BR8203685A - Mistura fotossensivel a material copiador fotossensivel produzido a partir da mesma - Google Patents

Mistura fotossensivel a material copiador fotossensivel produzido a partir da mesma

Info

Publication number
BR8203685A
BR8203685A BR8203685A BR8203685A BR8203685A BR 8203685 A BR8203685 A BR 8203685A BR 8203685 A BR8203685 A BR 8203685A BR 8203685 A BR8203685 A BR 8203685A BR 8203685 A BR8203685 A BR 8203685A
Authority
BR
Brazil
Prior art keywords
photosensitive
diazide
naphthoquinone
sulfonyl radical
same
Prior art date
Application number
BR8203685A
Other languages
English (en)
Inventor
Paul Stahlhofen
Original Assignee
Hoechst Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Ag filed Critical Hoechst Ag
Publication of BR8203685A publication Critical patent/BR8203685A/pt

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Measuring Or Testing Involving Enzymes Or Micro-Organisms (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Developing Agents For Electrophotography (AREA)
  • Acyclic And Carbocyclic Compounds In Medicinal Compositions (AREA)
BR8203685A 1981-06-25 1982-06-24 Mistura fotossensivel a material copiador fotossensivel produzido a partir da mesma BR8203685A (pt)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19813124936 DE3124936A1 (de) 1981-06-25 1981-06-25 Lichtempfindliches gemisch auf basis von o-naphthochinondiaziden und daraus hergestelltes lichtempfindliches kopiermaterial

Publications (1)

Publication Number Publication Date
BR8203685A true BR8203685A (pt) 1983-06-21

Family

ID=6135331

Family Applications (1)

Application Number Title Priority Date Filing Date
BR8203685A BR8203685A (pt) 1981-06-25 1982-06-24 Mistura fotossensivel a material copiador fotossensivel produzido a partir da mesma

Country Status (11)

Country Link
US (1) US4517275A (pt)
EP (1) EP0068346B1 (pt)
JP (1) JPS585737A (pt)
AT (1) ATE10141T1 (pt)
AU (1) AU8509082A (pt)
BR (1) BR8203685A (pt)
CA (1) CA1213600A (pt)
DE (2) DE3124936A1 (pt)
ES (1) ES513403A0 (pt)
FI (1) FI822257L (pt)
ZA (1) ZA824004B (pt)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4735885A (en) * 1985-12-06 1988-04-05 Allied Corporation Deep UV photoresist composition with 1,3-disubstituted-5-diazobarbituric acids
JP2552891B2 (ja) * 1988-01-26 1996-11-13 富士写真フイルム株式会社 ポジ型フオトレジスト組成物
JP2700918B2 (ja) * 1989-04-26 1998-01-21 富士写真フイルム株式会社 ポジ型フオトレジスト組成物
US5196517A (en) * 1989-10-30 1993-03-23 Ocg Microelectronic Materials, Inc. Selected trihydroxybenzophenone compounds and their use as photoactive compounds
US5019478A (en) * 1989-10-30 1991-05-28 Olin Hunt Specialty Products, Inc. Selected trihydroxybenzophenone compounds and their use in photoactive compounds and radiation sensitive mixtures
US5219714A (en) * 1989-10-30 1993-06-15 Ocg Microelectronic Materials, Inc. Selected trihydroxybenzophenone compounds and their use in photoactive compounds and radiation sensitive mixtures
US5618932A (en) * 1995-05-24 1997-04-08 Shipley Company, L.L.C. Photoactive compounds and compositions
US6461794B1 (en) * 1999-08-11 2002-10-08 Kodak Polychrome Graphics Llc Lithographic printing forms

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE510563A (pt) * 1949-07-23
BE508016A (pt) * 1950-12-23
BE586713A (pt) * 1959-01-21
US3647443A (en) * 1969-09-12 1972-03-07 Eastman Kodak Co Light-sensitive quinone diazide polymers and polymer compositions
JPS53494B2 (pt) * 1972-09-08 1978-01-09
DE2742631A1 (de) * 1977-09-22 1979-04-05 Hoechst Ag Lichtempfindliche kopiermasse
DE2828037A1 (de) * 1978-06-26 1980-01-10 Hoechst Ag Lichtempfindliches gemisch
DE3040157A1 (de) * 1980-10-24 1982-06-03 Hoechst Ag, 6000 Frankfurt Lichtemopfindliches gemisch und damit hergestelltes lichtempfindliches kopiermaterial
DE3043967A1 (de) * 1980-11-21 1982-06-24 Hoechst Ag, 6000 Frankfurt Lichtempfindliches gemisch auf basis von o-naphthochinondiaziden und daraus hergestelltes lichtempfindliches kopiermaterial

Also Published As

Publication number Publication date
CA1213600A (en) 1986-11-04
ATE10141T1 (de) 1984-11-15
EP0068346B1 (de) 1984-10-31
JPH0339301B2 (pt) 1991-06-13
FI822257L (fi) 1982-12-26
ZA824004B (en) 1983-03-30
DE3261128D1 (en) 1984-12-06
EP0068346A1 (de) 1983-01-05
DE3124936A1 (de) 1983-01-20
JPS585737A (ja) 1983-01-13
AU8509082A (en) 1983-01-06
ES8404065A1 (es) 1984-04-01
FI822257A0 (fi) 1982-06-23
US4517275A (en) 1985-05-14
ES513403A0 (es) 1984-04-01

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Legal Events

Date Code Title Description
MM Lapse due to non-payment of fees (art. 50)
B15K Others concerning applications: alteration of classification

Ipc: G03F 7/022 (2006.01)