JP5327556B2 - 半導体セラミック及び正特性サーミスタ - Google Patents
半導体セラミック及び正特性サーミスタ Download PDFInfo
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- JP5327556B2 JP5327556B2 JP2010542137A JP2010542137A JP5327556B2 JP 5327556 B2 JP5327556 B2 JP 5327556B2 JP 2010542137 A JP2010542137 A JP 2010542137A JP 2010542137 A JP2010542137 A JP 2010542137A JP 5327556 B2 JP5327556 B2 JP 5327556B2
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 41
- 239000000919 ceramic Substances 0.000 title claims abstract description 39
- 229910052761 rare earth metal Inorganic materials 0.000 claims abstract description 48
- 239000000203 mixture Substances 0.000 claims abstract description 42
- 229910052791 calcium Inorganic materials 0.000 claims abstract description 6
- 229910052692 Dysprosium Inorganic materials 0.000 claims description 8
- 229910052691 Erbium Inorganic materials 0.000 claims description 8
- 229910052689 Holmium Inorganic materials 0.000 claims description 8
- 229910052727 yttrium Inorganic materials 0.000 claims description 8
- 229910052783 alkali metal Inorganic materials 0.000 abstract description 3
- 150000001340 alkali metals Chemical class 0.000 abstract description 3
- 230000008859 change Effects 0.000 description 51
- 239000011734 sodium Substances 0.000 description 51
- 238000000034 method Methods 0.000 description 30
- 239000002994 raw material Substances 0.000 description 24
- 239000012298 atmosphere Substances 0.000 description 21
- 150000002500 ions Chemical class 0.000 description 19
- 239000013078 crystal Substances 0.000 description 16
- 238000005259 measurement Methods 0.000 description 15
- 229910001415 sodium ion Inorganic materials 0.000 description 15
- 239000012299 nitrogen atmosphere Substances 0.000 description 12
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 11
- 239000011812 mixed powder Substances 0.000 description 11
- 229910052760 oxygen Inorganic materials 0.000 description 11
- 239000001301 oxygen Substances 0.000 description 11
- 229910015902 Bi 2 O 3 Inorganic materials 0.000 description 10
- 229910052708 sodium Inorganic materials 0.000 description 10
- 229910010413 TiO 2 Inorganic materials 0.000 description 9
- 230000002950 deficient Effects 0.000 description 9
- 239000000843 powder Substances 0.000 description 9
- 239000000047 product Substances 0.000 description 9
- 238000005245 sintering Methods 0.000 description 9
- 238000010304 firing Methods 0.000 description 8
- 229910001422 barium ion Inorganic materials 0.000 description 7
- 229910052797 bismuth Inorganic materials 0.000 description 6
- 150000001875 compounds Chemical class 0.000 description 6
- 239000011572 manganese Substances 0.000 description 6
- 239000003795 chemical substances by application Substances 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 229910002077 partially stabilized zirconia Inorganic materials 0.000 description 5
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- 239000011230 binding agent Substances 0.000 description 4
- 239000002244 precipitate Substances 0.000 description 4
- 238000001556 precipitation Methods 0.000 description 4
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- MIVBAHRSNUNMPP-UHFFFAOYSA-N manganese(2+);dinitrate Chemical compound [Mn+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O MIVBAHRSNUNMPP-UHFFFAOYSA-N 0.000 description 3
- 238000010298 pulverizing process Methods 0.000 description 3
- 239000002002 slurry Substances 0.000 description 3
- 239000006104 solid solution Substances 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- 229910021193 La 2 O 3 Inorganic materials 0.000 description 2
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 2
- 230000009471 action Effects 0.000 description 2
- 238000001354 calcination Methods 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000002270 dispersing agent Substances 0.000 description 2
- 238000000227 grinding Methods 0.000 description 2
- AMWRITDGCCNYAT-UHFFFAOYSA-L hydroxy(oxo)manganese;manganese Chemical compound [Mn].O[Mn]=O.O[Mn]=O AMWRITDGCCNYAT-UHFFFAOYSA-L 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 229910052693 Europium Inorganic materials 0.000 description 1
- 229910052688 Gadolinium Inorganic materials 0.000 description 1
- 229910018054 Ni-Cu Inorganic materials 0.000 description 1
- 229910003322 NiCu Inorganic materials 0.000 description 1
- 229910018487 Ni—Cr Inorganic materials 0.000 description 1
- 229910018481 Ni—Cu Inorganic materials 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- JRPBQTZRNDNNOP-UHFFFAOYSA-N barium titanate Chemical compound [Ba+2].[Ba+2].[O-][Ti]([O-])([O-])[O-] JRPBQTZRNDNNOP-UHFFFAOYSA-N 0.000 description 1
- 229910002113 barium titanate Inorganic materials 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 229910001424 calcium ion Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- VNNRSPGTAMTISX-UHFFFAOYSA-N chromium nickel Chemical compound [Cr].[Ni] VNNRSPGTAMTISX-UHFFFAOYSA-N 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- RKTYLMNFRDHKIL-UHFFFAOYSA-N copper;5,10,15,20-tetraphenylporphyrin-22,24-diide Chemical compound [Cu+2].C1=CC(C(=C2C=CC([N-]2)=C(C=2C=CC=CC=2)C=2C=CC(N=2)=C(C=2C=CC=CC=2)C2=CC=C3[N-]2)C=2C=CC=CC=2)=NC1=C3C1=CC=CC=C1 RKTYLMNFRDHKIL-UHFFFAOYSA-N 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 230000014509 gene expression Effects 0.000 description 1
- 239000000383 hazardous chemical Substances 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 150000002697 manganese compounds Chemical class 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 229910001120 nichrome Inorganic materials 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229910052573 porcelain Inorganic materials 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000004513 sizing Methods 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- -1 specifically Inorganic materials 0.000 description 1
- 230000002269 spontaneous effect Effects 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
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- H01C7/02—Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material having positive temperature coefficient
- H01C7/022—Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material having positive temperature coefficient mainly consisting of non-metallic substances
- H01C7/023—Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material having positive temperature coefficient mainly consisting of non-metallic substances containing oxides or oxidic compounds, e.g. ferrites
- H01C7/025—Perovskites, e.g. titanates
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- C04B35/465—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on titanium oxides or titanates based on titanates based on alkaline earth metal titanates
- C04B35/468—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on titanium oxides or titanates based on titanates based on alkaline earth metal titanates based on barium titanates
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Description
ここで、Lnは半導体化剤となるべき希土類元素を示し、本実施の形態ではイオン半径がNaよりも小さい希土類元素が使用される。
0.0005≦z≦0.015…(2)
次に、モル比y及びモル比zを数式(1)、(2)に設定した理由を述べる。
Caは、上述したようにBaよりもイオン半径が小さく、Naよりもイオン半径の小さい希土類元素Lnの作用と相俟って結晶格子を小さくする作用を奏する。そしてこれにより、NaイオンはAサイトに固溶され易くなり、結晶粒界への析出が抑制されるため、信頼性向上に寄与する。
希土類元素Lnは半導体化剤としての作用を有すると共に、上述したようにNaよりもイオン半径の小さい希土類元素Lnを使用することにより、高湿度雰囲気での信頼性を確保することができる。
ただし、nは0.0001≦n≦0.0020である。
したがって、温度Tと電気抵抗率ρとの特性(以下、「ρ−T特性」という。)を測定し、その極大値と極小値とからPTC桁数ΔRを求めた。
尚、〔実施例1〕と同様、抵抗変化率Δρ/ρ0が30%以下を良品と判断した。
尚、〔実施例1〕と同様、抵抗変化率Δρ/ρ0が30%以下を良品と判断した。
尚、〔実施例1〕と同様、抵抗変化率Δρ/ρ0が30%以下を良品と判断した。
尚、〔実施例1〕と同様、抵抗変化率Δρ/ρ0が30%以下を良品と判断した。
尚、〔実施例1〕と同様、抵抗変化率Δρ/ρ0が30%以下を良品と判断した。
尚、〔実施例1〕と同様、抵抗変化率Δρ/ρ0が30%以下を良品と判断した。
2a、2b 外部電極
Claims (4)
- 実質的にPbを含まない非鉛系の半導体セラミックであって、
一般式AmBO3で表されるペロブスカイト型構造を有するBamTiO3系組成物を主成分とし、
Aサイトを構成するBaの一部が、Na、Bi、Ca、及び前記Naよりもイオン半径の小さい希土類元素で置換されると共に、
前記Aサイトを構成する元素の総モル数を1モルとしたときの前記希土類元素の含有量が、モル比換算で0.0005〜0.015であり、
かつ、前記Aサイトを構成する元素の総モル数を1モルとしたときの前記Caの含有量が、モル比換算で0.05〜0.20であり、
前記Aサイトを構成する元素の総モル数を1モルとしたときの前記Naと前記Biの含有量の合計が、モル比換算で0.02〜0.20であることを特徴とする半導体セラミック。 - 前記Caの含有量は、モル比換算で0.125〜0.175であることを特徴とする請求項1記載の半導体セラミック。
- 前記希土類元素は、Dy、Y、Ho、Erの群から選択された1種以上であることを特徴とする請求項1又は請求項2記載の半導体セラミック。
- 部品素体の表面に一対の外部電極が形成された正特性サーミスタにおいて、
前記部品素体が、請求項1乃至請求項3のいずれかに記載の半導体セラミックで形成されていることを特徴とする正特性サーミスタ。
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Application Number | Priority Date | Filing Date | Title |
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JP2010542137A JP5327556B2 (ja) | 2008-12-12 | 2009-12-11 | 半導体セラミック及び正特性サーミスタ |
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JP2008317476 | 2008-12-12 | ||
JP2008317476 | 2008-12-12 | ||
PCT/JP2009/070760 WO2010067868A1 (ja) | 2008-12-12 | 2009-12-11 | 半導体セラミック及び正特性サーミスタ |
JP2010542137A JP5327556B2 (ja) | 2008-12-12 | 2009-12-11 | 半導体セラミック及び正特性サーミスタ |
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EP2377836B1 (en) * | 2008-12-12 | 2018-07-25 | Murata Manufacturing Co., Ltd. | Semiconductor ceramic and positive temperature coefficient thermistor |
DE102009049404B4 (de) | 2009-10-14 | 2022-08-18 | Tdk Electronics Ag | Keramikmaterial, Verfahren zur Herstellung des Keramikmaterials und Widerstandsbauelement umfassend das Keramikmaterial |
JP5765611B2 (ja) * | 2011-02-16 | 2015-08-19 | 日立金属株式会社 | Ptc素子および発熱モジュール |
CN103403814B (zh) * | 2011-02-24 | 2016-08-10 | 株式会社村田制作所 | 正特性热敏电阻元件 |
CN103459350B (zh) * | 2011-03-30 | 2016-01-06 | 株式会社村田制作所 | 半导体陶瓷及正温度系数热敏电阻 |
WO2014017365A1 (ja) * | 2012-07-25 | 2014-01-30 | 株式会社村田製作所 | 積層型ptcサーミスタ素子 |
JP2014123604A (ja) * | 2012-12-20 | 2014-07-03 | Hitachi Metals Ltd | Ptc素子及び発熱モジュール |
JP6337689B2 (ja) * | 2013-10-03 | 2018-06-06 | Tdk株式会社 | 半導体磁器組成物およびptcサーミスタ |
JP2017034140A (ja) * | 2015-08-04 | 2017-02-09 | Tdk株式会社 | 半導体磁器組成物およびptcサーミスタ |
KR102116675B1 (ko) * | 2015-12-04 | 2020-05-29 | 가부시키가이샤 무라타 세이사쿠쇼 | 유전체 자기 조성물, 적층 세라믹 콘덴서 및 적층 세라믹 콘덴서의 제조 방법 |
JP6593781B2 (ja) * | 2015-12-18 | 2019-10-23 | 株式会社村田製作所 | 誘電体磁器組成物、誘電体磁器組成物の製造方法、及び積層型セラミック電子部品 |
KR102166127B1 (ko) | 2015-12-28 | 2020-10-15 | 삼성전기주식회사 | 유전체 조성물 및 이를 포함하는 적층 세라믹 커패시터 |
WO2019204430A1 (en) | 2018-04-17 | 2019-10-24 | Avx Corporation | Varistor for high temperature applications |
DE112019002421B4 (de) * | 2018-07-05 | 2023-12-07 | Murata Manufacturing Co., Ltd. | Keramikbauglied und elektronikvorrichtung |
CN110066172B (zh) * | 2019-05-31 | 2021-09-03 | 太原师范学院 | 一种正温度系数陶瓷介质材料及其制备方法 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56169301A (en) * | 1980-06-02 | 1981-12-26 | Tohoku Metal Ind Ltd | Method of producing barium titanate semiconductor porcelain |
WO2008038538A1 (fr) * | 2006-09-28 | 2008-04-03 | Murata Manufacturing Co., Ltd. | Composition de porcelaine semiconductrice de titanate de baryum et dispositif ptc utilisant celle-ci |
CN101284731A (zh) * | 2008-05-21 | 2008-10-15 | 中国科学院上海硅酸盐研究所 | 高使用温度、高稳定无铅正温度系数电阻材料及其制备方法 |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5595673A (en) | 1978-12-27 | 1980-07-21 | Matsushita Electric Ind Co Ltd | Semiconductive ceramic material and production thereof |
JPH05275203A (ja) | 1992-03-25 | 1993-10-22 | Chichibu Cement Co Ltd | 半導体磁器組成物 |
JPH10152372A (ja) | 1996-11-22 | 1998-06-09 | Matsushita Electric Ind Co Ltd | チタン酸バリウム系半導体磁器及びその製造方法 |
JP3506056B2 (ja) * | 1999-08-09 | 2004-03-15 | 株式会社村田製作所 | 正の抵抗温度特性を有する積層型半導体セラミック素子、および正の抵抗温度特性を有する積層型半導体セラミック素子の製造方法 |
US7295421B2 (en) * | 2003-02-21 | 2007-11-13 | Murata Manufacturing Co., Ltd. | Multilayer ceramic electronic components and method for manufacturing the same |
JP4765258B2 (ja) | 2004-03-12 | 2011-09-07 | 日立金属株式会社 | 半導体磁器組成物 |
JP2006179692A (ja) | 2004-12-22 | 2006-07-06 | Komatsu Electronics Inc | サーミスタの製造方法 |
JP4774511B2 (ja) | 2005-06-24 | 2011-09-14 | 国立大学法人 奈良先端科学技術大学院大学 | ジルコニア粉末、および該ジルコニア粉末を用いて得られるチタン酸バリウム系半導体磁器組成物の製造方法 |
IN2015DN01545A (ja) * | 2005-08-11 | 2015-07-03 | Hitachi Metals Ltd | |
JP4710096B2 (ja) * | 2005-09-20 | 2011-06-29 | 株式会社村田製作所 | 積層型正特性サーミスタ |
WO2007034831A1 (ja) * | 2005-09-20 | 2007-03-29 | Murata Manufacturing Co., Ltd. | 積層型正特性サーミスタ |
JP2008063188A (ja) | 2006-09-07 | 2008-03-21 | Furukawa Co Ltd | Ptcサーミスタ用配合材料およびptcサーミスタ用半導体磁器組成物 |
CN101013618A (zh) | 2007-01-16 | 2007-08-08 | 杨敬义 | 无铅高居里点ptc热敏电阻材料 |
WO2008152976A1 (ja) | 2007-06-14 | 2008-12-18 | Murata Manufacturing Co., Ltd. | 半導体セラミック材料 |
CN102245536B (zh) * | 2008-12-12 | 2013-07-31 | 株式会社村田制作所 | 半导体陶瓷以及正特性热敏电阻 |
WO2010067865A1 (ja) * | 2008-12-12 | 2010-06-17 | 株式会社 村田製作所 | 半導体セラミック及び正特性サーミスタ |
-
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Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56169301A (en) * | 1980-06-02 | 1981-12-26 | Tohoku Metal Ind Ltd | Method of producing barium titanate semiconductor porcelain |
WO2008038538A1 (fr) * | 2006-09-28 | 2008-04-03 | Murata Manufacturing Co., Ltd. | Composition de porcelaine semiconductrice de titanate de baryum et dispositif ptc utilisant celle-ci |
CN101284731A (zh) * | 2008-05-21 | 2008-10-15 | 中国科学院上海硅酸盐研究所 | 高使用温度、高稳定无铅正温度系数电阻材料及其制备方法 |
Non-Patent Citations (1)
Title |
---|
JPN6012067532; P. BLANCHART et al.: 'Influence of Calcium Addition on the Microstructure andthe Electrical Properties at Room Temperature' SILICATES INDUSTRIELS VOL.59 (1-2), 1994, PP.47-52 * |
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JPWO2010067868A1 (ja) | 2012-05-24 |
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CN102245537A (zh) | 2011-11-16 |
EP2377837B1 (en) | 2018-08-08 |
US20110234364A1 (en) | 2011-09-29 |
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