KR101004604B1 - 감광성 흑색 조성물 및 컬러 필터 - Google Patents

감광성 흑색 조성물 및 컬러 필터 Download PDF

Info

Publication number
KR101004604B1
KR101004604B1 KR20080054035A KR20080054035A KR101004604B1 KR 101004604 B1 KR101004604 B1 KR 101004604B1 KR 20080054035 A KR20080054035 A KR 20080054035A KR 20080054035 A KR20080054035 A KR 20080054035A KR 101004604 B1 KR101004604 B1 KR 101004604B1
Authority
KR
South Korea
Prior art keywords
carbon black
dispersant
formula
photosensitive
weight
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
KR20080054035A
Other languages
English (en)
Korean (ko)
Other versions
KR20080110493A (ko
Inventor
도시하루 요시자와
신지 우에노
야스하루 기리타니
신고 이케다
Original Assignee
도요 잉키 세이조 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 도요 잉키 세이조 가부시끼가이샤 filed Critical 도요 잉키 세이조 가부시끼가이샤
Publication of KR20080110493A publication Critical patent/KR20080110493A/ko
Application granted granted Critical
Publication of KR101004604B1 publication Critical patent/KR101004604B1/ko
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Paints Or Removers (AREA)
  • Liquid Crystal (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
KR20080054035A 2007-06-14 2008-06-10 감광성 흑색 조성물 및 컬러 필터 Active KR101004604B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007157315A JP5115046B2 (ja) 2007-06-14 2007-06-14 感光性黒色組成物およびカラーフィルタ
JPJP-P-2007-00157315 2007-06-14

Publications (2)

Publication Number Publication Date
KR20080110493A KR20080110493A (ko) 2008-12-18
KR101004604B1 true KR101004604B1 (ko) 2010-12-28

Family

ID=40188339

Family Applications (1)

Application Number Title Priority Date Filing Date
KR20080054035A Active KR101004604B1 (ko) 2007-06-14 2008-06-10 감광성 흑색 조성물 및 컬러 필터

Country Status (4)

Country Link
JP (1) JP5115046B2 (enExample)
KR (1) KR101004604B1 (enExample)
CN (1) CN101324754B (enExample)
TW (1) TWI443460B (enExample)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5565761B2 (ja) * 2008-01-30 2014-08-06 東海カーボン株式会社 カーボンブラック分散体組成物及びフォトレジスト組成物
JP5617177B2 (ja) * 2009-03-27 2014-11-05 東洋インキＳｃホールディングス株式会社 カラーフィルタ用着色組成物及びカラーフィルタ
JP5739134B2 (ja) * 2009-10-26 2015-06-24 サカタインクス株式会社 ブラックマトリックス用着色組成物
KR101791493B1 (ko) * 2009-12-11 2017-10-30 후지필름 가부시키가이샤 흑색 경화성 조성물, 차광성 컬러필터, 차광막 및 그 제조 방법, 웨이퍼 레벨 렌즈, 및 고체 촬상 소자
JP5741141B2 (ja) * 2010-08-27 2015-07-01 東洋インキＳｃホールディングス株式会社 黒色樹脂組成物及びブラックマトリクス
JP5654276B2 (ja) * 2010-07-08 2015-01-14 株式会社日本触媒 遮光性フィルム
JP2012141605A (ja) * 2010-12-16 2012-07-26 Toagosei Co Ltd 黒色感光性組成物、ソルダーレジスト及び感光性ドライフィルム
CN103246106B (zh) * 2013-04-28 2015-08-12 京东方科技集团股份有限公司 一种显示装置、彩色滤光片及其制备方法
CN104356764B (zh) * 2014-11-07 2016-04-06 京东方科技集团股份有限公司 黑色颜料液、黑矩阵制备方法及黑矩阵
CN107407870B (zh) * 2015-04-01 2018-12-14 东丽株式会社 感光性树脂组合物、导电性图案的制造方法、基板、触摸面板及显示器
CN118516023B (zh) * 2024-06-13 2025-04-11 华侨大学 一种基于激光蚀刻的超黑光吸收涂层及其制备方法
CN118876386B (zh) * 2024-09-27 2025-02-11 山东利迈医疗科技有限公司 一次性输液器用复合管及其制备工艺

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005010604A (ja) 2003-06-20 2005-01-13 Toyo Ink Mfg Co Ltd 感光性黒色組成物、それを用いたブラックマトリックス基板およびカラーフィルタ
JP2006171781A (ja) 2006-01-11 2006-06-29 Mitsubishi Chemicals Corp 遮光性感光性組成物の製造方法、遮光性感光性組成物、及びカラーフィルター

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004198717A (ja) * 2002-12-18 2004-07-15 Showa Denko Kk カラーフィルターブラックマトリックスレジスト組成物及びその組成物に用いるカーボンブラック分散液組成物
JP2005189561A (ja) * 2003-12-26 2005-07-14 Toyo Ink Mfg Co Ltd 感光性黒色組成物、それを用いたブラックマトリックス基板およびカラーフィルタ
JP4951200B2 (ja) * 2004-08-20 2012-06-13 東洋インキＳｃホールディングス株式会社 カラーフィルタ
KR101249574B1 (ko) * 2005-07-08 2013-04-01 토요잉크Sc홀딩스주식회사 분산제, 그의 제조방법 및 상기 분산제를 포함하는 안료분산체 및 잉크
JP5270814B2 (ja) * 2005-08-11 2013-08-21 東京応化工業株式会社 感光性組成物用着色剤分散液
CN100487500C (zh) * 2005-11-30 2009-05-13 东洋油墨制造株式会社 黑色组合物及其制造方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005010604A (ja) 2003-06-20 2005-01-13 Toyo Ink Mfg Co Ltd 感光性黒色組成物、それを用いたブラックマトリックス基板およびカラーフィルタ
JP2006171781A (ja) 2006-01-11 2006-06-29 Mitsubishi Chemicals Corp 遮光性感光性組成物の製造方法、遮光性感光性組成物、及びカラーフィルター

Also Published As

Publication number Publication date
JP5115046B2 (ja) 2013-01-09
TWI443460B (zh) 2014-07-01
CN101324754A (zh) 2008-12-17
TW200905390A (en) 2009-02-01
KR20080110493A (ko) 2008-12-18
CN101324754B (zh) 2013-05-22
JP2008310000A (ja) 2008-12-25

Similar Documents

Publication Publication Date Title
KR101004604B1 (ko) 감광성 흑색 조성물 및 컬러 필터
KR101249574B1 (ko) 분산제, 그의 제조방법 및 상기 분산제를 포함하는 안료분산체 및 잉크
KR100820610B1 (ko) 감광성 조성물, 감광성 착색 조성물, 컬러 필터, 및액정표시장치
CN107229183B (zh) 红色感光性树脂组合物、使用其制造的滤色器和包含该滤色器的显示元件
KR20110134334A (ko) 칼라 필터용 착색 조성물 및 칼라 필터
JP5834328B2 (ja) カラーフィルタ用着色組成物、およびカラーフィルタ
KR20150007571A (ko) 흑색 감광성 수지 조성물 및 이를 이용한 차광층
JP5636675B2 (ja) カラーフィルタ用着色組成物、カラーフィルタ及びカラー液晶表示素子
KR20190073337A (ko) 프탈로시아닌 안료, 착색 조성물 및 컬러필터
JP6705212B2 (ja) カラーフィルタ用着色組成物及びカラーフィルタ
JP5668273B2 (ja) カラーフィルタ用着色組成物及びカラーフィルタ
JP4899768B2 (ja) カラーフィルタ用着色組成物およびカラーフィルタ
KR100996046B1 (ko) 착색 감광성 수지 조성물, 블랙 매트릭스, 컬러 필터, 및액정 표시 디스플레이
JP5151126B2 (ja) 黒色組成物及びそれを用いたカラーフィルタ
JP4848936B2 (ja) 感光性黒色組成物およびカラーフィルタ
JP2010152224A (ja) 感光性黒色組成物及びカラーフィルタ
JP4652967B2 (ja) 液晶表示素子用感光性組成物およびこれを用いたカラーフィルタ
JP7264301B1 (ja) 着色組成物及びカラーフィルタ
KR101276737B1 (ko) 흑색 조성물 및 흑색 조성물의 제조방법
CN102023481B (zh) 着色组合物、滤色器和彩色液晶显示元件
JP2007271937A (ja) 感光性黒色組成物およびカラーフィルタ
KR102241498B1 (ko) 적색, 녹색 화소용 착색 감광성 수지 조성물
KR20180058949A (ko) 흑색 감광성 수지 조성물, 이로부터 제조된 화상표시장치용 블랙 매트릭스, 컬럼 스페이서 및 블랙 매트릭스 일체형 컬럼 스페이서
KR102241499B1 (ko) 적색, 녹색 화소용 착색 감광성 수지 조성물
JP2006003377A (ja) 感光性黒色組成物、それを用いたブラックマトリックス基板およびカラーフィルタ

Legal Events

Date Code Title Description
A201 Request for examination
PA0109 Patent application

St.27 status event code: A-0-1-A10-A12-nap-PA0109

PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

D13-X000 Search requested

St.27 status event code: A-1-2-D10-D13-srh-X000

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

D14-X000 Search report completed

St.27 status event code: A-1-2-D10-D14-srh-X000

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

R17-X000 Change to representative recorded

St.27 status event code: A-3-3-R10-R17-oth-X000

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

St.27 status event code: A-1-2-D10-D22-exm-PE0701

R17-X000 Change to representative recorded

St.27 status event code: A-3-3-R10-R17-oth-X000

GRNT Written decision to grant
PR0701 Registration of establishment

St.27 status event code: A-2-4-F10-F11-exm-PR0701

PR1002 Payment of registration fee

St.27 status event code: A-2-2-U10-U11-oth-PR1002

Fee payment year number: 1

PG1601 Publication of registration

St.27 status event code: A-4-4-Q10-Q13-nap-PG1601

PN2301 Change of applicant

St.27 status event code: A-5-5-R10-R13-asn-PN2301

St.27 status event code: A-5-5-R10-R11-asn-PN2301

R18-X000 Changes to party contact information recorded

St.27 status event code: A-5-5-R10-R18-oth-X000

FPAY Annual fee payment

Payment date: 20131210

Year of fee payment: 4

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 4

FPAY Annual fee payment

Payment date: 20141205

Year of fee payment: 5

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 5

FPAY Annual fee payment

Payment date: 20151118

Year of fee payment: 6

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 6

FPAY Annual fee payment

Payment date: 20161123

Year of fee payment: 7

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 7

P22-X000 Classification modified

St.27 status event code: A-4-4-P10-P22-nap-X000

R18-X000 Changes to party contact information recorded

St.27 status event code: A-5-5-R10-R18-oth-X000

FPAY Annual fee payment

Payment date: 20171117

Year of fee payment: 8

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 8

FPAY Annual fee payment

Payment date: 20181115

Year of fee payment: 9

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 9

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 10

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 11

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 12

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 13

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 14

PN2301 Change of applicant

St.27 status event code: A-5-5-R10-R13-asn-PN2301

St.27 status event code: A-5-5-R10-R11-asn-PN2301

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 15

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 16