JPH09228545A - Glass block and its cleaning method - Google Patents
Glass block and its cleaning methodInfo
- Publication number
- JPH09228545A JPH09228545A JP8282810A JP28281096A JPH09228545A JP H09228545 A JPH09228545 A JP H09228545A JP 8282810 A JP8282810 A JP 8282810A JP 28281096 A JP28281096 A JP 28281096A JP H09228545 A JPH09228545 A JP H09228545A
- Authority
- JP
- Japan
- Prior art keywords
- glass block
- layer
- surface layer
- photocatalyst
- water
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F28—HEAT EXCHANGE IN GENERAL
- F28F—DETAILS OF HEAT-EXCHANGE AND HEAT-TRANSFER APPARATUS, OF GENERAL APPLICATION
- F28F13/00—Arrangements for modifying heat-transfer, e.g. increasing, decreasing
- F28F13/18—Arrangements for modifying heat-transfer, e.g. increasing, decreasing by applying coatings, e.g. radiation-absorbing, radiation-reflecting; by surface treatment, e.g. polishing
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F24—HEATING; RANGES; VENTILATING
- F24F—AIR-CONDITIONING; AIR-HUMIDIFICATION; VENTILATION; USE OF AIR CURRENTS FOR SCREENING
- F24F8/00—Treatment, e.g. purification, of air supplied to human living or working spaces otherwise than by heating, cooling, humidifying or drying
- F24F8/20—Treatment, e.g. purification, of air supplied to human living or working spaces otherwise than by heating, cooling, humidifying or drying by sterilisation
- F24F8/22—Treatment, e.g. purification, of air supplied to human living or working spaces otherwise than by heating, cooling, humidifying or drying by sterilisation using UV light
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F28—HEAT EXCHANGE IN GENERAL
- F28F—DETAILS OF HEAT-EXCHANGE AND HEAT-TRANSFER APPARATUS, OF GENERAL APPLICATION
- F28F2245/00—Coatings; Surface treatments
- F28F2245/02—Coatings; Surface treatments hydrophilic
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Combustion & Propulsion (AREA)
- Catalysts (AREA)
- Paints Or Removers (AREA)
- Surface Treatment Of Glass (AREA)
- Laminated Bodies (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Finishing Walls (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
- Materials Applied To Surfaces To Minimize Adherence Of Mist Or Water (AREA)
- Prevention Of Fouling (AREA)
- Optical Elements Other Than Lenses (AREA)
- Pigments, Carbon Blacks, Or Wood Stains (AREA)
- Building Environments (AREA)
- Refuge Islands, Traffic Blockers, Or Guard Fence (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
- Exhaust Gas Treatment By Means Of Catalyst (AREA)
- Rear-View Mirror Devices That Are Mounted On The Exterior Of The Vehicle (AREA)
- Dental Tools And Instruments Or Auxiliary Dental Instruments (AREA)
- Road Signs Or Road Markings (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Greenhouses (AREA)
- Bridges Or Land Bridges (AREA)
- Joining Of Glass To Other Materials (AREA)
- Detergent Compositions (AREA)
- Illuminated Signs And Luminous Advertising (AREA)
- Mirrors, Picture Frames, Photograph Stands, And Related Fastening Devices (AREA)
- Aftertreatments Of Artificial And Natural Stones (AREA)
- Panels For Use In Building Construction (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
- Devices Affording Protection Of Roads Or Walls For Sound Insulation (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
- Respiratory Apparatuses And Protective Means (AREA)
- Separation Using Semi-Permeable Membranes (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、ガラスブロック、
及びその清浄化方法に関する。TECHNICAL FIELD The present invention relates to a glass block,
And its cleaning method.
【0002】[0002]
【従来の技術】ガラスブロック建材は、水拭き程度で
は、手垢等による油脂汚れが容易には充分に洗浄されな
い。また、高層ビルに利用した場合には、清掃しないと
汚れやすく、その清掃は高所作業であり、重労働である
と同時に危険を伴う。2. Description of the Related Art A glass block building material cannot be easily washed sufficiently with oil and grease stains due to hand stains, etc., just by wiping it with water. Further, when it is used for a high-rise building, it is easy to get dirty unless it is cleaned, and the cleaning is a work at a high place, which is a heavy work and is accompanied by danger.
【0003】[0003]
【発明の解決すべき課題】本発明の目的は、降雨により
自己清浄化(セルフクリーニング)される表面を有する
ガラスブロック、及びガラスブロックの清浄化方法を提
供することにある。本発明の他の目的は、散水や水濯ぎ
程度で簡単に清掃可能な表面を有するガラスブロック、
及びその清浄化方法を提供することにある。SUMMARY OF THE INVENTION An object of the present invention is to provide a glass block having a surface that is self-cleaning (self-cleaning) by rainfall, and a method of cleaning the glass block. Another object of the present invention is a glass block having a surface that can be easily cleaned by watering or rinsing.
And a method for cleaning the same.
【0004】[0004]
【課題を解決するための手段】本発明は、光触媒を含有
する表面層を形成した部材において、光触媒を光励起す
ると、部材の表面が高度に親水化されるという発見に基
づく。この現象は以下に示す機構により進行すると考え
られる。すなわち、光触媒の価電子帯上端と伝導帯下端
とのエネルギーギャップ以上のエネルギーを有する光が
光触媒に照射されると、光触媒の価電子帯中の電子が励
起されて伝導電子と正孔が生成し、そのいずれかまたは
双方の作用により、おそらく表面に極性が付与され、水
や水酸基等の極性成分が集められる。そして伝導電子と
正孔のいずれかまたは双方と、上記極性成分との協調的
な作用により、表面と前記表面に化学的に吸着した汚染
物質との化学結合を切断すると共に、表面に化学吸着水
が吸着し、さらに物理吸着水層がその上に形成されるの
である。また、一旦部材表面が高度に親水化されたなら
ば、部材を暗所に保持しても、表面の親水性はある程度
の期間持続する。SUMMARY OF THE INVENTION The present invention is based on the discovery that, in a member having a surface layer containing a photocatalyst formed thereon, when the photocatalyst is photoexcited, the surface of the member is highly hydrophilized. This phenomenon is considered to proceed by the following mechanism. That is, when the photocatalyst is irradiated with light having an energy larger than the energy gap between the valence band upper end and the conduction band lower end of the photocatalyst, the electrons in the valence band of the photocatalyst are excited to generate conduction electrons and holes. The action of either or both of them probably imparts polarity to the surface and collects polar components such as water and hydroxyl groups. Then, one or both of conduction electrons and holes and the above-mentioned polar component cooperate with each other to cut off a chemical bond between the surface and the contaminant chemically adsorbed on the surface, and to cause a chemical adsorbed water on the surface. Is adsorbed, and a physically adsorbed water layer is formed thereon. Further, once the surface of the member is highly hydrophilized, the hydrophilicity of the surface is maintained for a certain period even if the member is kept in a dark place.
【0005】本発明では、ガラスブロック基材の表面
に、光触媒粒子を含有する表面層を備えたセルフクリー
ニング性ガラスブロックを提供する。光触媒を含有する
表面層を備えることにより、光触媒の光励起に応じて、
表面層の表面は親水性を呈するので、ガラスブロックの
表面が降雨にさらされた時に付着堆積物及び/又は汚染
物が雨滴により洗い流されるのが可能となる。The present invention provides a self-cleaning glass block having a surface layer containing photocatalyst particles on the surface of a glass block substrate. By providing a surface layer containing a photocatalyst, in response to photoexcitation of the photocatalyst,
The surface of the surface layer exhibits hydrophilicity, which allows the deposition deposits and / or contaminants to be washed away by raindrops when the surface of the glass block is exposed to rainfall.
【0006】本発明では、ガラスブロック基材の表面
に、光触媒粒子を含有する表面層を備えた易清掃性ガラ
スブロックを提供する。光触媒を含有する表面層を備え
ることにより、光触媒の光励起に応じて、表面層の表面
は親水性を呈するので、ガラスブロックの表面を水で洗
浄するのが容易になる。The present invention provides an easily-cleanable glass block having a surface layer containing photocatalyst particles on the surface of a glass block substrate. By providing the surface layer containing the photocatalyst, the surface of the surface layer exhibits hydrophilicity in response to photoexcitation of the photocatalyst, so that the surface of the glass block can be easily washed with water.
【0007】本発明の好ましい態様においては、表面層
には、さらにシリカが含有されているようにする。シリ
カが含有されることにより、表面が水濡れ角0゜に近い
高度の親水性を呈しやすくなると共に、暗所に保持した
ときの親水維持性が向上する。その理由はシリカは構造
中に水を蓄えることができることと関係していると思わ
れる。In a preferred embodiment of the present invention, the surface layer further contains silica. By containing silica, the surface is likely to exhibit a high degree of hydrophilicity near a water wetting angle of 0 °, and the hydrophilicity retention when held in a dark place is improved. The reason seems to be related to the ability of silica to store water in its structure.
【0008】本発明の好ましい態様においては、表面層
には、さらに固体酸が含有されているようにする。固体
酸が含有されることにより、表面が水濡れ角0゜に近い
高度の親水性を呈しやすくなると共に、暗所に保持した
ときの親水維持性が向上する。その理由は表面層に固体
酸が含有されると、表面の極性が、光の有無にかかわら
ず大きな状態にあるために、疎水性分子よりも極性分子
である水分子を選択的に吸着させやすい。そのため安定
な物理吸着水層が形成されやすく、暗所に保持しても、
表面の親水性をかなり長期にわたり高度に維持できる。In a preferred embodiment of the present invention, the surface layer further contains a solid acid. When the solid acid is contained, the surface is likely to exhibit a high degree of hydrophilicity near a water wetting angle of 0 °, and the hydrophilicity retention when kept in a dark place is improved. The reason is that when a solid acid is contained in the surface layer, the polarity of the surface is large regardless of the presence or absence of light, so it is easier to selectively adsorb water molecules that are polar molecules than hydrophobic molecules. . Therefore, a stable physical adsorption water layer is easily formed, and even if it is kept in a dark place,
Surface hydrophilicity can be maintained at a high level for a fairly long time.
【0009】本発明の好ましい態様においては、表面層
には、さらにシリコーンが含有されているようにする。
シリコーンが含有されることにより、光触媒の光励起に
よって、シリコーン中のシリコン原子に結合する有機基
の少なくとも一部が水酸基に置換され、さらにその上に
物理吸着水層が形成されることにより、表面が水濡れ角
0゜に近い高度の親水性を呈するようになると共に、暗
所に保持したときの親水維持性が向上する。In a preferred embodiment of the present invention, the surface layer further contains silicone.
By containing silicone, by photoexcitation of the photocatalyst, at least a part of the organic group bonded to the silicon atom in the silicone is replaced with a hydroxyl group, and a physically adsorbed water layer is formed on the organic group, so that the surface is It exhibits a high degree of hydrophilicity close to a water wetting angle of 0 °, and improves the hydrophilicity maintaining ability when kept in a dark place.
【0010】[0010]
【発明の実施の形態】次に、本発明の具体的な構成につ
いて説明する。本発明におけるガラスブロックの表面に
は、図1又は図2に示すように、基材の表面に光触媒を
含む層が形成されている。このような表面構造をとるこ
とで、ガラスブロックの表面は、光触媒の光励起に応じ
て高度に親水化されるのである。それにより、表面の親
水性が親油性より強まる。それにより、ガラスブロック
の表面が降雨にさらされた時に付着堆積物及び/又は汚
染物が雨滴により洗い流されるようになる。さらに、ガ
ラスブロックの表面を水で洗浄するのが容易になる。BEST MODE FOR CARRYING OUT THE INVENTION Next, a specific structure of the present invention will be described. On the surface of the glass block in the present invention, as shown in FIG. 1 or 2, a layer containing a photocatalyst is formed on the surface of the base material. By taking such a surface structure, the surface of the glass block is highly hydrophilized in response to photoexcitation of the photocatalyst. Thereby, the hydrophilicity of the surface becomes stronger than the lipophilicity. This causes the deposits and / or contaminants to be washed away by raindrops when the surface of the glass block is exposed to rainfall. Further, it becomes easy to wash the surface of the glass block with water.
【0011】図1においては、表面層が光触媒のみから
なる場合には、光触媒は酸化物であることが好ましい。
そうすることにより、酸化物は環境中の汚染物質が吸着
していない状態では親水性を示すので、光励起作用によ
りその汚染物質を排斥させ、吸着水層を形成させること
で、親水性を呈しやすく、一様な水膜が形成できる。図
2において、Mは金属元素を示す。従って、図2の場
合、最表面は一般の無機酸化物からなる。この場合も、
酸化物は環境中の汚染物質が吸着していない状態では親
水性を示すので、上記無機酸化物以外に表面層に混入す
る光触媒の光励起作用によりその汚染物質を排斥させ、
吸着水層を形成させることで、一様な水膜が形成でき
る。In FIG. 1, when the surface layer is composed of only the photocatalyst, the photocatalyst is preferably an oxide.
By doing so, the oxide shows hydrophilicity in the state where the pollutants in the environment are not adsorbed, so that the pollutants are rejected by the photoexcitation action and the adsorbed water layer is formed, so that the oxides easily exhibit hydrophilicity. A uniform water film can be formed. In FIG. 2, M represents a metal element. Therefore, in the case of FIG. 2, the outermost surface is made of a general inorganic oxide. Again,
Since the oxide shows hydrophilicity in a state where the pollutant in the environment is not adsorbed, the pollutant is rejected by a photoexcitation effect of a photocatalyst mixed into the surface layer other than the inorganic oxide,
By forming the adsorbed water layer, a uniform water film can be formed.
【0012】本発明におけるガラスブロックは、例え
ば、無蓋の箱型のガラスを1対準備し、 対向させて、
400℃以上の温度で接触部を融着して作製する。The glass block in the present invention is prepared, for example, by preparing a pair of open-ended box-shaped glass and facing them,
It is manufactured by fusing the contact portion at a temperature of 400 ° C. or higher.
【0013】光触媒とは、その結晶の伝導帯と価電子帯
との間のエネルギーギャップよりも大きなエネルギー
(すなわち短い波長)の光(励起光)を照射したとき
に、価電子帯中の電子の励起(光励起)が生じて、伝導
電子と正孔を生成しうる物質をいい、例えば、アナター
ゼ型酸化チタン、ルチル型酸化チタン、酸化錫、酸化亜
鉛、三酸化二ビスマス、三酸化タングステン、酸化第二
鉄、チタン酸ストロンチウム等が好適に利用できる。こ
こで光触媒の光励起に用いる光源としては、太陽光;街
灯、常夜灯、室内照明、蛍光灯、メタルハライドラン
プ、ブラックライトランプ、キセノンランプ、水銀灯な
どが好適に利用できる。光触媒の光励起により、基材表
面が高度に親水化されるためには、励起光の照度は、
0.001mW/cm2以上あればよいが、0.01m
W/cm2以上だと好ましく、0.1mW/cm2以上
だとより好ましい。A photocatalyst is a photocatalyst of electrons in the valence band when irradiated with light (excitation light) having an energy (that is, a short wavelength) larger than the energy gap between the conduction band and the valence band of the crystal. A substance that is excited (photoexcited) to generate conduction electrons and holes. For example, anatase-type titanium oxide, rutile-type titanium oxide, tin oxide, zinc oxide, dibismuth trioxide, tungsten trioxide, and oxide oxide. Diiron, strontium titanate and the like can be preferably used. Here, as the light source used for the photoexcitation of the photocatalyst, sunlight; street lights, night lights, indoor lighting, fluorescent lights, metal halide lamps, black light lamps, xenon lamps, mercury lamps and the like can be preferably used. In order for the substrate surface to be highly hydrophilic by photoexcitation of the photocatalyst, the illuminance of the excitation light must be
It may be 0.001 mW / cm 2 or more, but 0.01 m
It is preferably at least W / cm 2, more preferably at least 0.1 mW / cm 2 .
【0014】光触媒を含有する表面層の膜厚は、0.4
μm以下にするのが好ましい。そうすれば、光の乱反射
による白濁を防止することができ、表面層は実質的に透
明となる。さらに、光触媒を含有する表面層の膜厚を
0.2μm以下にすると一層好ましい。 そうすれば、
光の干渉による表面層の発色を防止することができる。
また、表面層が薄ければ薄いほどその透明度は向上す
る。更に、膜厚を薄くすれば、表面層の耐摩耗性が向上
する。上記表面層の表面に、更に、親水化可能な耐摩耗
性又は耐食性の保護層や他の機能膜を設けても良い。The film thickness of the surface layer containing the photocatalyst is 0.4.
It is preferable that the thickness is less than or equal to μm. Then, white turbidity due to irregular reflection of light can be prevented, and the surface layer becomes substantially transparent. More preferably, the thickness of the surface layer containing the photocatalyst is 0.2 μm or less. that way,
Coloring of the surface layer due to light interference can be prevented.
Also, the thinner the surface layer, the better its transparency. Further, when the film thickness is reduced, the wear resistance of the surface layer is improved. The surface of the surface layer may be further provided with a wear-resistant or corrosion-resistant protective layer capable of being made hydrophilic and other functional films.
【0015】上記表面層には、Ag、Cu、Znのよう
な金属を添加することができる。前記金属を添加した表
面層は、表面に付着した細菌や黴を暗所でも死滅させる
ことができる。A metal such as Ag, Cu and Zn can be added to the surface layer. The surface layer to which the metal is added can kill bacteria and fungi attached to the surface even in a dark place.
【0016】上記表面層には、Pt、Pd、Ru、R
h、Ir、Osのような白金族金属を添加することがで
きる。前記金属を添加した表面層は、光触媒の酸化還元
活性を増強でき、脱臭浄化作用等が向上する。また、光
触媒以外に固体酸を添加した場合には、白金族金属の添
加により固体酸の酸度が向上するので、親水維持性も向
上し、付着水の水膜化がより促進されると共に、ある程
度長期間光触媒に励起光が照射されない場合の親水維持
性も向上する。上記表面層には、Moが添加されていて
もよい。この場合も光触媒以外に固体酸を添加した場合
に、固体酸の酸度が向上するので、親水維持性も向上
し、付着水の水膜化がより促進されると共に、ある程度
長期間光触媒に励起光が照射されない場合の親水維持性
も向上する。The surface layer includes Pt, Pd, Ru, R
A platinum group metal such as h, Ir, Os can be added. The surface layer to which the metal is added can enhance the oxidation-reduction activity of the photocatalyst and improve the deodorizing and purifying action and the like. In addition, when a solid acid is added in addition to the photocatalyst, the acidity of the solid acid is improved by the addition of a platinum group metal, so that the hydrophilicity is also improved, and the formation of a water film on the attached water is further promoted. The hydrophilicity when the excitation light is not irradiated to the photocatalyst for a long period of time is also improved. Mo may be added to the surface layer. Also in this case, when a solid acid is added in addition to the photocatalyst, the acidity of the solid acid is improved, so that the hydrophilicity retention property is also improved, the water film of the attached water is further promoted, and the photocatalyst is excited for a long period of time. Is also improved when not irradiated.
【0017】基材がナトリウムのようなアルカリ網目修
飾イオンを含むガラス(ソーダライムガラス、並板ガラ
ス等)の場合には、基材と表面層との間にシリカ等の中
間層を形成してもよい。そうすれば、焼成中にアルカリ
網目修飾イオンが基材から表面層へ拡散するのが防止さ
れ、光触媒機能がよりよく発揮される。When the substrate is a glass containing alkali network modifying ions such as sodium (soda lime glass, parallel plate glass, etc.), an intermediate layer such as silica may be formed between the substrate and the surface layer. Good. Then, the diffusion of the alkali network modifying ions from the base material to the surface layer during the firing is prevented, and the photocatalytic function is more effectively exhibited.
【0018】親水性とは、表面に水を滴下したときにな
じみやすい性質をいい、一般に水濡れ角が90゜未満の
状態をいう。本発明における高度の親水性とは、表面に
水を滴下したときに非常になじみやすい性質をいい、よ
り具体的には水濡れ角が10゜以下程度になる状態をい
う。特に、セルフクリーニング性、水による易清掃性に
はPCT/JP96/00734に開示したように、水
濡れ角が10゜以下であると好ましく、5゜以下ではよ
り好ましい。The term "hydrophilic" refers to the property of being easily conformed when water is dropped on the surface, and generally refers to a state where the water wetting angle is less than 90 °. The term “high hydrophilicity” in the present invention refers to a property that is highly compatible when water is dropped on the surface, and more specifically, a state where the water wetting angle is about 10 ° or less. Particularly, for the self-cleaning property and the easy cleaning property with water, as disclosed in PCT / JP96 / 00734, the water wetting angle is preferably 10 ° or less, more preferably 5 ° or less.
【0019】本発明における固体酸には、硫酸担持Al
2O3、硫酸担持TiO2、硫酸担持ZrO2、硫酸担
持SnO2、硫酸担持Fe2O3、硫酸担持SiO2、
硫酸担持HfO2、TiO2/WO3、WO3/SnO
2、WO3/ZrO2、WO3/Fe2O3、SiO2
・Al2O3、TiO2/SiO2、TiO2/Al2
O3、TiO2/ZrO2等が好適に利用できる。The solid acid used in the present invention includes sulfuric acid-supported Al.
2 O 3 , sulfuric acid supported TiO 2 , sulfuric acid supported ZrO 2 , sulfuric acid supported SnO 2 , sulfuric acid supported Fe 2 O 3 , sulfuric acid supported SiO 2 ,
Sulfuric acid supporting HfO 2 , TiO 2 / WO 3 , WO 3 / SnO
2 , WO 3 / ZrO 2 , WO 3 / Fe 2 O 3 , SiO 2
· Al 2 O 3, TiO 2 / SiO 2, TiO 2 / Al 2
O 3 , TiO 2 / ZrO 2 and the like can be preferably used.
【0020】次に、表面層の形成方法について説明す
る。まず、表面層が光触媒のみからなる場合の製法につ
いて、光触媒がアナターゼ型酸化チタンの場合を例にと
り説明する。この場合の方法は、大別して3つの方法が
ある。1つの方法はゾル塗布焼成法であり、他の方法は
有機チタネート法であり、他の方法は電子ビーム蒸着法
である。 (1)ゾル塗布焼成法 アナターゼ型酸化チタンゾルを、基材表面に、スプレー
コーティング法、ディップコーティング法、フローコー
ティング法、スピンコーティング法、ロールコーティン
グ法等の方法で塗布し、焼成する。 (2)有機チタネート法 チタンアルコキシド(テトラエトキシチタン、テトラメ
トキシチタン、テトラプロポキシチタン、テトラブトキ
シチタン等)、チタンアセテート、チタンキレート等の
有機チタネートに加水分解抑制剤(塩酸、エチルアミン
等)を添加し、アルコール(エタノール、プロパノー
ル、ブタノール等)などの非水溶媒で希釈した後、部分
的に加水分解を進行させながら又は完全に加水分解を進
行させた後、混合物をスプレーコーティング法、ディッ
プコーティング法、フローコーティング法、スピンコー
ティング法、ロールコーティング法等の方法で塗布し、
乾燥させる。乾燥により、有機チタネートの加水分解が
完遂して水酸化チタンが生成し、水酸化チタンの脱水縮
重合により無定型酸化チタンの層が基材表面に形成され
る。その後、アナターゼの結晶化温度以上の温度で焼成
して、無定型酸化チタンをアナターゼ型酸化チタンに相
転移させる。 (3)電子ビーム蒸着法 酸化チタンのターゲットに電子ビームを照射することに
より、基材表面に無定型酸化チタンの層を形成する。そ
の後、アナターゼの結晶化温度以上の温度で焼成して、
無定型酸化チタンをアナターゼ型酸化チタンに相転移さ
せる。Next, a method for forming the surface layer will be described. First, the production method in the case where the surface layer is composed of only the photocatalyst will be described by taking the case where the photocatalyst is anatase type titanium oxide as an example. In this case, there are roughly three methods. One method is a sol coating and firing method, the other method is an organic titanate method, and the other method is an electron beam evaporation method. (1) Sol-coating and firing method Anatase-type titanium oxide sol is applied to the surface of a substrate by a method such as spray coating, dip coating, flow coating, spin coating, or roll coating, and then fired. (2) Organic titanate method Titanium alkoxide (tetraethoxy titanium, tetramethoxy titanium, tetrapropoxy titanium, tetrabutoxy titanium, etc.), titanium acetate, titanium chelate, etc. are added with a hydrolysis inhibitor (hydrochloric acid, ethylamine, etc.). , After diluting with a non-aqueous solvent such as alcohol (ethanol, propanol, butanol, etc.), while partially or completely proceeding the hydrolysis, the mixture is spray-coated, dip-coated, Apply by methods such as flow coating method, spin coating method, roll coating method,
dry. By drying, the hydrolysis of the organic titanate is completed to produce titanium hydroxide, and a layer of amorphous titanium oxide is formed on the surface of the base material by dehydration-condensation polymerization of the titanium hydroxide. Thereafter, the amorphous titanium oxide is calcined at a temperature equal to or higher than the crystallization temperature of anatase to cause a phase transition from the amorphous titanium oxide to the anatase titanium oxide. (3) Electron beam evaporation method An amorphous titanium oxide layer is formed on the surface of a substrate by irradiating a titanium oxide target with an electron beam. After that, firing at a temperature higher than the crystallization temperature of anatase,
Phase transition of amorphous titanium oxide to anatase titanium oxide.
【0021】次に、表面層が光触媒とシリカからなる場
合について、光触媒がアナターゼ型酸化チタンの場合を
例にとり説明する。この場合の方法は、例えば、以下の
3つの方法がある。1つの方法はゾル塗布焼成法であ
り、他の方法は有機チタネート法であり、他の方法は4
官能性シラン法である。 (1)ゾル塗布焼成法 アナターゼ型酸化チタンゾルとシリカゾルとの混合液
を、基材表面にスプレーコーティング法、デイップコー
ティング法、フローコーティング法、スピンコーティン
グ法、ロールコーティング法等の方法で塗布し、焼成す
る。 (2)有機チタネート法 チタンアルコキシド(テトラエトキシチタン、テトラメ
トキシチタン、テトラプロポキシチタン、テトラブトキ
シチタン等)、チタンアセテート、チタンキレート等の
有機チタネートに加水分解抑制剤(塩酸、エチルアミン
等)とシリカゾルを添加し、アルコール(エタノール、
プロパノール、ブタノール等)などの非水溶媒で希釈し
た後、部分的に加水分解を進行させながら又は完全に加
水分解を進行させた後、混合物をスプレーコーティング
法、ディップコーティング法、フローコーティング法、
スピンコーティング法、ロールコーティング法等の方法
で塗布し、乾燥させる。乾燥により、有機チタネートの
加水分解が完遂して水酸化チタンが生成し、水酸化チタ
ンの脱水縮重合により無定型酸化チタンの層が基材表面
に形成される。その後、アナターゼの結晶化温度以上の
温度で焼成して、無定型酸化チタンをアナターゼ型酸化
チタンに相転移させる。 (3)4官能性シラン法 テトラアルコキシシラン(テトラエトキシシラン、テト
ラプロポキシシラン、テトラブトキシシラン、テトラメ
トキシシラン等)とアナターゼ型酸化チタンゾルとの混
合物を基材の表面にスプレーコーティング法、ディップ
コーティング法、フローコーティング法、スピンコーテ
ィング法、ロールコーティング法等の方法で塗布し、必
要に応じて加水分解させてシラノールを形成した後、加
熱等の方法でシラノールを脱水縮重合に付す。Next, the case where the surface layer is composed of a photocatalyst and silica will be described by taking the case where the photocatalyst is anatase type titanium oxide as an example. In this case, for example, there are the following three methods. One method is the sol coating firing method, the other is the organic titanate method, the other is 4
This is a functional silane method. (1) Sol coating firing method A mixed solution of anatase type titanium oxide sol and silica sol is applied to the surface of a substrate by a spray coating method, a dip coating method, a flow coating method, a spin coating method, a roll coating method or the like, and then baked. To do. (2) Organic titanate method Titanium alkoxides (tetraethoxytitanium, tetramethoxytitanium, tetrapropoxytitanium, tetrabutoxytitanium, etc.), titanium acetate, titanium chelate, and other organic titanates are added with a hydrolysis inhibitor (hydrochloric acid, ethylamine, etc.) and silica sol. Add alcohol (ethanol,
After diluting with a non-aqueous solvent such as propanol, butanol, etc., and then allowing the hydrolysis to proceed partially or completely, the mixture is spray-coated, dip-coated, flow-coated,
It is applied by a method such as spin coating or roll coating and dried. By drying, the hydrolysis of the organic titanate is completed to produce titanium hydroxide, and a layer of amorphous titanium oxide is formed on the surface of the base material by dehydration-condensation polymerization of the titanium hydroxide. Thereafter, the amorphous titanium oxide is calcined at a temperature equal to or higher than the crystallization temperature of anatase to cause a phase transition from the amorphous titanium oxide to the anatase titanium oxide. (3) Tetrafunctional silane method A mixture of tetraalkoxysilane (tetraethoxysilane, tetrapropoxysilane, tetrabutoxysilane, tetramethoxysilane, etc.) and anatase type titanium oxide sol is spray-coated or dip-coated on the surface of a substrate. , A flow coating method, a spin coating method, a roll coating method, or the like, and if necessary, hydrolyzing to form silanol, and then silanol is subjected to dehydration condensation polymerization by a method such as heating.
【0022】次に、表面層が光触媒と固体酸からなる場
合について、光触媒がアナターゼ型酸化チタン、固体酸
がTiO2/WO3の場合を例にとり説明する。この場
合の方法は、タングステン酸のアンモニア溶解液とアナ
ターゼ型酸化チタンゾルとを混合し、必要に応じて希釈
液(水、エタノール等)で希釈した混合物を基材の表面
にスプレーコーティング法、ディップコーティング法、
フローコーティング法、スピンコーティング法、ロール
コーティング法等の方法で塗布し、焼成する。他の方法
は、電子ビーム蒸着や、チタンアルコキシド、チタンア
セテート、チタンキレート等の有機チタネートの加水分
解及び脱水縮重合により、無定型酸化チタンが結晶化
し、かつTiO2/WO3複合酸化物が生成する温度で
熱処理する。Next, the case where the surface layer is composed of a photocatalyst and a solid acid will be described by taking as an example the case where the photocatalyst is anatase type titanium oxide and the solid acid is TiO 2 / WO 3 . In this case, the ammonia solution of tungstic acid and anatase type titanium oxide sol are mixed, and if necessary, a mixture diluted with a diluent (water, ethanol, etc.) is spray-coated or dip-coated on the surface of the substrate. Law,
It is applied by a method such as a flow coating method, a spin coating method, a roll coating method or the like, and baked. Other methods include electron beam evaporation and hydrolysis and dehydration polycondensation of organic titanates such as titanium alkoxide, titanium acetate and titanium chelate to crystallize amorphous titanium oxide and produce TiO 2 / WO 3 composite oxide. Heat treatment is performed at a temperature.
【0023】次に、表面層が光触媒とシリコーンからな
る場合について、光触媒がアナターゼ型酸化チタンの場
合を例にとり説明する。この場合の方法は、未硬化の若
しくは部分的に硬化したシリコーン又はシリコーンの前
駆体からなる塗料とアナターゼ型酸化チタンゾルとを混
合し、シリコーンの前駆体を必要に応じて加水分解させ
た後、混合物を基材の表面にスプレーコーティング法、
ディップコーティング法、フローコーティング法、スピ
ンコーティング法、ロールコーティング法等の方法で塗
布し、加熱等の方法でシリコーンの前駆体の加水分解物
を脱水縮重合に付して、アナターゼ型酸化チタン粒子と
シリコーンからなる表面層を形成する。形成された表面
層は、紫外線を含む光の照射によりアナターゼ型酸化チ
タンが光励起されることにより、シリコーン分子中のケ
イ素原子に結合した有機基の少なくとも一部を水酸基に
置換され、さらにその上に物理吸着水層が形成されて、
高度の親水性を呈する。ここでシリコーンの前駆体に
は、メチルトリメトキシシラン、メチルトリエトキシシ
ラン、メチルトリブトキシシラン、メチルトリプロポキ
シシラン、エチルトリメトキシシラン、エチルトリエト
キシシラン、エチルトリブトキシシラン、エチルトリプ
ロポキシシラン、フェニルトリメトキシシラン、フェニ
ルトリエトキシシラン、フェニルトリブトキシシラン、
フェニルトリプロポキシシラン、ジメチルジメトキシシ
ラン、ジメチルジエトキシシラン、ジメチルジブトキシ
シラン、ジメチルジプロポキシシラン、ジエチルジメト
キシシラン、ジエチルジエトキシシラン、ジエチルジブ
トキシシラン、ジエチルジプロポキシシラン、フェニル
メチルジメトキシシラン、フェニルメチルジエトキシシ
ラン、フェニルメチルジブトキシシラン、フェニルメチ
ルジプロポキシシラン、γ−グリシドキシプロピルトリ
メトキシシラン、及びそれらの加水分解物、それらの混
合物が好適に利用できる。Next, the case where the surface layer is composed of a photocatalyst and silicone will be described by taking the case where the photocatalyst is anatase type titanium oxide as an example. The method in this case is to mix a coating composed of uncured or partially cured silicone or a precursor of silicone and anatase type titanium oxide sol, and hydrolyze the precursor of silicone as needed, and then mix the mixture. Spray coating method on the surface of the substrate,
It is applied by a method such as a dip coating method, a flow coating method, a spin coating method, a roll coating method, etc., and a hydrolyzate of a silicone precursor is subjected to dehydration polycondensation by a method such as heating to obtain anatase type titanium oxide particles. A surface layer made of silicone is formed. The formed surface layer, by photoexcitation of anatase type titanium oxide by irradiation with light including ultraviolet rays, at least a part of the organic group bonded to the silicon atom in the silicone molecule is substituted with a hydroxyl group, and further on it. A physically adsorbed water layer is formed,
It exhibits a high degree of hydrophilicity. Here, the precursor of silicone includes methyltrimethoxysilane, methyltriethoxysilane, methyltributoxysilane, methyltripropoxysilane, ethyltrimethoxysilane, ethyltriethoxysilane, ethyltributoxysilane, ethyltripropoxysilane, and phenyl. Trimethoxysilane, phenyltriethoxysilane, phenyltributoxysilane,
Phenyltripropoxysilane, dimethyldimethoxysilane, dimethyldiethoxysilane, dimethyldibutoxysilane, dimethyldipropoxysilane, diethyldimethoxysilane, diethyldiethoxysilane, diethyldibutoxysilane, diethyldipropoxysilane, phenylmethyldimethoxysilane, phenylmethyl Diethoxysilane, phenylmethyldibutoxysilane, phenylmethyldipropoxysilane, γ-glycidoxypropyltrimethoxysilane, a hydrolyzate thereof, and a mixture thereof can be suitably used.
【0024】[0024]
【実施例】10cm角のソーダライムガラス板の表面に
電子ビーム蒸着法により無定型酸化チタンを被着し、そ
の後500℃の温度で焼成することにより、無定型酸化
チタンを結晶化させてアナターゼ型酸化チタンを生成さ
せた。アナターゼ型酸化チタン被膜の膜厚は100nm
であった。さらにその上に25%アンモニア水に溶解さ
せたタングステン酸を、タングステン酸重量に換算して
0.6μg/cm2を塗布後、500℃の温度で焼成し
た。次に、このガラス板を数日間暗所に放置した後、紫
外線光源(三共電気、ブラックライトブルー(BLB)
蛍光灯)を用いて試料の表面に0.5mW/cm2の紫
外線照度で約1時間紫外線を照射し、#1試料を得た。
比較のため、10cm角のソーダライムガラス板#2試
料も準備した。まず、#1試料と#2試料に水滴を滴下
し、滴下後の様子の観察及び水との接触角の測定を行っ
た。ここで水との接触角は接触角測定器(協和界面科
学、CA−X150)を用い、滴下後30秒後の水との
接触角で評価した。その結果#1試料はマイクロシリン
ジから試料表面に水滴を滴下されると、水滴が一様に水
膜状に試料表面を拡がる様子が観察された。また30秒
後の水との接触角は約0゜まで高度に親水化されてい
た。それに対し、#2試料ではマイクロシリンジから試
料表面に水滴を滴下されると、水滴は表面にややなじむ
ものの、一様に水膜状になるまでには至らなかった。ま
た30秒後の水との接触角は40゜であった。[Examples] Amorphous titanium oxide was crystallized by depositing amorphous titanium oxide on the surface of a 10 cm square soda lime glass plate by an electron beam evaporation method and then firing at a temperature of 500 ° C. Titanium oxide was produced. Anatase type titanium oxide film thickness is 100 nm
Met. Further, tungstic acid dissolved in 25% ammonia water was applied thereon at 0.6 μg / cm 2 in terms of tungstic acid weight, and then baked at a temperature of 500 ° C. Next, after leaving this glass plate in a dark place for several days, an ultraviolet light source (Sankyo Denki, Black Light Blue (BLB))
The surface of the sample was irradiated with ultraviolet rays for about 1 hour using a fluorescent lamp at an ultraviolet illuminance of 0.5 mW / cm 2 to obtain a # 1 sample.
For comparison, a 10 cm square soda lime glass plate # 2 sample was also prepared. First, a water drop was dropped on the # 1 sample and the # 2 sample, and the state after the drop was observed and the contact angle with water was measured. Here, the contact angle with water was evaluated using a contact angle measuring device (Kyowa Interface Science, CA-X150) based on the contact angle with water 30 seconds after dropping. As a result, when a water drop was dropped from the micro syringe onto the sample surface, it was observed that the water droplet spread uniformly on the sample surface in a water film shape. Further, the contact angle with water after 30 seconds was highly hydrophilized to about 0 °. On the other hand, in the # 2 sample, when a water droplet was dropped from the microsyringe on the surface of the sample, the water droplet slightly adapted to the surface, but did not reach a uniform water film shape. The contact angle with water after 30 seconds was 40 °.
【0025】次に、#1試料の表面にオレイン酸を塗布
し、試料表面を水平姿勢に保持しながら夫々の試料を水
槽に満たした水の中に浸漬した。その結果、#1試料で
は、オレイン酸は丸くなり、軽くこすると表面から離脱
した。Next, oleic acid was applied to the surface of the # 1 sample, and each sample was immersed in water filled in a water tank while keeping the sample surface in a horizontal posture. As a result, in the # 1 sample, the oleic acid became round, and lightly rubbed off from the surface.
【0026】次に、疎水性カーボンブラック1重量部、
親水性カーボンブラック1重量部からなる粉体混合物を
1.05g/リッターの濃度で水に懸濁させたスラリー
を調製した。45度に傾斜させた#1試料に上記スラリ
ー150mlを流下させて15分間乾燥させ、次いで蒸
留水150mlを流下させて15分間乾燥させ、このサ
イクルを25回反復した。試験前後の色差変化を,色差
計(東京電色)を用いて計測した。色差は日本工業規格
(JIS)H0201に従い、ΔE*表示を用いた。そ
の結果、#1試料の色差変化は0.6に止まった。Next, 1 part by weight of hydrophobic carbon black,
A slurry was prepared by suspending a powder mixture consisting of 1 part by weight of hydrophilic carbon black in water at a concentration of 1.05 g / liter. 150 ml of the above slurry was made to flow down on a # 1 sample inclined at 45 degrees and dried for 15 minutes, then 150 ml of distilled water was made to flow down and dried for 15 minutes, and this cycle was repeated 25 times. The color difference change before and after the test was measured using a color difference meter (Tokyo Denshoku). The color difference was represented by ΔE * according to Japanese Industrial Standard (JIS) H0201. As a result, the color difference change of the # 1 sample was only 0.6.
【0029】[0029]
【発明の効果】本発明では、ガラスブロック基材の表面
に、光触媒粒子を含有する表面層を備えるようにするこ
とにより、ガラスブロック表面は、光触媒の光励起に応
じて高度の親水性を呈し、降雨により自己清浄化(セル
フクリーニング)され、或いは散水や水濯ぎや水拭き程
度で清掃可能になる。INDUSTRIAL APPLICABILITY In the present invention, by providing the surface of the glass block substrate with the surface layer containing photocatalyst particles, the glass block surface exhibits a high degree of hydrophilicity in response to photoexcitation of the photocatalyst, It is self-cleaning (self-cleaning) by rainfall, or it can be cleaned by spraying water, rinsing water, or wiping with water.
【図1】 本発明に係るガラスブロックの表面構造を示
す図。FIG. 1 is a diagram showing a surface structure of a glass block according to the present invention.
【図2】 本発明に係るガラスブロックの他の表面構造
を示す図。FIG. 2 is a diagram showing another surface structure of the glass block according to the present invention.
Claims (10)
子を含有する表面層を備え、前記光触媒の光励起に応じ
て、前記層の表面は親水性を呈し、以てガラスブロック
の前記層が降雨にさらされた時に付着堆積物及び/又は
汚染物が雨滴により洗い流されるのを可能にするセルフ
クリーニング性ガラスブロック。1. A surface layer of a glass block substrate is provided with a surface layer containing photocatalyst particles, and the surface of the layer exhibits hydrophilicity in response to photoexcitation of the photocatalyst, whereby the layer of the glass block is rained. A self-cleaning glass block that allows adherent deposits and / or contaminants to be washed away by raindrops when exposed to water.
子を含有する表面層を備え、前記光触媒の光励起に応じ
て、前記層の表面は親水性を呈し、以てガラスブロック
の前記層表面を水で洗浄するのが容易になる易清掃性ガ
ラスブロック。2. The surface of a glass block substrate is provided with a surface layer containing photocatalyst particles, and the surface of the layer exhibits hydrophilicity in response to photoexcitation of the photocatalyst, and thus the surface of the layer of the glass block is Easy-to-clean glass block that is easy to wash with water.
れていることを特徴とする請求項1、2に記載のガラス
ブロック。3. The glass block according to claim 1, wherein the surface layer further contains silica.
れていることを特徴とする請求項1、2に記載のガラス
ブロック。4. The glass block according to claim 1, wherein the surface layer further contains a solid acid.
有されていることを特徴とする請求項1、2に記載のガ
ラスブロック。5. The glass block according to claim 1, wherein the surface layer further contains silicone.
起に応じて、水との接触角に換算して10゜以下の親水
性を呈することを特徴とする請求項1〜5に記載のガラ
スブロック。6. The surface according to claim 1, wherein the surface of the surface layer exhibits hydrophilicity of 10 ° or less in terms of contact angle with water in response to photoexcitation of the photocatalyst. Glass block.
起に応じて、水との接触角に換算して5゜以下の親水性
を呈することを特徴とする請求項1〜5に記載のガラス
ブロック。7. The surface of the surface layer exhibits hydrophilicity of 5 ° or less in terms of contact angle with water in response to photoexcitation of the photocatalyst. Glass block.
な保護層が設けられていることを特徴とする請求項1〜
7に記載のガラスブロック。8. A hydrophilic protective layer is further provided on the surface of the surface layer.
The glass block according to 7.
準備する工程と;前記ガラスブロックを前記層表面が降
雨の当たるように配置する工程と;前記ガラスブロック
の表面層に含有される光触媒を光励起することにより、
前記層の表面を親水性にする工程と;前記ガラスブロッ
クを降雨にさらして、前記層の表面に付着する堆積物及
び/又は汚染物を雨滴により洗い流させる工程;からな
るガラスブロックのセルフクリーニング方法。9. A step of preparing the glass block according to claim 1; a step of arranging the glass block such that the surface of the layer is exposed to rainfall; a photocatalyst contained in a surface layer of the glass block. By optically exciting
A method of self-cleaning a glass block, which comprises: making the surface of the layer hydrophilic; exposing the glass block to rainfall to wash away deposits and / or contaminants adhering to the surface of the layer by raindrops. .
を準備する工程と;前記ガラスブロックの表面層に含有
される光触媒を光励起することにより、前記層の表面を
親水性にする工程と;前記ガラスブロックを水で濯ぐ又
は水拭きすることにより、前記層の表面に付着する堆積
物及び/又は汚染物を表面から釈放させて水により洗い
流す工程;からなるガラスブロックの清浄化方法。10. A step of preparing the glass block according to claim 1; a step of making a surface of the layer hydrophilic by photoexciting a photocatalyst contained in a surface layer of the glass block; A method for cleaning a glass block, comprising the steps of rinsing or wiping the glass block with water to release deposits and / or contaminants adhering to the surface of the layer from the surface and washing with water.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8282810A JPH09228545A (en) | 1995-12-22 | 1996-09-18 | Glass block and its cleaning method |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7-354649 | 1995-12-22 | ||
JP35464995 | 1995-12-22 | ||
JP8282810A JPH09228545A (en) | 1995-12-22 | 1996-09-18 | Glass block and its cleaning method |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH09228545A true JPH09228545A (en) | 1997-09-02 |
Family
ID=18438979
Family Applications (71)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
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JP2000181284A Pending JP2001048679A (en) | 1995-12-22 | 2000-06-16 | Photocatalytic hydrophilic tile and its production |
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JP2000227056A Pending JP2001129916A (en) | 1995-12-22 | 2000-07-27 | Photocatalytic hydrophilic member |
JP2000227055A Withdrawn JP2001089752A (en) | 1995-12-22 | 2000-07-27 | Member capable of obtaining hydrophilic nature in accordance with photoexcitation of optical semiconductor and manufacturing method thereof |
JP2000247609A Pending JP2001122679A (en) | 1995-12-22 | 2000-08-17 | Antifouling tile |
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JP2002244772A Pending JP2003113345A (en) | 1995-12-22 | 2002-08-26 | Antistatic coating composition |
Family Applications Before (33)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8083499A Pending JPH09231821A (en) | 1995-12-22 | 1996-04-05 | Luminaire and method for maintaining illuminance |
JP13408196A Expired - Lifetime JP3385850B2 (en) | 1995-12-22 | 1996-04-19 | Composite material with hydrophilicity |
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JP15017196A Expired - Lifetime JP3760509B2 (en) | 1995-12-22 | 1996-05-22 | Greenhouse ceiling and its condensation prevention method |
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JP13653596A Expired - Lifetime JP3339304B2 (en) | 1995-12-22 | 1996-05-30 | Painted object and painting method |
JP8136777A Pending JPH09227178A (en) | 1995-12-22 | 1996-05-30 | Laminated glass and its production |
JP13782996A Ceased JP3189682B2 (en) | 1995-12-22 | 1996-05-31 | Antifouling material |
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JP8145265A Pending JPH09225276A (en) | 1995-12-22 | 1996-06-07 | Separating membrane and formation of surface layer to separating membrane |
JP8168662A Pending JPH09225389A (en) | 1995-12-22 | 1996-06-10 | Method for making member hydrophilic and preventing deterioration by ultraviolet ray, hydrophilic ultraviolet resistant member and its manufacture |
JP8158518A Pending JPH09225021A (en) | 1995-12-22 | 1996-06-19 | Medical material |
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JP8272814A Pending JPH09226041A (en) | 1995-12-22 | 1996-09-06 | Member for preventing attachment of condensation water drop and method for preventing attachment of condensation water drop of the member |
JP8272815A Pending JPH09224957A (en) | 1995-12-22 | 1996-09-06 | Laser beam focusing lens, dentistry and oral surgery treatment device using the same, and preventing device of laser beam irregular reflection due to stuck waterdrop |
JP8272808A Pending JPH09229724A (en) | 1995-12-22 | 1996-09-07 | Non-fogging cover for instrument panel of motorcycle, motorcycle equipped with the cover, and fogging-preventing method for the cover |
JP27280996A Expired - Fee Related JP3588202B2 (en) | 1995-12-22 | 1996-09-07 | Anti-fog road mirror and its anti-fog method |
JP27519096A Expired - Lifetime JP3277983B2 (en) | 1995-12-22 | 1996-09-10 | Outdoor display panel and its cleaning method |
JP8275189A Pending JPH09231807A (en) | 1995-12-22 | 1996-09-10 | Vehicle headlight cover, vehicle with it, and its defogging method |
JP8238927A Pending JPH09227159A (en) | 1995-12-22 | 1996-09-10 | Front and rear window glass of vehicle |
JP8281223A Expired - Lifetime JP3063968B2 (en) | 1995-12-22 | 1996-09-17 | Anti-fog vehicle mirror, automobile equipped with the same, anti-fog film for vehicle mirror and anti-fog method for vehicle mirror |
JP8281225A Pending JPH09230107A (en) | 1995-12-22 | 1996-09-17 | Anti-fogging glass lens and its anti-fogging method |
JP8281222A Pending JPH09230106A (en) | 1995-12-22 | 1996-09-17 | Anti-fogging camera filter and its anti-fogging method |
JP8281224A Pending JPH09228134A (en) | 1995-12-22 | 1996-09-17 | Antifogging helmet shield and antifogging method |
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JP8281220A Expired - Lifetime JP3003593B2 (en) | 1995-12-22 | 1996-09-17 | Photocatalytic hydrophilic member |
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JP8246180A Pending JPH09230493A (en) | 1995-12-22 | 1996-09-18 | Camera |
JP8282808A Pending JPH09228765A (en) | 1995-12-22 | 1996-09-18 | Blind and manufacture thereof |
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Family Applications After (37)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP08282811A Expired - Fee Related JP3075195B2 (en) | 1995-12-22 | 1996-09-18 | Anti-fog wash mirror, vanity table provided with the same, anti-fog film for wash mirror and anti-fog method for wash mirror |
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JP2000180301A Expired - Lifetime JP3414365B2 (en) | 1995-12-22 | 2000-06-15 | Building materials for exterior walls |
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JP2000227056A Pending JP2001129916A (en) | 1995-12-22 | 2000-07-27 | Photocatalytic hydrophilic member |
JP2000227055A Withdrawn JP2001089752A (en) | 1995-12-22 | 2000-07-27 | Member capable of obtaining hydrophilic nature in accordance with photoexcitation of optical semiconductor and manufacturing method thereof |
JP2000247609A Pending JP2001122679A (en) | 1995-12-22 | 2000-08-17 | Antifouling tile |
JP2001140242A Pending JP2002030258A (en) | 1995-12-22 | 2001-05-10 | Coated material and method for coating |
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Country Status (1)
Country | Link |
---|---|
JP (71) | JPH09231821A (en) |
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