KR100807445B1 - 하나 이상의 시스템 다이아프램을 갖는, 특히렌즈시스템에서의 광학영상장치 - Google Patents

하나 이상의 시스템 다이아프램을 갖는, 특히렌즈시스템에서의 광학영상장치 Download PDF

Info

Publication number
KR100807445B1
KR100807445B1 KR1020000061164A KR20000061164A KR100807445B1 KR 100807445 B1 KR100807445 B1 KR 100807445B1 KR 1020000061164 A KR1020000061164 A KR 1020000061164A KR 20000061164 A KR20000061164 A KR 20000061164A KR 100807445 B1 KR100807445 B1 KR 100807445B1
Authority
KR
South Korea
Prior art keywords
diaphragm
plate
bases
imaging device
base
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1020000061164A
Other languages
English (en)
Korean (ko)
Other versions
KR20010051088A (ko
Inventor
트룬쯔 미카엘
Original Assignee
칼 짜이스 에스엠테 아게
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 칼 짜이스 에스엠테 아게 filed Critical 칼 짜이스 에스엠테 아게
Publication of KR20010051088A publication Critical patent/KR20010051088A/ko
Application granted granted Critical
Publication of KR100807445B1 publication Critical patent/KR100807445B1/ko
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/7025—Size or form of projection system aperture, e.g. aperture stops, diaphragms or pupil obscuration; Control thereof
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/005—Diaphragms

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Diaphragms For Cameras (AREA)
  • Lens Barrels (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
KR1020000061164A 1999-11-20 2000-10-18 하나 이상의 시스템 다이아프램을 갖는, 특히렌즈시스템에서의 광학영상장치 Expired - Fee Related KR100807445B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19955984.8 1999-11-20
DE19955984A DE19955984A1 (de) 1999-11-20 1999-11-20 Optische Abbildungsvorrichtung, insbesondere Objektiv mit wenigstens einer Systemblende

Publications (2)

Publication Number Publication Date
KR20010051088A KR20010051088A (ko) 2001-06-25
KR100807445B1 true KR100807445B1 (ko) 2008-02-25

Family

ID=7929810

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020000061164A Expired - Fee Related KR100807445B1 (ko) 1999-11-20 2000-10-18 하나 이상의 시스템 다이아프램을 갖는, 특히렌즈시스템에서의 광학영상장치

Country Status (6)

Country Link
US (1) US6445510B1 (enExample)
EP (2) EP1102103B1 (enExample)
JP (1) JP5107486B2 (enExample)
KR (1) KR100807445B1 (enExample)
DE (3) DE19955984A1 (enExample)
TW (1) TW460707B (enExample)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005019878A1 (de) * 2003-08-01 2005-03-03 Carl Zeiss Smt Ag Optische abbildungsvorrichtung mit wenigstens einer systemblende
KR101179286B1 (ko) 2003-10-29 2012-09-03 칼 짜이스 에스엠테 게엠베하 조리개 변경 장치
US7492509B2 (en) 2003-12-02 2009-02-17 Carl Zeiss Smt Ag Projection optical system
US7301707B2 (en) * 2004-09-03 2007-11-27 Carl Zeiss Smt Ag Projection optical system and method
KR20070097083A (ko) * 2004-12-30 2007-10-02 칼 짜이스 에스엠테 아게 투사 광학 시스템
US7310131B2 (en) * 2005-08-02 2007-12-18 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
WO2007020004A1 (de) 2005-08-17 2007-02-22 Carl Zeiss Smt Ag Projektionsobjektiv und verfahren zur optimierung einer systemblende eines projektionsobjektivs
JP4003790B2 (ja) 2005-08-23 2007-11-07 セイコーエプソン株式会社 光学絞り装置、およびプロジェクタ
DE102006038455A1 (de) * 2006-08-16 2008-02-21 Carl Zeiss Smt Ag Optisches System für die Halbleiterlithographie
WO2010108516A1 (en) 2009-03-27 2010-09-30 Carl Zeiss Smt Ag Illumination optical system for euv microlithography and euv attenuator for an illumination optical system of this kind, illumination system and projection exposure installation having an illumination optical system of this kind
DE102010005449B4 (de) * 2010-01-24 2015-07-23 Leica Camera Ag Blendenlamelle mit Tragvorrichtung
DE102012111731B4 (de) * 2012-12-03 2017-10-12 Carl Zeiss Industrielle Messtechnik Gmbh Irisblende und optische Vorrichtung
DE102014223811B4 (de) 2014-11-21 2016-09-29 Carl Zeiss Smt Gmbh Abbildende Optik für die EUV-Projektionslithographie, Projektionsbelichtungsanlage und Verfahren zur Herstellung eines strukturierten Bauteils
JP7204400B2 (ja) * 2018-09-28 2023-01-16 キヤノン株式会社 露光装置及び物品の製造方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3997906A (en) * 1974-08-17 1976-12-14 Nippon Kogaku K.K. Diaphragm device in a camera lens
US4149775A (en) * 1977-08-03 1979-04-17 Blake Daniel H Zoom lens apparatus with adjustable aperture

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5910910A (ja) * 1982-07-09 1984-01-20 Minolta Camera Co Ltd 変倍光学鏡胴
US4904055A (en) 1988-10-03 1990-02-27 Eastman Kodak Company Variable aperture formed by linearly movable elements
JPH0477743A (ja) * 1990-07-19 1992-03-11 Canon Inc 投影露光装置
JPH0553170A (ja) * 1991-08-29 1993-03-05 Canon Inc 絞り装置を有する光学機器
JPH0623017U (ja) * 1992-08-24 1994-03-25 オリンパス光学工業株式会社 視野絞り機構
JPH07199272A (ja) * 1993-12-29 1995-08-04 Minolta Co Ltd カメラレンズの絞り補正機構
JPH07301845A (ja) * 1994-05-06 1995-11-14 Canon Inc 絞り装置及びそれを用いた投影露光装置
DE4417489A1 (de) 1994-05-19 1995-11-23 Zeiss Carl Fa Höchstaperturiges katadioptrisches Reduktionsobjektiv für die Miktrolithographie
JP3530241B2 (ja) * 1994-12-21 2004-05-24 日本電産コパル株式会社 カメラ用シャッタ
JPH08220591A (ja) * 1995-02-10 1996-08-30 Nikon Corp 絞り移動装置
JP3597311B2 (ja) * 1996-07-18 2004-12-08 オリンパス株式会社 光ピックアップ
JP3925576B2 (ja) * 1997-07-24 2007-06-06 株式会社ニコン 投影光学系、該光学系を備えた露光装置、及び該装置を用いたデバイスの製造方法
JP4066085B2 (ja) 1997-10-07 2008-03-26 株式会社ニコン 投影露光装置、該装置を用いた半導体デバイスの製造方法、及び露光方法
JP2000075185A (ja) * 1998-08-31 2000-03-14 Nikon Corp レンズ鏡筒
TW367050U (en) * 1999-01-14 1999-08-11 Umax Data Systems Inc Improved bladed aperture stop of a lens

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3997906A (en) * 1974-08-17 1976-12-14 Nippon Kogaku K.K. Diaphragm device in a camera lens
US4149775A (en) * 1977-08-03 1979-04-17 Blake Daniel H Zoom lens apparatus with adjustable aperture

Also Published As

Publication number Publication date
EP2090920B1 (de) 2011-04-13
DE50016095D1 (de) 2011-05-26
JP5107486B2 (ja) 2012-12-26
EP1102103A2 (de) 2001-05-23
EP1102103A3 (de) 2001-08-08
US6445510B1 (en) 2002-09-03
DE19955984A1 (de) 2001-05-23
EP1102103B1 (de) 2009-08-26
TW460707B (en) 2001-10-21
DE50015730D1 (de) 2009-10-08
EP2090920A1 (de) 2009-08-19
KR20010051088A (ko) 2001-06-25
JP2001154235A (ja) 2001-06-08

Similar Documents

Publication Publication Date Title
KR100807445B1 (ko) 하나 이상의 시스템 다이아프램을 갖는, 특히렌즈시스템에서의 광학영상장치
DE60317088T2 (de) Optische Vorrichtung, Belichtungsapparat, und Herstellungsmethode für Halbleiterbauteile
JP5444390B2 (ja) 光学式結像装置、システムおよび方法
US6553175B2 (en) Variable optical attenuator
JP2005517291A (ja) 多数の鏡面を有する面鏡
CN102236265A (zh) 光刻设备和制造物品的方法
JP5917255B2 (ja) 案内装置、露光装置および物品の製造方法
US6278558B1 (en) Transverse zoom lens set
JP2004078209A5 (enExample)
EP0169593A2 (en) Adjusting the direction of a beam of radiation
US20030086070A1 (en) Single aperture optical system for photolithography systems
US4507774A (en) Optical disc and disc-turntable air flow interface assembly
US5506731A (en) Device for controllably moving an optical element
US9989753B2 (en) Centrosymmetric changer for optical elements
JPH06230309A (ja) ２進回折光学素子スキャナ
CN107984081A (zh) 激光雕刻机光路结构
JP3252533B2 (ja) ズームレンズ装置の調整機構
JP2002258134A (ja) レンズ鏡筒
JP7204400B2 (ja) 露光装置及び物品の製造方法
US20240094604A1 (en) Light shielding unit and lens barrel equipped with the same
JP2012199383A (ja) 露光装置、半導体装置の製造方法、及び、パターン形成方法
SU1282041A1 (ru) Поворотна турель дл смены оптических элементов
JP2007003581A (ja) レンズ鏡筒
JP4526748B2 (ja) 原盤露光装置
JP2021036274A (ja) レンズ鏡筒

Legal Events

Date Code Title Description
PA0109 Patent application

St.27 status event code: A-0-1-A10-A12-nap-PA0109

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

R15-X000 Change to inventor requested

St.27 status event code: A-3-3-R10-R15-oth-X000

R16-X000 Change to inventor recorded

St.27 status event code: A-3-3-R10-R16-oth-X000

N231 Notification of change of applicant
PN2301 Change of applicant

St.27 status event code: A-3-3-R10-R13-asn-PN2301

St.27 status event code: A-3-3-R10-R11-asn-PN2301

A201 Request for examination
PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

R18-X000 Changes to party contact information recorded

St.27 status event code: A-3-3-R10-R18-oth-X000

R17-X000 Change to representative recorded

St.27 status event code: A-3-3-R10-R17-oth-X000

T11-X000 Administrative time limit extension requested

St.27 status event code: U-3-3-T10-T11-oth-X000

T11-X000 Administrative time limit extension requested

St.27 status event code: U-3-3-T10-T11-oth-X000

T11-X000 Administrative time limit extension requested

St.27 status event code: U-3-3-T10-T11-oth-X000

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

St.27 status event code: A-1-2-D10-D22-exm-PE0701

GRNT Written decision to grant
PR0701 Registration of establishment

St.27 status event code: A-2-4-F10-F11-exm-PR0701

PR1002 Payment of registration fee

St.27 status event code: A-2-2-U10-U11-oth-PR1002

Fee payment year number: 1

PG1601 Publication of registration

St.27 status event code: A-4-4-Q10-Q13-nap-PG1601

PN2301 Change of applicant

St.27 status event code: A-5-5-R10-R13-asn-PN2301

St.27 status event code: A-5-5-R10-R11-asn-PN2301

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 4

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 5

FPAY Annual fee payment

Payment date: 20130207

Year of fee payment: 6

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 6

FPAY Annual fee payment

Payment date: 20140206

Year of fee payment: 7

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 7

FPAY Annual fee payment

Payment date: 20150205

Year of fee payment: 8

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 8

FPAY Annual fee payment

Payment date: 20160212

Year of fee payment: 9

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 9

LAPS Lapse due to unpaid annual fee
PC1903 Unpaid annual fee

St.27 status event code: A-4-4-U10-U13-oth-PC1903

Not in force date: 20170220

Payment event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

PC1903 Unpaid annual fee

St.27 status event code: N-4-6-H10-H13-oth-PC1903

Ip right cessation event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

Not in force date: 20170220

P22-X000 Classification modified

St.27 status event code: A-4-4-P10-P22-nap-X000