KR100568386B1 - 금속도금방법 및 전처리제 - Google Patents
금속도금방법 및 전처리제 Download PDFInfo
- Publication number
- KR100568386B1 KR100568386B1 KR1020047000325A KR20047000325A KR100568386B1 KR 100568386 B1 KR100568386 B1 KR 100568386B1 KR 1020047000325 A KR1020047000325 A KR 1020047000325A KR 20047000325 A KR20047000325 A KR 20047000325A KR 100568386 B1 KR100568386 B1 KR 100568386B1
- Authority
- KR
- South Korea
- Prior art keywords
- coupling agent
- silane coupling
- plating
- azole
- plating method
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/1851—Pretreatment of the material to be coated of surfaces of non-metallic or semiconducting in organic material
- C23C18/1872—Pretreatment of the material to be coated of surfaces of non-metallic or semiconducting in organic material by chemical pretreatment
- C23C18/1875—Pretreatment of the material to be coated of surfaces of non-metallic or semiconducting in organic material by chemical pretreatment only one step pretreatment
- C23C18/1879—Use of metal, e.g. activation, sensitisation with noble metals
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/1851—Pretreatment of the material to be coated of surfaces of non-metallic or semiconducting in organic material
- C23C18/1872—Pretreatment of the material to be coated of surfaces of non-metallic or semiconducting in organic material by chemical pretreatment
- C23C18/1875—Pretreatment of the material to be coated of surfaces of non-metallic or semiconducting in organic material by chemical pretreatment only one step pretreatment
- C23C18/1882—Use of organic or inorganic compounds other than metals, e.g. activation, sensitisation with polymers
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/38—Coating with copper
- C23C18/40—Coating with copper using reducing agents
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Chemically Coating (AREA)
- Separation Using Semi-Permeable Membranes (AREA)
- Manufacture And Refinement Of Metals (AREA)
Abstract
Description
Claims (5)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JPJP-P-2002-00263736 | 2002-09-10 | ||
JP2002263736 | 2002-09-10 | ||
PCT/JP2003/009968 WO2004024984A1 (ja) | 2002-09-10 | 2003-08-05 | 金属めっき方法および前処理剤 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20040043153A KR20040043153A (ko) | 2004-05-22 |
KR100568386B1 true KR100568386B1 (ko) | 2006-04-05 |
Family
ID=31986464
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020047000325A KR100568386B1 (ko) | 2002-09-10 | 2003-08-05 | 금속도금방법 및 전처리제 |
Country Status (7)
Country | Link |
---|---|
US (1) | US7867564B2 (ko) |
EP (1) | EP1538237B1 (ko) |
JP (1) | JP3849946B2 (ko) |
KR (1) | KR100568386B1 (ko) |
AT (1) | ATE444381T1 (ko) |
DE (1) | DE60329501D1 (ko) |
WO (1) | WO2004024984A1 (ko) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20240004056A (ko) | 2022-07-04 | 2024-01-11 | 김강민 | 도금층 표면 균일화 도금 방법 |
Families Citing this family (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1910305B (zh) * | 2004-01-29 | 2011-12-28 | 日矿金属株式会社 | 化学镀预处理剂、利用它的化学镀方法和化学镀产品 |
WO2006095590A1 (ja) * | 2005-03-10 | 2006-09-14 | Nippon Mining & Metals Co., Ltd. | 樹脂用フィラー、それを配合した樹脂基材、及び電子部品基材 |
NL1029311C2 (nl) * | 2005-06-22 | 2006-12-27 | Nanotechnology B V | Microscopisch substraat alzijdig bedekt met een metaallaag en werkwijze voor het metalliseren van een microscopisch substraat. |
JP5142982B2 (ja) * | 2006-03-07 | 2013-02-13 | 国立大学法人 奈良先端科学技術大学院大学 | 金属被覆された脂質二分子膜小胞体及びその製造方法 |
JP4794325B2 (ja) * | 2006-03-09 | 2011-10-19 | 株式会社ブリヂストン | 光透過性電磁波シールド材の製造方法、光透過性電磁波シールド材、およびディスプレイ用フィルタ |
EP1993338A4 (en) * | 2006-03-09 | 2011-05-25 | Bridgestone Corp | PROCESS FOR MANUFACTURING TRANSLUCENT ELECTROMAGNETIC WAVE PROTECTION MATERIALS, TRANSLUCENT ELECTROMAGNETIC WAVE PROTECTIVE MATERIALS, AND DISPLAY FILTER |
JP4794326B2 (ja) * | 2006-03-09 | 2011-10-19 | 株式会社ブリヂストン | 光透過性電磁波シールド材の製造方法、光透過性電磁波シールド材、およびディスプレイ用フィルタ |
JP4897384B2 (ja) * | 2006-08-03 | 2012-03-14 | 株式会社ブリヂストン | 光透過性電磁波シールド材の製造方法、光透過性電磁波シールド材、およびディスプレイ用フィルタ |
JP2008041823A (ja) * | 2006-08-03 | 2008-02-21 | Bridgestone Corp | 光透過性電磁波シールド材の製造方法、光透過性電磁波シールド材、およびディスプレイ用フィルタ |
US7931518B2 (en) * | 2006-08-03 | 2011-04-26 | Bridgestone Corporation | Process for preparing light transmissive electromagnetic wave shielding material, light transmissive electromagnetic wave shielding material and display filter |
JP2008060350A (ja) * | 2006-08-31 | 2008-03-13 | Bridgestone Corp | 光透過性電磁波シールド材の製造方法 |
JP2008218714A (ja) * | 2007-03-05 | 2008-09-18 | Bridgestone Corp | 光透過性電磁波シールド材及びその製造方法、並びに貴金属の極薄膜を有する微粒子及びその製造方法 |
KR20100091663A (ko) | 2009-02-11 | 2010-08-19 | 삼성전자주식회사 | 표면개질제, 이를 사용하여 제조된 적층 구조, 그 구조의 제조방법 및 이를 포함하는 트랜지스터 |
US9090966B2 (en) | 2009-06-08 | 2015-07-28 | Basf Se | Use of ionic liquids for the pretreatment of surfaces of plastics for metallization |
US8814997B2 (en) | 2010-03-23 | 2014-08-26 | Jx Nippon Mining & Metals Corporation | Electroless plating pretreatment agent, electroless plating method using same, and electroless plated object |
DE102010036535A1 (de) * | 2010-07-21 | 2012-01-26 | Saint-Gobain Isover G+H Ag | Verfahren zum Metallisieren von Mineralfasern sowie Verwendung derselben |
TWI414643B (zh) * | 2010-09-01 | 2013-11-11 | Univ Nat Chunghsing | 銅電鍍液組成物 |
US9499912B2 (en) | 2014-05-26 | 2016-11-22 | Rohm And Haas Electronic Materials Llc | Copolymers of diglycidyl ether terminated polysiloxane compounds and non-aromatic polyamines |
TWI608124B (zh) * | 2015-09-21 | 2017-12-11 | 國立清華大學 | 使用高附著性觸媒的無矽烷無電鍍金屬沉積方法及其生成物 |
WO2018147205A1 (ja) * | 2017-02-13 | 2018-08-16 | 東洋炭素株式会社 | めっきの前処理方法、めっき方法、めっき前処理物及びめっき物 |
ES2646237B2 (es) * | 2017-09-28 | 2018-07-27 | Avanzare Innovacion Tecnologica S.L. | Formulación para el mordentado de materiales poliméricos previo al recubrimiento de los mismos |
TWI672175B (zh) * | 2017-10-20 | 2019-09-21 | 國立清華大學 | 自吸附觸媒組成物、自吸附觸媒組成物的製造方法以及無電鍍基板的製造方法 |
KR102300834B1 (ko) * | 2019-11-21 | 2021-09-13 | 주식회사 포스코 | 스테인리스강 산세용 이온성 액체 및 이를 이용한 스테인리스강의 산세방법 |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5952701A (ja) | 1982-09-21 | 1984-03-27 | Fuji Xerox Co Ltd | 測定具の目盛表示装置 |
JPS60181294A (ja) | 1984-02-24 | 1985-09-14 | Agency Of Ind Science & Technol | 金属皮膜を表面に有する無機質粉体の製造方法 |
JPS61194183A (ja) | 1985-02-21 | 1986-08-28 | Hitachi Chem Co Ltd | 無電解めつき法 |
JPH0344149A (ja) | 1989-07-11 | 1991-02-26 | Nec Corp | ハンズフリー電話機 |
JPH06256358A (ja) | 1993-03-01 | 1994-09-13 | Japan Energy Corp | 新規イミダゾールシラン化合物及びその製造方法並びにそれを用いる金属表面処理剤 |
CN1195099C (zh) | 1998-07-07 | 2005-03-30 | 株式会社日矿材料 | 金属镀覆的前处理剂和使用该前处理剂的金属镀覆方法 |
WO2001049898A1 (fr) * | 2000-01-07 | 2001-07-12 | Nikko Materials Co., Ltd. | Procede de galvanoplastie, agent de pretraitement et tranche de semi-conducteurs et dispositif semi-conducteur utilisant cette derniere |
US7045461B2 (en) * | 2000-01-07 | 2006-05-16 | Nikkon Materials Co., Ltd. | Metal plating method, pretreatment agent, and semiconductor wafer and semiconductor device obtained using these |
JP3536014B2 (ja) | 2000-04-07 | 2004-06-07 | 株式会社日鉱マテリアルズ | イミダゾール有機モノカルボン酸塩誘導体反応生成物及びその製造方法、並びにそれを用いる表面処理剤、樹脂添加剤および樹脂組成物 |
EP1279750B1 (en) | 2000-04-25 | 2016-05-04 | JX Nippon Mining & Metals Corporation | Pretreating agent for metal plating |
JP4836312B2 (ja) | 2000-08-01 | 2011-12-14 | Jx日鉱日石金属株式会社 | 銀めっき前処理剤および銀めっき方法 |
JP4425453B2 (ja) | 2000-11-24 | 2010-03-03 | 日鉱金属株式会社 | 金属膜間密着性向上方法 |
JP2002226972A (ja) | 2001-02-01 | 2002-08-14 | Nikko Materials Co Ltd | 無電解めっき方法 |
WO2004108986A1 (ja) * | 2003-06-09 | 2004-12-16 | Nikko Materials Co., Ltd. | 無電解めっき方法及び金属めっき物 |
-
2003
- 2003-08-05 EP EP03788697A patent/EP1538237B1/en not_active Expired - Lifetime
- 2003-08-05 DE DE60329501T patent/DE60329501D1/de not_active Expired - Lifetime
- 2003-08-05 US US10/482,092 patent/US7867564B2/en active Active
- 2003-08-05 JP JP2004535867A patent/JP3849946B2/ja not_active Expired - Lifetime
- 2003-08-05 AT AT03788697T patent/ATE444381T1/de not_active IP Right Cessation
- 2003-08-05 KR KR1020047000325A patent/KR100568386B1/ko active IP Right Grant
- 2003-08-05 WO PCT/JP2003/009968 patent/WO2004024984A1/ja active Application Filing
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20240004056A (ko) | 2022-07-04 | 2024-01-11 | 김강민 | 도금층 표면 균일화 도금 방법 |
Also Published As
Publication number | Publication date |
---|---|
EP1538237A1 (en) | 2005-06-08 |
DE60329501D1 (de) | 2009-11-12 |
JPWO2004024984A1 (ja) | 2006-01-12 |
ATE444381T1 (de) | 2009-10-15 |
EP1538237A4 (en) | 2006-03-15 |
WO2004024984A1 (ja) | 2004-03-25 |
JP3849946B2 (ja) | 2006-11-22 |
US7867564B2 (en) | 2011-01-11 |
KR20040043153A (ko) | 2004-05-22 |
EP1538237B1 (en) | 2009-09-30 |
US20050147755A1 (en) | 2005-07-07 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR100568386B1 (ko) | 금속도금방법 및 전처리제 | |
KR100495164B1 (ko) | 도금 전처리제 및 그것을 사용한 금속도금 방법 | |
JP3670238B2 (ja) | 金属めっき方法、前処理剤、それを用いた半導体ウェハー及び半導体装置 | |
JP3277463B2 (ja) | 金属めっき前処理剤、およびそれを用いる金属めっき方法 | |
US7045461B2 (en) | Metal plating method, pretreatment agent, and semiconductor wafer and semiconductor device obtained using these | |
WO2005073431A1 (ja) | 無電解めっき前処理剤、それを用いる無電解めっき方法、及び無電解めっき物 | |
WO2006027947A1 (ja) | 無電解めっき前処理剤及びフレキシブル基板用銅張り積層体 | |
US8182873B2 (en) | Method for electroless plating and metal-plated article | |
JPH0564236B2 (ko) | ||
JP3758532B2 (ja) | 銅あるいは銅合金上への無電解ニッケルめっき用前処理液及び無電解ニッケルめっき方法 | |
KR100568389B1 (ko) | 표면처리제, 그것을 사용한 표면처리물 및 무전해니켈도금방법 | |
JP4582528B2 (ja) | 表面処理剤、およびそれを用いた表面処理物 | |
JP2003193245A (ja) | めっき前処理剤、及びそれを用いた無電解めっき方法 | |
JP4836312B2 (ja) | 銀めっき前処理剤および銀めっき方法 | |
KR100970067B1 (ko) | 스루홀을 가진 프린트 배선 기판에의 무전해 도금용 촉매,및 그 촉매를 이용하여 처리된 스루홀을 가진 프린트 배선기판 | |
JP2002047574A (ja) | 高性能無電解めっき法 | |
JP2002161389A (ja) | 金属膜間密着性向上方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
E701 | Decision to grant or registration of patent right | ||
GRNT | Written decision to grant | ||
FPAY | Annual fee payment |
Payment date: 20130304 Year of fee payment: 8 |
|
FPAY | Annual fee payment |
Payment date: 20140228 Year of fee payment: 9 |
|
FPAY | Annual fee payment |
Payment date: 20150302 Year of fee payment: 10 |
|
FPAY | Annual fee payment |
Payment date: 20160303 Year of fee payment: 11 |
|
FPAY | Annual fee payment |
Payment date: 20170302 Year of fee payment: 12 |
|
FPAY | Annual fee payment |
Payment date: 20190227 Year of fee payment: 14 |
|
FPAY | Annual fee payment |
Payment date: 20200227 Year of fee payment: 15 |