KR100796894B1 - 무전해 도금 전처리제, 그것을 이용하는 무전해 도금방법,및 무전해 도금물 - Google Patents
무전해 도금 전처리제, 그것을 이용하는 무전해 도금방법,및 무전해 도금물 Download PDFInfo
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- KR100796894B1 KR100796894B1 KR1020067017357A KR20067017357A KR100796894B1 KR 100796894 B1 KR100796894 B1 KR 100796894B1 KR 1020067017357 A KR1020067017357 A KR 1020067017357A KR 20067017357 A KR20067017357 A KR 20067017357A KR 100796894 B1 KR100796894 B1 KR 100796894B1
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- Prior art keywords
- electroless plating
- palladium
- electroless
- silane coupling
- pretreatment
- Prior art date
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1633—Process of electroless plating
- C23C18/1646—Characteristics of the product obtained
- C23C18/165—Multilayered product
- C23C18/1651—Two or more layers only obtained by electroless plating
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/1851—Pretreatment of the material to be coated of surfaces of non-metallic or semiconducting in organic material
- C23C18/1872—Pretreatment of the material to be coated of surfaces of non-metallic or semiconducting in organic material by chemical pretreatment
- C23C18/1875—Pretreatment of the material to be coated of surfaces of non-metallic or semiconducting in organic material by chemical pretreatment only one step pretreatment
- C23C18/1879—Use of metal, e.g. activation, sensitisation with noble metals
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/1851—Pretreatment of the material to be coated of surfaces of non-metallic or semiconducting in organic material
- C23C18/1872—Pretreatment of the material to be coated of surfaces of non-metallic or semiconducting in organic material by chemical pretreatment
- C23C18/1875—Pretreatment of the material to be coated of surfaces of non-metallic or semiconducting in organic material by chemical pretreatment only one step pretreatment
- C23C18/1882—Use of organic or inorganic compounds other than metals, e.g. activation, sensitisation with polymers
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
- C23C18/2006—Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30
- C23C18/2046—Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30 by chemical pretreatment
- C23C18/2053—Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30 by chemical pretreatment only one step pretreatment
- C23C18/2066—Use of organic or inorganic compounds other than metals, e.g. activation, sensitisation with polymers
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
- C23C18/28—Sensitising or activating
- C23C18/30—Activating or accelerating or sensitising with palladium or other noble metal
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Chemically Coating (AREA)
Abstract
Description
Claims (13)
- 탄소원자수 5∼25를 갖는 지방산 또는 나프텐산의 귀금속 비누를 포함하고, 분자 내에 금속 포착능을 지닌 관능기를 더 갖는 실란커플링제를 포함하는 무전해 도금 전처리제.
- 삭제
- 제 1 항에 있어서, 실란커플링제가 아졸계 화합물 또는 아민 화합물과 에폭시 실란계 화합물과의 반응에 의해서 얻어진 실란커플링제인 무전해 도금 전처리제.
- 제 1 항 또는 제 3 항에 있어서, 금속 포착능을 지닌 관능기가 이미다졸기인 무전해 도금 전처리제.
- 제 1 항 또는 제 3 항에 있어서, 귀금속 비누가 팔라듐 비누인 무전해 도금 전처리제.
- 제 1 항 또는 제 3 항에 있어서, 귀금속 비누가 나프텐산 팔라듐, 네오데칸산 팔라듐, 옥틸산 팔라듐인 무전해 도금 전처리제.
- 제 1 항 또는 제 3 항에 기재된 무전해 도금 전처리제를 포함하는 잉크 조성물.
- 제 1 항 또는 제 3 항에 기재된 무전해 도금 전처리제 의해 피도금물을 전처리하고, 이어서 무전해 도금하는 것을 특징으로 하는 무전해 도금방법.
- 제 7 항에 기재된 잉크 조성물에 의해 피도금물을 전처리하고, 이어서 무전해 도금하는 것을 특징으로 하는 무전해 도금방법.
- 제 9 항에 있어서, 잉크조성물에 의한 전처리가 잉크젯에 의한 묘화인 무전해 도금방법.
- 제 8 항에 기재된 무전해 도금방법에 의해 얻어진, 1.2kgf/㎠ 이상의 필 강도의 도금피막을 가진 도금물.
- 제 9 항에 기재된 무전해 도금방법에 의해 얻어진, 1.2kgf/㎠ 이상의 필 강도의 도금피막을 가진 도금물.
- 제 10 항에 기재된 무전해 도금방법에 의해 얻어진, 1.2kgf/㎠ 이상의 필 강도의 도금피막을 가진 도금물.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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JP2004021128 | 2004-01-29 | ||
JPJP-P-2004-00021128 | 2004-01-29 |
Publications (2)
Publication Number | Publication Date |
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KR20060114024A KR20060114024A (ko) | 2006-11-03 |
KR100796894B1 true KR100796894B1 (ko) | 2008-01-22 |
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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KR1020067017357A KR100796894B1 (ko) | 2004-01-29 | 2004-11-11 | 무전해 도금 전처리제, 그것을 이용하는 무전해 도금방법,및 무전해 도금물 |
Country Status (8)
Country | Link |
---|---|
US (1) | US7713340B2 (ko) |
EP (1) | EP1760171B1 (ko) |
JP (1) | JP4711415B2 (ko) |
KR (1) | KR100796894B1 (ko) |
CN (1) | CN1910305B (ko) |
DE (1) | DE602004032478D1 (ko) |
TW (1) | TWI306907B (ko) |
WO (1) | WO2005073431A1 (ko) |
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WO2006027947A1 (ja) * | 2004-09-10 | 2006-03-16 | Nippon Mining & Metals Co., Ltd. | 無電解めっき前処理剤及びフレキシブル基板用銅張り積層体 |
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JP2007242918A (ja) * | 2006-03-09 | 2007-09-20 | Bridgestone Corp | 光透過性電磁波シールド材の製造方法、光透過性電磁波シールド材、およびディスプレイ用フィルタ |
JP2007242915A (ja) * | 2006-03-09 | 2007-09-20 | Bridgestone Corp | 光透過性電磁波シールド材の製造方法、光透過性電磁波シールド材、およびディスプレイ用フィルタ |
JP2008060350A (ja) * | 2006-08-31 | 2008-03-13 | Bridgestone Corp | 光透過性電磁波シールド材の製造方法 |
JP2008218777A (ja) * | 2007-03-06 | 2008-09-18 | Bridgestone Corp | 光透過性電磁波シールド材の製造方法 |
KR100997629B1 (ko) * | 2007-06-15 | 2010-12-01 | 제이엑스 닛코 닛세키 킨조쿠 가부시키가이샤 | 내열 에이징 특성이 우수한 금속 피복 폴리이미드 수지 기판의 제조 방법 |
JP5041214B2 (ja) | 2007-06-15 | 2012-10-03 | ソニー株式会社 | 金属薄膜の形成方法および電子デバイスの製造方法 |
US8814997B2 (en) * | 2010-03-23 | 2014-08-26 | Jx Nippon Mining & Metals Corporation | Electroless plating pretreatment agent, electroless plating method using same, and electroless plated object |
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KR101483920B1 (ko) | 2011-12-15 | 2015-01-16 | 헨켈 아이피 앤드 홀딩 게엠베하 | 흑연 상으로의 은의 무전해 도금 방법 |
TWI573687B (zh) * | 2013-12-31 | 2017-03-11 | 財團法人工業技術研究院 | 積層板及其製作方法 |
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2004
- 2004-11-11 EP EP04799625A patent/EP1760171B1/en active Active
- 2004-11-11 KR KR1020067017357A patent/KR100796894B1/ko active IP Right Grant
- 2004-11-11 US US10/586,379 patent/US7713340B2/en active Active
- 2004-11-11 JP JP2005517380A patent/JP4711415B2/ja active Active
- 2004-11-11 CN CN2004800411893A patent/CN1910305B/zh active Active
- 2004-11-11 DE DE602004032478T patent/DE602004032478D1/de active Active
- 2004-11-11 WO PCT/JP2004/016764 patent/WO2005073431A1/ja active Application Filing
- 2004-11-19 TW TW093135568A patent/TWI306907B/zh active
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JP2000289167A (ja) * | 1999-02-03 | 2000-10-17 | Ube Ind Ltd | 化学メッキ用ベ−スフィルム及びメッキフィルム |
JP2002317274A (ja) * | 2000-10-24 | 2002-10-31 | Shipley Co Llc | メッキ触媒 |
JP2003193245A (ja) * | 2001-12-21 | 2003-07-09 | Nikko Materials Co Ltd | めっき前処理剤、及びそれを用いた無電解めっき方法 |
WO2003091476A1 (fr) * | 2002-04-23 | 2003-11-06 | Nikko Materials Co., Ltd. | Procede de depot non electrolytique et tranche de semi-conducteur sur laquelle est formee une couche de depot metallique |
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EP1760171A4 (en) | 2008-01-23 |
EP1760171A1 (en) | 2007-03-07 |
JPWO2005073431A1 (ja) | 2008-04-24 |
WO2005073431A1 (ja) | 2005-08-11 |
CN1910305A (zh) | 2007-02-07 |
US20080014362A1 (en) | 2008-01-17 |
EP1760171B1 (en) | 2011-04-27 |
KR20060114024A (ko) | 2006-11-03 |
TW200525048A (en) | 2005-08-01 |
TWI306907B (en) | 2009-03-01 |
US7713340B2 (en) | 2010-05-11 |
DE602004032478D1 (de) | 2011-06-09 |
JP4711415B2 (ja) | 2011-06-29 |
CN1910305B (zh) | 2011-12-28 |
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