JPWO2010067865A1 - 半導体セラミック及び正特性サーミスタ - Google Patents
半導体セラミック及び正特性サーミスタ Download PDFInfo
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- JPWO2010067865A1 JPWO2010067865A1 JP2010542134A JP2010542134A JPWO2010067865A1 JP WO2010067865 A1 JPWO2010067865 A1 JP WO2010067865A1 JP 2010542134 A JP2010542134 A JP 2010542134A JP 2010542134 A JP2010542134 A JP 2010542134A JP WO2010067865 A1 JPWO2010067865 A1 JP WO2010067865A1
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- semiconductor ceramic
- molar ratio
- alkali metal
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- metal element
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 35
- 239000000919 ceramic Substances 0.000 title claims abstract description 33
- 239000000203 mixture Substances 0.000 claims abstract description 22
- 229910052783 alkali metal Inorganic materials 0.000 claims abstract description 19
- 150000001340 alkali metals Chemical class 0.000 claims abstract description 15
- 229910052712 strontium Inorganic materials 0.000 claims abstract description 13
- 229910052761 rare earth metal Inorganic materials 0.000 claims abstract description 12
- 229910052708 sodium Inorganic materials 0.000 claims description 5
- 229910052700 potassium Inorganic materials 0.000 claims description 4
- 238000002845 discoloration Methods 0.000 abstract description 13
- 230000006866 deterioration Effects 0.000 abstract description 3
- 229910002113 barium titanate Inorganic materials 0.000 abstract description 2
- 230000032683 aging Effects 0.000 abstract 1
- 150000002910 rare earth metals Chemical class 0.000 abstract 1
- 239000000843 powder Substances 0.000 description 9
- 239000002994 raw material Substances 0.000 description 8
- 239000011572 manganese Substances 0.000 description 6
- 150000001875 compounds Chemical class 0.000 description 5
- 238000010304 firing Methods 0.000 description 5
- 229910002077 partially stabilized zirconia Inorganic materials 0.000 description 5
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- 239000011230 binding agent Substances 0.000 description 4
- 239000013078 crystal Substances 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 239000011812 mixed powder Substances 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- 239000012298 atmosphere Substances 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- MIVBAHRSNUNMPP-UHFFFAOYSA-N manganese(2+);dinitrate Chemical compound [Mn+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O MIVBAHRSNUNMPP-UHFFFAOYSA-N 0.000 description 3
- 239000012299 nitrogen atmosphere Substances 0.000 description 3
- 239000002002 slurry Substances 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 229910052688 Gadolinium Inorganic materials 0.000 description 2
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 2
- 230000001133 acceleration Effects 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000002950 deficient Effects 0.000 description 2
- 239000002270 dispersing agent Substances 0.000 description 2
- 238000000227 grinding Methods 0.000 description 2
- AMWRITDGCCNYAT-UHFFFAOYSA-L hydroxy(oxo)manganese;manganese Chemical compound [Mn].O[Mn]=O.O[Mn]=O AMWRITDGCCNYAT-UHFFFAOYSA-L 0.000 description 2
- 239000010410 layer Substances 0.000 description 2
- 229910052744 lithium Inorganic materials 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 238000010298 pulverizing process Methods 0.000 description 2
- 238000001878 scanning electron micrograph Methods 0.000 description 2
- 239000006104 solid solution Substances 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- AREPHAPHABGCQP-UHFFFAOYSA-N 1-(dimethylamino)-3-[2-[2-(4-methoxyphenyl)ethyl]phenoxy]propan-2-ol Chemical compound C1=CC(OC)=CC=C1CCC1=CC=CC=C1OCC(O)CN(C)C AREPHAPHABGCQP-UHFFFAOYSA-N 0.000 description 1
- 229910015902 Bi 2 O 3 Inorganic materials 0.000 description 1
- 229910052692 Dysprosium Inorganic materials 0.000 description 1
- 229910052693 Europium Inorganic materials 0.000 description 1
- 229910052779 Neodymium Inorganic materials 0.000 description 1
- 229910018054 Ni-Cu Inorganic materials 0.000 description 1
- 229910003322 NiCu Inorganic materials 0.000 description 1
- 229910018487 Ni—Cr Inorganic materials 0.000 description 1
- 229910018481 Ni—Cu Inorganic materials 0.000 description 1
- 229910052772 Samarium Inorganic materials 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- 229910001413 alkali metal ion Inorganic materials 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- JRPBQTZRNDNNOP-UHFFFAOYSA-N barium titanate Chemical compound [Ba+2].[Ba+2].[O-][Ti]([O-])([O-])[O-] JRPBQTZRNDNNOP-UHFFFAOYSA-N 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- 238000001354 calcination Methods 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- VNNRSPGTAMTISX-UHFFFAOYSA-N chromium nickel Chemical compound [Cr].[Ni] VNNRSPGTAMTISX-UHFFFAOYSA-N 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- RKTYLMNFRDHKIL-UHFFFAOYSA-N copper;5,10,15,20-tetraphenylporphyrin-22,24-diide Chemical compound [Cu+2].C1=CC(C(=C2C=CC([N-]2)=C(C=2C=CC=CC=2)C=2C=CC(N=2)=C(C=2C=CC=CC=2)C2=CC=C3[N-]2)C=2C=CC=CC=2)=NC1=C3C1=CC=CC=C1 RKTYLMNFRDHKIL-UHFFFAOYSA-N 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010828 elution Methods 0.000 description 1
- 230000014509 gene expression Effects 0.000 description 1
- 239000000383 hazardous chemical Substances 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 150000002697 manganese compounds Chemical class 0.000 description 1
- 229910001120 nichrome Inorganic materials 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229910052573 porcelain Inorganic materials 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 238000004513 sizing Methods 0.000 description 1
- 229910001415 sodium ion Inorganic materials 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
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Abstract
Description
ここで、M1は、Li、Na、Kに代表されるアルカリ金属元素を示している。また、Lnは半導体化剤となる希土類元素を示している。この希土類元素Lnとしては、半導体化剤としての作用を奏するものであれば、特に限定されるものではないが、Y、Sm、Nd、Dy、及びGdの群から選択された1種以上を好んで使用することができる。
0.02≦y≦0.12…(2)
2x+5y≦0.7 …(3)
すなわち、本実施の形態の組成範囲は、図1の斜線部で規定される。
ただし、nは、0.0001≦n≦0.0020である。
したがって、温度Tと電気抵抗率ρとの特性(以下、「ρ−T特性」という。)を測定し、その極大値と極小値とからPTC桁数を求めた。
2a、2b 外部電極
Claims (4)
- 実質的に鉛を含まない非鉛系の半導体セラミックであって、
一般式AmBO3で表されるペロブスカイト型構造を有するBaTiO3系組成物を主成分とし、
Aサイトを構成するBaの一部が、アルカリ金属元素、Bi、Ca、Sr及び希土類元素で置換されると共に、
前記Aサイトを構成する元素の総モル数を1モルとしたときの前記Ca及びSrの含有量は、前記Caのモル比をx、前記Srのモル比をyとした場合に、0.05≦x≦0.20、0.02≦y≦0.12、及び2x+5y≦0.7を満足することを特徴とする半導体セラミック。 - 前記Caの含有量は、前記モル比xが、0.125≦x≦0.175であることを特徴とする請求項1記載の半導体セラミック。
- 前記アルカリ金属元素は、Na及びKのうちの少なくとも1種であることを特徴とする請求項1又は請求項2記載の半導体セラミック。
- 部品素体の両端部に外部電極が形成された正特性サーミスタにおいて、
前記部品素体が、請求項1乃至請求項3のいずれかに記載の半導体セラミックで形成されていることを特徴とする正特性サーミスタ。
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DE112011103112T5 (de) * | 2010-09-17 | 2013-06-27 | Murata Mfg. Co., Ltd. | Thermistor mit positivem Temperaturkoeffizienten und Verfahren zur Herstellung eines Thermistors mit positivem Temperaturkoeffizienten |
CN103403814B (zh) * | 2011-02-24 | 2016-08-10 | 株式会社村田制作所 | 正特性热敏电阻元件 |
CN103459350B (zh) * | 2011-03-30 | 2016-01-06 | 株式会社村田制作所 | 半导体陶瓷及正温度系数热敏电阻 |
DE112014001227B4 (de) * | 2013-03-11 | 2019-10-10 | Tdk Corporation | PTC-Thermistorkeramikzusammensetzung und PTC-Thermistorelement |
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JP6447841B2 (ja) * | 2014-11-26 | 2019-01-09 | 株式会社村田製作所 | チタン酸バリウム系半導体セラミック、チタン酸バリウム系半導体セラミック組成物および温度検知用正特性サーミスタ |
JP2017143090A (ja) * | 2016-02-08 | 2017-08-17 | Tdk株式会社 | 半導体磁器組成物およびptcサーミスタ |
CN111971759B (zh) | 2018-04-17 | 2023-05-02 | 京瓷Avx元器件公司 | 用于高温应用的变阻器 |
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