会社Ｓｃｒｅｅｎホールディングス 処理カップユニットおよび基板処理装置
CN109445255A (zh) * 2018-11-22 2019-03-08 武汉华星光电半导体显示技术有限公司 显影装置及其清洗方法
JP6648248B2 (ja) * 2018-12-21 2020-02-14 株式会社Ｓｃｒｅｅｎホールディングス 基板処理方法
JP6831889B2 (ja) * 2019-10-11 2021-02-17 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置および基板処理方法
JP7360973B2 (ja) * 2020-02-27 2023-10-13 東京エレクトロン株式会社 現像処理装置及び現像処理方法
JP7585745B2 (ja) * 2020-11-30 2024-11-19 新東工業株式会社 ノズル、現像装置及び被処理体の加工方法
JP7682690B2 (ja) * 2021-05-11 2025-05-26 東京エレクトロン株式会社 基板処理装置および基板処理方法
KR102836407B1 (ko) 2021-07-27 2025-07-21 삼성전자주식회사 기판 처리 장치 및 기판 처리 방법
JP7780381B2 (ja) * 2022-04-14 2025-12-04 東京エレクトロン株式会社 カップ及び基板処理装置
JP2024022955A (ja) * 2022-08-08 2024-02-21 東京エレクトロン株式会社 液処理装置及び液処理方法
KR102627076B1 (ko) * 2022-08-30 2024-01-23 주식회사 포톤 기판 세정용 고정식 바울장치

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005183709A (ja) 2003-12-19 2005-07-07 Tokyo Electron Ltd 現像装置及び現像方法

Family Cites Families (11)

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JPS6223044A (ja) * 1985-07-22 1987-01-31 Konishiroku Photo Ind Co Ltd 感光性平版印刷版の処理方法
JPH0271273A (ja) * 1988-09-07 1990-03-09 Oki Electric Ind Co Ltd フォトレジスト現像装置
JPH03286517A (ja) * 1990-04-03 1991-12-17 Tokyo Electron Ltd 処理方法
JP3943741B2 (ja) * 1999-01-07 2007-07-11 株式会社東芝 パターン形成方法
JP2003297801A (ja) * 2002-03-28 2003-10-17 Shibaura Mechatronics Corp スピン処理装置
JP4369325B2 (ja) * 2003-12-26 2009-11-18 東京エレクトロン株式会社 現像装置及び現像処理方法
JP4862902B2 (ja) * 2009-03-04 2012-01-25 東京エレクトロン株式会社 液処理装置、液処理方法及び記憶媒体
JP5348083B2 (ja) * 2010-07-16 2013-11-20 東京エレクトロン株式会社 塗布、現像装置、塗布、現像方法及び記憶媒体
JP5338777B2 (ja) * 2010-09-02 2013-11-13 東京エレクトロン株式会社 塗布、現像装置、塗布、現像方法及び記憶媒体
TWI497226B (zh) * 2011-01-05 2015-08-21 東京威力科創股份有限公司 Coating, developing device, coating, developing method and memory medium
JP6007155B2 (ja) * 2013-07-30 2016-10-12 東京エレクトロン株式会社 現像処理方法、プログラム、コンピュータ記憶媒体及び現像処理装置

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005183709A (ja) 2003-12-19 2005-07-07 Tokyo Electron Ltd 現像装置及び現像方法

Also Published As

Publication number Publication date
US20140071411A1 (en) 2014-03-13
TW201418909A (zh) 2014-05-16
KR20140035281A (ko) 2014-03-21
US9304398B2 (en) 2016-04-05
US20160202609A1 (en) 2016-07-14
JP6005604B2 (ja) 2016-10-12
TWI569111B (zh) 2017-02-01
US9470979B2 (en) 2016-10-18
JP2014075575A (ja) 2014-04-24

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