TWI306907B - Non-electrolytic pre-plating treating agent, non-electrolytic plating method using the agent and non-electrolytic plating product - Google Patents
Non-electrolytic pre-plating treating agent, non-electrolytic plating method using the agent and non-electrolytic plating product Download PDFInfo
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- TWI306907B TWI306907B TW093135568A TW93135568A TWI306907B TW I306907 B TWI306907 B TW I306907B TW 093135568 A TW093135568 A TW 093135568A TW 93135568 A TW93135568 A TW 93135568A TW I306907 B TWI306907 B TW I306907B
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- electroless plating
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1633—Process of electroless plating
- C23C18/1646—Characteristics of the product obtained
- C23C18/165—Multilayered product
- C23C18/1651—Two or more layers only obtained by electroless plating
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/1851—Pretreatment of the material to be coated of surfaces of non-metallic or semiconducting in organic material
- C23C18/1872—Pretreatment of the material to be coated of surfaces of non-metallic or semiconducting in organic material by chemical pretreatment
- C23C18/1875—Pretreatment of the material to be coated of surfaces of non-metallic or semiconducting in organic material by chemical pretreatment only one step pretreatment
- C23C18/1879—Use of metal, e.g. activation, sensitisation with noble metals
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/1851—Pretreatment of the material to be coated of surfaces of non-metallic or semiconducting in organic material
- C23C18/1872—Pretreatment of the material to be coated of surfaces of non-metallic or semiconducting in organic material by chemical pretreatment
- C23C18/1875—Pretreatment of the material to be coated of surfaces of non-metallic or semiconducting in organic material by chemical pretreatment only one step pretreatment
- C23C18/1882—Use of organic or inorganic compounds other than metals, e.g. activation, sensitisation with polymers
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
- C23C18/2006—Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30
- C23C18/2046—Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30 by chemical pretreatment
- C23C18/2053—Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30 by chemical pretreatment only one step pretreatment
- C23C18/2066—Use of organic or inorganic compounds other than metals, e.g. activation, sensitisation with polymers
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
- C23C18/28—Sensitising or activating
- C23C18/30—Activating or accelerating or sensitising with palladium or other noble metal
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- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
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- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Chemically Coating (AREA)
Description
1306907 九、發明說明: 【發明所屬之技術領域】 本發明係關於一種可溶於有機溶劑且安定之 霞理劑、使用該無電解電鍛前處理劑 解 法及無電解電鍍物。 鮮笔鍍方 【先前技術】 二等之觸媒係可使用錫,之膠體溶液 化巴耗化,物的水溶液。此等觸媒係使 化&物,故潤濕性較水良好且塗布塗工性優良,且: = = = :::機化:物的有機溶劑,溶: 亀級脂肪酸之亀係」: = = = :。又, 鈀會立即沉殿之問題。 &而1合於甲醇中,但有 【發明内容】 無電於提供:種可溶於有機溶劑且安定之 性優異之無電解電電解電鍍前處理劑且密接 士政 ^鍍方法及無電解電鍍物。 考X明人專經專心究处 金屬化合物與脂肪酸所得:之;二:餘化合物等責 :電鑛液析出金屬時之觸媒效果==持從無電 在其溶劑中安^,終完成發明。Τ了4於有機溶劑及 亦即,本發明係關於 ⑴-種無電解電鍍前處理劑,其罝 之脂肪酸的貴金屬肥皂。 -石反原子數5至25 316513 5 1306907 係進一步含有於 劑。 、 其中矽烷偶合劑 氣矽烷系化合物 (2)則述(1)記載之無電解電鍍前處理劑, 分子内具金屬捕捉官能基之矽烷偶合 0)則述(2)記載之無電解電鍍前處理劑, 為唑(azole)系化合物或胺化合物與環 反應所得到者。 ⑷=述(2)或⑺記载之無電解钱前處理“中 屬捕捉能之官能基為咪唑基。 ,、擁有金 ⑺=⑴至(4)中任一項記載的無電解電鍍前處理 中貝金屬肥皂為鈀肥皂。 ^其 (6) &述(1)至(5)中任一項記載的益電解♦供& 中貴令属肭白达 I,、电角千电鍍前處理劑,就 ⑺ 、,,屬肥t為環烷酸鈀、新癸酸鈀、辛酸鈀。、 :種油墨組成物’係含有前述⑴至(6)中任—項 無電解電鍍前處理劑。 、裁的 ⑻ 二種無電解電錢方法,其特微在於藉前述⑴至⑺中任 产Si:無電解電鍍前處理劑或油墨組成物進行前 處理被㈣,職進行無電解電鍍。 ()j祗二)„己载之無電解電鍍方法,其中以油墨組成物進 行之前處理係以喷墨進行描繪。 種a鍍物’係由前述⑻或⑼記載之無電解電方法 獲得。 【實施方式】 (用以實施發明之最佳現態) 本么月所使用之貴金屬肥皂係可由脂肪酸與貴金屬 化合物之反應得到。 ' 316513 1306907 〜脂㈣係宜為碳原子數5至25者,更宜為8至. 右月日肪s欠之碳數為4以下,會很 . a很難哈解於有機溶劑,成為 不-…為兔原子數26以上,於有 交限制,貴金屬含量降低,致添加量會變多,不實::曰 酸、==酸!?舉例十二烧酸、十人㈣㈣和脂肪 丨、,由酸寻不飽和脂肪酸、羥基十四烧酸、缓A 癸酸等錢脂_、或此等之混合物。 又,前述脂肪酸若例示較佳者,可舉例環烧酸、辛酸、 新癸酸、十五烷酸等。 兩刚述貝金屬化合物係可舉例:可從無電解電鑛液於被 電鍍二表面顯示使銅或鎳等析出時之觸媒效果的鈀、銀、 始i等之齒化物,氫氧化物、硫酸鹽、碳酸鹽等化合物, 且可形成?旨肪酸與肥皂之化合物,但以鈀化合物尤佳。 、、主本舍明所使用之責金屬肥皂係可使前述脂肪酸與前 l貝A屬化合物藉複分解法、直接法等金屬肥4製造法的 常用方法反應而獲得。 ;^ "貞示較佳之環烧酸把作為使用於本發明之貴 金屬肥皂。 [化1]
nCOO
Pd N = 9至13之混合物 環垸酸4巴之構造式 7 316513 1306907 使用於本發明之前述責金屬肥 劑,又形成溶液會很安定,如此之有機溶劑溶 酉予、2-乙基己醇、辛醇等醇類、二夫、牛'J如丁 等脂肪族烴、氣仿、二噁烷等。 ' 、己烧 又’貴金屬肥皂係於前處理劑之溶液中 職mg/丨、較佳係5〇至1〇〇〇〇_之濃度使用。 f m = 鑛刚處理液係除了前述脂肪酸之 貝至屬肥七外,較佳尚可添加於 能基之矽烷偶合劑,。萨由、…,、有金屬捕捉能官 鑛面藉峨偶合劑更;::::=偶合劑’可對被電 4更勾i確貫地固定貴金屬觸媒。 以則述矽烷偶合劑進行之處理伟於 前處理劑中添加矽烷偶合劑广肥七之 來實施,但在貴金屬肥4之處;==:里_物 合劑之溶液來進行處理。&亦可料猎切烧偶 輕!偶合劑較佳者係由唾系化合物或胺化合物 衣氧土矽烷系化合物反應而得到者。 哇化合物係、可舉例:㈣ϋ、義、μ、吼。坐、 咦惡唑、異噻唑、三唑、噁二唑、噻二唑、四唑、噁三唑、 戶==、彳五唾、㈣、苯并㈣、苯并三μ。不為此等 所限制,但尤宜為咪唑。 . 5物係可舉例如丙胺等飽和烴胺、乙烯基胺等不 飽和烴胺二苯基胺等芳香族胺等。 所明别述矽烷偶合劑係於源自前述唑系化合物或胺 化合物之重金屈# 4 # ’屬捕捉基外,尚具有-SixlX2X3基之化合 316513 8 UU6907 鹵素或烷氧基等,只要可 XI、X2、X3可為相同或 物:X1、H3係意指烧基、 固疋於被電鍍物之官能基即可。 相異。 則述矽烷偶合劑 鱼璟®h ,、猎由則述唑糸化合物或胺化合物 ^乳矽烷系化合物反應而得到。 如此之環氧矽烷系化合物係 [化2] C\^H^CH2〇(CH2)3Si (〇R1)nRVn) (弋中,R1、R2係氫或碳數為 示之環氧矽烷偶合劑。 至3之烷基、n為〇至3)所 矽烷化合物之反 -256358號之條件 别述°坐系化合物與前述含環氧基的 心ϋ例如可以記載於日本專利特開平6 實施。 下入例如,在8 0至2 〇 〇 °C下相對於唾系化合物i莫耳,滴 9 I3 0·1至1G莫耳之含環氧基的錢化合物而反應5分至 2小時即可得到。 ^此時,特別不需要溶劑,但亦可使用氣仿、二噁烷、 甲醇、乙醇等有機溶劑。 特佳之例係下述所示味唑與環氧矽烷系化合物的反 316513 9 1306907[化3]
FT
N -ML,十 CH2CHGH2〇(CH2)3S ί (〇β”ηΡ2(3-η) Νγ^»Η \〇/ R3 R4 ^ Ν<^/Ν〇Η2ΟΗ(:Η2〇(<ίΗ2)3 S i (OR1)nR2(3_n)
k- l〇H (山式中,R1、R2表示氫或碳數為1至3之烷基、R3為氫、或 石反數1至20的燒基、R4為乙烯基、或碳數1至5之烷基、 n表示0至3。) 使用於本發明之具有金屬捕捉能官能基的矽烷偶合 劑^其他例可舉如:了-胺基丙基甲氧基石夕烧、τ_胺基丙 基三乙氧基矽烷、Ν_0(胺基乙基)r -胺基丙基三甲氧基矽 、元基乙基)7_胺基丙基三乙氧基矽烷、卜巯基丙 基三曱氧基矽烷。 在本發明中,前處理劑含有脂肪酸之貴金屬肥阜雖很
但習知之氯化錫等的觸媒亦可包含於本 的範圍内。 J 点私又,本發明之無電解電鍍前處理劑係以此作為油墨植 ::而藉噴墨方式塗布於被電鑛物上。此時,為滿足作為 加劑。 之枯度调整创、表面張力劑等添 告依本發明之金屬電錢方法祐兩 拽灿 κ 乂 破毛鍍物係不限制於i 狀。例如可適用於玻璃、陶t等無機材料,㈣” 316513 10 ^306907 ^ i亞胺、氟樹脂等塑豚 _ 依需要經玻璃布基材等補強之产:二:二薄片、纖維、 物、咬S i b鬥e L 展氧知^月曰專絕緣板等頌終 4 S“曰固等半導 坂寻、、、巴緣 物即使為透明破璃板、Sian甘低之被咖’而被電鑛 次私體’亦可適用本發明之方法。 极之釦面物, 如此之粉體可舉例如:玻 _ •粉末、石墨粉末,粉末、氧匕;化銦,末、氧化 氧化矽粉末、雲母片、玻 友"乳化銘粉末、 標)粉末等。 , ”、、虱化矽、鐵氟龍(註冊商 對於布狀或板狀之基材,一 布等表面塗布後使溶劑揮二方、t、, 使_剩均—地附限定於此’只要 之石^ 後使溶劑揮發而強迫地使溶液中所含有 之夕烷偶合劑附著於基材表 劑之均-成膜性以… 可猎此石夕垸偶合 成Mi·生以次>貝處理狀態吸附於基材表面,故亦可 處理後過濾分離溶劑而使潮濕的粉體乾燥之方法。依附著 狀悲而定有時亦只以水洗,可省略乾燥步驟。 、,所處理之溶液中具有金屬捕捉能的矽烷偶合劑濃度 :〇不:艮定於此’但宜為0.001至1〇重量%。不足〇 〇〇;; 里%時,附著於基材表面之化合物量易變低,難獲得到效 果右超過1 〇重量%,附著量會過多而很難乾燥,易引起 粉末之凝集。 為使表面處理後所使用之溶劑揮發,若加熱至此溶劑 之揮發溫度以上而使表面乾燥,即已足夠,但進一步宜於 316513 11 ^306907 60至12〇t加熱3至60分鐘。 本發明之無電解電鍍方法 施前處理的被電鍍物,適’古、於敘述於此之已實 此一來,# 、用$用方法之無電解電鍍法。如 一本發明,可得到無電解電鑛物,…有均一 且密著性優異之例如鋼 '鎳、姐 ,、知/、有均 的無電解電㈣。 ’、錫、料之無電解電鐘皮膜 (實施例) 以下藉實施例詳細說明本發明。 實施例1 · 以氣化錫500ml/升盘淨、ρ祕▲ Λ 衣说酸鈀5〇〇mg/升((股)日鑛材 料製、以i巴換算為60mg/弁、哨制丁丄/ g/开)5周製丁醇系電鍍前處理劑。於 此溶液中在阶下浸潰麵基板U)分鐘,以水流水洗後, 在大氣壓、nm:下加熱處理15分鐘。冷卻至室溫後,將 無電㈣電鐘液尼柯姆(二〕Λ) 7N_〇(日鑛金屬電艘(股) 衣)於70 C加熱進打電鍍5分鐘。進一步附著無電解電鍍 液KC5〇0(日鑛金屬電鍍(股)製口 " ^厚。測試銅皮膜之密修 接性的結果’剝離強度為高達〇 9kgf/cm2之密接度。 實施例2 調製含有咪。坐與r -環氧丙氧基丙基三曱氧基矽烷之 專旲耳反應生成物的石夕烧偶合劑5〇〇mg/升、環烧酸名巴 500ml/升((股)曰鑛材料製、以鈀換算為⑼邮/升)之2_乙基 己醇系電鍍前處理劑。於此溶液中在60°C下浸潰玻璃基板 10分鐘,以水流水洗後’在大氣壓、l〇0°C下加熱處理15 分鐘。冷卻至室溫後,將無電解鎳電鍍液尼柯姆(二3厶) 12 316513 1306907 7N-〇(日鑛金屬電鍍(股)製)於7〇t加熱進行電鍍5分鐘。 進—步附著無電解電鍍液KC50〇(曰鑛金屬電鍍(股)製)丨以·' m厚。測試銅皮膜之密接性的結果,剝離強度為高達、 L3kgf/cni2之密接度。 ‘ 貫施例3 . 以成為r -胺基丙基三曱氧基矽烷2g/升與辛烷酸鈀_ 3g/升((股)日鑛材料製、以鈀換算為3〇〇mg/升)之方式添加 而調製辛醇系電鍍前處理劑。於此溶液中在6〇t:下浸潰玻 璃板30分鐘’以水流水洗後,*氮氣、i5〇〇c下加=理· 2〇分鐘。將無電解鎳鍍液尼柯姆(二〕Λ) 7n_〇(日鑛金屬 電鍍(股)製)於7(TC加熱進行電鍍10分鐘。形成^ m之膜 各其剝離強度為向達1.2kgf/cm2之密接度。 、 實施例4 ^在含有味唑與r-環氧丙氧基丙基三甲氧基矽烷之等 莫耳反應生成物的矽烷偶合劑5g/升之水溶液中,在室溫 下浸潰聚!I亞胺膜。以水流水洗後,浸潰於含環烧㈣叫/ 升(曰鑛材料(股)製、以鈀換算為丨㈣升)之二甲苯溶液 中三其後,在大氣壓中、1(}代下加熱處理15分鐘。冷卻, 至至/皿後’將無電解鎳電鍍液尼柯姆(二〕厶”N_〇(日鑛金· 屬電鑛(股)製)於7(TC加熱進行電鍍5分鐘。進一步附著無 包角:電鍍液KC50〇(日鑛金屬電鐘(股)製)厚。測試銅 皮月旲之密接性的結果,剝離強度為高丨l3kgf/cm2之密接 度。 山 實施例5 31651 13 1306907 混合咪唑與9環氧丙4 且内虱基丙基三甲氧基矽烷之等莫 耳反應生成物的矽烷偶人匈 、 制 』 σ 新癸酸鈀((股)日鑛材料 衣)(b)而s周‘ 2 -乙基己醇溶夜。 — 促方、此/谷液中加入粘度調整 劑、表面張力劑,而以…
Alnn /iL ⑷為1g/升、㈨為lg/升(以纪換算 4 100mg/升)之方式油墨化。 ^ 丹攸贺墨嘴吐出,於聚醯亞 «基板料配線電路。風乾後,實施無電解鎳電鍛液尼 柯姆(二〕M 7N'〇(日鑛金屬電鍍(股)製)。進一步附著無 電解電鍍液KC500(日鑛金屬電鍍(股)製)厚。在咖 之剖面觀察結果,錢案外析出,形成電鍍界面之明顯配 線。 ’、 實施例6 對味。坐與^環氧丙氧基丙基三甲氧基石夕烷之等莫耳 反應生成物10g/升添加環烷酸鈀1〇g/升((股)日鑛材料製、 以鈀換算為1.2g/升)而調製辛醇溶液。此溶液在室溫下安 定1個月以上。 比較例1 以氣化錫500ml/升與氯化鈀500mg/升(以鈀換算為 300mg/升)調製丁醇系電鍍前處理劑。於此溶液中在 下浸漬玻璃板10分鐘,以水流水洗後,在大氣墨中、1〇〇 °C下加熱處理15分鐘。冷卻至室溫後,將無電解鎳電鍍液 尼柯姆(一〕厶)7N-0(曰鑛金屬電鍍(股)製)於7〇〇c加熱進 行電鍍5分鐘。進一步附著無電解電鍍液KC5〇〇(日鑛金屬 電鍍(股)製)1 // m厚。測試銅皮膜之密接性的結果,剝離 強度為0.3kgf/cm2。又’前處理劑在室溫中5小時纪會析 316513 14 1306907 出沉澱。 比较例2 對°米嗤與[環氧兩氧基丙基三曱氧基石夕燒之等莫耳 反應生成物lg/升添加醋酸鈀lg/升(以鈀換算為 而調製辛醇溶液。此溶液在室溫下約5分 澱,不能使用來作為前處理劑。 “斤出 >儿 (產業上之利用可能性) 本發明之益雷疏带μ、, 且在立、、… 讀丽處理劑係-種可溶於有機、一丨 仕具/合液中之安定性显 分々、頁機浴劑 塗工性優良,I,亦可二其溶液對於被電鍍物之塗布 於習知電鍍為困難者亦可:::繪之墨水。因此’即使對 優良之密接性形成電鍍膜。^電鍍。而1 ’可以均一且
316513 15
Claims (1)
1306907 第93135568號專利申請案 申清專利範圍修正本 丁 厂一……. .㈣年9月·:曰) .一種無電解電鍍前處理劑,係含有具碳原.子數..5.呈Μ 之月曰肪酸或環烷酸的貴金屬肥皂,以及含有於分子内具 有金屬捕捉能的官能基之梦烧偶合劑。 2·如申請專利範圍第”之無電解電鍍前處理劑,其中, 石夕燒偶合劑為以化合物或胺化合物與環氧基石夕烧系 化合物反應所得者。 3.如申睛專利範圍第丨項之無電解電鍍前處理劑,其中, 具有金屬捕捉能之官能基為咪唑基。 •如申凊專利範圍第1項的無電解電鍍前處理劑,其中, 貴金屬肥皂為鈀肥皂。 '、 .:申明專利旄圍帛i項的無電解電鍍前處理劑,其中, $金屬肥4為魏_、新癸酸、辛酸⑲。' 6:種油墨組成物,係含有如申請專利範圍第!至5項中 任一項的無電解電鍍前處理劑。 種無電解電鍍方法,係以如中請專利範圍第1至5項 工 項的無電解電鍍前處理劑或如申請專利範圍第6 ^的油墨組成物進行前處理被電鍍物,然後進行無電解 電鑛。 申喷專利範圍第7項之無電解電鍍方法,其中,以油 >二、且成物進仃之前處理係以噴墨進行描緣。 。物係由如申請專利範圍第7項之無電解電鍍 316513(修正版) 1 1306907 方法獲得,且具有1.2kgf/cm2以上剝離強度的電鍍皮膜。 10.—種電鍍物,係由如申請專利範圍第8項之無電解電鍍 方法獲得,且具有1.2kgf/cm2以上剝離強度的電鍍皮膜。 316513(修正版)
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US7179741B2 (en) * | 2002-04-23 | 2007-02-20 | Nikko Materials Co., Ltd. | Electroless plating method and semiconductor wafer on which metal plating layer is formed |
DE60329501D1 (de) * | 2002-09-10 | 2009-11-12 | Nippon Mining Co | Verfahren zur metallabscheidung und vorbehandlungsmittel |
KR100764294B1 (ko) * | 2003-11-05 | 2007-10-05 | 닛코킨조쿠 가부시키가이샤 | 잉크젯용 잉크 조성물 |
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2004
- 2004-11-11 KR KR1020067017357A patent/KR100796894B1/ko active IP Right Grant
- 2004-11-11 EP EP04799625A patent/EP1760171B1/en active Active
- 2004-11-11 JP JP2005517380A patent/JP4711415B2/ja active Active
- 2004-11-11 US US10/586,379 patent/US7713340B2/en active Active
- 2004-11-11 WO PCT/JP2004/016764 patent/WO2005073431A1/ja active Application Filing
- 2004-11-11 DE DE602004032478T patent/DE602004032478D1/de active Active
- 2004-11-11 CN CN2004800411893A patent/CN1910305B/zh active Active
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
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TWI460304B (zh) * | 2010-03-23 | 2014-11-11 | Jx Nippon Mining & Metals Corp | 無電解鍍覆前處理劑、使用該前處理劑之無電解鍍覆方法及無電解鍍覆物 |
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Publication number | Publication date |
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WO2005073431A1 (ja) | 2005-08-11 |
KR20060114024A (ko) | 2006-11-03 |
US7713340B2 (en) | 2010-05-11 |
TW200525048A (en) | 2005-08-01 |
KR100796894B1 (ko) | 2008-01-22 |
CN1910305B (zh) | 2011-12-28 |
JP4711415B2 (ja) | 2011-06-29 |
EP1760171B1 (en) | 2011-04-27 |
EP1760171A4 (en) | 2008-01-23 |
CN1910305A (zh) | 2007-02-07 |
US20080014362A1 (en) | 2008-01-17 |
EP1760171A1 (en) | 2007-03-07 |
DE602004032478D1 (de) | 2011-06-09 |
JPWO2005073431A1 (ja) | 2008-04-24 |
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