KR101059314B1 - 어닐 장치 - Google Patents
어닐 장치 Download PDFInfo
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- KR101059314B1 KR101059314B1 KR1020097004654A KR20097004654A KR101059314B1 KR 101059314 B1 KR101059314 B1 KR 101059314B1 KR 1020097004654 A KR1020097004654 A KR 1020097004654A KR 20097004654 A KR20097004654 A KR 20097004654A KR 101059314 B1 KR101059314 B1 KR 101059314B1
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- light emitting
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- YVTHLONGBIQYBO-UHFFFAOYSA-N zinc indium(3+) oxygen(2-) Chemical compound [O--].[Zn++].[In+3] YVTHLONGBIQYBO-UHFFFAOYSA-N 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
- H01L21/67115—Apparatus for thermal treatment mainly by radiation
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/324—Thermal treatment for modifying the properties of semiconductor bodies, e.g. annealing, sintering
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
- H01L21/67109—Apparatus for thermal treatment mainly by convection
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/186—Particular post-treatment for the devices, e.g. annealing, impurity gettering, short-circuit elimination, recrystallisation
- H01L31/1864—Annealing
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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- Condensed Matter Physics & Semiconductors (AREA)
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- Microelectronics & Electronic Packaging (AREA)
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- High Energy & Nuclear Physics (AREA)
- Chemical Vapour Deposition (AREA)
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- Physical Vapour Deposition (AREA)
- Arrangement Of Elements, Cooling, Sealing, Or The Like Of Lighting Devices (AREA)
- Led Devices (AREA)
Abstract
Description
Claims (23)
- 피처리체가 수용되는 처리실과,피처리체의 적어도 한쪽의 면에 면하도록 마련되고, 피처리체에 대하여 광을 조사하는 복수의 발광 소자를 가지는 가열원과,상기 가열원에 대응하여 마련되고, 상기 발광 소자로부터의 광을 투과하는 광투과 부재와,상기 광투과 부재의 상기 처리실과 반대측을 지지하고, 상기 가열원에 직접 접촉하도록 마련된 고열전도성 재료로 이루어지는 냉각 부재와,상기 냉각 부재를 냉각 매체로 냉각하는 냉각 기구와,상기 처리실내를 배기하는 배기 기구와,상기 처리실내에 처리 가스를 공급하는 처리 가스 공급 기구를 구비하고,상기 가열원은, 이면측의 전체면이 상기 냉각 부재와 접촉하도록 마련된 고열전도성 절연 재료로 이루어지는 지지체와, 상기 지지체에 전체면이 접촉하도록 마련된 복수의 전극과, 상기 각 전극에 전체면이 접촉하도록 마련된 복수의 발광 소자를 가지는 발광 소자 어레이를 복수 구비하는 것을 특징으로 하는어닐 장치.
- 삭제
- 제 1 항에 있어서,상기 냉각 부재는 동제(銅製)이며, 상기 지지체는 AlN제인 것을 특징으로 하는어닐 장치.
- 제 1 항에 있어서,상기 냉각 부재와 상기 광투과 부재 사이에 공간을 가지고, 상기 공간에 상기 가열원이 마련되어 있는 것을 특징으로 하는어닐 장치.
- 제 4 항에 있어서,상기 공간에는 투명 수지가 충전되는 것을 특징으로 하는어닐 장치.
- 제 5 항에 있어서,상기 투명 수지는, 상기 냉각 부재측의 발광 소자를 포함하는 부분에 상대적으로 딱딱한 수지를 마련하고, 상기 광투과 부재측에 상대적으로 부드러운 수지를 마련하여 이루어지는 것을 특징으로 하는어닐 장치.
- 제 4 항에 있어서,상기 공간에는 불활성 가스가 충전되는 것을 특징으로 하는어닐 장치.
- 제 7 항에 있어서,상기 공간을 진공배기하는 진공배기 기구와, 상기 공간에 불활성 가스를 공급하는 불활성 가스 공급 기구를 더 가지는 것을 특징으로 하는어닐 장치.
- 제 1 항에 있어서,상기 냉각 부재와 상기 광투과 부재 사이에 공간을 가지고, 상기 공간에 상기 가열원이 마련되고, 상기 공간에는, 상기 발광 소자의 재료와 상기 광투과 부재 사이의 굴절율을 가지는 액체가 충전되어 있고, 상기 지지체는 상기 냉각 부재에 열전도층을 거쳐서 나사고정되어 있는 것을 특징으로 하는어닐 장치.
- 제 9 항에 있어서,상기 지지체는, 그 외곽이 상기 냉각 부재에 접하도록 마련되고, 그 내측이 반사면으로 되어 있는 동시에, 액체통류 구멍이 마련되어 있는 것을 특징으로 하는어닐 장치.
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 삭제
- 피처리체가 수용되는 처리실과,피처리체의 적어도 한쪽의 면에 면하도록 마련되고, 피처리체에 대하여 광을 조사하는 복수의 발광 소자를 가지는 가열원과,상기 가열원에 대응하여 마련되고, 상기 발광 소자로부터의 광을 투과하는 광투과 부재와,상기 가열원을 지지하는 가열원 지지 부재와,상기 가열원 지지 부재의 이면측으로부터 상기 가열원 지지 부재를 통해 상기 발광 소자에 급전하는 급전 기구와,상기 처리실 내를 배기하는 배기 기구와,상기 처리실 내에 처리 가스를 공급하는 처리 가스 공급 기구를 구비하고,상기 가열원은, 상기 가열원 지지 부재에 마련된 지지체와, 상기 지지체상에 형성된 복수의 전극과, 상기 각 전극상에 형성된 복수의 발광 소자와, 상기 발광 소자에 급전하는 급전 전극을 가지는 발광 소자 어레이를 복수 구비하고,상기 급전 기구는, 상기 발광 소자 어레이의 급전 전극에 접속되어 상기 가열원 지지부재 내로 연장되는 복수의 전극막대와, 각 전극막대에 급전하는 복수의 급전 부재를 가지는 것을 특징으로 하는어닐 장치.
- 삭제
- 제 17 항에 있어서,상기 전극막대와 상기 급전 부재의 사이는 스프링 핀으로 콘택트되는 것을 특징으로 하는어닐 장치.
- 제 17 항에 있어서,상기 발광 소자 어레이에 마련된 복수의 발광 소자는, 복수의 급전 영역으로 분할되어 배치되고, 상기 급전 전극은 각 급전 영역에 대응하여 복수 마련되고, 복수의 급전 전극은 직선 형상으로 배열되어 있는 것을 특징으로 하는어닐 장치.
- 제 20 항에 있어서,상기 급전 전극은, 복수의 음극과 공통된 양극을 가지는 것을 특징으로 하는어닐 장치.
- 제 20 항에 있어서,상기 급전 영역에 있어서의 복수의 발광 소자는, 직렬로 접속된 직렬 접속조가 복수 병렬로 마련되어 있는 것을 특징으로 하는어닐 장치.
- 제 1 항, 제 3 항 내지 제 10 항, 제 17 항, 또는 제 19 항 내지 제 22 항 중 어느 한 항에 있어서,상기 발광 소자는 발광 다이오드인 것을 특징으로 하는어닐 장치.
Applications Claiming Priority (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006240420 | 2006-09-05 | ||
JPJP-P-2006-240420 | 2006-09-05 | ||
JPJP-P-2007-034417 | 2007-02-15 | ||
JP2007034417 | 2007-02-15 | ||
JP2007081609A JP5138253B2 (ja) | 2006-09-05 | 2007-03-27 | アニール装置 |
JPJP-P-2007-081609 | 2007-03-27 | ||
PCT/JP2007/067053 WO2008029742A1 (fr) | 2006-09-05 | 2007-08-31 | Appareil de recuit |
Related Child Applications (1)
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KR1020117003539A Division KR20110022740A (ko) | 2006-09-05 | 2007-08-31 | 어닐 장치 |
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KR20090045314A KR20090045314A (ko) | 2009-05-07 |
KR101059314B1 true KR101059314B1 (ko) | 2011-08-24 |
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KR1020117003539A KR20110022740A (ko) | 2006-09-05 | 2007-08-31 | 어닐 장치 |
KR1020097004654A KR101059314B1 (ko) | 2006-09-05 | 2007-08-31 | 어닐 장치 |
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KR1020117003539A KR20110022740A (ko) | 2006-09-05 | 2007-08-31 | 어닐 장치 |
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US (2) | US8246900B2 (ko) |
JP (1) | JP5138253B2 (ko) |
KR (2) | KR20110022740A (ko) |
CN (1) | CN101405842B (ko) |
TW (1) | TWI389170B (ko) |
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JP5138253B2 (ja) * | 2006-09-05 | 2013-02-06 | 東京エレクトロン株式会社 | アニール装置 |
JP2009099925A (ja) * | 2007-09-27 | 2009-05-07 | Tokyo Electron Ltd | アニール装置 |
WO2009041466A1 (ja) * | 2007-09-27 | 2009-04-02 | Tokyo Electron Limited | アニール装置 |
JP5351479B2 (ja) * | 2008-01-28 | 2013-11-27 | 東京エレクトロン株式会社 | 加熱源の冷却構造 |
JP2009253242A (ja) * | 2008-04-11 | 2009-10-29 | Tokyo Electron Ltd | アニール装置 |
US20110174790A1 (en) * | 2008-06-25 | 2011-07-21 | Tokyo Electron Limited | Annealing apparatus |
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US20120279944A1 (en) | 2012-11-08 |
US20100038833A1 (en) | 2010-02-18 |
CN101405842A (zh) | 2009-04-08 |
JP5138253B2 (ja) | 2013-02-06 |
TW200830354A (en) | 2008-07-16 |
JP2008227435A (ja) | 2008-09-25 |
KR20110022740A (ko) | 2011-03-07 |
US8246900B2 (en) | 2012-08-21 |
TWI389170B (zh) | 2013-03-11 |
CN101405842B (zh) | 2010-09-01 |
KR20090045314A (ko) | 2009-05-07 |
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