JPS5319205B2 - - Google Patents

Info

Publication number
JPS5319205B2
JPS5319205B2 JP3537773A JP3537773A JPS5319205B2 JP S5319205 B2 JPS5319205 B2 JP S5319205B2 JP 3537773 A JP3537773 A JP 3537773A JP 3537773 A JP3537773 A JP 3537773A JP S5319205 B2 JPS5319205 B2 JP S5319205B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP3537773A
Other versions
JPS49123021A (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP3537773A priority Critical patent/JPS5319205B2/ja
Priority to DE2414240A priority patent/DE2414240A1/de
Priority to GB1348374A priority patent/GB1459563A/en
Publication of JPS49123021A publication Critical patent/JPS49123021A/ja
Priority to US05/834,020 priority patent/US4304838A/en
Publication of JPS5319205B2 publication Critical patent/JPS5319205B2/ja
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F255/00—Macromolecular compounds obtained by polymerising monomers on to polymers of hydrocarbons as defined in group C08F10/00
    • C08F255/02—Macromolecular compounds obtained by polymerising monomers on to polymers of hydrocarbons as defined in group C08F10/00 on to polymers of olefins having two or three carbon atoms
    • C08F255/023—On to modified polymers, e.g. chlorinated polymers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/108—Polyolefin or halogen containing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Polymerisation Methods In General (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP3537773A 1973-03-27 1973-03-27 Expired JPS5319205B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP3537773A JPS5319205B2 (ja) 1973-03-27 1973-03-27
DE2414240A DE2414240A1 (de) 1973-03-27 1974-03-25 Photopolymerisierbare masse und ihre verwendung in einem aufzeichnungsmaterial
GB1348374A GB1459563A (en) 1973-03-27 1974-03-26 Photopolymerizable compositions and recording materials incorporating them
US05/834,020 US4304838A (en) 1973-03-27 1977-09-16 Photopolymerizable composition and recording materials utilizing the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3537773A JPS5319205B2 (ja) 1973-03-27 1973-03-27

Publications (2)

Publication Number Publication Date
JPS49123021A JPS49123021A (ja) 1974-11-25
JPS5319205B2 true JPS5319205B2 (ja) 1978-06-20

Family

ID=12440197

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3537773A Expired JPS5319205B2 (ja) 1973-03-27 1973-03-27

Country Status (4)

Country Link
US (1) US4304838A (ja)
JP (1) JPS5319205B2 (ja)
DE (1) DE2414240A1 (ja)
GB (1) GB1459563A (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6037624U (ja) * 1983-08-24 1985-03-15 プルトンチェン株式会社 スライドレ−ル

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5179342A (ja) * 1974-12-26 1976-07-10 Fuji Photo Film Co Ltd
US4402887A (en) * 1978-03-14 1983-09-06 Dainippon Ink And Chemicals Inc. Sheet-like articles of polyvinyl chloride
JPS6053300B2 (ja) * 1978-08-29 1985-11-25 富士写真フイルム株式会社 感光性樹脂組成物
US4289842A (en) 1980-06-27 1981-09-15 Eastman Kodak Company Negative-working polymers useful as electron beam resists
US4634562A (en) * 1981-09-08 1987-01-06 The Goodyear Tire & Rubber Company Photocurable polyvinyl chloride composition
DE3324642A1 (de) * 1983-07-08 1985-01-17 Basf Ag, 6700 Ludwigshafen Verfahren zur stabilisierung von photopolymerisierbaren mischungen
GB8321813D0 (en) * 1983-08-12 1983-09-14 Vickers Plc Radiation sensitive compounds
JPS62195640A (ja) * 1986-02-24 1987-08-28 Fuji Photo Film Co Ltd 感光材料
US4902605A (en) * 1987-07-24 1990-02-20 Eastman Kodak Company Photoresist composition comprising cyclohexyleneoxyalkyl acrylates
US4767883A (en) * 1987-07-24 1988-08-30 Eastman Kodak Company Polymerizable cyclohexyleneoxyalkyl acrylates
US5236806A (en) * 1988-07-18 1993-08-17 Hoechst Celanese Corporation Photopolymerizable, positive working, peel developable, single sheet color proofing system
US4895787A (en) * 1988-07-18 1990-01-23 Hoechst Celanese Corporation Photopolymerizable positive working, peel developable, single sheet color proofing system
EP0441638B1 (en) 1990-02-08 1999-10-13 Konica Corporation Light sensitive litho printing plate
US5294515A (en) * 1991-05-17 1994-03-15 Hoechst Celanese Corporation Photopolymerizable, negative working, peel developable, single sheet color proofing system
IT1277362B1 (it) * 1995-07-27 1997-11-10 M & G Ricerche Spa Resine poliestere con migliorate caratteristiche di colore
WO2002051721A1 (fr) * 2000-12-27 2002-07-04 Hitachi Chemical Co., Ltd. Procede d'emballage de rouleau de film photosensible, boitier de resine destine a ce procede d'emballage, procede de recuperation et de reutilisation de ce boitier, et matiere d'emballage et procede de transport pour rouleau de film photosensible
PL209142B1 (pl) * 2003-02-18 2011-07-29 Fujikura Kasei Kk Sposób wytwarzania zmodyfikowanej akrylanem chlorowanej żywicy poliolefinowej
JP4396443B2 (ja) 2004-08-18 2010-01-13 コニカミノルタエムジー株式会社 感光性平版印刷版の製造方法及び使用方法
US7879525B2 (en) * 2004-12-03 2011-02-01 Tokyo Ohka Kogyo Co., Ltd. Chemically amplified photoresist composition, laminated product, and connection element
EP2148901B1 (en) * 2007-05-23 2019-03-06 Sun Chemical Corporation Non-aqueous energy curable polymeric dispersion
JP5572737B1 (ja) * 2013-06-04 2014-08-13 太陽インキ製造株式会社 光硬化熱硬化性樹脂組成物、硬化物、及びプリント配線板
US10459337B2 (en) 2015-12-14 2019-10-29 University Of Maryland, College Park Multicolor photolithography materials and methods

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3024180A (en) * 1959-08-17 1962-03-06 Du Pont Photopolymerizable elements

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3713831A (en) * 1969-08-22 1973-01-30 Staley Mfg Co A E Coating composition comprising photoactivator and film-forming organic material for powder development
US3867153A (en) * 1972-09-11 1975-02-18 Du Pont Photohardenable element

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3024180A (en) * 1959-08-17 1962-03-06 Du Pont Photopolymerizable elements

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6037624U (ja) * 1983-08-24 1985-03-15 プルトンチェン株式会社 スライドレ−ル

Also Published As

Publication number Publication date
JPS49123021A (ja) 1974-11-25
GB1459563A (en) 1976-12-22
US4304838A (en) 1981-12-08
DE2414240A1 (de) 1974-10-10

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