JPS6133904B2 - - Google Patents
Info
- Publication number
- JPS6133904B2 JPS6133904B2 JP55015613A JP1561380A JPS6133904B2 JP S6133904 B2 JPS6133904 B2 JP S6133904B2 JP 55015613 A JP55015613 A JP 55015613A JP 1561380 A JP1561380 A JP 1561380A JP S6133904 B2 JPS6133904 B2 JP S6133904B2
- Authority
- JP
- Japan
- Prior art keywords
- gas
- diluted
- nozzle
- layer
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000007789 gas Substances 0.000 claims description 95
- 229910006404 SnO 2 Inorganic materials 0.000 claims description 63
- 238000000034 method Methods 0.000 claims description 42
- 239000000758 substrate Substances 0.000 claims description 39
- 238000006243 chemical reaction Methods 0.000 claims description 38
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 claims description 33
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 32
- 239000012159 carrier gas Substances 0.000 claims description 24
- 239000000376 reactant Substances 0.000 claims description 24
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 23
- 229910052739 hydrogen Inorganic materials 0.000 claims description 21
- 239000001257 hydrogen Substances 0.000 claims description 19
- 229910052757 nitrogen Inorganic materials 0.000 claims description 16
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 15
- 239000012495 reaction gas Substances 0.000 claims description 13
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 11
- 229910052731 fluorine Inorganic materials 0.000 claims description 11
- 239000011737 fluorine Substances 0.000 claims description 11
- 239000000203 mixture Substances 0.000 claims description 10
- 238000000151 deposition Methods 0.000 claims description 9
- 229910052787 antimony Inorganic materials 0.000 claims description 7
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 claims description 7
- HPGGPRDJHPYFRM-UHFFFAOYSA-J tin(iv) chloride Chemical compound Cl[Sn](Cl)(Cl)Cl HPGGPRDJHPYFRM-UHFFFAOYSA-J 0.000 claims description 7
- 229910052751 metal Inorganic materials 0.000 claims description 6
- 239000002184 metal Substances 0.000 claims description 6
- 238000009826 distribution Methods 0.000 claims description 5
- 239000011343 solid material Substances 0.000 claims description 5
- 229910010413 TiO 2 Inorganic materials 0.000 claims description 4
- 150000002431 hydrogen Chemical class 0.000 claims description 4
- 229910045601 alloy Inorganic materials 0.000 claims description 3
- 239000000956 alloy Substances 0.000 claims description 3
- 150000002739 metals Chemical class 0.000 claims description 3
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 claims description 3
- 229910003074 TiCl4 Inorganic materials 0.000 claims description 2
- 238000007599 discharging Methods 0.000 claims description 2
- 229910044991 metal oxide Inorganic materials 0.000 claims description 2
- 150000004706 metal oxides Chemical class 0.000 claims description 2
- 239000003795 chemical substances by application Substances 0.000 claims 13
- 229910021627 Tin(IV) chloride Inorganic materials 0.000 claims 1
- 230000002040 relaxant effect Effects 0.000 claims 1
- 239000011521 glass Substances 0.000 description 81
- 239000010410 layer Substances 0.000 description 66
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 16
- 239000011247 coating layer Substances 0.000 description 11
- 239000007788 liquid Substances 0.000 description 10
- 239000011248 coating agent Substances 0.000 description 8
- 238000000576 coating method Methods 0.000 description 8
- 238000005229 chemical vapour deposition Methods 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 6
- 229910001887 tin oxide Inorganic materials 0.000 description 6
- 239000002253 acid Substances 0.000 description 5
- 239000003638 chemical reducing agent Substances 0.000 description 4
- 239000003921 oil Substances 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 4
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 3
- 150000007513 acids Chemical class 0.000 description 3
- 229910003460 diamond Inorganic materials 0.000 description 3
- 239000010432 diamond Substances 0.000 description 3
- 229910052709 silver Inorganic materials 0.000 description 3
- 239000004332 silver Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- FAPDDOBMIUGHIN-UHFFFAOYSA-K antimony trichloride Chemical compound Cl[Sb](Cl)Cl FAPDDOBMIUGHIN-UHFFFAOYSA-K 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 238000007865 diluting Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 229910001369 Brass Inorganic materials 0.000 description 1
- 238000006124 Pilkington process Methods 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical group [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000010951 brass Substances 0.000 description 1
- 239000010724 circulating oil Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 150000004677 hydrates Chemical class 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000010791 quenching Methods 0.000 description 1
- 230000000171 quenching effect Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- -1 steel or brass Chemical class 0.000 description 1
- 238000007669 thermal treatment Methods 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/84—Heating arrangements specially adapted for transparent or reflecting areas, e.g. for demisting or de-icing windows, mirrors or vehicle windshields
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/001—General methods for coating; Devices therefor
- C03C17/002—General methods for coating; Devices therefor for flat glass, e.g. float glass
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/245—Oxides by deposition from the vapour phase
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/453—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating passing the reaction gases through burners or torches, e.g. atmospheric pressure CVD
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/211—SnO2
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/212—TiO2
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/24—Doped oxides
- C03C2217/241—Doped oxides with halides
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/24—Doped oxides
- C03C2217/244—Doped oxides with Sb
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/152—Deposition methods from the vapour phase by cvd
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B2203/00—Aspects relating to Ohmic resistive heating covered by group H05B3/00
- H05B2203/017—Manufacturing methods or apparatus for heaters
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Plasma & Fusion (AREA)
- Physics & Mathematics (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Surface Treatment Of Glass (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CH141279A CH628600A5 (fr) | 1979-02-14 | 1979-02-14 | Procede pour deposer en continu, sur la surface d'un substrat porte a haute temperature, une couche d'une matiere solide et installation pour la mise en oeuvre de ce procede. |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS55130842A JPS55130842A (en) | 1980-10-11 |
JPS6133904B2 true JPS6133904B2 (US07714131-20100511-C00001.png) | 1986-08-05 |
Family
ID=4209839
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1561380A Granted JPS55130842A (en) | 1979-02-14 | 1980-02-13 | Method and device for continuously depositing solid substance layer on surface of substrate with high temperature |
Country Status (22)
Families Citing this family (55)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
IT1134153B (it) * | 1979-11-21 | 1986-07-31 | Siv Soc Italiana Vetro | Ugello per depositare in continuo su un substrato uno strato di una materia solida |
CA1172918A (en) * | 1980-02-15 | 1984-08-21 | William E. Hofmann | Process for making glass surfaces abrasion-resistant and article produced thereby |
DE3123694A1 (de) * | 1980-06-19 | 1982-03-18 | Bfg Glassgroup, Paris | Verfahren und vorrichtung zur beschichtung von glas |
CH643469A5 (fr) * | 1981-12-22 | 1984-06-15 | Siv Soc Italiana Vetro | Installation pour deposer en continu, sur la surface d'un substrat porte a haute temperature, une couche d'une matiere solide. |
US4451000A (en) * | 1982-06-11 | 1984-05-29 | Hollis Engineering, Inc. | Soldering apparatus exhaust system |
US4477494A (en) * | 1982-07-12 | 1984-10-16 | Glass Containers Corporation | Process for forming rust resistant tin oxide coatings on glass containers |
US4524718A (en) * | 1982-11-22 | 1985-06-25 | Gordon Roy G | Reactor for continuous coating of glass |
GB2139612B (en) * | 1983-05-13 | 1987-03-11 | Glaverbel | Coating a hot vitreous substrate |
WO1985003460A1 (en) * | 1984-02-13 | 1985-08-15 | Schmitt Jerome J Iii | Method and apparatus for the gas jet deposition of conducting and dielectric thin solid films and products produced thereby |
US4928627A (en) * | 1985-12-23 | 1990-05-29 | Atochem North America, Inc. | Apparatus for coating a substrate |
US5122394A (en) * | 1985-12-23 | 1992-06-16 | Atochem North America, Inc. | Apparatus for coating a substrate |
JPH0645881B2 (ja) * | 1986-03-28 | 1994-06-15 | 日本鋼管株式会社 | 連続処理ラインにおける鋼板の浸珪処理方法 |
JPS63139033A (ja) * | 1986-11-28 | 1988-06-10 | Nec Corp | プラズマディスプレイ用透明導電膜の製造方法 |
DE3869793D1 (de) * | 1987-01-27 | 1992-05-14 | Asahi Glass Co Ltd | Gaszufuehrungsrohr fuer die reaktive abscheidung aus der gasphase. |
GB2209176A (en) * | 1987-08-28 | 1989-05-04 | Pilkington Plc | Coating glass |
US4853257A (en) * | 1987-09-30 | 1989-08-01 | Ppg Industries, Inc. | Chemical vapor deposition of tin oxide on float glass in the tin bath |
US5136975A (en) * | 1990-06-21 | 1992-08-11 | Watkins-Johnson Company | Injector and method for delivering gaseous chemicals to a surface |
GB9300400D0 (en) * | 1993-01-11 | 1993-03-03 | Glaverbel | A device and method for forming a coating by pyrolysis |
US5453383A (en) * | 1994-06-14 | 1995-09-26 | General Mills, Inc. | Method of applying sugar coating by using steam assisted discharge nozzle |
US5534314A (en) * | 1994-08-31 | 1996-07-09 | University Of Virginia Patent Foundation | Directed vapor deposition of electron beam evaporant |
FR2724923B1 (fr) * | 1994-09-27 | 1996-12-20 | Saint Gobain Vitrage | Technique de depot de revetements par pyrolyse de composition de gaz precurseur(s) |
US5571332A (en) * | 1995-02-10 | 1996-11-05 | Jet Process Corporation | Electron jet vapor deposition system |
GB2302101B (en) * | 1995-06-09 | 1999-03-10 | Glaverbel | A glazing panel having solar screening properties |
CA2178032A1 (en) * | 1995-06-09 | 1996-12-10 | Robert Terneu | Glazing panel having solar screening properties |
GB2302102B (en) * | 1995-06-09 | 1999-03-10 | Glaverbel | A glazing panel having solar screening properties and a process for making such a panel |
US6231971B1 (en) * | 1995-06-09 | 2001-05-15 | Glaverbel | Glazing panel having solar screening properties |
GB9515198D0 (en) * | 1995-07-25 | 1995-09-20 | Pilkington Plc | A method of coating glass |
MY129739A (en) * | 1996-01-09 | 2007-04-30 | Nippon Sheet Glass Co Ltd | Coated glass for buildings |
US5698262A (en) | 1996-05-06 | 1997-12-16 | Libbey-Owens-Ford Co. | Method for forming tin oxide coating on glass |
GB9616983D0 (en) * | 1996-08-13 | 1996-09-25 | Pilkington Plc | Method for depositing tin oxide and titanium oxide coatings on flat glass and the resulting coated glass |
US6238738B1 (en) | 1996-08-13 | 2001-05-29 | Libbey-Owens-Ford Co. | Method for depositing titanium oxide coatings on flat glass |
US7096692B2 (en) | 1997-03-14 | 2006-08-29 | Ppg Industries Ohio, Inc. | Visible-light-responsive photoactive coating, coated article, and method of making same |
US6027766A (en) * | 1997-03-14 | 2000-02-22 | Ppg Industries Ohio, Inc. | Photocatalytically-activated self-cleaning article and method of making same |
US6103015A (en) * | 1998-01-19 | 2000-08-15 | Libbey-Owens-Ford Co. | Symmetrical CVD coater with lower upstream exhaust toe |
US5904958A (en) * | 1998-03-20 | 1999-05-18 | Rexam Industries Corp. | Adjustable nozzle for evaporation or organic monomers |
US6268019B1 (en) * | 1998-06-04 | 2001-07-31 | Atofina Chemicals, Inc. | Preparation of fluorine modified, low haze, titanium dioxide films |
DE19923591A1 (de) * | 1999-05-21 | 2000-11-23 | Fleissner Maschf Gmbh Co | Vorrichtung mit einem Düsenbalken zur Erzeugung von Flüssigkeitsstrahlen zur Strahlbeaufschlagung der Fasern einer Warenbahn |
GB9913315D0 (en) | 1999-06-08 | 1999-08-11 | Pilkington Plc | Improved process for coating glass |
DE10046557B4 (de) * | 2000-09-19 | 2006-07-27 | Datron-Electronic Gmbh | Vorrichtung zum dosierten Ausbringen eines aus mehreren unterschiedlich viskosen Medien bestehenden Materialstranges mittels Koextrusion und mehrfunktionale Kombinationsdichtung |
JP4124046B2 (ja) * | 2003-07-10 | 2008-07-23 | 株式会社大阪チタニウムテクノロジーズ | 金属酸化物被膜の成膜方法および蒸着装置 |
CN102154628B (zh) * | 2004-08-02 | 2014-05-07 | 维高仪器股份有限公司 | 用于化学气相沉积反应器的多气体分配喷射器 |
US8398770B2 (en) * | 2007-09-26 | 2013-03-19 | Eastman Kodak Company | Deposition system for thin film formation |
US8709160B2 (en) * | 2008-08-22 | 2014-04-29 | United Technologies Corporation | Deposition apparatus having thermal hood |
US8404047B2 (en) * | 2008-09-16 | 2013-03-26 | United Technologies Corporation | Electron beam vapor deposition apparatus and method |
US8343591B2 (en) * | 2008-10-24 | 2013-01-01 | United Technologies Corporation | Method for use with a coating process |
US20100104773A1 (en) * | 2008-10-24 | 2010-04-29 | Neal James W | Method for use in a coating process |
US20100189929A1 (en) * | 2009-01-28 | 2010-07-29 | Neal James W | Coating device and deposition apparatus |
US20100247809A1 (en) * | 2009-03-31 | 2010-09-30 | Neal James W | Electron beam vapor deposition apparatus for depositing multi-layer coating |
TR201903701T4 (tr) | 2011-03-23 | 2019-04-22 | Pilkington Group Ltd | İnce film kaplamaların çöktürülmesi için düzenek ve bu düzeneğin kullanılması için çöktürme usulü. |
GB201114242D0 (en) | 2011-08-18 | 2011-10-05 | Pilkington Group Ltd | Tantalum oxide coatings |
GB2510615A (en) * | 2013-02-08 | 2014-08-13 | Glyndwr University | Gas blade injection system |
US10704144B2 (en) * | 2015-10-12 | 2020-07-07 | Universal Display Corporation | Apparatus and method for printing multilayer organic thin films from vapor phase in an ultra-pure gas ambient |
DK3430183T3 (da) * | 2016-03-18 | 2022-03-07 | Basf Se | Metaldoteret tinoxid til anvendelser inden for elektrokatalyse |
JP6529628B2 (ja) * | 2018-04-17 | 2019-06-12 | 東芝三菱電機産業システム株式会社 | 成膜装置 |
WO2023139925A1 (ja) * | 2022-01-19 | 2023-07-27 | 東京エレクトロン株式会社 | プラズマ成膜装置及びプラズマ成膜方法 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1307216A (en) * | 1969-04-23 | 1973-02-14 | Pilkington Brothers Ltd | Treating glass |
US3814327A (en) * | 1971-04-06 | 1974-06-04 | Gen Electric | Nozzle for chemical reaction processes |
CH544156A (de) * | 1971-04-16 | 1973-11-15 | Bbc Brown Boveri & Cie | Verfahren zur Herstellung von oxydischen Halbleiterschichten und Vorrichtung zur Durchführung des Verfahrens |
DE2121319A1 (de) * | 1971-04-30 | 1973-01-18 | Rocholl Martin Ggottfried Dipl | Verfahren zum beschichten von glasscheiben mit einem optisch transparenten flaechenheizleiter |
FR2210675B1 (US07714131-20100511-C00001.png) * | 1972-12-15 | 1978-05-12 | Ppg Industries Inc | |
US3850679A (en) * | 1972-12-15 | 1974-11-26 | Ppg Industries Inc | Chemical vapor deposition of coatings |
US3951100A (en) * | 1972-12-15 | 1976-04-20 | Ppg Industries, Inc. | Chemical vapor deposition of coatings |
DD109033A1 (US07714131-20100511-C00001.png) * | 1973-12-11 | 1974-10-12 |
-
1979
- 1979-02-14 CH CH141279A patent/CH628600A5/fr unknown
-
1980
- 1980-01-31 US US06/117,086 patent/US4294868A/en not_active Expired - Lifetime
- 1980-02-01 AU AU55139/80A patent/AU538579B2/en not_active Ceased
- 1980-02-12 IT IT19855/80A patent/IT1140560B/it active
- 1980-02-12 PL PL1980221965A patent/PL126146B1/pl unknown
- 1980-02-12 CA CA000345546A patent/CA1136007A/en not_active Expired
- 1980-02-13 SU SU802878803A patent/SU1371499A3/ru active
- 1980-02-13 NL NLAANVRAGE8000897,A patent/NL179043C/xx not_active IP Right Cessation
- 1980-02-13 TR TR20840A patent/TR20840A/xx unknown
- 1980-02-13 CS CS98280A patent/CS274254B2/cs unknown
- 1980-02-13 JP JP1561380A patent/JPS55130842A/ja active Granted
- 1980-02-13 DE DE3005797A patent/DE3005797C2/de not_active Expired
- 1980-02-13 GB GB8004867A patent/GB2044137B/en not_active Expired
- 1980-02-13 SE SE8001131A patent/SE446091B/sv not_active IP Right Cessation
- 1980-02-13 ZA ZA00800824A patent/ZA80824B/xx unknown
- 1980-02-13 ES ES488517A patent/ES8100356A1/es not_active Expired
- 1980-02-13 BR BR8000891A patent/BR8000891A/pt unknown
- 1980-02-13 BE BE0/199390A patent/BE881708A/fr not_active IP Right Cessation
- 1980-02-14 MX MX181188A patent/MX154318A/es unknown
- 1980-02-14 FR FR8003323A patent/FR2448943A1/fr active Granted
- 1980-02-14 KR KR1019800000592A patent/KR830002475B1/ko not_active IP Right Cessation
- 1980-02-14 DD DD80219060A patent/DD149058A5/de not_active IP Right Cessation
-
1981
- 1981-02-18 US US06/236,134 patent/US4351267A/en not_active Expired - Lifetime
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