KR100791161B1 - 광학장치 및 그것을 구비한 노광장치 - Google Patents

광학장치 및 그것을 구비한 노광장치 Download PDF

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Publication number
KR100791161B1
KR100791161B1 KR1020060033401A KR20060033401A KR100791161B1 KR 100791161 B1 KR100791161 B1 KR 100791161B1 KR 1020060033401 A KR1020060033401 A KR 1020060033401A KR 20060033401 A KR20060033401 A KR 20060033401A KR 100791161 B1 KR100791161 B1 KR 100791161B1
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South Korea
Prior art keywords
optical
deformation
optical element
optical system
optical device
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KR1020060033401A
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English (en)
Korean (ko)
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KR20060108523A (ko
Inventor
초쇼쿠 사이
시게오 사키노
카츠미 아사다
히로히토 이토
신지 우치다
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캐논 가부시끼가이샤
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0825—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a flexible sheet or membrane, e.g. for varying the focus
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G03F7/70266—Adaptive optics, e.g. deformable optical elements for wavefront control, e.g. for aberration adjustment or correction
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70591—Testing optical components
    • G03F7/706—Aberration measurement

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Lenses (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
KR1020060033401A 2005-04-14 2006-04-13 광학장치 및 그것을 구비한 노광장치 Expired - Fee Related KR100791161B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2005-00116586 2005-04-14
JP2005116586A JP4817702B2 (ja) 2005-04-14 2005-04-14 光学装置及びそれを備えた露光装置

Publications (2)

Publication Number Publication Date
KR20060108523A KR20060108523A (ko) 2006-10-18
KR100791161B1 true KR100791161B1 (ko) 2008-01-02

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KR1020060033401A Expired - Fee Related KR100791161B1 (ko) 2005-04-14 2006-04-13 광학장치 및 그것을 구비한 노광장치

Country Status (4)

Country Link
US (1) US7771065B2 (enExample)
EP (1) EP1712955B1 (enExample)
JP (1) JP4817702B2 (enExample)
KR (1) KR100791161B1 (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
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KR100945605B1 (ko) 2007-06-20 2010-03-04 캐논 가부시끼가이샤 노광장치 및 디바이스 제조방법
KR20170089767A (ko) * 2016-01-27 2017-08-04 캐논 가부시끼가이샤 광학 디바이스, 노광 장치 및 물품의 제조 방법

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JP4817702B2 (ja) 2005-04-14 2011-11-16 キヤノン株式会社 光学装置及びそれを備えた露光装置
US7633630B2 (en) * 2006-08-09 2009-12-15 Northrop Grumman Corporation Image amplifying, servo-loop controlled, point diffraction interometer
JP2008112756A (ja) * 2006-10-27 2008-05-15 Canon Inc 光学素子駆動装置及びその制御方法、露光装置、並びにデバイス製造方法
US8044373B2 (en) * 2007-06-14 2011-10-25 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7664159B2 (en) * 2007-07-31 2010-02-16 Coherent, Inc. Thermal distortion compensation for laser mirrors
NL1036305A1 (nl) 2007-12-21 2009-06-23 Asml Netherlands Bv Grating for EUV-radiation, method for manufacturing the grating and wavefront measurement system.
NL1036543A1 (nl) * 2008-02-20 2009-08-24 Asml Netherlands Bv Lithographic apparatus comprising a magnet, method for the protection of a magnet in a lithographic apparatus and device manufacturing method.
DE102008049616B4 (de) 2008-09-30 2012-03-29 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage für die Mikrolithographie zur Herstellung von Halbleiterbauelementen
EP2219077A1 (en) 2009-02-12 2010-08-18 Carl Zeiss SMT AG Projection exposure method, projection exposure system and projection objective
DE102009009221A1 (de) * 2009-02-17 2010-08-26 Carl Zeiss Smt Ag Projektionsbelichtungsanlage für die Halbleiterlithographie mit einem Aktuatorsystem
JP5511199B2 (ja) 2009-02-25 2014-06-04 キヤノン株式会社 投影光学系、露光装置、およびデバイス製造方法
CN102414623A (zh) * 2009-04-27 2012-04-11 Asml荷兰有限公司 光刻设备和方法
CN105122139B (zh) 2013-01-28 2017-10-10 Asml荷兰有限公司 用于光刻设备的投影系统、反射镜和辐射源
JP2014225639A (ja) * 2013-04-16 2014-12-04 キヤノン株式会社 ミラーユニット及び露光装置
TW201443479A (zh) * 2013-05-09 2014-11-16 Hon Hai Prec Ind Co Ltd 微機電系統鏡片及微機電系統反射裝置
JP6168957B2 (ja) * 2013-09-30 2017-07-26 キヤノン株式会社 光学装置、投影光学系、露光装置および物品の製造方法
JP6336274B2 (ja) * 2013-12-25 2018-06-06 キヤノン株式会社 光学装置、投影光学系、露光装置、および物品の製造方法
JP6293024B2 (ja) * 2014-09-10 2018-03-14 株式会社ニューフレアテクノロジー 試料高さ検出装置およびパターン検査システム
JP6365156B2 (ja) * 2014-09-11 2018-08-01 株式会社デンソー ３次元形状作成装置
DE102015106184B4 (de) * 2015-04-22 2021-09-02 Friedrich-Schiller-Universität Jena Verfahren zur Formgebung und/oder Formkorrektur mindestens eines optischen Elements
CN105093848B (zh) * 2015-08-06 2018-01-16 武汉华星光电技术有限公司 一种曝光设备
JP6742717B2 (ja) * 2015-12-10 2020-08-19 キヤノン株式会社 光学装置、それを備えた露光装置、および物品の製造方法
JP6980660B2 (ja) * 2015-12-15 2021-12-15 カール・ツァイス・エスエムティー・ゲーエムベーハー リソグラフィ装置用の光学デバイス及びリソグラフィ装置
JP2017129685A (ja) 2016-01-19 2017-07-27 キヤノン株式会社 光学装置、投影光学系、露光装置およびデバイス製造方法
JP2018013510A (ja) * 2016-07-19 2018-01-25 キヤノン株式会社 光学装置、リソグラフィ装置及び物品の製造方法
DE102016219334A1 (de) * 2016-10-06 2017-08-17 Carl Zeiss Smt Gmbh Anordnung und lithographieanlage
JP6598827B2 (ja) * 2017-08-01 2019-10-30 キヤノン株式会社 光学装置、これを用いた露光装置、および物品の製造方法
US11143965B2 (en) * 2019-04-30 2021-10-12 Taiwan Semiconductor Manufacturing Company, Ltd. Optical lithography system for patterning semiconductor devices and method of using the same
DE102020210026A1 (de) 2020-08-07 2022-02-10 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage mit Temperiervorrichtung
DE102020210773B4 (de) * 2020-08-26 2024-04-18 Carl Zeiss Smt Gmbh Optische Baugruppe, Verfahren zur Ansteuerung einer optischen Baugruppe und Projektionsbelichtungsanlage
DE102021205368A1 (de) 2021-05-27 2022-12-01 Carl Zeiss Smt Gmbh Komponente für eine Projektionsbelichtungsanlage für die Halbleiterlithografie und Verfahren zur Auslegung der Komponente
US12055788B2 (en) * 2021-06-28 2024-08-06 Coherent, Inc. Thermally actuated adaptive optics
JP7589188B2 (ja) * 2022-02-28 2024-11-25 キヤノン株式会社 計測装置、計測方法、リソグラフィ装置及び物品の製造方法
CN114859551B (zh) * 2022-05-19 2023-07-14 中国科学院长春光学精密机械与物理研究所 一种反射式色散系统主动像差校正系统及校正方法
DE102023204312A1 (de) * 2023-05-10 2024-11-14 Carl Zeiss Smt Gmbh Optische Baugruppe

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100945605B1 (ko) 2007-06-20 2010-03-04 캐논 가부시끼가이샤 노광장치 및 디바이스 제조방법
KR20170089767A (ko) * 2016-01-27 2017-08-04 캐논 가부시끼가이샤 광학 디바이스, 노광 장치 및 물품의 제조 방법
KR102138113B1 (ko) * 2016-01-27 2020-07-27 캐논 가부시끼가이샤 광학 디바이스, 노광 장치 및 물품의 제조 방법

Also Published As

Publication number Publication date
EP1712955A3 (en) 2007-12-19
EP1712955B1 (en) 2011-06-15
JP2006295023A (ja) 2006-10-26
KR20060108523A (ko) 2006-10-18
US20060232866A1 (en) 2006-10-19
JP4817702B2 (ja) 2011-11-16
EP1712955A2 (en) 2006-10-18
US7771065B2 (en) 2010-08-10

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