DE19955984A1 - Optische Abbildungsvorrichtung, insbesondere Objektiv mit wenigstens einer Systemblende - Google Patents
Optische Abbildungsvorrichtung, insbesondere Objektiv mit wenigstens einer SystemblendeInfo
- Publication number
- DE19955984A1 DE19955984A1 DE19955984A DE19955984A DE19955984A1 DE 19955984 A1 DE19955984 A1 DE 19955984A1 DE 19955984 A DE19955984 A DE 19955984A DE 19955984 A DE19955984 A DE 19955984A DE 19955984 A1 DE19955984 A1 DE 19955984A1
- Authority
- DE
- Germany
- Prior art keywords
- diaphragm
- imaging device
- optical imaging
- lamellae
- slats
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000012634 optical imaging Methods 0.000 title claims abstract description 20
- 230000003287 optical effect Effects 0.000 claims abstract description 21
- 241000446313 Lamella Species 0.000 claims description 3
- 230000001154 acute effect Effects 0.000 claims description 2
- 210000000554 iris Anatomy 0.000 description 27
- 238000003384 imaging method Methods 0.000 description 9
- 230000008901 benefit Effects 0.000 description 6
- 230000008859 change Effects 0.000 description 6
- 238000005096 rolling process Methods 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 230000002349 favourable effect Effects 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000005457 optimization Methods 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 235000012431 wafers Nutrition 0.000 description 2
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000007257 malfunction Effects 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/7025—Size or form of projection system aperture, e.g. aperture stops, diaphragms or pupil obscuration; Control thereof
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/005—Diaphragms
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Diaphragms For Cameras (AREA)
- Lens Barrels (AREA)
- Mechanical Light Control Or Optical Switches (AREA)
Priority Applications (9)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19955984A DE19955984A1 (de) | 1999-11-20 | 1999-11-20 | Optische Abbildungsvorrichtung, insbesondere Objektiv mit wenigstens einer Systemblende |
| US09/678,715 US6445510B1 (en) | 1999-11-20 | 2000-10-04 | Optical imaging device, in particular lens system, with at least one system diaphragm |
| EP00122003A EP1102103B1 (de) | 1999-11-20 | 2000-10-10 | Optische Abbildungsvorrichtung, inbesondere Objektiv, mit wenigstens einer Systemblende |
| DE50015730T DE50015730D1 (de) | 1999-11-20 | 2000-10-10 | Optische Abbildungsvorrichtung, inbesondere Objektiv, mit wenigstens einer Systemblende |
| EP09160725A EP2090920B1 (de) | 1999-11-20 | 2000-10-10 | Optische Abbildungsvorrichtung, insbesondere Objektiv, mit wenigstens einer Systemblende |
| DE50016095T DE50016095D1 (de) | 1999-11-20 | 2000-10-10 | Optische Abbildungsvorrichtung, insbesondere Objektiv, mit wenigstens einer Systemblende |
| KR1020000061164A KR100807445B1 (ko) | 1999-11-20 | 2000-10-18 | 하나 이상의 시스템 다이아프램을 갖는, 특히렌즈시스템에서의 광학영상장치 |
| JP2000324184A JP5107486B2 (ja) | 1999-11-20 | 2000-10-24 | 少なくとも1つのシステム絞りを有する光学結像装置 |
| TW089124245A TW460707B (en) | 1999-11-20 | 2000-11-16 | Optical imaging device, in particular lens system, with at least one system diaphragm |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19955984A DE19955984A1 (de) | 1999-11-20 | 1999-11-20 | Optische Abbildungsvorrichtung, insbesondere Objektiv mit wenigstens einer Systemblende |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE19955984A1 true DE19955984A1 (de) | 2001-05-23 |
Family
ID=7929810
Family Applications (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19955984A Withdrawn DE19955984A1 (de) | 1999-11-20 | 1999-11-20 | Optische Abbildungsvorrichtung, insbesondere Objektiv mit wenigstens einer Systemblende |
| DE50015730T Expired - Lifetime DE50015730D1 (de) | 1999-11-20 | 2000-10-10 | Optische Abbildungsvorrichtung, inbesondere Objektiv, mit wenigstens einer Systemblende |
| DE50016095T Expired - Lifetime DE50016095D1 (de) | 1999-11-20 | 2000-10-10 | Optische Abbildungsvorrichtung, insbesondere Objektiv, mit wenigstens einer Systemblende |
Family Applications After (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE50015730T Expired - Lifetime DE50015730D1 (de) | 1999-11-20 | 2000-10-10 | Optische Abbildungsvorrichtung, inbesondere Objektiv, mit wenigstens einer Systemblende |
| DE50016095T Expired - Lifetime DE50016095D1 (de) | 1999-11-20 | 2000-10-10 | Optische Abbildungsvorrichtung, insbesondere Objektiv, mit wenigstens einer Systemblende |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US6445510B1 (enExample) |
| EP (2) | EP1102103B1 (enExample) |
| JP (1) | JP5107486B2 (enExample) |
| KR (1) | KR100807445B1 (enExample) |
| DE (3) | DE19955984A1 (enExample) |
| TW (1) | TW460707B (enExample) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2005019878A1 (de) * | 2003-08-01 | 2005-03-03 | Carl Zeiss Smt Ag | Optische abbildungsvorrichtung mit wenigstens einer systemblende |
| DE102006038455A1 (de) * | 2006-08-16 | 2008-02-21 | Carl Zeiss Smt Ag | Optisches System für die Halbleiterlithographie |
| US7492509B2 (en) | 2003-12-02 | 2009-02-17 | Carl Zeiss Smt Ag | Projection optical system |
| US7684125B2 (en) | 2003-10-29 | 2010-03-23 | Carl Zeiss Smt Ag | Diaphragm changing device |
| US7751127B2 (en) | 2005-08-17 | 2010-07-06 | Carl Zeiss Smt Ag | Projection objective and method for optimizing a system aperture stop of a projection objective |
| EP2357524A1 (de) * | 2010-01-24 | 2011-08-17 | Leica Camera AG | Blendenlamelle mit Tragvorrichtung |
| DE102012111731A1 (de) * | 2012-12-03 | 2014-06-05 | Carl Zeiss Industrielle Messtechnik Gmbh | Irisblende, optische Vorrichtung und Verfahren zum Herstellen eines Satzes von Blendenschneiden für eine Irisblende |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7301707B2 (en) * | 2004-09-03 | 2007-11-27 | Carl Zeiss Smt Ag | Projection optical system and method |
| KR20070097083A (ko) * | 2004-12-30 | 2007-10-02 | 칼 짜이스 에스엠테 아게 | 투사 광학 시스템 |
| US7310131B2 (en) * | 2005-08-02 | 2007-12-18 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| JP4003790B2 (ja) | 2005-08-23 | 2007-11-07 | セイコーエプソン株式会社 | 光学絞り装置、およびプロジェクタ |
| WO2010108516A1 (en) | 2009-03-27 | 2010-09-30 | Carl Zeiss Smt Ag | Illumination optical system for euv microlithography and euv attenuator for an illumination optical system of this kind, illumination system and projection exposure installation having an illumination optical system of this kind |
| DE102014223811B4 (de) | 2014-11-21 | 2016-09-29 | Carl Zeiss Smt Gmbh | Abbildende Optik für die EUV-Projektionslithographie, Projektionsbelichtungsanlage und Verfahren zur Herstellung eines strukturierten Bauteils |
| JP7204400B2 (ja) * | 2018-09-28 | 2023-01-16 | キヤノン株式会社 | 露光装置及び物品の製造方法 |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5760009Y2 (enExample) | 1974-08-17 | 1982-12-21 | ||
| US4149775A (en) | 1977-08-03 | 1979-04-17 | Blake Daniel H | Zoom lens apparatus with adjustable aperture |
| JPS5910910A (ja) * | 1982-07-09 | 1984-01-20 | Minolta Camera Co Ltd | 変倍光学鏡胴 |
| US4904055A (en) | 1988-10-03 | 1990-02-27 | Eastman Kodak Company | Variable aperture formed by linearly movable elements |
| JPH0477743A (ja) * | 1990-07-19 | 1992-03-11 | Canon Inc | 投影露光装置 |
| JPH0553170A (ja) * | 1991-08-29 | 1993-03-05 | Canon Inc | 絞り装置を有する光学機器 |
| JPH0623017U (ja) * | 1992-08-24 | 1994-03-25 | オリンパス光学工業株式会社 | 視野絞り機構 |
| JPH07199272A (ja) * | 1993-12-29 | 1995-08-04 | Minolta Co Ltd | カメラレンズの絞り補正機構 |
| JPH07301845A (ja) * | 1994-05-06 | 1995-11-14 | Canon Inc | 絞り装置及びそれを用いた投影露光装置 |
| DE4417489A1 (de) | 1994-05-19 | 1995-11-23 | Zeiss Carl Fa | Höchstaperturiges katadioptrisches Reduktionsobjektiv für die Miktrolithographie |
| JP3530241B2 (ja) * | 1994-12-21 | 2004-05-24 | 日本電産コパル株式会社 | カメラ用シャッタ |
| JPH08220591A (ja) * | 1995-02-10 | 1996-08-30 | Nikon Corp | 絞り移動装置 |
| JP3597311B2 (ja) * | 1996-07-18 | 2004-12-08 | オリンパス株式会社 | 光ピックアップ |
| JP3925576B2 (ja) * | 1997-07-24 | 2007-06-06 | 株式会社ニコン | 投影光学系、該光学系を備えた露光装置、及び該装置を用いたデバイスの製造方法 |
| JP4066085B2 (ja) | 1997-10-07 | 2008-03-26 | 株式会社ニコン | 投影露光装置、該装置を用いた半導体デバイスの製造方法、及び露光方法 |
| JP2000075185A (ja) * | 1998-08-31 | 2000-03-14 | Nikon Corp | レンズ鏡筒 |
| TW367050U (en) * | 1999-01-14 | 1999-08-11 | Umax Data Systems Inc | Improved bladed aperture stop of a lens |
-
1999
- 1999-11-20 DE DE19955984A patent/DE19955984A1/de not_active Withdrawn
-
2000
- 2000-10-04 US US09/678,715 patent/US6445510B1/en not_active Expired - Lifetime
- 2000-10-10 EP EP00122003A patent/EP1102103B1/de not_active Expired - Lifetime
- 2000-10-10 DE DE50015730T patent/DE50015730D1/de not_active Expired - Lifetime
- 2000-10-10 EP EP09160725A patent/EP2090920B1/de not_active Expired - Lifetime
- 2000-10-10 DE DE50016095T patent/DE50016095D1/de not_active Expired - Lifetime
- 2000-10-18 KR KR1020000061164A patent/KR100807445B1/ko not_active Expired - Fee Related
- 2000-10-24 JP JP2000324184A patent/JP5107486B2/ja not_active Expired - Fee Related
- 2000-11-16 TW TW089124245A patent/TW460707B/zh not_active IP Right Cessation
Cited By (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2005019878A1 (de) * | 2003-08-01 | 2005-03-03 | Carl Zeiss Smt Ag | Optische abbildungsvorrichtung mit wenigstens einer systemblende |
| US7684125B2 (en) | 2003-10-29 | 2010-03-23 | Carl Zeiss Smt Ag | Diaphragm changing device |
| US8089707B2 (en) | 2003-10-29 | 2012-01-03 | Carl Zeiss Smt Gmbh | Diaphragm changing device |
| US10139733B2 (en) | 2003-10-29 | 2018-11-27 | Carl Zeiss Smt Gmbh | Diaphragm changing device |
| US7492509B2 (en) | 2003-12-02 | 2009-02-17 | Carl Zeiss Smt Ag | Projection optical system |
| US7751127B2 (en) | 2005-08-17 | 2010-07-06 | Carl Zeiss Smt Ag | Projection objective and method for optimizing a system aperture stop of a projection objective |
| US8049973B2 (en) | 2005-08-17 | 2011-11-01 | Carl Zeiss Smt Gmbh | Projection objective and method for optimizing a system aperture stop of a projection objective |
| DE102006038455A1 (de) * | 2006-08-16 | 2008-02-21 | Carl Zeiss Smt Ag | Optisches System für die Halbleiterlithographie |
| US9383544B2 (en) | 2006-08-16 | 2016-07-05 | Carl Zeiss Smt Gmbh | Optical system for semiconductor lithography |
| EP2357524A1 (de) * | 2010-01-24 | 2011-08-17 | Leica Camera AG | Blendenlamelle mit Tragvorrichtung |
| DE102012111731A1 (de) * | 2012-12-03 | 2014-06-05 | Carl Zeiss Industrielle Messtechnik Gmbh | Irisblende, optische Vorrichtung und Verfahren zum Herstellen eines Satzes von Blendenschneiden für eine Irisblende |
| DE102012111731B4 (de) * | 2012-12-03 | 2017-10-12 | Carl Zeiss Industrielle Messtechnik Gmbh | Irisblende und optische Vorrichtung |
Also Published As
| Publication number | Publication date |
|---|---|
| EP2090920B1 (de) | 2011-04-13 |
| DE50016095D1 (de) | 2011-05-26 |
| JP5107486B2 (ja) | 2012-12-26 |
| EP1102103A2 (de) | 2001-05-23 |
| EP1102103A3 (de) | 2001-08-08 |
| US6445510B1 (en) | 2002-09-03 |
| EP1102103B1 (de) | 2009-08-26 |
| TW460707B (en) | 2001-10-21 |
| KR100807445B1 (ko) | 2008-02-25 |
| DE50015730D1 (de) | 2009-10-08 |
| EP2090920A1 (de) | 2009-08-19 |
| KR20010051088A (ko) | 2001-06-25 |
| JP2001154235A (ja) | 2001-06-08 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8181 | Inventor (new situation) |
Inventor name: MAUL, GUENTER, 73431 AALEN, DE Inventor name: MUEHLBEYER, MICHAEL, 73430 AALEN, DE Inventor name: SCHUSTER, KARLHEINZ, 89551 KOENIGSBRONN, DE Inventor name: GELLRICH, BERNHARD, 73430 AALEN, DE Inventor name: BISCHOFF, THOMAS, 73433 AALEN, DE Inventor name: TRUNZ, MICHAEL, 73479 ELLWANGEN, DE |
|
| 8127 | New person/name/address of the applicant |
Owner name: CARL ZEISS SMT AG, 73447 OBERKOCHEN, DE |
|
| 8110 | Request for examination paragraph 44 | ||
| 8130 | Withdrawal |