ES513403A0 - Una mezcla foto-sensible. - Google Patents

Una mezcla foto-sensible.

Info

Publication number
ES513403A0
ES513403A0 ES513403A ES513403A ES513403A0 ES 513403 A0 ES513403 A0 ES 513403A0 ES 513403 A ES513403 A ES 513403A ES 513403 A ES513403 A ES 513403A ES 513403 A0 ES513403 A0 ES 513403A0
Authority
ES
Spain
Prior art keywords
diazide
naphthoquinone
sulfonyl radical
light
sensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
ES513403A
Other languages
English (en)
Other versions
ES8404065A1 (es
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoechst AG
Original Assignee
Hoechst AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst AG filed Critical Hoechst AG
Publication of ES513403A0 publication Critical patent/ES513403A0/es
Publication of ES8404065A1 publication Critical patent/ES8404065A1/es
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Measuring Or Testing Involving Enzymes Or Micro-Organisms (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Acyclic And Carbocyclic Compounds In Medicinal Compositions (AREA)
  • Developing Agents For Electrophotography (AREA)
  • Photoreceptors In Electrophotography (AREA)
ES513403A 1981-06-25 1982-06-23 Una mezcla foto-sensible. Expired ES8404065A1 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19813124936 DE3124936A1 (de) 1981-06-25 1981-06-25 Lichtempfindliches gemisch auf basis von o-naphthochinondiaziden und daraus hergestelltes lichtempfindliches kopiermaterial

Publications (2)

Publication Number Publication Date
ES513403A0 true ES513403A0 (es) 1984-04-01
ES8404065A1 ES8404065A1 (es) 1984-04-01

Family

ID=6135331

Family Applications (1)

Application Number Title Priority Date Filing Date
ES513403A Expired ES8404065A1 (es) 1981-06-25 1982-06-23 Una mezcla foto-sensible.

Country Status (11)

Country Link
US (1) US4517275A (es)
EP (1) EP0068346B1 (es)
JP (1) JPS585737A (es)
AT (1) ATE10141T1 (es)
AU (1) AU8509082A (es)
BR (1) BR8203685A (es)
CA (1) CA1213600A (es)
DE (2) DE3124936A1 (es)
ES (1) ES8404065A1 (es)
FI (1) FI822257L (es)
ZA (1) ZA824004B (es)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4735885A (en) * 1985-12-06 1988-04-05 Allied Corporation Deep UV photoresist composition with 1,3-disubstituted-5-diazobarbituric acids
JP2552891B2 (ja) * 1988-01-26 1996-11-13 富士写真フイルム株式会社 ポジ型フオトレジスト組成物
JP2700918B2 (ja) * 1989-04-26 1998-01-21 富士写真フイルム株式会社 ポジ型フオトレジスト組成物
US5196517A (en) * 1989-10-30 1993-03-23 Ocg Microelectronic Materials, Inc. Selected trihydroxybenzophenone compounds and their use as photoactive compounds
US5019478A (en) * 1989-10-30 1991-05-28 Olin Hunt Specialty Products, Inc. Selected trihydroxybenzophenone compounds and their use in photoactive compounds and radiation sensitive mixtures
US5219714A (en) * 1989-10-30 1993-06-15 Ocg Microelectronic Materials, Inc. Selected trihydroxybenzophenone compounds and their use in photoactive compounds and radiation sensitive mixtures
US5618932A (en) * 1995-05-24 1997-04-08 Shipley Company, L.L.C. Photoactive compounds and compositions
US6461794B1 (en) * 1999-08-11 2002-10-08 Kodak Polychrome Graphics Llc Lithographic printing forms

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL76414C (es) * 1949-07-23
BE508016A (es) * 1950-12-23
NL247588A (es) * 1959-01-21
US3647443A (en) * 1969-09-12 1972-03-07 Eastman Kodak Co Light-sensitive quinone diazide polymers and polymer compositions
JPS53494B2 (es) * 1972-09-08 1978-01-09
DE2742631A1 (de) * 1977-09-22 1979-04-05 Hoechst Ag Lichtempfindliche kopiermasse
DE2828037A1 (de) * 1978-06-26 1980-01-10 Hoechst Ag Lichtempfindliches gemisch
DE3040157A1 (de) * 1980-10-24 1982-06-03 Hoechst Ag, 6000 Frankfurt Lichtemopfindliches gemisch und damit hergestelltes lichtempfindliches kopiermaterial
DE3043967A1 (de) * 1980-11-21 1982-06-24 Hoechst Ag, 6000 Frankfurt Lichtempfindliches gemisch auf basis von o-naphthochinondiaziden und daraus hergestelltes lichtempfindliches kopiermaterial

Also Published As

Publication number Publication date
EP0068346A1 (de) 1983-01-05
DE3261128D1 (en) 1984-12-06
BR8203685A (pt) 1983-06-21
AU8509082A (en) 1983-01-06
JPH0339301B2 (es) 1991-06-13
ZA824004B (en) 1983-03-30
FI822257A0 (fi) 1982-06-23
ATE10141T1 (de) 1984-11-15
JPS585737A (ja) 1983-01-13
CA1213600A (en) 1986-11-04
FI822257L (fi) 1982-12-26
EP0068346B1 (de) 1984-10-31
US4517275A (en) 1985-05-14
DE3124936A1 (de) 1983-01-20
ES8404065A1 (es) 1984-04-01

Similar Documents

Publication Publication Date Title
IL57623A0 (en) Bis-1,2-naphthoquinone-2-diazide sulfonic acid esters and light sensitive mixtures containing them
FI822470L (fi) Ljuskaenslig blandning pao basen av o-naftokinondiazider och daerav framstaellt ljuskaensligt kopiematerial
ES513403A0 (es) Una mezcla foto-sensible.
PH21005A (en) Negative photoresist compositions with polyglutarimide polymer
AU542387B2 (en) Naphthoquinone diazide sulfonic ester
SE8106441L (sv) 2,6-c-dimetyltyrosin?721-d-aminosyra?722-omega-aminokapronsyra-och-gamma-aminosmorsyraderivat av metioninencefalin
FI820087L (fi) Ljuskaenslig blandning baserad pao o-naftokinondiazider och avenna framstaellt kopiermaterial
FI812804L (fi) 2-(1,4-bensodioxan-2-ylalkyl)-imidazoler anvaendbara som antidepressiva laekemedel
PT77208A (de) Neue thieno-thieno-derivate verfahren zu ihrer herstellung und diese verbindugen enthaltende
JPS52100470A (en) Synthesis of hydantoin derivatives
SE8207294L (sv) 1,4-tiazankarboxylsyraderivat, deras framstellning och anvendning och kompositioner vari dessa derivat ingar
ATE19879T1 (de) Furyloxazolylessigsaeure-derivate, verfahren zu deren herstellung und diese enthaltende pharmazeutische zusammensetzungen.
ATE29251T1 (de) Aminopyridincarbonsaeure-derivate, verfahren zu ihrer herstellung und diese enthaltende pharmazeutische zusammensetzungen.
AU552775B2 (en) Compounds
GB2022583A (en) New ionic polyiodo benzene derivatives useful as X-ray contrast media

Legal Events

Date Code Title Description
FD1A Patent lapsed

Effective date: 19980202