JPS5532070A - Photosensitive resin composition - Google Patents

Photosensitive resin composition

Info

Publication number
JPS5532070A
JPS5532070A JP10519678A JP10519678A JPS5532070A JP S5532070 A JPS5532070 A JP S5532070A JP 10519678 A JP10519678 A JP 10519678A JP 10519678 A JP10519678 A JP 10519678A JP S5532070 A JPS5532070 A JP S5532070A
Authority
JP
Japan
Prior art keywords
photo
alkyl
free radical
formula
resin composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10519678A
Other languages
English (en)
Other versions
JPS6053300B2 (ja
Inventor
Akira Nagashima
Shigeru Sato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP53105196A priority Critical patent/JPS6053300B2/ja
Priority to DE2934758A priority patent/DE2934758C2/de
Priority to GB7929911A priority patent/GB2029428B/en
Priority to FR7921633A priority patent/FR2435067B1/fr
Priority to US06/070,556 priority patent/US4258123A/en
Publication of JPS5532070A publication Critical patent/JPS5532070A/ja
Publication of JPS6053300B2 publication Critical patent/JPS6053300B2/ja
Expired legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • C08F2/48Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G03F7/0295Photolytic halogen compounds
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/114Initiator containing
    • Y10S430/117Free radical
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/114Initiator containing
    • Y10S430/12Nitrogen compound containing
    • Y10S430/121Nitrogen in heterocyclic ring
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/114Initiator containing
    • Y10S430/126Halogen compound containing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Silver Salt Photography Or Processing Solution Therefor (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Materials For Photolithography (AREA)
JP53105196A 1978-08-29 1978-08-29 感光性樹脂組成物 Expired JPS6053300B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP53105196A JPS6053300B2 (ja) 1978-08-29 1978-08-29 感光性樹脂組成物
DE2934758A DE2934758C2 (de) 1978-08-29 1979-08-28 Lichtempfindliches Gemisch und Druckplatte mit dem lichtempfindlichen Gemisch
GB7929911A GB2029428B (en) 1978-08-29 1979-08-29 Photosensitive resin composition giving print-out images
FR7921633A FR2435067B1 (fr) 1978-08-29 1979-08-29 Composition de resine photosensible procurant un contraste ameliore
US06/070,556 US4258123A (en) 1978-08-29 1979-08-29 Photosensitive resin composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP53105196A JPS6053300B2 (ja) 1978-08-29 1978-08-29 感光性樹脂組成物

Publications (2)

Publication Number Publication Date
JPS5532070A true JPS5532070A (en) 1980-03-06
JPS6053300B2 JPS6053300B2 (ja) 1985-11-25

Family

ID=14400908

Family Applications (1)

Application Number Title Priority Date Filing Date
JP53105196A Expired JPS6053300B2 (ja) 1978-08-29 1978-08-29 感光性樹脂組成物

Country Status (5)

Country Link
US (1) US4258123A (ja)
JP (1) JPS6053300B2 (ja)
DE (1) DE2934758C2 (ja)
FR (1) FR2435067B1 (ja)
GB (1) GB2029428B (ja)

Cited By (110)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58190947A (ja) * 1982-04-08 1983-11-08 イ−ストマン コダック カンパニ− 輻射線感応性画像形成組成物
JPS59135458A (ja) * 1982-12-28 1984-08-03 バスフ アクチェン ゲゼルシャフト レリ−フ版及び印刷版を製造するための光重合性混合物の層
JPS60105667A (ja) * 1983-10-12 1985-06-11 ヘキスト・アクチエンゲゼルシヤフト トリクロルメチル基を有する感光性化合物及びその製法
JPS62184455A (ja) * 1986-01-25 1987-08-12 モートン インターナショナル インコーポレイテッド 光重合性組成物
JPS6442645A (en) * 1987-08-11 1989-02-14 Tomoegawa Paper Co Ltd Optical coloring composition
JPH01257841A (ja) * 1988-04-07 1989-10-13 Nippon Synthetic Chem Ind Co Ltd:The 感光性組成物
JPH08240908A (ja) * 1994-12-29 1996-09-17 Tokyo Ohka Kogyo Co Ltd 感光性樹脂組成物、それを用いた感光性平版印刷版、および平版印刷用版材の製造方法
EP0747768A2 (en) 1995-06-05 1996-12-11 Fuji Photo Film Co., Ltd. Chemically amplified positive resist composition
EP0784233A1 (en) 1996-01-10 1997-07-16 Mitsubishi Chemical Corporation Photosensitive composition and lithographic printing plate
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Families Citing this family (97)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5651735A (en) * 1979-10-03 1981-05-09 Asahi Chem Ind Co Ltd Photoreactive composition
JPS5720734A (en) * 1980-07-15 1982-02-03 Fuji Photo Film Co Ltd Heat developing photosensitive material
JPS5815503A (ja) * 1981-07-20 1983-01-28 Fuji Photo Film Co Ltd 光重合性組成物
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US4258123A (en) 1981-03-24
DE2934758A1 (de) 1980-03-20
FR2435067A1 (fr) 1980-03-28
GB2029428A (en) 1980-03-19
DE2934758C2 (de) 1985-10-24
FR2435067B1 (fr) 1987-08-14
JPS6053300B2 (ja) 1985-11-25
GB2029428B (en) 1982-10-13

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