JPS5532070A - Photosensitive resin composition - Google Patents
Photosensitive resin compositionInfo
- Publication number
- JPS5532070A JPS5532070A JP10519678A JP10519678A JPS5532070A JP S5532070 A JPS5532070 A JP S5532070A JP 10519678 A JP10519678 A JP 10519678A JP 10519678 A JP10519678 A JP 10519678A JP S5532070 A JPS5532070 A JP S5532070A
- Authority
- JP
- Japan
- Prior art keywords
- photo
- alkyl
- free radical
- formula
- resin composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000011342 resin composition Substances 0.000 title abstract 2
- 125000000217 alkyl group Chemical group 0.000 abstract 3
- 150000001875 compounds Chemical class 0.000 abstract 3
- 150000003254 radicals Chemical class 0.000 abstract 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 abstract 2
- 125000003118 aryl group Chemical group 0.000 abstract 2
- 239000003795 chemical substances by application Substances 0.000 abstract 2
- 238000004132 cross linking Methods 0.000 abstract 2
- 239000002243 precursor Substances 0.000 abstract 2
- 230000035945 sensitivity Effects 0.000 abstract 2
- 239000002253 acid Substances 0.000 abstract 1
- 125000003342 alkenyl group Chemical group 0.000 abstract 1
- 230000015572 biosynthetic process Effects 0.000 abstract 1
- 125000000623 heterocyclic group Chemical group 0.000 abstract 1
- 229910052757 nitrogen Inorganic materials 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
- G03F7/0295—Photolytic halogen compounds
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/117—Free radical
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/12—Nitrogen compound containing
- Y10S430/121—Nitrogen in heterocyclic ring
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/126—Halogen compound containing
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Inorganic Chemistry (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Silver Salt Photography Or Processing Solution Therefor (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Materials For Photolithography (AREA)
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP53105196A JPS6053300B2 (ja) | 1978-08-29 | 1978-08-29 | 感光性樹脂組成物 |
DE2934758A DE2934758C2 (de) | 1978-08-29 | 1979-08-28 | Lichtempfindliches Gemisch und Druckplatte mit dem lichtempfindlichen Gemisch |
GB7929911A GB2029428B (en) | 1978-08-29 | 1979-08-29 | Photosensitive resin composition giving print-out images |
FR7921633A FR2435067B1 (fr) | 1978-08-29 | 1979-08-29 | Composition de resine photosensible procurant un contraste ameliore |
US06/070,556 US4258123A (en) | 1978-08-29 | 1979-08-29 | Photosensitive resin composition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP53105196A JPS6053300B2 (ja) | 1978-08-29 | 1978-08-29 | 感光性樹脂組成物 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5532070A true JPS5532070A (en) | 1980-03-06 |
JPS6053300B2 JPS6053300B2 (ja) | 1985-11-25 |
Family
ID=14400908
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP53105196A Expired JPS6053300B2 (ja) | 1978-08-29 | 1978-08-29 | 感光性樹脂組成物 |
Country Status (5)
Country | Link |
---|---|
US (1) | US4258123A (ja) |
JP (1) | JPS6053300B2 (ja) |
DE (1) | DE2934758C2 (ja) |
FR (1) | FR2435067B1 (ja) |
GB (1) | GB2029428B (ja) |
Cited By (110)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58190947A (ja) * | 1982-04-08 | 1983-11-08 | イ−ストマン コダック カンパニ− | 輻射線感応性画像形成組成物 |
JPS59135458A (ja) * | 1982-12-28 | 1984-08-03 | バスフ アクチェン ゲゼルシャフト | レリ−フ版及び印刷版を製造するための光重合性混合物の層 |
JPS60105667A (ja) * | 1983-10-12 | 1985-06-11 | ヘキスト・アクチエンゲゼルシヤフト | トリクロルメチル基を有する感光性化合物及びその製法 |
JPS62184455A (ja) * | 1986-01-25 | 1987-08-12 | モートン インターナショナル インコーポレイテッド | 光重合性組成物 |
JPS6442645A (en) * | 1987-08-11 | 1989-02-14 | Tomoegawa Paper Co Ltd | Optical coloring composition |
JPH01257841A (ja) * | 1988-04-07 | 1989-10-13 | Nippon Synthetic Chem Ind Co Ltd:The | 感光性組成物 |
JPH08240908A (ja) * | 1994-12-29 | 1996-09-17 | Tokyo Ohka Kogyo Co Ltd | 感光性樹脂組成物、それを用いた感光性平版印刷版、および平版印刷用版材の製造方法 |
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Also Published As
Publication number | Publication date |
---|---|
US4258123A (en) | 1981-03-24 |
DE2934758A1 (de) | 1980-03-20 |
FR2435067A1 (fr) | 1980-03-28 |
GB2029428A (en) | 1980-03-19 |
DE2934758C2 (de) | 1985-10-24 |
FR2435067B1 (fr) | 1987-08-14 |
JPS6053300B2 (ja) | 1985-11-25 |
GB2029428B (en) | 1982-10-13 |
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