KR101151767B1 - 스트림 추출 시스템 및 방법 - Google Patents

스트림 추출 시스템 및 방법 Download PDF

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Publication number
KR101151767B1
KR101151767B1 KR1020067026392A KR20067026392A KR101151767B1 KR 101151767 B1 KR101151767 B1 KR 101151767B1 KR 1020067026392 A KR1020067026392 A KR 1020067026392A KR 20067026392 A KR20067026392 A KR 20067026392A KR 101151767 B1 KR101151767 B1 KR 101151767B1
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South Korea
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liquid
gas
tank
pressure
control
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Expired - Fee Related
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KR1020067026392A
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English (en)
Korean (ko)
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KR20070021260A (ko
Inventor
앤드류 존 하프햄
폴 존 세크터
폴 알랜 스톡맨
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에이에스엠엘 네델란즈 비.브이.
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D57/00—Separation, other than separation of solids, not fully covered by a single other group or subclass, e.g. B03C
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70841—Constructional issues related to vacuum environment, e.g. load-lock chamber

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Chemical & Material Sciences (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Degasification And Air Bubble Elimination (AREA)
KR1020067026392A 2004-06-16 2005-06-06 스트림 추출 시스템 및 방법 Expired - Fee Related KR101151767B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US10/869,191 2004-06-16
US10/869,191 US7481867B2 (en) 2004-06-16 2004-06-16 Vacuum system for immersion photolithography
PCT/GB2005/002205 WO2005124464A2 (en) 2004-06-16 2005-06-06 Vacuum system for immersion photolithography

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1020117011954A Division KR101341923B1 (ko) 2004-06-16 2005-06-06 스트림 추출 시스템 및 방법

Publications (2)

Publication Number Publication Date
KR20070021260A KR20070021260A (ko) 2007-02-22
KR101151767B1 true KR101151767B1 (ko) 2012-06-15

Family

ID=32851367

Family Applications (2)

Application Number Title Priority Date Filing Date
KR1020117011954A Expired - Fee Related KR101341923B1 (ko) 2004-06-16 2005-06-06 스트림 추출 시스템 및 방법
KR1020067026392A Expired - Fee Related KR101151767B1 (ko) 2004-06-16 2005-06-06 스트림 추출 시스템 및 방법

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KR1020117011954A Expired - Fee Related KR101341923B1 (ko) 2004-06-16 2005-06-06 스트림 추출 시스템 및 방법

Country Status (10)

Country Link
US (7) US7481867B2 (enExample)
EP (1) EP1756672B1 (enExample)
JP (3) JP4772787B2 (enExample)
KR (2) KR101341923B1 (enExample)
CN (2) CN101794081B (enExample)
AT (1) ATE464589T1 (enExample)
DE (1) DE602005020619D1 (enExample)
GB (1) GB0414967D0 (enExample)
TW (1) TWI339131B (enExample)
WO (1) WO2005124464A2 (enExample)

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KR101371917B1 (ko) 2003-09-03 2014-03-07 가부시키가이샤 니콘 액침 리소그래피용 유체를 제공하기 위한 장치 및 방법
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US8018573B2 (en) * 2005-02-22 2011-09-13 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7433016B2 (en) 2005-05-03 2008-10-07 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8514365B2 (en) * 2007-06-01 2013-08-20 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7924404B2 (en) * 2007-08-16 2011-04-12 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
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US20120012191A1 (en) * 2010-07-16 2012-01-19 Nikon Corporation Liquid recovery apparatus, exposure apparatus, liquid recovering method, device fabricating method, program, and storage medium
NL2009899A (en) 2011-12-20 2013-06-24 Asml Netherlands Bv A pump system, a carbon dioxide supply system, an extraction system, a lithographic apparatus and a device manufacturing method.
CN104035288A (zh) * 2014-06-05 2014-09-10 浙江大学 用于浸没式光刻机中的负压环境下的连续气液分离装置
WO2016017700A1 (ja) * 2014-07-31 2016-02-04 株式会社オプトクリエーション 洗浄装置
JP6535649B2 (ja) * 2016-12-12 2019-06-26 株式会社荏原製作所 基板処理装置、排出方法およびプログラム
CN112684675B (zh) * 2020-12-30 2023-02-21 浙江启尔机电技术有限公司 真空系统及使用该真空系统的浸没式光刻机
TW202439039A (zh) * 2023-03-21 2024-10-01 聯華電子股份有限公司 微影機台系統及其液體儲存槽的漏液檢測方法
CN121002450A (zh) 2023-04-04 2025-11-21 Asml荷兰有限公司 流体处理系统和方法以及制造器件的方法

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