JPS6356482B2 - - Google Patents

Info

Publication number
JPS6356482B2
JPS6356482B2 JP57207698A JP20769882A JPS6356482B2 JP S6356482 B2 JPS6356482 B2 JP S6356482B2 JP 57207698 A JP57207698 A JP 57207698A JP 20769882 A JP20769882 A JP 20769882A JP S6356482 B2 JPS6356482 B2 JP S6356482B2
Authority
JP
Japan
Prior art keywords
dimension
pattern
measurement
image data
image
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP57207698A
Other languages
English (en)
Japanese (ja)
Other versions
JPS59112217A (ja
Inventor
Masaaki Kano
Hiroshi Yamaji
Shinji Nakao
Katsuya Okumura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP57207698A priority Critical patent/JPS59112217A/ja
Priority to EP83111669A priority patent/EP0110301B1/en
Priority to DE8383111669T priority patent/DE3380834D1/de
Priority to US06/554,717 priority patent/US4567364A/en
Publication of JPS59112217A publication Critical patent/JPS59112217A/ja
Publication of JPS6356482B2 publication Critical patent/JPS6356482B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B15/00—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B7/00—Measuring arrangements characterised by the use of electric or magnetic techniques
    • G01B7/02—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
JP57207698A 1982-11-29 1982-11-29 寸法測定方法 Granted JPS59112217A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP57207698A JPS59112217A (ja) 1982-11-29 1982-11-29 寸法測定方法
EP83111669A EP0110301B1 (en) 1982-11-29 1983-11-22 Method and apparatus for measuring dimension of secondary electron emission object
DE8383111669T DE3380834D1 (en) 1982-11-29 1983-11-22 Method and apparatus for measuring dimension of secondary electron emission object
US06/554,717 US4567364A (en) 1982-11-29 1983-11-23 Method and apparatus for measuring dimension of secondary electron emission object

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57207698A JPS59112217A (ja) 1982-11-29 1982-11-29 寸法測定方法

Publications (2)

Publication Number Publication Date
JPS59112217A JPS59112217A (ja) 1984-06-28
JPS6356482B2 true JPS6356482B2 (en, 2012) 1988-11-08

Family

ID=16544083

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57207698A Granted JPS59112217A (ja) 1982-11-29 1982-11-29 寸法測定方法

Country Status (4)

Country Link
US (1) US4567364A (en, 2012)
EP (1) EP0110301B1 (en, 2012)
JP (1) JPS59112217A (en, 2012)
DE (1) DE3380834D1 (en, 2012)

Families Citing this family (41)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6179114A (ja) * 1984-09-27 1986-04-22 Toshiba Corp 寸法測定装置
JPS6189508A (ja) * 1984-10-08 1986-05-07 Toshiba Corp 寸法測定装置
JPH0430489Y2 (en, 2012) * 1984-11-26 1992-07-23
JPS61140811A (ja) * 1984-12-14 1986-06-27 Hitachi Ltd 電子ビ−ム測長装置
US4588890A (en) * 1984-12-31 1986-05-13 International Business Machines Corporation Apparatus and method for composite image formation by scanning electron beam
JPS61265517A (ja) * 1985-05-20 1986-11-25 Jeol Ltd 荷電粒子線を用いた測長装置
JPS61265516A (ja) * 1985-05-20 1986-11-25 Jeol Ltd 荷電粒子線を用いた測長装置
DE3621045A1 (de) * 1985-06-24 1987-01-02 Nippon Telegraph & Telephone Strahlerzeugende vorrichtung
JPS6240146A (ja) * 1985-08-14 1987-02-21 Mitsubishi Electric Corp 荷電ビ−ムパタ−ン欠陥検査装置
JPS6275206A (ja) * 1985-09-30 1987-04-07 Hitachi Ltd 電子ビ−ム測長装置
JPS63231856A (ja) * 1987-03-19 1988-09-27 Jeol Ltd 電子顕微鏡等の制御方法
JPS63231205A (ja) * 1987-03-19 1988-09-27 Osaka Daiyamondo Kogyo Kk 輪郭形状の測定方法
JP2791020B2 (ja) * 1987-09-21 1998-08-27 株式会社日立製作所 信号対雑音比改善方法および走査電子顕微鏡
JPH01102841A (ja) * 1987-10-14 1989-04-20 Toshiba Corp 画像形成方法
JPH01311551A (ja) * 1988-06-08 1989-12-15 Toshiba Corp パターン形状測定装置
US5093572A (en) * 1989-11-02 1992-03-03 Mitsubishi Denki Kabushiki Kaisha Scanning electron microscope for observation of cross section and method of observing cross section employing the same
JPH0687003B2 (ja) * 1990-02-09 1994-11-02 株式会社日立製作所 走査型トンネル顕微鏡付き走査型電子顕微鏡
JP2943815B2 (ja) * 1990-04-06 1999-08-30 日本電子株式会社 電子ビーム測長機における測長方式
JP3345060B2 (ja) * 1992-11-09 2002-11-18 日本テキサス・インスツルメンツ株式会社 走査形電子顕微鏡における画像信号処理方法およびその装置
JP2823450B2 (ja) * 1992-11-19 1998-11-11 株式会社東芝 回路パターンの寸法測定方法
JP3184675B2 (ja) * 1993-09-22 2001-07-09 株式会社東芝 微細パターンの測定装置
JP3201926B2 (ja) * 1995-04-10 2001-08-27 株式会社日立製作所 走査電子顕微鏡
AU2579197A (en) * 1997-03-12 1998-09-29 Ilyin, Mikhail Julievich Method for measuring linear dimensions
US6127840A (en) * 1998-03-17 2000-10-03 International Business Machines Corporation Dynamic line termination clamping circuit
US6509890B1 (en) * 1998-03-31 2003-01-21 International Business Machines Corporation Mini-TrackPoint IV pointing device
US6198299B1 (en) 1998-08-27 2001-03-06 The Micromanipulator Company, Inc. High Resolution analytical probe station
US6744268B2 (en) 1998-08-27 2004-06-01 The Micromanipulator Company, Inc. High resolution analytical probe station
US6157032A (en) * 1998-11-04 2000-12-05 Schlumberger Technologies, Inc. Sample shape determination by measurement of surface slope with a scanning electron microscope
US6326618B1 (en) * 1999-07-02 2001-12-04 Agere Systems Guardian Corp. Method of analyzing semiconductor surface with patterned feature using line width metrology
US6538249B1 (en) * 1999-07-09 2003-03-25 Hitachi, Ltd. Image-formation apparatus using charged particle beams under various focus conditions
US6545275B1 (en) * 1999-09-03 2003-04-08 Applied Materials, Inc. Beam evaluation
DE10047211B4 (de) * 2000-09-23 2007-03-22 Leica Microsystems Semiconductor Gmbh Verfahren und Vorrichtung zur Positionsbestimmung einer Kante eines Strukturelementes auf einem Substrat
KR100383258B1 (ko) * 2000-11-09 2003-05-09 삼성전자주식회사 주사 전자 현미경을 이용한 측정 장치의 측정 에러 검출방법
US6909930B2 (en) * 2001-07-19 2005-06-21 Hitachi, Ltd. Method and system for monitoring a semiconductor device manufacturing process
DE10250893B4 (de) * 2002-10-31 2008-04-03 Advanced Micro Devices, Inc., Sunnyvale Verfahren und Vorrichtung zum Bestimmen der Abmessung eines Strukturelements durch Variieren eines die Auflösung bestimmenden Parameters
WO2004068414A1 (ja) * 2003-01-27 2004-08-12 Fujitsu Limited 注目物体の出現位置表示装置
KR100567622B1 (ko) * 2003-12-29 2006-04-04 삼성전자주식회사 반도체 소자의 패턴 선폭 측정 방법 및 장치
US20080175518A1 (en) * 2007-01-22 2008-07-24 Carl Picciotto Alignment system and method for overlapping substrates
JP5361137B2 (ja) * 2007-02-28 2013-12-04 株式会社日立ハイテクノロジーズ 荷電粒子ビーム測長装置
JP4950716B2 (ja) 2007-03-22 2012-06-13 株式会社日立ハイテクノロジーズ 画像処理システム、及び走査型電子顕微鏡装置
JP6029293B2 (ja) * 2012-03-07 2016-11-24 株式会社日立ハイテクノロジーズ 走査型電子顕微鏡の画像処理装置、および、走査方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51134558A (en) * 1975-05-19 1976-11-22 Hitachi Ltd Measuring unit
DD124091A1 (en, 2012) * 1975-09-24 1977-02-02
JPS5478166A (en) * 1977-12-05 1979-06-22 Hitachi Ltd Method and apparatus for measuring length of electron microscopes
JPS54141665A (en) * 1978-04-26 1979-11-05 Mitsubishi Electric Corp Pattern measuring apparatus
DE2937741C2 (de) * 1979-09-18 1987-03-12 Siemens AG, 1000 Berlin und 8000 München Verfahren und Vorrichtung zur opto-elektronischen Vermessung von Mikrostrukturen, insbesondere auf Masken und Scheiben der Halbleitertechnik
JPS59761B2 (ja) * 1979-10-25 1984-01-09 日本電子株式会社 走査電子顕微鏡における距離測定装置
JPS56105633A (en) * 1980-01-28 1981-08-22 Hitachi Ltd Inspection device of mask for electron beam

Also Published As

Publication number Publication date
EP0110301A3 (en) 1986-06-11
DE3380834D1 (en) 1989-12-14
US4567364A (en) 1986-01-28
EP0110301A2 (en) 1984-06-13
JPS59112217A (ja) 1984-06-28
EP0110301B1 (en) 1989-11-08

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