KR101484638B1 - 노어 플래시 메모리 및 제조 방법 - Google Patents

노어 플래시 메모리 및 제조 방법 Download PDF

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Publication number
KR101484638B1
KR101484638B1 KR20070043457A KR20070043457A KR101484638B1 KR 101484638 B1 KR101484638 B1 KR 101484638B1 KR 20070043457 A KR20070043457 A KR 20070043457A KR 20070043457 A KR20070043457 A KR 20070043457A KR 101484638 B1 KR101484638 B1 KR 101484638B1
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gates
oxide
floating gates
memory cell
cell array
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KR20070108073A (ko
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보미 첸
프라팁 툰타수드
데어-시르 판
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실리콘 스토리지 테크놀로지 인크
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10B—ELECTRONIC MEMORY DEVICES
    • H10B41/00—Electrically erasable-and-programmable ROM [EEPROM] devices comprising floating gates
    • H10B41/30—Electrically erasable-and-programmable ROM [EEPROM] devices comprising floating gates characterised by the memory core region
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C16/00—Erasable programmable read-only memories
    • G11C16/02—Erasable programmable read-only memories electrically programmable
    • G11C16/04—Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS
    • G11C16/0408—Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS comprising cells containing floating gate transistors
    • G11C16/0425—Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS comprising cells containing floating gate transistors comprising cells containing a merged floating gate and select transistor
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C16/00—Erasable programmable read-only memories
    • G11C16/02—Erasable programmable read-only memories electrically programmable
    • G11C16/04—Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS
    • G11C16/0408—Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS comprising cells containing floating gate transistors
    • G11C16/0433—Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS comprising cells containing floating gate transistors comprising cells containing a single floating gate transistor and one or more separate select transistors
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C16/00—Erasable programmable read-only memories
    • G11C16/02—Erasable programmable read-only memories electrically programmable
    • G11C16/04—Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS
    • G11C16/0491—Virtual ground arrays
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10B—ELECTRONIC MEMORY DEVICES
    • H10B41/00—Electrically erasable-and-programmable ROM [EEPROM] devices comprising floating gates
    • H10B41/30—Electrically erasable-and-programmable ROM [EEPROM] devices comprising floating gates characterised by the memory core region
    • H10B41/35—Electrically erasable-and-programmable ROM [EEPROM] devices comprising floating gates characterised by the memory core region with a cell select transistor, e.g. NAND
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10B—ELECTRONIC MEMORY DEVICES
    • H10B69/00—Erasable-and-programmable ROM [EPROM] devices not provided for in groups H10B41/00 - H10B63/00, e.g. ultraviolet erasable-and-programmable ROM [UVEPROM] devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/60—Insulated-gate field-effect transistors [IGFET]
    • H10D30/68—Floating-gate IGFETs
    • H10D30/681—Floating-gate IGFETs having only two programming levels
    • H10D30/684—Floating-gate IGFETs having only two programming levels programmed by hot carrier injection
    • H10D30/685—Floating-gate IGFETs having only two programming levels programmed by hot carrier injection from the channel
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/60—Insulated-gate field-effect transistors [IGFET]
    • H10D30/68—Floating-gate IGFETs
    • H10D30/6891—Floating-gate IGFETs characterised by the shapes, relative sizes or dispositions of the floating gate electrode
    • H10D30/6892—Floating-gate IGFETs characterised by the shapes, relative sizes or dispositions of the floating gate electrode having at least one additional gate other than the floating gate and the control gate, e.g. program gate, erase gate or select gate

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  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Semiconductor Memories (AREA)
  • Non-Volatile Memory (AREA)
  • Read Only Memory (AREA)
KR20070043457A 2006-05-05 2007-05-04 노어 플래시 메모리 및 제조 방법 Active KR101484638B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/381,948 2006-05-05
US11/381,948 US7598561B2 (en) 2006-05-05 2006-05-05 NOR flash memory

Publications (2)

Publication Number Publication Date
KR20070108073A KR20070108073A (ko) 2007-11-08
KR101484638B1 true KR101484638B1 (ko) 2015-01-20

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Country Link
US (1) US7598561B2 (https=)
JP (1) JP5401016B2 (https=)
KR (1) KR101484638B1 (https=)
CN (1) CN101068020B (https=)
TW (1) TWI415226B (https=)

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US8320191B2 (en) 2007-08-30 2012-11-27 Infineon Technologies Ag Memory cell arrangement, method for controlling a memory cell, memory array and electronic device
US7800159B2 (en) * 2007-10-24 2010-09-21 Silicon Storage Technology, Inc. Array of contactless non-volatile memory cells
US8008702B2 (en) * 2008-02-20 2011-08-30 Taiwan Semiconductor Manufacturing Company, Ltd. Multi-transistor non-volatile memory element
WO2009107241A1 (ja) * 2008-02-29 2009-09-03 株式会社 東芝 マルチドットフラッシュメモリ
US7893519B2 (en) * 2008-05-28 2011-02-22 Qimonda Ag Integrated circuit with conductive structures
JP2010050208A (ja) * 2008-08-20 2010-03-04 Renesas Technology Corp 半導体記憶装置
US8461640B2 (en) * 2009-09-08 2013-06-11 Silicon Storage Technology, Inc. FIN-FET non-volatile memory cell, and an array and method of manufacturing
US8384147B2 (en) * 2011-04-29 2013-02-26 Silicon Storage Technology, Inc. High endurance non-volatile memory cell and array
US8711636B2 (en) * 2011-05-13 2014-04-29 Silicon Storage Technology, Inc. Method of operating a split gate flash memory cell with coupling gate
US8488388B2 (en) * 2011-11-01 2013-07-16 Silicon Storage Technology, Inc. Method of programming a split gate non-volatile floating gate memory cell having a separate erase gate
US9048137B2 (en) * 2012-02-17 2015-06-02 Flashsilicon Incorporation Scalable gate logic non-volatile memory cells and arrays
US8811093B2 (en) * 2012-03-13 2014-08-19 Silicon Storage Technology, Inc. Non-volatile memory device and a method of operating same
US9293204B2 (en) * 2013-04-16 2016-03-22 Silicon Storage Technology, Inc. Non-volatile memory cell with self aligned floating and erase gates, and method of making same
US9184252B2 (en) * 2013-11-15 2015-11-10 Taiwan Semiconductor Manufacturing Company, Ltd. Flash memory embedded with HKMG technology
US20150179749A1 (en) * 2013-12-19 2015-06-25 Silicon Storage Technology, Inc Non-volatile Memory Cell With Self Aligned Floating And Erase Gates, And Method Of Making Same
US20150263012A1 (en) * 2014-03-11 2015-09-17 Kabushiki Kaisha Toshiba Nonvolatile semiconductor memory device and manufacturing method thereof
US9159842B1 (en) * 2014-03-28 2015-10-13 Taiwan Semiconductor Manufacturing Co., Ltd. Embedded nonvolatile memory
JP6286292B2 (ja) * 2014-06-20 2018-02-28 株式会社フローディア 不揮発性半導体記憶装置
CN105609131A (zh) * 2014-07-22 2016-05-25 硅存储技术公司 抑制擦除分裂栅闪存存储器单元扇区的部分的系统和方法
US9252150B1 (en) 2014-07-29 2016-02-02 Taiwan Semiconductor Manufacturing Co., Ltd. High endurance non-volatile memory cell
JP6367044B2 (ja) * 2014-08-13 2018-08-01 ルネサスエレクトロニクス株式会社 半導体装置
TWI606583B (zh) * 2015-01-13 2017-11-21 北京芯盈速騰電子科技有限責任公司 Non-volatile memory device method
TWI606551B (zh) * 2015-02-16 2017-11-21 北京芯盈速騰電子科技有限責任公司 Non-volatile memory device method
US10134475B2 (en) * 2015-03-31 2018-11-20 Silicon Storage Technology, Inc. Method and apparatus for inhibiting the programming of unselected bitlines in a flash memory system
JP6560087B2 (ja) * 2015-09-30 2019-08-14 ルネサスエレクトロニクス株式会社 半導体装置および半導体装置の製造方法
CN107293546B (zh) * 2016-04-08 2020-09-04 硅存储技术公司 减小型分裂栅非易失性闪存单元及其制造方法
CN107305892B (zh) 2016-04-20 2020-10-02 硅存储技术公司 使用两个多晶硅沉积步骤来形成三栅极非易失性闪存单元对的方法
CN107425003B (zh) * 2016-05-18 2020-07-14 硅存储技术公司 制造分裂栅非易失性闪存单元的方法
US9899395B1 (en) * 2016-07-26 2018-02-20 Taiwan Semiconductor Manufacturing Co., Ltd. Semiconductor device and method for manufacturing the same
CN107799146B (zh) * 2016-08-31 2020-06-09 中芯国际集成电路制造(上海)有限公司 存储器阵列及其读、编程、擦除操作方法
US10535574B2 (en) * 2017-09-20 2020-01-14 Taiwan Semiconductor Manufacturing Co., Ltd. Cell-like floating-gate test structure
CN110021602B (zh) * 2018-01-05 2023-04-07 硅存储技术公司 在专用沟槽中具有浮栅的非易失性存储器单元
EP3853895B1 (en) * 2019-01-30 2023-11-22 Yangtze Memory Technologies Co., Ltd. Capacitor structure having vertical diffusion plates
TWI740560B (zh) * 2019-08-30 2021-09-21 台灣積體電路製造股份有限公司 積體電路、記憶體元件及其形成方法
US11239245B2 (en) 2019-08-30 2022-02-01 Taiwan Semiconductor Manufacturing Company, Ltd. Etch method for opening a source line in flash memory
US11422968B2 (en) * 2020-03-09 2022-08-23 Infineon Technologies LLC Methods, devices and systems for high speed serial bus transactions
US11309324B2 (en) * 2020-07-28 2022-04-19 Globalfoundries Singapore Pte. Ltd. Compact memory cell with a shared conductive word line and methods of making such a memory cell
CN114335186B (zh) * 2020-09-30 2025-02-07 硅存储技术股份有限公司 具有设置在字线栅上方的擦除栅的分裂栅非易失性存储器单元及其制备方法
CN112349722B (zh) * 2020-10-15 2021-11-09 长江存储科技有限责任公司 半导体器件结构及其制备方法
US12051755B2 (en) 2021-08-31 2024-07-30 Taiwan Semiconductor Manufacturing Company, Ltd. Transistor and method for manufacturing the same
KR102396632B1 (ko) 2021-12-17 2022-05-12 성화전자 (주) 연료전지차량용 미반응수소가스의 가스농도 측정장치
US12527035B2 (en) * 2022-11-10 2026-01-13 Iotmemory Technology Inc. Non-volatile memory device
US12279422B2 (en) 2022-01-18 2025-04-15 Iotmemory Technology Inc. Method of manufacturing non-volatile memory device
US20240274682A1 (en) * 2023-02-13 2024-08-15 Iotmemory Technology Inc. Non-volatile memory device

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Publication number Publication date
TWI415226B (zh) 2013-11-11
CN101068020A (zh) 2007-11-07
TW200802731A (en) 2008-01-01
JP5401016B2 (ja) 2014-01-29
CN101068020B (zh) 2011-01-12
US7598561B2 (en) 2009-10-06
JP2007300098A (ja) 2007-11-15
KR20070108073A (ko) 2007-11-08
US20070257299A1 (en) 2007-11-08

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