JP5107486B2 - 少なくとも１つのシステム絞りを有する光学結像装置 - Google Patents

少なくとも１つのシステム絞りを有する光学結像装置 Download PDF

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Publication number
JP5107486B2
JP5107486B2 JP2000324184A JP2000324184A JP5107486B2 JP 5107486 B2 JP5107486 B2 JP 5107486B2 JP 2000324184 A JP2000324184 A JP 2000324184A JP 2000324184 A JP2000324184 A JP 2000324184A JP 5107486 B2 JP5107486 B2 JP 5107486B2
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Prior art keywords
diaphragm
bases
optical imaging
aperture
imaging device
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JP2000324184A
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Japanese (ja)
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JP2001154235A5 (enExample
JP2001154235A (ja
Inventor
シュスター カール−ハインズ
ビスチョフ トーマス
ゲルリッチ ベルンハード
ムエルベヤー ミハエル
マウル グエンター
ミハエル トランツ
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カール・ツァイス・エスエムティー・ゲーエムベーハー
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Publication of JP2001154235A5 publication Critical patent/JP2001154235A5/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/7025—Size or form of projection system aperture, e.g. aperture stops, diaphragms or pupil obscuration; Control thereof
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/005—Diaphragms

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Diaphragms For Cameras (AREA)
  • Lens Barrels (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
JP2000324184A 1999-11-20 2000-10-24 少なくとも１つのシステム絞りを有する光学結像装置 Expired - Fee Related JP5107486B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19955984.8 1999-11-20
DE19955984A DE19955984A1 (de) 1999-11-20 1999-11-20 Optische Abbildungsvorrichtung, insbesondere Objektiv mit wenigstens einer Systemblende

Publications (3)

Publication Number Publication Date
JP2001154235A JP2001154235A (ja) 2001-06-08
JP2001154235A5 JP2001154235A5 (enExample) 2007-11-29
JP5107486B2 true JP5107486B2 (ja) 2012-12-26

Family

ID=7929810

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000324184A Expired - Fee Related JP5107486B2 (ja) 1999-11-20 2000-10-24 少なくとも１つのシステム絞りを有する光学結像装置

Country Status (6)

Country Link
US (1) US6445510B1 (enExample)
EP (2) EP1102103B1 (enExample)
JP (1) JP5107486B2 (enExample)
KR (1) KR100807445B1 (enExample)
DE (3) DE19955984A1 (enExample)
TW (1) TW460707B (enExample)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005019878A1 (de) * 2003-08-01 2005-03-03 Carl Zeiss Smt Ag Optische abbildungsvorrichtung mit wenigstens einer systemblende
KR101179286B1 (ko) 2003-10-29 2012-09-03 칼 짜이스 에스엠테 게엠베하 조리개 변경 장치
US7492509B2 (en) 2003-12-02 2009-02-17 Carl Zeiss Smt Ag Projection optical system
US7301707B2 (en) * 2004-09-03 2007-11-27 Carl Zeiss Smt Ag Projection optical system and method
KR20070097083A (ko) * 2004-12-30 2007-10-02 칼 짜이스 에스엠테 아게 투사 광학 시스템
US7310131B2 (en) * 2005-08-02 2007-12-18 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
WO2007020004A1 (de) 2005-08-17 2007-02-22 Carl Zeiss Smt Ag Projektionsobjektiv und verfahren zur optimierung einer systemblende eines projektionsobjektivs
JP4003790B2 (ja) 2005-08-23 2007-11-07 セイコーエプソン株式会社 光学絞り装置、およびプロジェクタ
DE102006038455A1 (de) * 2006-08-16 2008-02-21 Carl Zeiss Smt Ag Optisches System für die Halbleiterlithographie
WO2010108516A1 (en) 2009-03-27 2010-09-30 Carl Zeiss Smt Ag Illumination optical system for euv microlithography and euv attenuator for an illumination optical system of this kind, illumination system and projection exposure installation having an illumination optical system of this kind
DE102010005449B4 (de) * 2010-01-24 2015-07-23 Leica Camera Ag Blendenlamelle mit Tragvorrichtung
DE102012111731B4 (de) * 2012-12-03 2017-10-12 Carl Zeiss Industrielle Messtechnik Gmbh Irisblende und optische Vorrichtung
DE102014223811B4 (de) 2014-11-21 2016-09-29 Carl Zeiss Smt Gmbh Abbildende Optik für die EUV-Projektionslithographie, Projektionsbelichtungsanlage und Verfahren zur Herstellung eines strukturierten Bauteils
JP7204400B2 (ja) * 2018-09-28 2023-01-16 キヤノン株式会社 露光装置及び物品の製造方法

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5760009Y2 (enExample) 1974-08-17 1982-12-21
US4149775A (en) 1977-08-03 1979-04-17 Blake Daniel H Zoom lens apparatus with adjustable aperture
JPS5910910A (ja) * 1982-07-09 1984-01-20 Minolta Camera Co Ltd 変倍光学鏡胴
US4904055A (en) 1988-10-03 1990-02-27 Eastman Kodak Company Variable aperture formed by linearly movable elements
JPH0477743A (ja) * 1990-07-19 1992-03-11 Canon Inc 投影露光装置
JPH0553170A (ja) * 1991-08-29 1993-03-05 Canon Inc 絞り装置を有する光学機器
JPH0623017U (ja) * 1992-08-24 1994-03-25 オリンパス光学工業株式会社 視野絞り機構
JPH07199272A (ja) * 1993-12-29 1995-08-04 Minolta Co Ltd カメラレンズの絞り補正機構
JPH07301845A (ja) * 1994-05-06 1995-11-14 Canon Inc 絞り装置及びそれを用いた投影露光装置
DE4417489A1 (de) 1994-05-19 1995-11-23 Zeiss Carl Fa Höchstaperturiges katadioptrisches Reduktionsobjektiv für die Miktrolithographie
JP3530241B2 (ja) * 1994-12-21 2004-05-24 日本電産コパル株式会社 カメラ用シャッタ
JPH08220591A (ja) * 1995-02-10 1996-08-30 Nikon Corp 絞り移動装置
JP3597311B2 (ja) * 1996-07-18 2004-12-08 オリンパス株式会社 光ピックアップ
JP3925576B2 (ja) * 1997-07-24 2007-06-06 株式会社ニコン 投影光学系、該光学系を備えた露光装置、及び該装置を用いたデバイスの製造方法
JP4066085B2 (ja) 1997-10-07 2008-03-26 株式会社ニコン 投影露光装置、該装置を用いた半導体デバイスの製造方法、及び露光方法
JP2000075185A (ja) * 1998-08-31 2000-03-14 Nikon Corp レンズ鏡筒
TW367050U (en) * 1999-01-14 1999-08-11 Umax Data Systems Inc Improved bladed aperture stop of a lens

Also Published As

Publication number Publication date
EP2090920B1 (de) 2011-04-13
DE50016095D1 (de) 2011-05-26
EP1102103A2 (de) 2001-05-23
EP1102103A3 (de) 2001-08-08
US6445510B1 (en) 2002-09-03
DE19955984A1 (de) 2001-05-23
EP1102103B1 (de) 2009-08-26
TW460707B (en) 2001-10-21
KR100807445B1 (ko) 2008-02-25
DE50015730D1 (de) 2009-10-08
EP2090920A1 (de) 2009-08-19
KR20010051088A (ko) 2001-06-25
JP2001154235A (ja) 2001-06-08

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