JPWO2021132252A1 - - Google Patents

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Publication number
JPWO2021132252A1
JPWO2021132252A1 JP2021567488A JP2021567488A JPWO2021132252A1 JP WO2021132252 A1 JPWO2021132252 A1 JP WO2021132252A1 JP 2021567488 A JP2021567488 A JP 2021567488A JP 2021567488 A JP2021567488 A JP 2021567488A JP WO2021132252 A1 JPWO2021132252 A1 JP WO2021132252A1
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JP
Japan
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Pending
Application number
JP2021567488A
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Publication date
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Publication of JPWO2021132252A1 publication Critical patent/JPWO2021132252A1/ja
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Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62Record carriers characterised by the selection of the material
    • G11B5/72Protective coatings, e.g. anti-static or antifriction
    • G11B5/725Protective coatings, e.g. anti-static or antifriction containing a lubricant, e.g. organic compounds
    • G11B5/7253Fluorocarbon lubricant
    • G11B5/7257Perfluoropolyether lubricant
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C217/00Compounds containing amino and etherified hydroxy groups bound to the same carbon skeleton
    • C07C217/02Compounds containing amino and etherified hydroxy groups bound to the same carbon skeleton having etherified hydroxy groups and amino groups bound to acyclic carbon atoms of the same carbon skeleton
    • C07C217/04Compounds containing amino and etherified hydroxy groups bound to the same carbon skeleton having etherified hydroxy groups and amino groups bound to acyclic carbon atoms of the same carbon skeleton the carbon skeleton being acyclic and saturated
    • C07C217/28Compounds containing amino and etherified hydroxy groups bound to the same carbon skeleton having etherified hydroxy groups and amino groups bound to acyclic carbon atoms of the same carbon skeleton the carbon skeleton being acyclic and saturated having one amino group and at least two singly-bound oxygen atoms, with at least one being part of an etherified hydroxy group, bound to the carbon skeleton, e.g. ethers of polyhydroxy amines
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C217/00Compounds containing amino and etherified hydroxy groups bound to the same carbon skeleton
    • C07C217/78Compounds containing amino and etherified hydroxy groups bound to the same carbon skeleton having amino groups and etherified hydroxy groups bound to carbon atoms of six-membered aromatic rings of the same carbon skeleton
    • C07C217/80Compounds containing amino and etherified hydroxy groups bound to the same carbon skeleton having amino groups and etherified hydroxy groups bound to carbon atoms of six-membered aromatic rings of the same carbon skeleton having amino groups and etherified hydroxy groups bound to carbon atoms of non-condensed six-membered aromatic rings
    • C07C217/82Compounds containing amino and etherified hydroxy groups bound to the same carbon skeleton having amino groups and etherified hydroxy groups bound to carbon atoms of six-membered aromatic rings of the same carbon skeleton having amino groups and etherified hydroxy groups bound to carbon atoms of non-condensed six-membered aromatic rings of the same non-condensed six-membered aromatic ring
    • C07C217/84Compounds containing amino and etherified hydroxy groups bound to the same carbon skeleton having amino groups and etherified hydroxy groups bound to carbon atoms of six-membered aromatic rings of the same carbon skeleton having amino groups and etherified hydroxy groups bound to carbon atoms of non-condensed six-membered aromatic rings of the same non-condensed six-membered aromatic ring the oxygen atom of at least one of the etherified hydroxy groups being further bound to an acyclic carbon atom
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/002Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from unsaturated compounds
    • C08G65/005Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from unsaturated compounds containing halogens
    • C08G65/007Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from unsaturated compounds containing halogens containing fluorine
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/02Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
    • C08G65/32Polymers modified by chemical after-treatment
    • C08G65/329Polymers modified by chemical after-treatment with organic compounds
    • C08G65/331Polymers modified by chemical after-treatment with organic compounds containing oxygen
    • C08G65/3311Polymers modified by chemical after-treatment with organic compounds containing oxygen containing a hydroxy group
    • C08G65/3312Polymers modified by chemical after-treatment with organic compounds containing oxygen containing a hydroxy group acyclic
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/02Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
    • C08G65/32Polymers modified by chemical after-treatment
    • C08G65/329Polymers modified by chemical after-treatment with organic compounds
    • C08G65/333Polymers modified by chemical after-treatment with organic compounds containing nitrogen
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/02Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
    • C08G65/32Polymers modified by chemical after-treatment
    • C08G65/329Polymers modified by chemical after-treatment with organic compounds
    • C08G65/333Polymers modified by chemical after-treatment with organic compounds containing nitrogen
    • C08G65/33303Polymers modified by chemical after-treatment with organic compounds containing nitrogen containing amino group
    • C08G65/33306Polymers modified by chemical after-treatment with organic compounds containing nitrogen containing amino group acyclic
    • CCHEMISTRY; METALLURGY
    • C10PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10MLUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
    • C10M107/00Lubricating compositions characterised by the base-material being a macromolecular compound
    • C10M107/38Lubricating compositions characterised by the base-material being a macromolecular compound containing halogen
    • CCHEMISTRY; METALLURGY
    • C10PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10MLUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
    • C10M2213/00Organic macromolecular compounds containing halogen as ingredients in lubricant compositions
    • C10M2213/04Organic macromolecular compounds containing halogen as ingredients in lubricant compositions obtained from monomers containing carbon, hydrogen, halogen and oxygen
    • C10M2213/043Organic macromolecular compounds containing halogen as ingredients in lubricant compositions obtained from monomers containing carbon, hydrogen, halogen and oxygen used as base material
    • CCHEMISTRY; METALLURGY
    • C10PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10MLUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
    • C10M2213/00Organic macromolecular compounds containing halogen as ingredients in lubricant compositions
    • C10M2213/06Perfluoro polymers
    • C10M2213/0606Perfluoro polymers used as base material
    • CCHEMISTRY; METALLURGY
    • C10PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10NINDEXING SCHEME ASSOCIATED WITH SUBCLASS C10M RELATING TO LUBRICATING COMPOSITIONS
    • C10N2030/00Specified physical or chemical properties which is improved by the additive characterising the lubricating composition, e.g. multifunctional additives
    • C10N2030/06Oiliness; Film-strength; Anti-wear; Resistance to extreme pressure
    • CCHEMISTRY; METALLURGY
    • C10PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10NINDEXING SCHEME ASSOCIATED WITH SUBCLASS C10M RELATING TO LUBRICATING COMPOSITIONS
    • C10N2040/00Specified use or application for which the lubricating composition is intended
    • C10N2040/14Electric or magnetic purposes
    • C10N2040/18Electric or magnetic purposes in connection with recordings on magnetic tape or disc
    • CCHEMISTRY; METALLURGY
    • C10PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10NINDEXING SCHEME ASSOCIATED WITH SUBCLASS C10M RELATING TO LUBRICATING COMPOSITIONS
    • C10N2050/00Form in which the lubricant is applied to the material being lubricated
    • C10N2050/015Dispersions of solid lubricants
    • C10N2050/02Dispersions of solid lubricants dissolved or suspended in a carrier which subsequently evaporates to leave a lubricant coating
    • CCHEMISTRY; METALLURGY
    • C10PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10NINDEXING SCHEME ASSOCIATED WITH SUBCLASS C10M RELATING TO LUBRICATING COMPOSITIONS
    • C10N2050/00Form in which the lubricant is applied to the material being lubricated
    • C10N2050/023Multi-layer lubricant coatings
    • C10N2050/025Multi-layer lubricant coatings in the form of films or sheets
    • CCHEMISTRY; METALLURGY
    • C10PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10NINDEXING SCHEME ASSOCIATED WITH SUBCLASS C10M RELATING TO LUBRICATING COMPOSITIONS
    • C10N2070/00Specific manufacturing methods for lubricant compositions

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Lubricants (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Magnetic Record Carriers (AREA)
JP2021567488A 2019-12-26 2020-12-22 Pending JPWO2021132252A1 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2019236885 2019-12-26
PCT/JP2020/047987 WO2021132252A1 (ja) 2019-12-26 2020-12-22 含フッ素エーテル化合物、磁気記録媒体用潤滑剤および磁気記録媒体

Publications (1)

Publication Number Publication Date
JPWO2021132252A1 true JPWO2021132252A1 (ja) 2021-07-01

Family

ID=76574180

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021567488A Pending JPWO2021132252A1 (ja) 2019-12-26 2020-12-22

Country Status (4)

Country Link
US (1) US11905365B2 (ja)
JP (1) JPWO2021132252A1 (ja)
CN (1) CN114845989A (ja)
WO (1) WO2021132252A1 (ja)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112673048B (zh) 2018-09-12 2023-06-13 株式会社力森诺科 含氟醚化合物、磁记录介质用润滑剂及磁记录介质
JP7435589B2 (ja) 2019-03-12 2024-02-21 株式会社レゾナック 含フッ素エーテル化合物、磁気記録媒体用潤滑剤および磁気記録媒体
CN114341094B (zh) 2019-09-18 2024-01-12 株式会社力森诺科 含氟醚化合物、磁记录介质用润滑剂及磁记录介质
US11905365B2 (en) 2019-12-26 2024-02-20 Resonac Corporation Fluorine-containing ether compound, lubricant for magnetic recording medium, and magnetic recording medium
CN115038685A (zh) * 2020-02-07 2022-09-09 昭和电工株式会社 含氟醚化合物、磁记录介质用润滑剂及磁记录介质

Family Cites Families (74)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4360645A (en) 1981-04-03 1982-11-23 E. I. Du Pont De Nemours And Company Perfluoroglycidyl ethers
US4526833A (en) 1983-10-03 1985-07-02 Minnesota Mining And Manufacturing Company Magnetic recording medium having a perfluoropolyether polymer protective coating
JPS61126052A (ja) 1984-11-20 1986-06-13 Green Cross Corp:The 含フツ素メタクリル酸エステル
US5157066A (en) 1988-09-26 1992-10-20 Hitachi, Ltd. Fluoroalkyl ether, surface modifying composition and method for modifying surface
JPH037798A (ja) 1989-06-05 1991-01-14 Asahi Chem Ind Co Ltd 冷凍機用潤滑油
KR930008206B1 (ko) 1989-06-05 1993-08-26 아사히가세이고오교 가부시끼가이샤 냉매조성물
JPH0512655A (ja) 1991-07-05 1993-01-22 Konica Corp 磁気記録媒体
US5604032A (en) * 1993-10-19 1997-02-18 Matsushita Electric Industrial Co., Ltd. Fluorine-containing carboxylic acid amine salt and a magnetic recording medium with the same thereon
IT1279004B1 (it) 1995-03-10 1997-12-02 Ausimont Spa Composizioni ad alto secco a base di fluoropolieteri
US5834564A (en) 1996-04-30 1998-11-10 Hewlett-Packard Company Photoconductor coating having perfluoro copolymer and composition for making same
JP3365472B2 (ja) 1996-09-26 2003-01-14 エヌオーケー株式会社 フッ素ベース磁性流体
JP2866622B2 (ja) 1996-09-17 1999-03-08 花王株式会社 新規含フッ素化合物及びこれを含有する潤滑剤並びに磁気記録媒体
WO1998017617A1 (fr) 1996-10-17 1998-04-30 Hitachi, Ltd. Compose fluore, lubrifiant, modificateur de surface, film lubrifiant, support d'enregistrement magnetique et dispositif d'enregistrement magnetique
JPH1160720A (ja) 1997-08-22 1999-03-05 Showa Denko Kk ポリエーテル化合物及び磁気記録媒体
JPH11131083A (ja) * 1997-08-29 1999-05-18 Showa Denko Kk ポリエーテル化合物及び磁気記録媒体
JP4452343B2 (ja) 1999-03-17 2010-04-21 共栄社化学株式会社 パーフルオロ基を含有する化合物およびその硬化重合物
JP2001134924A (ja) 1999-11-02 2001-05-18 Fujitsu Ltd 磁気ディスク装置、その製造方法、および磁気ディスクの製造装置
JP2001209924A (ja) 1999-11-19 2001-08-03 Showa Denko Kk 磁気記録媒体およびその製造方法
JP4590703B2 (ja) 2000-08-31 2010-12-01 ユニマテック株式会社 含フッ素ポリエーテルカルボン酸エステル
JP2003113389A (ja) * 2001-10-04 2003-04-18 Sony Corp パーフルオロポリエーテル系化合物を含有する潤滑剤、および該潤滑剤を用いた磁気記録媒体。
JP2004115640A (ja) 2002-09-26 2004-04-15 Nippon Kayaku Co Ltd 低屈折率樹脂組成物及びそれを用いたポリマー光導波路
JP4013881B2 (ja) 2002-10-18 2007-11-28 ソニーケミカル&インフォメーションデバイス株式会社 パーフルオロポリエーテルエステル化合物、潤滑剤及び磁気記録媒体
ITMI20030992A1 (it) 2003-05-20 2004-11-21 Solvay Solexis Spa Additivi perfluoropolieterei.
US7247397B2 (en) 2003-12-09 2007-07-24 Imation Corp. Thermally stable perfluoropolyether lubricant for recording media
US8158728B2 (en) 2004-02-13 2012-04-17 The University Of North Carolina At Chapel Hill Methods and materials for fabricating microfluidic devices
WO2006011387A1 (ja) 2004-07-27 2006-02-02 Asahi Glass Company, Limited 含フッ素ポリエーテル化合物を潤滑剤とする磁気記録媒体用潤滑剤溶液
JP2006131874A (ja) 2004-10-08 2006-05-25 Matsushita Electric Ind Co Ltd 潤滑剤および磁気記録媒体
ITMI20042238A1 (it) 2004-11-19 2005-02-19 Solvay Solexis Spa Composti per fluoropolirterei
JP5250937B2 (ja) 2006-02-28 2013-07-31 富士通株式会社 潤滑剤、磁気記録媒体およびヘッドスライダ
JP4632144B2 (ja) 2007-09-14 2011-02-16 富士電機デバイステクノロジー株式会社 磁気記録媒体
US9245568B2 (en) 2008-03-30 2016-01-26 Wd Media (Singapore) Pte. Ltd. Magnetic disk and method of manufacturing the same
JP5613916B2 (ja) 2008-12-18 2014-10-29 株式会社Moresco パーフルオロポリエーテル化合物、その製造方法、該化合物を含有する潤滑剤、および磁気ディスク
JP5469924B2 (ja) 2009-06-08 2014-04-16 ショウワデンコウ エイチディ シンガポール ピーティイー リミテッド 磁気記録媒体及び磁気記録媒体の製造方法、並びに磁気記録再生装置
CN102639477A (zh) 2009-11-26 2012-08-15 旭硝子株式会社 醚化合物、含该醚化合物的润滑剂及润滑剂组合物
WO2011099131A1 (ja) 2010-02-10 2011-08-18 株式会社Moresco パーフルオロポリエーテル化合物、その製造方法、該化合物を含有する潤滑剤、および磁気ディスク
JP5835874B2 (ja) 2010-06-22 2015-12-24 ダブリュディ・メディア・シンガポール・プライベートリミテッド 磁気ディスクの製造方法
JP2012033253A (ja) 2010-07-09 2012-02-16 Hitachi Ltd 磁気記録媒体および磁気記録装置
JP5206746B2 (ja) 2010-07-20 2013-06-12 ユニマテック株式会社 含フッ素ポリエーテルカルボン酸エステル
JP5523377B2 (ja) * 2011-03-07 2014-06-18 富士フイルム株式会社 潤滑剤組成物、フッ素化合物、及びその用途
US8685548B2 (en) 2011-03-31 2014-04-01 Seagate Technology Llc Lubricant compositions
JP5909837B2 (ja) 2012-02-13 2016-04-27 株式会社Moresco フルオロポリエーテル化合物、これを含有する潤滑剤ならびに磁気ディスク
JP5789545B2 (ja) 2012-03-02 2015-10-07 富士フイルム株式会社 含フッ素化合物、撥液性処理剤、及び硬化膜
JP2013181140A (ja) 2012-03-02 2013-09-12 Fujifilm Corp 光学用樹脂組成物、硬化物、光学部品、半導体発光装置用封止剤、光学レンズ、光学用接着剤、光学用シール剤、光導波路
JP6040455B2 (ja) 2013-12-09 2016-12-07 株式会社Moresco フルオロポリエーテル化合物、これを含有する潤滑剤ならびに磁気ディスク
US9950980B2 (en) 2013-12-17 2018-04-24 Moresco Corporation Fluoropolyether compound, lubricant containing same, and magnetic disk
JP6160540B2 (ja) 2014-03-31 2017-07-12 信越化学工業株式会社 硬化性パーフルオロポリエーテル系ゲル組成物及びその硬化物を用いたゲル製品
EP3162836B1 (en) 2014-06-24 2018-10-17 Moresco Corporation Fluoropolyether compound, lubricant, and magnetic disk
US9765273B2 (en) 2014-09-08 2017-09-19 Western Digital Technologies, Inc. Monodisperse lubricant including multidentate perfluoropolyether structures
EP3225612B1 (en) 2014-11-28 2019-09-04 Moresco Corporation Fluoropolyether compound, lubricant, magnetic disk, and method for producing same
KR20170141649A (ko) 2015-04-30 2017-12-26 아사히 가라스 가부시키가이샤 함불소 화합물, 광 경화성 조성물, 코팅액, 하드 코트층 형성용 조성물 및 물품
EP3320020B1 (en) 2015-07-09 2019-10-02 Solvay Specialty Polymers Italy S.p.A. Novel (per)fluoropolyether polymers
CN114550755B (zh) 2016-02-22 2023-09-29 株式会社力森诺科 含氟醚化合物、磁记录介质用润滑剂及磁记录介质
JP6763014B2 (ja) 2016-03-10 2020-09-30 昭和電工株式会社 含フッ素エーテル化合物、磁気記録媒体用潤滑剤および磁気記録媒体
CN109196689B (zh) 2016-05-10 2020-09-01 西奥公司 具有腈基团的氟化电解质
JP6838874B2 (ja) 2016-07-05 2021-03-03 昭和電工株式会社 含フッ素エーテル化合物、磁気記録媒体用潤滑剤および磁気記録媒体
JP6122191B1 (ja) 2016-07-26 2017-04-26 オリジン電気株式会社 潤滑グリース組成物
JP6804893B2 (ja) 2016-08-10 2020-12-23 昭和電工株式会社 含フッ素エーテル化合物、磁気記録媒体用潤滑剤および磁気記録媒体
CN109642022B (zh) 2016-08-25 2022-02-11 大金工业株式会社 含全氟(聚)醚基的醇化合物的分离方法
JP2018076404A (ja) 2016-11-07 2018-05-17 昭和電工株式会社 有機フッ素化合物および潤滑剤
WO2018116742A1 (ja) 2016-12-20 2018-06-28 昭和電工株式会社 含フッ素エーテル化合物、磁気記録媒体用潤滑剤および磁気記録媒体
US11427779B2 (en) 2017-01-26 2022-08-30 Showa Denko K.K. Fluorine-containing ether compound, lubricant for magnetic recording medium, and magnetic recording medium
CN109963894B (zh) * 2017-01-26 2022-05-13 昭和电工株式会社 含氟醚化合物、磁记录介质用润滑剂及磁记录介质
JP6763980B2 (ja) 2017-02-10 2020-09-30 株式会社Moresco フルオロポリエーテル化合物、これを用いた潤滑剤およびその利用
US11661478B2 (en) 2017-03-02 2023-05-30 Showa Denko K.K. Magnetic recording medium, fluorine-containing ether compound and lubricant for magnetic recording medium
JP7033949B2 (ja) * 2017-04-04 2022-03-11 デクセリアルズ株式会社 イオン液体、磁気記録媒体用潤滑剤、及び磁気記録媒体
CN110997625B (zh) * 2017-08-21 2023-03-31 昭和电工株式会社 含氟醚化合物、磁记录介质用润滑剂及磁记录介质
US11639330B2 (en) 2017-08-21 2023-05-02 Showa Denko K.K. Fluorine-containing ether compound, lubricant for magnetic recording medium, and magnetic recording medium
WO2019049585A1 (ja) 2017-09-07 2019-03-14 昭和電工株式会社 含フッ素エーテル化合物、磁気記録媒体用潤滑剤および磁気記録媒体
CN111278797B (zh) * 2017-09-13 2023-06-16 株式会社力森诺科 含氟醚化合物、磁记录介质用润滑剂及磁记录介质
JP7177782B2 (ja) 2017-10-31 2022-11-24 昭和電工株式会社 含フッ素エーテル化合物、磁気記録媒体用潤滑剤および磁気記録媒体
JP7435589B2 (ja) 2019-03-12 2024-02-21 株式会社レゾナック 含フッ素エーテル化合物、磁気記録媒体用潤滑剤および磁気記録媒体
CN114341094B (zh) * 2019-09-18 2024-01-12 株式会社力森诺科 含氟醚化合物、磁记录介质用润滑剂及磁记录介质
CN114599631B (zh) 2019-11-07 2024-01-12 株式会社力森诺科 含氟醚化合物、磁记录介质用润滑剂及磁记录介质
US11905365B2 (en) 2019-12-26 2024-02-20 Resonac Corporation Fluorine-containing ether compound, lubricant for magnetic recording medium, and magnetic recording medium

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