JP5115046B2 - 感光性黒色組成物およびカラーフィルタ - Google Patents

感光性黒色組成物およびカラーフィルタ Download PDF

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Publication number
JP5115046B2
JP5115046B2 JP2007157315A JP2007157315A JP5115046B2 JP 5115046 B2 JP5115046 B2 JP 5115046B2 JP 2007157315 A JP2007157315 A JP 2007157315A JP 2007157315 A JP2007157315 A JP 2007157315A JP 5115046 B2 JP5115046 B2 JP 5115046B2
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Japan
Prior art keywords
carbon black
dispersant
photopolymerization initiator
general formula
black composition
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JP2007157315A
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English (en)
Japanese (ja)
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JP2008310000A5 (enExample
JP2008310000A (ja
Inventor
俊啓 吉沢
慎司 上野
康治 桐谷
真吾 池田
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Artience Co Ltd
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Toyo Ink SC Holdings Co Ltd
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Publication date
Application filed by Toyo Ink SC Holdings Co Ltd filed Critical Toyo Ink SC Holdings Co Ltd
Priority to JP2007157315A priority Critical patent/JP5115046B2/ja
Priority to TW97120831A priority patent/TWI443460B/zh
Priority to KR20080054035A priority patent/KR101004604B1/ko
Priority to CN2008101254230A priority patent/CN101324754B/zh
Publication of JP2008310000A publication Critical patent/JP2008310000A/ja
Publication of JP2008310000A5 publication Critical patent/JP2008310000A5/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Paints Or Removers (AREA)
  • Liquid Crystal (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
JP2007157315A 2007-06-14 2007-06-14 感光性黒色組成物およびカラーフィルタ Active JP5115046B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2007157315A JP5115046B2 (ja) 2007-06-14 2007-06-14 感光性黒色組成物およびカラーフィルタ
TW97120831A TWI443460B (zh) 2007-06-14 2008-06-04 光敏黑色組成物及彩色濾光片
KR20080054035A KR101004604B1 (ko) 2007-06-14 2008-06-10 감광성 흑색 조성물 및 컬러 필터
CN2008101254230A CN101324754B (zh) 2007-06-14 2008-06-13 感光性黑色组合物以及滤色器

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007157315A JP5115046B2 (ja) 2007-06-14 2007-06-14 感光性黒色組成物およびカラーフィルタ

Publications (3)

Publication Number Publication Date
JP2008310000A JP2008310000A (ja) 2008-12-25
JP2008310000A5 JP2008310000A5 (enExample) 2010-05-20
JP5115046B2 true JP5115046B2 (ja) 2013-01-09

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ID=40188339

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JP2007157315A Active JP5115046B2 (ja) 2007-06-14 2007-06-14 感光性黒色組成物およびカラーフィルタ

Country Status (4)

Country Link
JP (1) JP5115046B2 (enExample)
KR (1) KR101004604B1 (enExample)
CN (1) CN101324754B (enExample)
TW (1) TWI443460B (enExample)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5565761B2 (ja) * 2008-01-30 2014-08-06 東海カーボン株式会社 カーボンブラック分散体組成物及びフォトレジスト組成物
JP5617177B2 (ja) * 2009-03-27 2014-11-05 東洋インキＳｃホールディングス株式会社 カラーフィルタ用着色組成物及びカラーフィルタ
JP5739134B2 (ja) * 2009-10-26 2015-06-24 サカタインクス株式会社 ブラックマトリックス用着色組成物
KR101791493B1 (ko) * 2009-12-11 2017-10-30 후지필름 가부시키가이샤 흑색 경화성 조성물, 차광성 컬러필터, 차광막 및 그 제조 방법, 웨이퍼 레벨 렌즈, 및 고체 촬상 소자
JP5741141B2 (ja) * 2010-08-27 2015-07-01 東洋インキＳｃホールディングス株式会社 黒色樹脂組成物及びブラックマトリクス
JP5654276B2 (ja) * 2010-07-08 2015-01-14 株式会社日本触媒 遮光性フィルム
JP2012141605A (ja) * 2010-12-16 2012-07-26 Toagosei Co Ltd 黒色感光性組成物、ソルダーレジスト及び感光性ドライフィルム
CN103246106B (zh) * 2013-04-28 2015-08-12 京东方科技集团股份有限公司 一种显示装置、彩色滤光片及其制备方法
CN104356764B (zh) * 2014-11-07 2016-04-06 京东方科技集团股份有限公司 黑色颜料液、黑矩阵制备方法及黑矩阵
CN107407870B (zh) * 2015-04-01 2018-12-14 东丽株式会社 感光性树脂组合物、导电性图案的制造方法、基板、触摸面板及显示器
CN118516023B (zh) * 2024-06-13 2025-04-11 华侨大学 一种基于激光蚀刻的超黑光吸收涂层及其制备方法
CN118876386B (zh) * 2024-09-27 2025-02-11 山东利迈医疗科技有限公司 一次性输液器用复合管及其制备工艺

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004198717A (ja) * 2002-12-18 2004-07-15 Showa Denko Kk カラーフィルターブラックマトリックスレジスト組成物及びその組成物に用いるカーボンブラック分散液組成物
JP4601267B2 (ja) * 2003-06-20 2010-12-22 東洋インキ製造株式会社 感光性黒色組成物、それを用いたブラックマトリックス基板およびカラーフィルタ
JP2005189561A (ja) * 2003-12-26 2005-07-14 Toyo Ink Mfg Co Ltd 感光性黒色組成物、それを用いたブラックマトリックス基板およびカラーフィルタ
JP4951200B2 (ja) * 2004-08-20 2012-06-13 東洋インキＳｃホールディングス株式会社 カラーフィルタ
KR101249574B1 (ko) * 2005-07-08 2013-04-01 토요잉크Sc홀딩스주식회사 분산제, 그의 제조방법 및 상기 분산제를 포함하는 안료분산체 및 잉크
JP5270814B2 (ja) * 2005-08-11 2013-08-21 東京応化工業株式会社 感光性組成物用着色剤分散液
CN100487500C (zh) * 2005-11-30 2009-05-13 东洋油墨制造株式会社 黑色组合物及其制造方法
JP2006171781A (ja) 2006-01-11 2006-06-29 Mitsubishi Chemicals Corp 遮光性感光性組成物の製造方法、遮光性感光性組成物、及びカラーフィルター

Also Published As

Publication number Publication date
KR101004604B1 (ko) 2010-12-28
TWI443460B (zh) 2014-07-01
CN101324754A (zh) 2008-12-17
TW200905390A (en) 2009-02-01
KR20080110493A (ko) 2008-12-18
CN101324754B (zh) 2013-05-22
JP2008310000A (ja) 2008-12-25

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