TW460707B - Optical imaging device, in particular lens system, with at least one system diaphragm - Google Patents
Optical imaging device, in particular lens system, with at least one system diaphragm Download PDFInfo
- Publication number
- TW460707B TW460707B TW089124245A TW89124245A TW460707B TW 460707 B TW460707 B TW 460707B TW 089124245 A TW089124245 A TW 089124245A TW 89124245 A TW89124245 A TW 89124245A TW 460707 B TW460707 B TW 460707B
- Authority
- TW
- Taiwan
- Prior art keywords
- light
- imaging device
- base
- patent application
- block
- Prior art date
Links
- 238000012634 optical imaging Methods 0.000 title claims abstract description 16
- 230000003287 optical effect Effects 0.000 claims abstract description 29
- 230000004888 barrier function Effects 0.000 claims description 30
- 230000000903 blocking effect Effects 0.000 claims description 14
- 238000003384 imaging method Methods 0.000 claims description 7
- 239000002689 soil Substances 0.000 claims description 2
- 241001133760 Acoelorraphe Species 0.000 claims 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims 1
- 229910052802 copper Inorganic materials 0.000 claims 1
- 239000010949 copper Substances 0.000 claims 1
- 230000002265 prevention Effects 0.000 claims 1
- 238000005096 rolling process Methods 0.000 description 14
- 230000008901 benefit Effects 0.000 description 7
- 230000008859 change Effects 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 230000006872 improvement Effects 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000005457 optimization Methods 0.000 description 2
- 241000283690 Bos taurus Species 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 240000008866 Ziziphus nummularia Species 0.000 description 1
- 230000001154 acute effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 235000013399 edible fruits Nutrition 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 239000010977 jade Substances 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 230000036316 preload Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/7025—Size or form of projection system aperture, e.g. aperture stops, diaphragms or pupil obscuration; Control thereof
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/005—Diaphragms
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Diaphragms For Cameras (AREA)
- Lens Barrels (AREA)
- Mechanical Light Control Or Optical Switches (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19955984A DE19955984A1 (de) | 1999-11-20 | 1999-11-20 | Optische Abbildungsvorrichtung, insbesondere Objektiv mit wenigstens einer Systemblende |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW460707B true TW460707B (en) | 2001-10-21 |
Family
ID=7929810
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW089124245A TW460707B (en) | 1999-11-20 | 2000-11-16 | Optical imaging device, in particular lens system, with at least one system diaphragm |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US6445510B1 (enExample) |
| EP (2) | EP1102103B1 (enExample) |
| JP (1) | JP5107486B2 (enExample) |
| KR (1) | KR100807445B1 (enExample) |
| DE (3) | DE19955984A1 (enExample) |
| TW (1) | TW460707B (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI762801B (zh) * | 2018-09-28 | 2022-05-01 | 日商佳能股份有限公司 | 曝光裝置以及物品之製造方法 |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2005019878A1 (de) * | 2003-08-01 | 2005-03-03 | Carl Zeiss Smt Ag | Optische abbildungsvorrichtung mit wenigstens einer systemblende |
| KR101179286B1 (ko) | 2003-10-29 | 2012-09-03 | 칼 짜이스 에스엠테 게엠베하 | 조리개 변경 장치 |
| US7492509B2 (en) | 2003-12-02 | 2009-02-17 | Carl Zeiss Smt Ag | Projection optical system |
| US7301707B2 (en) * | 2004-09-03 | 2007-11-27 | Carl Zeiss Smt Ag | Projection optical system and method |
| KR20070097083A (ko) * | 2004-12-30 | 2007-10-02 | 칼 짜이스 에스엠테 아게 | 투사 광학 시스템 |
| US7310131B2 (en) * | 2005-08-02 | 2007-12-18 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| WO2007020004A1 (de) | 2005-08-17 | 2007-02-22 | Carl Zeiss Smt Ag | Projektionsobjektiv und verfahren zur optimierung einer systemblende eines projektionsobjektivs |
| JP4003790B2 (ja) | 2005-08-23 | 2007-11-07 | セイコーエプソン株式会社 | 光学絞り装置、およびプロジェクタ |
| DE102006038455A1 (de) * | 2006-08-16 | 2008-02-21 | Carl Zeiss Smt Ag | Optisches System für die Halbleiterlithographie |
| WO2010108516A1 (en) | 2009-03-27 | 2010-09-30 | Carl Zeiss Smt Ag | Illumination optical system for euv microlithography and euv attenuator for an illumination optical system of this kind, illumination system and projection exposure installation having an illumination optical system of this kind |
| DE102010005449B4 (de) * | 2010-01-24 | 2015-07-23 | Leica Camera Ag | Blendenlamelle mit Tragvorrichtung |
| DE102012111731B4 (de) * | 2012-12-03 | 2017-10-12 | Carl Zeiss Industrielle Messtechnik Gmbh | Irisblende und optische Vorrichtung |
| DE102014223811B4 (de) | 2014-11-21 | 2016-09-29 | Carl Zeiss Smt Gmbh | Abbildende Optik für die EUV-Projektionslithographie, Projektionsbelichtungsanlage und Verfahren zur Herstellung eines strukturierten Bauteils |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5760009Y2 (enExample) | 1974-08-17 | 1982-12-21 | ||
| US4149775A (en) | 1977-08-03 | 1979-04-17 | Blake Daniel H | Zoom lens apparatus with adjustable aperture |
| JPS5910910A (ja) * | 1982-07-09 | 1984-01-20 | Minolta Camera Co Ltd | 変倍光学鏡胴 |
| US4904055A (en) | 1988-10-03 | 1990-02-27 | Eastman Kodak Company | Variable aperture formed by linearly movable elements |
| JPH0477743A (ja) * | 1990-07-19 | 1992-03-11 | Canon Inc | 投影露光装置 |
| JPH0553170A (ja) * | 1991-08-29 | 1993-03-05 | Canon Inc | 絞り装置を有する光学機器 |
| JPH0623017U (ja) * | 1992-08-24 | 1994-03-25 | オリンパス光学工業株式会社 | 視野絞り機構 |
| JPH07199272A (ja) * | 1993-12-29 | 1995-08-04 | Minolta Co Ltd | カメラレンズの絞り補正機構 |
| JPH07301845A (ja) * | 1994-05-06 | 1995-11-14 | Canon Inc | 絞り装置及びそれを用いた投影露光装置 |
| DE4417489A1 (de) | 1994-05-19 | 1995-11-23 | Zeiss Carl Fa | Höchstaperturiges katadioptrisches Reduktionsobjektiv für die Miktrolithographie |
| JP3530241B2 (ja) * | 1994-12-21 | 2004-05-24 | 日本電産コパル株式会社 | カメラ用シャッタ |
| JPH08220591A (ja) * | 1995-02-10 | 1996-08-30 | Nikon Corp | 絞り移動装置 |
| JP3597311B2 (ja) * | 1996-07-18 | 2004-12-08 | オリンパス株式会社 | 光ピックアップ |
| JP3925576B2 (ja) * | 1997-07-24 | 2007-06-06 | 株式会社ニコン | 投影光学系、該光学系を備えた露光装置、及び該装置を用いたデバイスの製造方法 |
| JP4066085B2 (ja) | 1997-10-07 | 2008-03-26 | 株式会社ニコン | 投影露光装置、該装置を用いた半導体デバイスの製造方法、及び露光方法 |
| JP2000075185A (ja) * | 1998-08-31 | 2000-03-14 | Nikon Corp | レンズ鏡筒 |
| TW367050U (en) * | 1999-01-14 | 1999-08-11 | Umax Data Systems Inc | Improved bladed aperture stop of a lens |
-
1999
- 1999-11-20 DE DE19955984A patent/DE19955984A1/de not_active Withdrawn
-
2000
- 2000-10-04 US US09/678,715 patent/US6445510B1/en not_active Expired - Lifetime
- 2000-10-10 EP EP00122003A patent/EP1102103B1/de not_active Expired - Lifetime
- 2000-10-10 DE DE50015730T patent/DE50015730D1/de not_active Expired - Lifetime
- 2000-10-10 EP EP09160725A patent/EP2090920B1/de not_active Expired - Lifetime
- 2000-10-10 DE DE50016095T patent/DE50016095D1/de not_active Expired - Lifetime
- 2000-10-18 KR KR1020000061164A patent/KR100807445B1/ko not_active Expired - Fee Related
- 2000-10-24 JP JP2000324184A patent/JP5107486B2/ja not_active Expired - Fee Related
- 2000-11-16 TW TW089124245A patent/TW460707B/zh not_active IP Right Cessation
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI762801B (zh) * | 2018-09-28 | 2022-05-01 | 日商佳能股份有限公司 | 曝光裝置以及物品之製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| EP2090920B1 (de) | 2011-04-13 |
| DE50016095D1 (de) | 2011-05-26 |
| JP5107486B2 (ja) | 2012-12-26 |
| EP1102103A2 (de) | 2001-05-23 |
| EP1102103A3 (de) | 2001-08-08 |
| US6445510B1 (en) | 2002-09-03 |
| DE19955984A1 (de) | 2001-05-23 |
| EP1102103B1 (de) | 2009-08-26 |
| KR100807445B1 (ko) | 2008-02-25 |
| DE50015730D1 (de) | 2009-10-08 |
| EP2090920A1 (de) | 2009-08-19 |
| KR20010051088A (ko) | 2001-06-25 |
| JP2001154235A (ja) | 2001-06-08 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GD4A | Issue of patent certificate for granted invention patent | ||
| MM4A | Annulment or lapse of patent due to non-payment of fees |