KR101488048B1 - 계측 방법, 스테이지 장치, 및 노광 장치 - Google Patents

계측 방법, 스테이지 장치, 및 노광 장치 Download PDF

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Publication number
KR101488048B1
KR101488048B1 KR1020107003290A KR20107003290A KR101488048B1 KR 101488048 B1 KR101488048 B1 KR 101488048B1 KR 1020107003290 A KR1020107003290 A KR 1020107003290A KR 20107003290 A KR20107003290 A KR 20107003290A KR 101488048 B1 KR101488048 B1 KR 101488048B1
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South Korea
Prior art keywords
scale
support member
stage
wafer
measurement
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Expired - Fee Related
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KR1020107003290A
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English (en)
Korean (ko)
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KR20100059799A (ko
Inventor
다이 아라이
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가부시키가이샤 니콘
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
    • H10P76/00—
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Optical Transform (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Transmission And Conversion Of Sensor Element Output (AREA)
KR1020107003290A 2007-07-18 2008-07-16 계측 방법, 스테이지 장치, 및 노광 장치 Expired - Fee Related KR101488048B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2007-187649 2007-07-18
JP2007187649 2007-07-18
PCT/JP2008/062802 WO2009011356A1 (ja) 2007-07-18 2008-07-16 計測方法、ステージ装置、及び露光装置

Related Child Applications (2)

Application Number Title Priority Date Filing Date
KR1020137018085A Division KR101538245B1 (ko) 2007-07-18 2008-07-16 계측 방법, 스테이지 장치, 및 노광 장치
KR1020137018086A Division KR101538246B1 (ko) 2007-07-18 2008-07-16 계측 방법, 스테이지 장치, 및 노광 장치

Publications (2)

Publication Number Publication Date
KR20100059799A KR20100059799A (ko) 2010-06-04
KR101488048B1 true KR101488048B1 (ko) 2015-01-29

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Family Applications (8)

Application Number Title Priority Date Filing Date
KR1020107003290A Expired - Fee Related KR101488048B1 (ko) 2007-07-18 2008-07-16 계측 방법, 스테이지 장치, 및 노광 장치
KR1020157001127A Expired - Fee Related KR101614666B1 (ko) 2007-07-18 2008-07-16 계측 방법, 스테이지 장치, 및 노광 장치
KR1020137018085A Expired - Fee Related KR101538245B1 (ko) 2007-07-18 2008-07-16 계측 방법, 스테이지 장치, 및 노광 장치
KR1020137018086A Expired - Fee Related KR101538246B1 (ko) 2007-07-18 2008-07-16 계측 방법, 스테이지 장치, 및 노광 장치
KR1020187007270A Expired - Fee Related KR101923356B1 (ko) 2007-07-18 2008-07-16 계측 방법, 스테이지 장치, 및 노광 장치
KR1020157029261A Expired - Fee Related KR101706884B1 (ko) 2007-07-18 2008-07-16 계측 방법, 스테이지 장치, 및 노광 장치
KR1020177003435A Expired - Fee Related KR101843699B1 (ko) 2007-07-18 2008-07-16 계측 방법, 스테이지 장치, 및 노광 장치
KR1020187033093A Ceased KR20180126088A (ko) 2007-07-18 2008-07-16 계측 방법, 스테이지 장치, 및 노광 장치

Family Applications After (7)

Application Number Title Priority Date Filing Date
KR1020157001127A Expired - Fee Related KR101614666B1 (ko) 2007-07-18 2008-07-16 계측 방법, 스테이지 장치, 및 노광 장치
KR1020137018085A Expired - Fee Related KR101538245B1 (ko) 2007-07-18 2008-07-16 계측 방법, 스테이지 장치, 및 노광 장치
KR1020137018086A Expired - Fee Related KR101538246B1 (ko) 2007-07-18 2008-07-16 계측 방법, 스테이지 장치, 및 노광 장치
KR1020187007270A Expired - Fee Related KR101923356B1 (ko) 2007-07-18 2008-07-16 계측 방법, 스테이지 장치, 및 노광 장치
KR1020157029261A Expired - Fee Related KR101706884B1 (ko) 2007-07-18 2008-07-16 계측 방법, 스테이지 장치, 및 노광 장치
KR1020177003435A Expired - Fee Related KR101843699B1 (ko) 2007-07-18 2008-07-16 계측 방법, 스테이지 장치, 및 노광 장치
KR1020187033093A Ceased KR20180126088A (ko) 2007-07-18 2008-07-16 계측 방법, 스테이지 장치, 및 노광 장치

Country Status (9)

Country Link
US (5) US9316917B2 (enExample)
EP (7) EP3447582A1 (enExample)
JP (8) JPWO2009011356A1 (enExample)
KR (8) KR101488048B1 (enExample)
CN (7) CN101755188A (enExample)
HK (2) HK1201943A1 (enExample)
SG (3) SG10201502625RA (enExample)
TW (7) TWI498683B (enExample)
WO (1) WO2009011356A1 (enExample)

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US8493547B2 (en) * 2009-08-25 2013-07-23 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
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