KR100683585B1 - 산화물 소결체 - Google Patents
산화물 소결체 Download PDFInfo
- Publication number
- KR100683585B1 KR100683585B1 KR1020030031813A KR20030031813A KR100683585B1 KR 100683585 B1 KR100683585 B1 KR 100683585B1 KR 1020030031813 A KR1020030031813 A KR 1020030031813A KR 20030031813 A KR20030031813 A KR 20030031813A KR 100683585 B1 KR100683585 B1 KR 100683585B1
- Authority
- KR
- South Korea
- Prior art keywords
- oxide
- oxide sintered
- sintered body
- indium
- tungsten
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G15/00—Compounds of gallium, indium or thallium
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/622—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/64—Burning or sintering processes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
- H01B1/06—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of other non-metallic substances
- H01B1/08—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of other non-metallic substances oxides
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
- C04B2235/30—Constituents and secondary phases not being of a fibrous nature
- C04B2235/32—Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
- C04B2235/3231—Refractory metal oxides, their mixed metal oxides, or oxide-forming salts thereof
- C04B2235/3258—Tungsten oxides, tungstates, or oxide-forming salts thereof
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
- C04B2235/30—Constituents and secondary phases not being of a fibrous nature
- C04B2235/32—Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
- C04B2235/3286—Gallium oxides, gallates, indium oxides, indates, thallium oxides, thallates or oxide forming salts thereof, e.g. zinc gallate
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
- C04B2235/50—Constituents or additives of the starting mixture chosen for their shape or used because of their shape or their physical appearance
- C04B2235/54—Particle size related information
- C04B2235/5418—Particle size related information expressed by the size of the particles or aggregates thereof
- C04B2235/5436—Particle size related information expressed by the size of the particles or aggregates thereof micrometer sized, i.e. from 1 to 100 micron
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
- C04B2235/50—Constituents or additives of the starting mixture chosen for their shape or used because of their shape or their physical appearance
- C04B2235/54—Particle size related information
- C04B2235/5418—Particle size related information expressed by the size of the particles or aggregates thereof
- C04B2235/5445—Particle size related information expressed by the size of the particles or aggregates thereof submicron sized, i.e. from 0,1 to 1 micron
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/65—Aspects relating to heat treatments of ceramic bodies such as green ceramics or pre-sintered ceramics, e.g. burning, sintering or melting processes
- C04B2235/66—Specific sintering techniques, e.g. centrifugal sintering
- C04B2235/661—Multi-step sintering
- C04B2235/662—Annealing after sintering
- C04B2235/664—Reductive annealing
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/70—Aspects relating to sintered or melt-casted ceramic products
- C04B2235/74—Physical characteristics
- C04B2235/76—Crystal structural characteristics, e.g. symmetry
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/70—Aspects relating to sintered or melt-casted ceramic products
- C04B2235/80—Phases present in the sintered or melt-cast ceramic products other than the main phase
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/70—Aspects relating to sintered or melt-casted ceramic products
- C04B2235/96—Properties of ceramic products, e.g. mechanical properties such as strength, toughness, wear resistance
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Ceramic Engineering (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Structural Engineering (AREA)
- Inorganic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Compositions Of Oxide Ceramics (AREA)
- Photovoltaic Devices (AREA)
- Conductive Materials (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JPJP-P-2002-00255425 | 2002-08-30 | ||
| JP2002255425A JP3906766B2 (ja) | 2002-08-30 | 2002-08-30 | 酸化物焼結体 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20040019865A KR20040019865A (ko) | 2004-03-06 |
| KR100683585B1 true KR100683585B1 (ko) | 2007-02-15 |
Family
ID=31972885
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020030031813A Expired - Fee Related KR100683585B1 (ko) | 2002-08-30 | 2003-05-20 | 산화물 소결체 |
Country Status (5)
| Country | Link |
|---|---|
| US (2) | US7011691B2 (enExample) |
| JP (1) | JP3906766B2 (enExample) |
| KR (1) | KR100683585B1 (enExample) |
| CN (1) | CN1326154C (enExample) |
| TW (1) | TWI241982B (enExample) |
Families Citing this family (33)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI254080B (en) * | 2002-03-27 | 2006-05-01 | Sumitomo Metal Mining Co | Transparent conductive thin film, process for producing the same, sintered target for producing the same, and transparent, electroconductive substrate for display panel, and organic electroluminescence device |
| JP3797317B2 (ja) * | 2002-05-30 | 2006-07-19 | 住友金属鉱山株式会社 | 透明導電性薄膜用ターゲット、透明導電性薄膜およびその製造方法、ディスプレイ用電極材料、有機エレクトロルミネッセンス素子 |
| JP2005306662A (ja) * | 2004-04-21 | 2005-11-04 | Tdk Corp | 誘電体セラミックス粉末の製造方法及び複合誘電体材料の製造方法 |
| JP4826066B2 (ja) * | 2004-04-27 | 2011-11-30 | 住友金属鉱山株式会社 | 非晶質の透明導電性薄膜およびその製造方法、並びに、該非晶質の透明導電性薄膜を得るためのスパッタリングターゲットおよびその製造方法 |
| CA2570369C (en) | 2004-07-12 | 2008-02-19 | Cardinal Cg Company | Low-maintenance coatings |
| JP4182357B2 (ja) * | 2005-01-17 | 2008-11-19 | 住友金属鉱山株式会社 | 熱線遮蔽樹脂シート材および熱線遮蔽樹脂シート材積層体、並びにそれらを用いた建築構造体 |
| KR100961421B1 (ko) * | 2005-03-25 | 2010-06-09 | 아사히 가라스 가부시키가이샤 | 전기 전도성 재료 |
| ITTO20050269A1 (it) * | 2005-04-21 | 2006-10-22 | Sales Spa | Dispositivo di apertura per contenitori flessibili ermetici |
| US8999836B2 (en) | 2005-05-13 | 2015-04-07 | Semiconductor Energy Laboratory Co., Ltd. | Method for manufacturing display device |
| US7862910B2 (en) | 2006-04-11 | 2011-01-04 | Cardinal Cg Company | Photocatalytic coatings having improved low-maintenance properties |
| US20080011599A1 (en) | 2006-07-12 | 2008-01-17 | Brabender Dennis M | Sputtering apparatus including novel target mounting and/or control |
| US7452488B2 (en) * | 2006-10-31 | 2008-11-18 | H.C. Starck Inc. | Tin oxide-based sputtering target, low resistivity, transparent conductive film, method for producing such film and composition for use therein |
| US7820296B2 (en) * | 2007-09-14 | 2010-10-26 | Cardinal Cg Company | Low-maintenance coating technology |
| JP5604888B2 (ja) * | 2009-12-21 | 2014-10-15 | 住友大阪セメント株式会社 | 静電チャックの製造方法 |
| EP2671855B1 (en) * | 2011-02-04 | 2016-05-25 | Sumitomo Metal Mining Co., Ltd. | Oxide sintered body and tablets obtained by processing same |
| CN102751341A (zh) * | 2012-06-20 | 2012-10-24 | 常州天合光能有限公司 | 透明导电薄膜及其制备方法 |
| SG11201509031RA (en) * | 2013-05-02 | 2015-11-27 | Basf Se | Polyarylethersulfone copolymers |
| JP5967016B2 (ja) * | 2013-05-29 | 2016-08-10 | 住友金属鉱山株式会社 | 蒸着用タブレットとその製造方法 |
| JP6044503B2 (ja) * | 2013-10-08 | 2016-12-14 | 住友金属鉱山株式会社 | 導電性接着フィルム及びそれを用いた多接合型太陽電池 |
| KR20150105527A (ko) | 2014-03-06 | 2015-09-17 | 삼성디스플레이 주식회사 | 산화물 스퍼터링 타겟 및 이를 이용한 박막 트랜지스터 |
| JP6119773B2 (ja) * | 2014-03-25 | 2017-04-26 | 住友電気工業株式会社 | 酸化物焼結体およびその製造方法、スパッタターゲット、ならびに半導体デバイス |
| JP6233447B2 (ja) * | 2014-03-25 | 2017-11-22 | 住友電気工業株式会社 | 酸化物焼結体およびその製造方法、スパッタターゲット、ならびに半導体デバイス |
| CN105745183B (zh) | 2014-08-12 | 2018-03-13 | 住友电气工业株式会社 | 氧化物烧结体及其制造方法、溅射靶、以及半导体器件 |
| EP3061735A4 (en) * | 2014-10-22 | 2016-12-14 | Sumitomo Electric Industries | SINTERED OXID AND SEMICONDUCTOR ELEMENT |
| US10475631B2 (en) | 2015-02-13 | 2019-11-12 | Sumitomo Electric Industries, Ltd. | Oxide sintered body and method for manufacturing the same, sputtering target, and semiconductor device |
| CN105374901A (zh) * | 2015-11-18 | 2016-03-02 | 南京迪纳科光电材料有限公司 | 用于薄膜太阳能电池透明电极的iwo材料的制备方法 |
| WO2018093985A1 (en) | 2016-11-17 | 2018-05-24 | Cardinal Cg Company | Static-dissipative coating technology |
| GB2562115B (en) | 2017-05-05 | 2022-02-16 | William Blythe Ltd | Tungsten oxide |
| GB2562116B (en) | 2017-05-05 | 2022-04-27 | William Blythe Ltd | Metal oxide, composition comprising the same and method of making metal oxide |
| JP6493501B2 (ja) * | 2017-12-05 | 2019-04-03 | 住友電気工業株式会社 | 酸化物焼結体の製造方法 |
| CN111943650B (zh) * | 2020-07-22 | 2022-11-29 | 长沙壹纳光电材料有限公司 | 一种用于活化等离子沉积技术的iwo靶材及其制备方法 |
| CN113548872A (zh) * | 2021-07-16 | 2021-10-26 | 长沙壹纳光电材料有限公司 | 一种iwo靶材及其制备方法与应用 |
| CN114702304B (zh) * | 2022-05-11 | 2023-03-17 | 郑州大学 | 一种铟钨氧化物靶材及其制备方法 |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5938541B2 (ja) * | 1979-12-22 | 1984-09-18 | 松下電工株式会社 | 可燃性ガス検知素子 |
| JPS59204625A (ja) * | 1983-05-06 | 1984-11-20 | Daicel Chem Ind Ltd | 透明導電性フイルムの製造方法 |
| NL8501257A (nl) * | 1985-05-03 | 1986-12-01 | Philips Nv | Werkwijze voor het vervaardigen van een naleveringskathode en toepassing van de werkwijze. |
| JPH01278869A (ja) * | 1988-04-30 | 1989-11-09 | Mazda Motor Corp | 車両の故障診断装置 |
| US5225273A (en) * | 1989-12-28 | 1993-07-06 | Teijin Limited | Transparent electroconductive laminate |
| JPH0656503A (ja) * | 1992-08-10 | 1994-03-01 | Showa Denko Kk | Ito焼結体 |
| JP3827334B2 (ja) * | 1993-08-11 | 2006-09-27 | 東ソー株式会社 | Ito焼結体及びスパッタリングターゲット |
| JPH11279438A (ja) * | 1998-03-27 | 1999-10-12 | Sumitomo Osaka Cement Co Ltd | 透明導電膜形成用塗料および透明導電膜 |
| JP2000238178A (ja) * | 1999-02-24 | 2000-09-05 | Teijin Ltd | 透明導電積層体 |
| CN1191592C (zh) * | 2000-04-11 | 2005-03-02 | 复旦大学 | 一种透明导电薄膜的制备方法 |
| JP2002075623A (ja) | 2000-09-04 | 2002-03-15 | Mitsubishi Electric Corp | 誘導加熱調理器及びその制御方法 |
| JP4560219B2 (ja) | 2001-01-15 | 2010-10-13 | 旭化成ケミカルズ株式会社 | ガラス基板用緩衝体 |
| JP3780932B2 (ja) * | 2000-12-28 | 2006-05-31 | 住友金属鉱山株式会社 | 透明導電性薄膜作製用焼結体ターゲットおよびその製造方法 |
| JP4140805B2 (ja) | 2000-12-28 | 2008-08-27 | 株式会社スギノマシン | 手動ツール交換機能付きマシニングセンタ |
| JP2002275623A (ja) * | 2001-03-19 | 2002-09-25 | Sumitomo Metal Mining Co Ltd | 透明導電性薄膜形成用焼結体ターゲット、その製造方法、及びそれより得られる透明導電性薄膜 |
| JP4647823B2 (ja) | 2001-04-26 | 2011-03-09 | 旭化成エレクトロニクス株式会社 | Gm−Cフィルタ |
-
2002
- 2002-08-30 JP JP2002255425A patent/JP3906766B2/ja not_active Expired - Lifetime
-
2003
- 2003-05-19 TW TW092113424A patent/TWI241982B/zh not_active IP Right Cessation
- 2003-05-20 US US10/441,980 patent/US7011691B2/en not_active Expired - Lifetime
- 2003-05-20 KR KR1020030031813A patent/KR100683585B1/ko not_active Expired - Fee Related
- 2003-05-20 CN CNB031476880A patent/CN1326154C/zh not_active Expired - Lifetime
-
2005
- 2005-12-12 US US11/301,205 patent/US7569167B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| CN1326154C (zh) | 2007-07-11 |
| TW200403189A (en) | 2004-03-01 |
| CN1479321A (zh) | 2004-03-03 |
| JP2004091265A (ja) | 2004-03-25 |
| US7011691B2 (en) | 2006-03-14 |
| US20040040414A1 (en) | 2004-03-04 |
| US7569167B2 (en) | 2009-08-04 |
| US20060099140A1 (en) | 2006-05-11 |
| JP3906766B2 (ja) | 2007-04-18 |
| TWI241982B (en) | 2005-10-21 |
| KR20040019865A (ko) | 2004-03-06 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR100683585B1 (ko) | 산화물 소결체 | |
| JP4231967B2 (ja) | 酸化物焼結体、その製造方法、透明導電膜、およびそれを用いて得られる太陽電池 | |
| US8304359B2 (en) | Sputtering target, transparent conductive film, and transparent electrode for touch panel | |
| KR100626700B1 (ko) | 산화물 소결체 및 스퍼터링 타겟, 산화물 투명 전극막의 제조방법 | |
| KR100819621B1 (ko) | 산화물 소결체, 산화물 투명 도전막 및 그 제조방법 | |
| KR20140004143A (ko) | 투명 산화물막 및 그 제조 방법 | |
| JP5381744B2 (ja) | 酸化物蒸着材と蒸着薄膜並びに太陽電池 | |
| CN102666429B (zh) | 氧化铟系烧结体及氧化铟系透明导电膜 | |
| JP2011184715A (ja) | 酸化亜鉛系透明導電膜形成材料、その製造方法、それを用いたターゲット、および酸化亜鉛系透明導電膜の形成方法 | |
| KR102755952B1 (ko) | 몰리브덴 산화물계 소결체, 상기 소결체를 이용한 박막, 상기 박막을 포함하는 박막트랜지스터 및 디스플레이 장치 | |
| JP4175071B2 (ja) | 酸化物焼結体およびスパッタリングターゲット | |
| KR20150039753A (ko) | 산화물 소결체 및 그것을 가공한 테블렛 | |
| JP2006188392A (ja) | 酸化物焼結体、透明導電性薄膜およびその実装素子 | |
| KR100862593B1 (ko) | 투명 전도성 박막 및 이의 제조방법 | |
| JP2012106880A (ja) | 酸化亜鉛系透明導電膜形成材料、その製造方法、それを用いたターゲット、および酸化亜鉛系透明導電膜の形成方法 | |
| JP4370868B2 (ja) | 酸化物焼結体及びスパッタリングターゲット、酸化物透明電極膜の製造方法 | |
| CN107254669A (zh) | 烧结体和非晶膜 | |
| KR100816316B1 (ko) | 투명 전기전도성 필름 및 그의 제조 방법 | |
| WO2012121298A1 (ja) | 酸化物焼結体、その製造方法およびそれを用いたターゲット | |
| JP2003342068A (ja) | 酸化物焼結体 | |
| JP4218230B2 (ja) | 透明導電膜作製用焼結体ターゲット | |
| KR20250091830A (ko) | 몰리브덴 산화물계 소결체, 상기 소결체를 이용한 박막, 상기 박막을 포함하는 박막트랜지스터 및 디스플레이 장치 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PA0109 | Patent application |
St.27 status event code: A-0-1-A10-A12-nap-PA0109 |
|
| A201 | Request for examination | ||
| PA0201 | Request for examination |
St.27 status event code: A-1-2-D10-D11-exm-PA0201 |
|
| PG1501 | Laying open of application |
St.27 status event code: A-1-1-Q10-Q12-nap-PG1501 |
|
| D13-X000 | Search requested |
St.27 status event code: A-1-2-D10-D13-srh-X000 |
|
| D14-X000 | Search report completed |
St.27 status event code: A-1-2-D10-D14-srh-X000 |
|
| E902 | Notification of reason for refusal | ||
| PE0902 | Notice of grounds for rejection |
St.27 status event code: A-1-2-D10-D21-exm-PE0902 |
|
| T11-X000 | Administrative time limit extension requested |
St.27 status event code: U-3-3-T10-T11-oth-X000 |
|
| P11-X000 | Amendment of application requested |
St.27 status event code: A-2-2-P10-P11-nap-X000 |
|
| P13-X000 | Application amended |
St.27 status event code: A-2-2-P10-P13-nap-X000 |
|
| E902 | Notification of reason for refusal | ||
| PE0902 | Notice of grounds for rejection |
St.27 status event code: A-1-2-D10-D21-exm-PE0902 |
|
| T11-X000 | Administrative time limit extension requested |
St.27 status event code: U-3-3-T10-T11-oth-X000 |
|
| E13-X000 | Pre-grant limitation requested |
St.27 status event code: A-2-3-E10-E13-lim-X000 |
|
| P11-X000 | Amendment of application requested |
St.27 status event code: A-2-2-P10-P11-nap-X000 |
|
| P13-X000 | Application amended |
St.27 status event code: A-2-2-P10-P13-nap-X000 |
|
| E701 | Decision to grant or registration of patent right | ||
| PE0701 | Decision of registration |
St.27 status event code: A-1-2-D10-D22-exm-PE0701 |
|
| GRNT | Written decision to grant | ||
| PR0701 | Registration of establishment |
St.27 status event code: A-2-4-F10-F11-exm-PR0701 |
|
| PR1002 | Payment of registration fee |
St.27 status event code: A-2-2-U10-U11-oth-PR1002 Fee payment year number: 1 |
|
| PG1601 | Publication of registration |
St.27 status event code: A-4-4-Q10-Q13-nap-PG1601 |
|
| PR1001 | Payment of annual fee |
St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 4 |
|
| PR1001 | Payment of annual fee |
St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 5 |
|
| PR1001 | Payment of annual fee |
St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 6 |
|
| FPAY | Annual fee payment |
Payment date: 20130118 Year of fee payment: 7 |
|
| PR1001 | Payment of annual fee |
St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 7 |
|
| FPAY | Annual fee payment |
Payment date: 20140117 Year of fee payment: 8 |
|
| PR1001 | Payment of annual fee |
St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 8 |
|
| FPAY | Annual fee payment |
Payment date: 20150119 Year of fee payment: 9 |
|
| PR1001 | Payment of annual fee |
St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 9 |
|
| FPAY | Annual fee payment |
Payment date: 20160119 Year of fee payment: 10 |
|
| PR1001 | Payment of annual fee |
St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 10 |
|
| FPAY | Annual fee payment |
Payment date: 20170119 Year of fee payment: 11 |
|
| PR1001 | Payment of annual fee |
St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 11 |
|
| FPAY | Annual fee payment |
Payment date: 20180119 Year of fee payment: 12 |
|
| PR1001 | Payment of annual fee |
St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 12 |
|
| FPAY | Annual fee payment |
Payment date: 20190117 Year of fee payment: 13 |
|
| PR1001 | Payment of annual fee |
St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 13 |
|
| PR1001 | Payment of annual fee |
St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 14 |
|
| PR1001 | Payment of annual fee |
St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 15 |
|
| PR1001 | Payment of annual fee |
St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 16 |
|
| PC1903 | Unpaid annual fee |
St.27 status event code: A-4-4-U10-U13-oth-PC1903 Not in force date: 20230210 Payment event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE |
|
| PC1903 | Unpaid annual fee |
St.27 status event code: N-4-6-H10-H13-oth-PC1903 Ip right cessation event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE Not in force date: 20230210 |
|
| R18-X000 | Changes to party contact information recorded |
St.27 status event code: A-5-5-R10-R18-oth-X000 |