JPWO2014054590A1 - ローラコンベア及び板状体の検査装置、並びにガラス板の製造装置 - Google Patents

ローラコンベア及び板状体の検査装置、並びにガラス板の製造装置 Download PDF

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Publication number
JPWO2014054590A1
JPWO2014054590A1 JP2014539735A JP2014539735A JPWO2014054590A1 JP WO2014054590 A1 JPWO2014054590 A1 JP WO2014054590A1 JP 2014539735 A JP2014539735 A JP 2014539735A JP 2014539735 A JP2014539735 A JP 2014539735A JP WO2014054590 A1 JPWO2014054590 A1 JP WO2014054590A1
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JP
Japan
Prior art keywords
glass plate
flow path
liquid
cleaning
plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2014539735A
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English (en)
Japanese (ja)
Inventor
一朗 中山
一朗 中山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AGC Inc
Original Assignee
Asahi Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Co Ltd filed Critical Asahi Glass Co Ltd
Publication of JPWO2014054590A1 publication Critical patent/JPWO2014054590A1/ja
Withdrawn legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/67706—Mechanical details, e.g. roller, belt
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B1/00—Cleaning by methods involving the use of tools
    • B08B1/20—Cleaning of moving articles, e.g. of moving webs or of objects on a conveyor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02—Cleaning by the force of jets or sprays
    • B08B3/024—Cleaning by means of spray elements moving over the surface to be cleaned
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B9/00—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor
    • B24B9/02—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground
    • B24B9/06—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain
    • B24B9/08—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain of glass
    • B24B9/10—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain of glass of plate glass
    • B24B9/102—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain of glass of plate glass for travelling sheets
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C33/00—Parts of bearings; Special methods for making bearings or parts thereof
    • F16C33/30—Parts of ball or roller bearings
    • F16C33/58—Raceways; Race rings
    • F16C33/62—Selection of substances
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C33/00—Parts of bearings; Special methods for making bearings or parts thereof
    • F16C33/30—Parts of ball or roller bearings
    • F16C33/66—Special parts or details in view of lubrication
    • F16C33/6637—Special parts or details in view of lubrication with liquid lubricant
    • F16C33/6659—Details of supply of the liquid to the bearing, e.g. passages or nozzles
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/6776—Continuous loading and unloading into and out of a processing chamber, e.g. transporting belts within processing chambers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G49/00—Conveying systems characterised by their application for specified purposes not otherwise provided for
    • B65G49/05—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
    • B65G49/06—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
    • B65G49/063—Transporting devices for sheet glass
    • B65G49/064—Transporting devices for sheet glass in a horizontal position

Landscapes

  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Rollers For Roller Conveyors For Transfer (AREA)
JP2014539735A 2012-10-05 2013-09-30 ローラコンベア及び板状体の検査装置、並びにガラス板の製造装置 Withdrawn JPWO2014054590A1 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2012222761 2012-10-05
JP2012222761 2012-10-05
PCT/JP2013/076582 WO2014054590A1 (ja) 2012-10-05 2013-09-30 ローラコンベア及び板状体の検査装置、並びにガラス板の製造装置

Publications (1)

Publication Number Publication Date
JPWO2014054590A1 true JPWO2014054590A1 (ja) 2016-08-25

Family

ID=50434917

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2014539735A Withdrawn JPWO2014054590A1 (ja) 2012-10-05 2013-09-30 ローラコンベア及び板状体の検査装置、並びにガラス板の製造装置

Country Status (5)

Country Link
JP (1) JPWO2014054590A1 (zh)
KR (1) KR20150066530A (zh)
CN (2) CN104703898A (zh)
TW (1) TW201420525A (zh)
WO (1) WO2014054590A1 (zh)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN203994992U (zh) * 2014-05-16 2014-12-10 日东电工株式会社 玻璃基板搬送装置
CN106458459A (zh) * 2014-05-21 2017-02-22 夏普株式会社 搬运装置和湿式处理装置
JPWO2017086257A1 (ja) * 2015-11-17 2018-08-30 Ａｇｃ株式会社 薄板状体の搬送方法、装置、及びガラス薄板状体製品の製造方法
CN105905563B (zh) * 2016-06-20 2018-10-12 昆山国显光电有限公司 辊子擦拭装置
WO2019070654A2 (en) * 2017-10-06 2019-04-11 Corning Incorporated APPARATUS AND METHOD FOR PROCESSING GLASS SHEET
FR3075375A1 (fr) * 2017-12-19 2019-06-21 Saint-Gobain Glass France Systeme d’inspection a nettoyage ameliore
CN108589022B (zh) * 2018-07-02 2023-12-05 海安国洋机械科技有限公司 金属纤维拉断喷射装置
JP2020040757A (ja) * 2018-09-07 2020-03-19 日本電気硝子株式会社 ガラス板の製造装置、及びガラス板の製造方法
BR112021006936A2 (pt) * 2018-10-12 2021-07-20 Saint-Gobain Glass France esteira rolante para chapas de vidro
KR102111370B1 (ko) * 2018-10-22 2020-05-15 주식회사 모션퀘스트 글라스 이송 장치용 롤러
KR102008142B1 (ko) * 2019-03-04 2019-08-08 (주)엠에스솔루션 기판 이송 장치의 원터치 캡 결합형 베어링 홀더
DE102019210063B4 (de) * 2019-07-09 2021-05-20 NICE Solar Energy GmbH Substratfördereinrichtung, Vakuumbehandlungsvorrichtung mit einer Substratfördereinrichtung und Verfahren zum Fördern eines Substrats
JP2023165241A (ja) * 2022-05-02 2023-11-15 日本電気硝子株式会社 ガラス製品の製造方法及び製造装置

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03283487A (ja) * 1990-03-30 1991-12-13 Shibaura Eng Works Co Ltd 基板搬送装置の発塵防止装置
JPH06156678A (ja) * 1992-11-21 1994-06-03 Dainippon Screen Mfg Co Ltd 基板搬送装置の発塵防止装置
JPH11230178A (ja) * 1998-02-17 1999-08-27 Nippon Seiko Kk 円筒ころ軸受装置
JP2002347928A (ja) * 2001-05-23 2002-12-04 Sumitomo Precision Prod Co Ltd 基板処理装置
JP2008082547A (ja) * 2006-08-28 2008-04-10 Ntn Corp 転がり軸受の潤滑方法
JP2009519881A (ja) * 2005-12-16 2009-05-21 コーニング インコーポレイテッド ガラスシートを仕上げる方法および装置

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN2172270Y (zh) * 1993-06-23 1994-07-20 张世昭 带式输送机用脲醛塑料托辊
JP3364016B2 (ja) * 1994-08-19 2003-01-08 三菱重工業株式会社 冷凍機用スクロール型圧縮機
JPH0864564A (ja) * 1994-08-22 1996-03-08 Dainippon Screen Mfg Co Ltd 基板処理装置
JPH11108066A (ja) * 1997-10-01 1999-04-20 Nippon Seiko Kk 循環給油軸受装置
JP2001341827A (ja) * 2000-05-31 2001-12-11 Canon Inc 枚葉式洗浄機および枚葉式洗浄機に用いられるローラーコンベア用の中間軸受け
JP2003314544A (ja) * 2002-04-18 2003-11-06 Hitachi Ltd 磁気ディスク装置
JP4562424B2 (ja) * 2004-05-25 2010-10-13 三機工業株式会社 ホイールコンベヤ
JP2006214461A (ja) * 2005-02-01 2006-08-17 Maruyasu Kikai Kk 軸受装置及びそれを用いたローラコンベヤ
JP2009083699A (ja) * 2007-10-01 2009-04-23 Jtekt Corp 車輪支持装置
CN101381195A (zh) * 2008-08-05 2009-03-11 河南安飞电子玻璃有限公司 玻璃板生产中熔融玻璃流量控制装置及控制方法
JP5444667B2 (ja) * 2008-09-08 2014-03-19 日本電気硝子株式会社 ガラス板付着液体除去装置及びガラス板付着液体除去方法
JP5428811B2 (ja) * 2009-12-04 2014-02-26 凸版印刷株式会社 基板乾燥方法、基板乾燥装置、基板の製造方法、及びフラットパネルディスプレイ
CN202030662U (zh) * 2011-03-15 2011-11-09 山东寿光第一建筑有限公司 一种立式中空玻璃加工装置

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03283487A (ja) * 1990-03-30 1991-12-13 Shibaura Eng Works Co Ltd 基板搬送装置の発塵防止装置
JPH06156678A (ja) * 1992-11-21 1994-06-03 Dainippon Screen Mfg Co Ltd 基板搬送装置の発塵防止装置
JPH11230178A (ja) * 1998-02-17 1999-08-27 Nippon Seiko Kk 円筒ころ軸受装置
JP2002347928A (ja) * 2001-05-23 2002-12-04 Sumitomo Precision Prod Co Ltd 基板処理装置
JP2009519881A (ja) * 2005-12-16 2009-05-21 コーニング インコーポレイテッド ガラスシートを仕上げる方法および装置
JP2008082547A (ja) * 2006-08-28 2008-04-10 Ntn Corp 転がり軸受の潤滑方法

Also Published As

Publication number Publication date
KR20150066530A (ko) 2015-06-16
WO2014054590A1 (ja) 2014-04-10
CN106271957A (zh) 2017-01-04
TW201420525A (zh) 2014-06-01
CN104703898A (zh) 2015-06-10

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