JPH09225388A - Stainproofing member - Google Patents
Stainproofing memberInfo
- Publication number
- JPH09225388A JPH09225388A JP8137829A JP13782996A JPH09225388A JP H09225388 A JPH09225388 A JP H09225388A JP 8137829 A JP8137829 A JP 8137829A JP 13782996 A JP13782996 A JP 13782996A JP H09225388 A JPH09225388 A JP H09225388A
- Authority
- JP
- Japan
- Prior art keywords
- surface layer
- photocatalyst particles
- antifouling member
- titania
- titanium oxide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F28—HEAT EXCHANGE IN GENERAL
- F28F—DETAILS OF HEAT-EXCHANGE AND HEAT-TRANSFER APPARATUS, OF GENERAL APPLICATION
- F28F13/00—Arrangements for modifying heat-transfer, e.g. increasing, decreasing
- F28F13/18—Arrangements for modifying heat-transfer, e.g. increasing, decreasing by applying coatings, e.g. radiation-absorbing, radiation-reflecting; by surface treatment, e.g. polishing
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F24—HEATING; RANGES; VENTILATING
- F24F—AIR-CONDITIONING; AIR-HUMIDIFICATION; VENTILATION; USE OF AIR CURRENTS FOR SCREENING
- F24F8/00—Treatment, e.g. purification, of air supplied to human living or working spaces otherwise than by heating, cooling, humidifying or drying
- F24F8/20—Treatment, e.g. purification, of air supplied to human living or working spaces otherwise than by heating, cooling, humidifying or drying by sterilisation
- F24F8/22—Treatment, e.g. purification, of air supplied to human living or working spaces otherwise than by heating, cooling, humidifying or drying by sterilisation using UV light
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F28—HEAT EXCHANGE IN GENERAL
- F28F—DETAILS OF HEAT-EXCHANGE AND HEAT-TRANSFER APPARATUS, OF GENERAL APPLICATION
- F28F2245/00—Coatings; Surface treatments
- F28F2245/02—Coatings; Surface treatments hydrophilic
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明はタイル、コンクリー
ト、ガラス、煉瓦、プラスチック、セラミック或いはこ
れらを複合した部材に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to tiles, concrete, glass, bricks, plastics, ceramics, or composite members thereof.
【0002】[0002]
【従来の技術】従来にあっては部材表面を撥水性にする
ことで汚れが付着しにくくなると考えられていた。しか
しながら、撥水性を持たせた場合、泥水などが水滴とな
って基材表面に残り、これが乾燥すると落としにくくな
る。また外壁に貼り付けたタイル等には経時的に黒い筋
状の汚れが目立つようになる。この汚れは燃焼生成物の
カーボンブラック等の疎水性物質からなり、この疎水性
物質は水よりも疎水性の基材になじみやすいため、雨水
によって流されにくく、材料表面に滞留してしまう。2. Description of the Related Art Conventionally, it has been considered that stains are less likely to adhere by making the surface of a member water repellent. However, when it is made water-repellent, muddy water or the like remains as water droplets on the surface of the base material, and when it dries, it becomes difficult to drop it. Also, black stripe-like stains will become noticeable over time on the tiles and the like attached to the outer wall. The dirt is composed of a hydrophobic substance such as carbon black which is a combustion product. Since the hydrophobic substance is more easily adapted to a hydrophobic base material than water, it is hard to be washed away by rainwater and stays on the surface of the material.
【0003】そこで最近では、基材表面に親水性の樹脂
コーティングを施すことで、自動洗浄効果を発揮させる
ことが文献(「高分子」1995 第44巻)に提案されてい
る。即ち、基材表面に親水性を持たせることで、表面に
薄い水膜を形成し、汚れ成分を付着しにくくするととも
に雨水等で容易に汚れを流し落とすというものである。Therefore, recently, it has been proposed in the literature ("Polymer" 1995, Vol. 44) to exert an automatic cleaning effect by applying a hydrophilic resin coating to the surface of a base material. That is, by imparting hydrophilicity to the surface of the base material, a thin water film is formed on the surface to make it difficult for dirt components to adhere and to easily wash away dirt with rainwater or the like.
【0004】そこで、親水性のグラフトポリマーで建物
を塗装することも提案されている(化学工業日報 19
95年1月30日)。更に、最近ではアクリル樹脂やア
クリルシリコン樹脂等の多数の親水性塗料が市販されて
いる。Therefore, it has been proposed to coat the building with a hydrophilic graft polymer (Chemical Industry Daily 19
January 30, 1995). Further, recently, many hydrophilic paints such as acrylic resin and acrylic silicone resin are commercially available.
【0005】親水性塗料としては、アクリルシリコン系
樹脂、水性シリコーンコーティング剤、シリコーン樹脂
とアクリル樹脂のグラフト重合体、シリコーン樹脂とア
クリル樹脂のブロック重合体、アクリル樹脂、アクリル
−スチレン樹脂、ソルビタン脂肪酸エチレンオキサイ
ド、ウレタン系アセテート、ソルビタン脂肪酸エステ
ル、ポリカーボネイトジオール及び/またはポリイソシ
アネートからなる架橋型ウレタン、ポリアクリル酸アル
キルエステル架橋体等がある。Examples of hydrophilic coating materials include acrylic silicone resins, water-based silicone coating agents, graft polymers of silicone resins and acrylic resins, block polymers of silicone resins and acrylic resins, acrylic resins, acrylic-styrene resins, sorbitan fatty acid ethylene. There are cross-linked urethanes composed of oxides, urethane acetates, sorbitan fatty acid esters, polycarbonate diols and / or polyisocyanates, polyacrylic acid alkyl ester cross-linked products, and the like.
【0006】[0006]
【発明が解決しようとする課題】前記したように、樹脂
コーティングによって基材表面を親水性にした場合で
も、水との接触角はせいぜい30〜40°程度までしか
小さくならず、これでは一般的なタイル表面の水との接
触角(約20°)よりも大きく、自動洗浄効果はタイル
以上にはならない。As described above, even when the surface of the base material is made hydrophilic by the resin coating, the contact angle with water can be reduced to about 30 to 40 ° at most, and this is common. It is larger than the contact angle of water (about 20 °) on the tile surface, and the automatic cleaning effect is no better than the tile.
【0007】また、燃焼生成物や都市塵埃等は基本的に
疎水性であるため、基材の水との接触角が大きくなると
同じ疎水性を示す基材表面に付着しやすくなり、汚れが
目立つようになる。また、燃焼生成物や都市塵埃以外の
汚泥等の汚れは、水との接触角が20°〜50°程度の
親水性を発揮する。したがって、基板表面の水との接触
角が20°〜50°の場合に基材表面と汚れとが類似の
親水性を発揮することになり、付着しやすくなって汚れ
のピーク値を示す。Further, since combustion products and city dust are basically hydrophobic, when the contact angle of the base material with water increases, the base material having the same hydrophobicity easily adheres to the surface of the base material and stains are conspicuous. Like Further, dirt such as combustion products and sludge other than urban dust exhibits hydrophilicity with a contact angle with water of about 20 ° to 50 °. Therefore, when the contact angle of the surface of the substrate with water is 20 ° to 50 °, the surface of the base material and the stain exhibit similar hydrophilicity, and they easily adhere to each other and show the peak value of the stain.
【0008】これとは逆に、基材表面の水との接触角が
20°以下、好ましくは10°以下、更に好ましくは1
°以下になると、無機物質(汚れ)に対する親和性より
も水に対する親和性の方が高くなり、表面に優先的に付
着する水によって無機物質の付着が阻害されるととも
に、付着した或いは付着しようとする無機物質が水によ
って容易に洗い流されることになるが、長期に亘って基
材表面の水との接触角を10°以下に保つ技術が開発さ
れていない。On the contrary, the contact angle of the surface of the substrate with water is 20 ° or less, preferably 10 ° or less, more preferably 1
When the temperature is less than °, the affinity for water becomes higher than the affinity for inorganic substances (dirt), and the water preferentially adhering to the surface inhibits the adhesion of the inorganic substances, and at the same time tries to adhere or try to adhere. The resulting inorganic substance is easily washed away with water, but no technique has been developed for keeping the contact angle of the surface of the substrate with water at 10 ° or less for a long period of time.
【0009】一方、特開平6−278241号公報及び
特開平7−51646号公報には、光触媒による酸化還
元作用によって汚れを分解する提案がなされている。光
触媒粒子の酸化還元反応に基づく分解作用は、光触媒粒
子に紫外線等を照射すると、光励起により電子−正孔対
が生じ、このうち電子は表面酸素を還元してスーパーオ
キサイドイオン(O2 -)を生成し、正孔は表面水酸基を
酸化して水酸ラジカル(・OH)を生成し、これらの極
めて反応性に富む活性種(O2 -や・OH)の酸化還元反
応によって表面に付着した悪臭成分等を分解するという
ものである。On the other hand, Japanese Unexamined Patent Publication No. 6-278241 and Japanese Unexamined Patent Publication No. 7-51646 propose to decompose dirt by the redox action of a photocatalyst. Decomposing action based on the redox reaction of the photocatalyst particles is irradiated with ultraviolet rays or the like to the photocatalyst particles, electrons by photoexcitation - hole pairs are generated, superoxide ion electron pairs is by reducing the surface oxygen - the (O 2) generated, holes oxidize surface hydroxyl groups to produce the hydroxyl radical (· OH), these highly active species highly reactive - attached to the surface by an oxidation-reduction reaction of (O 2 or · OH) malodor It is to decompose the components.
【0010】[0010]
【課題を解決するための手段】本発明は部材表面に汚れ
が付着しにくい特性を付与するとともに部材自体に汚れ
に対する自浄効果を持たせるには、表面を撥水性にする
よりも水に対する接触角が小さい親水性にする方が効果
的であるという事実。また、酸化チタン等の光触媒粒子
には従来から知られていた酸化還元反応によって汚れ等
を分解する作用の他に、物品の表面を親水化(超親水
化)する作用を有するという本発明者らが独自に知見し
た事実に基づいて本発明を成したものである。According to the present invention, in order to impart the property that dirt is not easily attached to the surface of a member and to have a self-cleaning effect on the member itself, the contact angle to water is more preferable than making the surface water repellent. The fact that it is more effective to make it less hydrophilic. Further, the present inventors have found that photocatalyst particles such as titanium oxide have a function of hydrophilizing (superhydrophilizing) the surface of an article in addition to the function of decomposing dirt and the like by a conventionally known redox reaction. The present invention has been made based on the facts independently discovered by.
【0011】ここで、本発明者らが最近新たに知見した
光触媒の親水化作用は、その理論的根拠は完全には解明
されていないが、光触媒効果によって水酸基(OH-)
が光触媒粒子表面に化学吸着し、或いは水酸基(O
H-)が有機基と置換し、更にこの水酸基(OH-)に空
気中の水分子が物理吸着し、物理吸着水が増加すること
によって表面の親水性が増し、超親水性の表面が実現す
ると考えている。Here, the theoretical basis of the hydrophilization action of the photocatalyst newly discovered by the present inventors has not been completely elucidated, but the photocatalytic effect causes a hydroxyl group (OH − ).
Are chemically adsorbed on the surface of photocatalyst particles, or hydroxyl groups (O
H -) is replaced with an organic group, further the hydroxyl (OH -) water molecules in the air is physically adsorbed, the hydrophilic surface is increased by physically adsorbed water increases, super hydrophilic surface is achieved I think so.
【0012】具体例として、表面層がSi−O結合を有
するシリコーン樹脂からなる場合を説明すると、光触媒
粒子に光を照射する前は図1(a)に示すように、Si
原子にアルキル基(R)が結合しているため、表面層は
疎水性を示すが、光触媒粒子のバンドギャップエネルギ
よりも高いエネルギの光を照射すると、図1(b)に示
すように、まず光触媒効果によってアルキル基(R)が
水酸基(OH-)に置換(化学吸着)し、更にこの水酸
基(OH-)に空気中の水分子が物理吸着して親水性を
発揮する。As a specific example, a case where the surface layer is made of a silicone resin having a Si--O bond will be described. Before the photocatalyst particles are irradiated with light, as shown in FIG.
Since the alkyl group (R) is bonded to the atom, the surface layer exhibits hydrophobicity. However, when the surface layer is irradiated with light having an energy higher than the band gap energy of the photocatalyst particles, as shown in FIG. the substitution (chemisorption), further the hydroxyl group - (OH) alkyl group (R) is a hydroxyl group by photocatalytic effect - exhibit hydrophilic water molecules in the air are physically adsorbed (OH).
【0013】また、光触媒粒子として酸化チタン(Ti
O2)のみからなる場合を説明すると、光を照射する前
は図2(a)に示す状態であったものが、光を照射する
と、図2(b)に示すように、空気中の水分を構成する
水酸基(OH-)がTi原子に、水素原子(H+)が酸素
原子(O)に化学吸着し、更にこの水酸基(OH-)や
水素原子(H+)に空気中の水分子が物理吸着して親水
性を発揮する。Further, titanium oxide (Ti
O 2 ) will be described. The state shown in FIG. 2A before the light irradiation is changed to the state shown in FIG. 2A when the light is irradiated, as shown in FIG. 2B. hydroxyl group constituting the (OH -) is a Ti atom, a hydrogen atom (H +) is chemically adsorbed to the oxygen atom (O), further the hydroxyl - water molecules and in the air a hydrogen atom (H +) (OH) Exerts hydrophilicity by physical adsorption.
【0014】上記の説明で、物質の分解作用と親水化作
用とは全く別のものであることが明らかであるが、具体
的事例を示せば、TiO2でもアナターゼ型のTiO2は酸
化還元反応に基づく物質の分解作用を示すがルチル型の
TiO2は殆ど酸化還元反応に基づく物質の分解作用を示
さない。また光触媒のうちでも酸化錫も酸化還元反応に
基づく物質の分解作用を示さない。これらの光触媒粒子
は伝導帯のエネルギ準位が十分に高くないため還元反応
が進行せず、その結果、伝導帯に光励起された電子が過
剰となり、光励起により生じた電子−正孔対が酸化還元
反応に関与せずに再結合するためと考えられている。し
かしながら、これらルチル型TiO2及び酸化錫のいずれ
も親水化作用は示す。また、物質の分解作用を発揮する
には、光触媒層の厚みとして少なくとも100nm以上
必要であったが、親水化作用を発揮するには、数nm以
上あれば可能である。これらの事実から光触媒による物
質の分解作用と親水化作用とは全く別のものであると言
える。[0014] In the above description, it is apparent that the decomposition and hydrophilization effect of a substance is completely different, if Shimese concrete examples, TiO 2 anatase even TiO 2 oxidation-reduction reaction However, rutile-type TiO 2 shows almost no decomposition action of the substance based on the redox reaction. Also, among the photocatalysts, tin oxide does not show a decomposition effect of a substance based on a redox reaction. In these photocatalyst particles, the energy level of the conduction band is not sufficiently high, so that the reduction reaction does not proceed. As a result, the electrons excited by the photoexcitation in the conduction band become excessive, and the electron-hole pairs generated by the photoexcitation are oxidized and reduced. It is believed that they recombine without participating in the reaction. However, both rutile TiO 2 and tin oxide exhibit a hydrophilizing action. Further, the photocatalytic layer needs to have a thickness of at least 100 nm in order to exhibit the decomposing action of the substance, but it is possible for the photocatalytic layer to exhibit a hydrophilizing action if it has a thickness of several nm or more. From these facts, it can be said that the decomposition action of the substance by the photocatalyst and the hydrophilization action are completely different.
【0015】そして、光触媒による物質の分解作用は前
記したように、光励起により生じた電子−正孔対が起因
しており、このような光触媒を含有する表面層が鉄イオ
ンを含む水に接すると、より少ない電子の授受で生じ得
る鉄の光還元反応を引き起こし、部材が着色してしま
う。即ち、光触媒粒子の酸化還元作用は汚れ成分を分解
する利点もあるが、部材を着色してしまう不利もある。As described above, the decomposition action of the substance by the photocatalyst is caused by the electron-hole pair generated by photoexcitation, and when the surface layer containing such photocatalyst comes into contact with water containing iron ions. , Causes a photoreduction reaction of iron that can occur by transfer of less electrons, and the member is colored. That is, the redox action of the photocatalyst particles has an advantage of decomposing the dirt component, but has a disadvantage of coloring the member.
【0016】そこで、本発明に係る防汚性部材は、表面
に光触媒粒子からなる表面層または光触媒粒子を含有す
る表面層が形成され、この表面層は前記光触媒粒子のバ
ンドギャップエネルギよりも高いエネルギの光を照射す
ることで親水性を呈し、また表面層の光還元能力を色差
変化(ΔE)で表わすと、2ppmの鉄イオン含有水中
に部材を浸漬し、表面層に光触媒粒子のバンドギャップ
エネルギよりも高いエネルギの光を、単位時間当りのフ
ォトン密度で1×1015/sec・cm2となる条件
で、積算フォトン密度で8×1019/cm2照射したと
きに、ΔE≦1であるようにした。Therefore, in the antifouling member according to the present invention, a surface layer composed of photocatalyst particles or a surface layer containing photocatalyst particles is formed on the surface, and this surface layer has an energy higher than the band gap energy of the photocatalyst particles. When the surface of the photocatalyst has a bandgap energy of 2 ppm by immersing the member in water containing 2 ppm of iron ions, the surface of the photocatalyst exhibits hydrophilicity when it is exposed to light and the photoreduction capacity of the surface layer is represented by a color difference change (ΔE). ΔE ≦ 1 when light of higher energy is irradiated at a cumulative photon density of 8 × 10 19 / cm 2 under the condition that the photon density per unit time is 1 × 10 15 / sec · cm 2. I did it.
【0017】光還元能力を抑制する手段の1つは、光触
媒の単位面積当りの量を少なくすることである。前記し
た如く、光触媒の酸化還元反応と親水化作用とは別の作
用であり、酸化還元反応には単位面積当り多量の光触媒
粒子が要求されるが、親水化作用は少量の光触媒粒子で
も発揮される。斯かる理由から光触媒粒子の含有量とし
ては、単位面積当り10μmol/cm2以下が好まし
い。このようにすることで、親水化作用のみを選択する
ことができる。One of the means for suppressing the photoreduction ability is to reduce the amount of photocatalyst per unit area. As described above, the redox reaction and the hydrophilization action of the photocatalyst are different actions. A large amount of photocatalyst particles per unit area is required for the redox reaction, but the hydrophilization action is exhibited even with a small amount of photocatalyst particles. It For this reason, the content of photocatalyst particles is preferably 10 μmol / cm 2 or less per unit area. By doing so, only the hydrophilizing action can be selected.
【0018】光還元能力を抑制する他の手段としては、
例えばアルカリ金属、アルカリ土類金属、アルミナ、シ
リカ、ジルコニア、酸化アンチモン、無定形型酸化チタ
ン、含水酸化チタン、アルミニウム、マンガンの少なく
とも1種を、表面層自体に添加するか、表面層の下地層
または表面層の上に形成される被覆層中に添加する。As another means for suppressing the photoreduction ability,
For example, at least one of alkali metal, alkaline earth metal, alumina, silica, zirconia, antimony oxide, amorphous titanium oxide, hydrous titanium oxide, aluminum, and manganese is added to the surface layer itself, or a base layer of the surface layer. Alternatively, it is added to the coating layer formed on the surface layer.
【0019】また、光還元能力がどれだけ抑制されたか
を表わす指標として、本発明では色差変化(ΔE)を選
定した。具体的には、2ppmの鉄イオン含有水中に部
材を浸漬し、表面層に光触媒粒子のバンドギャップエネ
ルギよりも高いエネルギの光を、単位時間当りのフォト
ン密度(p)で1×1015/sec・cm2となる条件
で、積算フォトン密度(P)で8×1019/cm2照射
したときの色差変化(ΔE)が1以下となるようにし
た。In the present invention, the change in color difference (ΔE) was selected as an index showing how much the photoreduction ability was suppressed. Specifically, the member is immersed in water containing 2 ppm of iron ions, and light having an energy higher than the band gap energy of the photocatalyst particles is applied to the surface layer at a photon density (p) of 1 × 10 15 / sec. · cm 2 become the condition, color difference change when the 8 × 10 19 / cm 2 were irradiated with integrated photon density (P) (ΔE) was set to be 1 or less.
【0020】ここで、単位時間当りのフォトン密度
(p)は、p=(A・λ)/(h・c)で表わされる。
ただし、Aは紫外線照度(W/cm2)、λは紫外線波
長(cm)、hはプランク定数、cは光速(cm/se
c) また波長分布がある場合には、p=Σ(Ai・λi)/
(h・c)で表わされる。ただし、Aiは波長λiの照
度である。Here, the photon density (p) per unit time is expressed by p = (Aλ) / (hc).
Where A is ultraviolet illuminance (W / cm 2 ), λ is ultraviolet wavelength (cm), h is Planck's constant, and c is speed of light (cm / se).
c) If there is a wavelength distribution, p = Σ (Ai · λi) /
It is represented by (h · c). However, Ai is the illuminance of the wavelength λi.
【0021】一方、積算フォトン密度(P)は、P=
(A・λ・t)/(h・c)で表わされる。ただし、t
は紫外線の照射時間(sec)である。また波長分布が
ある場合には、p=Σ(Ai・λi・t)/(h・c)
で表わされる。On the other hand, the integrated photon density (P) is P =
It is represented by (A · λ · t) / (h · c). However, t
Is the irradiation time (sec) of ultraviolet rays. When there is a wavelength distribution, p = Σ (Ai · λi · t) / (h · c)
Is represented by
【0022】尚、光触媒粒子としては酸化チタンが最も
好ましいが、この他にも、ZnO、SnO2、SrTiO3、
WO3、Bi2O3、Fe2O3などの金属酸化物が挙げられ
る。これらは表面に金属元素と酸素が存在するため表面
に水酸基(OH-)を吸着しやすく、したがって親水性
を発揮しやすいと考えられる。Titanium oxide is most preferable as the photocatalyst particles, but in addition to this, ZnO, SnO 2 , SrTiO 3 ,
Examples thereof include metal oxides such as WO 3 , Bi 2 O 3 and Fe 2 O 3 . Since metal elements and oxygen exist on the surface of these, it is considered that hydroxyl groups (OH −) are easily adsorbed on the surface and therefore hydrophilicity is easily exhibited.
【0023】光触媒粒子を含有する親水性の表面層の形
成方法として、チタニア(酸化チタン)を例にとって説
明すると、無定形チタニアの形成、シリカ配合チタニア
の塗布、酸化錫配合チタニアの塗布、チタニア含有シリ
コーン塗料の塗布等が挙げられる。As a method of forming a hydrophilic surface layer containing photocatalyst particles, taking titania (titanium oxide) as an example, the formation of amorphous titania, the application of silica-containing titania, the application of tin oxide-containing titania, the inclusion of titania Examples thereof include application of silicone paint.
【0024】無定形チタニアの形成は、先ず被塗装面を
無定形チタニアで被覆し、これを焼成して結晶性チタニ
アに相変化させる方法であり、次のいずれかの方法を採
用することができる。 (1)有機チタン化合物の加水分解と脱水縮重合 チタンのアルコキシド、例えば、テトラエトキシチタ
ン、テトライソプロポキシチタン、テトラn−プロポキ
シチタン、テトラブトキシチタン、テトラメトキシチタ
ン、に塩酸またはエチルアミンのような加水分解抑制剤
を添加し、エタノールやプロパノールのようなアルコー
ルで希釈した後、部分的に加水分解を進行させながら又
は完全に加水分解を進行させた後、混合物を塗布し、常
温から200℃の温度で乾燥させる。乾燥により、チタ
ンのアルコキシドの加水分解が完遂して水酸化チタンが
生成し、水酸化チタンの脱水縮重合により無定形チタニ
アの層が形成される。チタンのアルコキシドに代えて、
チタンのキレート又はチタンのアセテートのような他の
有機チタン化合物を用いてもよい。 (2)無機チタン化合物による無定形チタニアの形成 無機チタン化合物、例えば、TiCl4またはTi(S
O4)2の酸性水溶液を塗布し、100〜200℃の温度
で乾燥させることにより加水分解と脱水縮重合を行い、
無定形チタニアの層を形成する。或いはTiCl4の化学
蒸着により被塗装面に無定形チタニアの層を形成しても
よい。 (3)スパッタリングによる無定形チタニアの形成 金属チタンまたは酸化チタンのターゲットに酸化雰囲気
で電子ビームを照射することにより、被塗装面に無定形
チタニアの層を形成する。The formation of amorphous titania is a method in which the surface to be coated is first coated with amorphous titania and then fired to change the phase to crystalline titania, and any of the following methods can be adopted. . (1) Hydrolysis and dehydration condensation polymerization of an organic titanium compound An alkoxide of titanium, for example, tetraethoxytitanium, tetraisopropoxytitanium, tetra-n-propoxytitanium, tetrabutoxytitanium, tetramethoxytitanium, or a hydrochloride such as hydrochloric acid or ethylamine After adding a decomposition inhibitor and diluting with an alcohol such as ethanol or propanol, the mixture is applied after partially or completely promoting the hydrolysis, and then the mixture is applied, and the temperature is from room temperature to 200 ° C. And dry. By drying, the hydrolysis of the alkoxide of titanium is completed to form titanium hydroxide, and a layer of amorphous titania is formed by dehydration-condensation polymerization of titanium hydroxide. Instead of titanium alkoxide,
Other organic titanium compounds such as titanium chelates or titanium acetate may be used. (2) Formation of amorphous titania by inorganic titanium compound Inorganic titanium compound such as TiCl 4 or Ti (S
Hydrolysis and dehydration polycondensation are performed by applying an acidic aqueous solution of O 4 ) 2 and drying at a temperature of 100 to 200 ° C.
Form a layer of amorphous titania. Or it may form a layer of amorphous titania on the surface to be coated by chemical vapor deposition of TiCl 4. (3) Formation of Amorphous Titania by Sputtering A target of metallic titanium or titanium oxide is irradiated with an electron beam in an oxidizing atmosphere to form a layer of amorphous titania on the surface to be coated.
【0025】シリカ配合チタニアの塗布は、チタニアと
シリカとの混合物からなる層を被塗装面に形成すること
である。チタニアとシリカの合計に対するシリカの割合
は、5〜90モル%、好ましくは10〜70モル%、よ
り好ましくは10〜50モル%である。またシリカ配合
チタニアからなる表面層の形成方法には以下の方法を採
用することができる。 (1)アナターゼ型又はルチル型チタニアの粒子とシリ
カの粒子を含む懸濁液を被塗装面に塗布し、基材(被塗
装物)の軟化点以下の温度で焼成する。 (2)無定形シリカの前駆体(例えば、テトラエトキシ
チタン、テトライソプロポキシチタン、テトラn−プロ
ポキシチタン、テトラブトキシチタン、テトラメトキシ
チタン、等のテトラアルコキシシラン)と結晶性チタニ
アゾルとの混合物を基材の表面に塗布し、必要に応じて
加水分解させてシラノールを形成した後、約100℃以
上の温度で加熱してシラノールを脱水縮重合に付すこと
により、チタニアが無定形シリカで結着された表面層
(光触媒コーティング)を得る。特に、シラノールの脱
水縮重合を約200℃以上の温度で行えば、シラノール
の重合度を増し、光触媒コーティングの耐アルカリ性能
を向上させることができる。 (3)無定形チタニアの前駆体(チタンのアルコキシ
ド、キレート又はアセテートのような有機チタン化合
物、又はTiCl4またはTi(SO4)2のような無機チタ
ン化合物)の溶液にシリカの粒子を分散させてなる懸濁
液を基材の表面に塗布し、チタン化合物を常温から20
0℃の温度で加水分解と脱水縮重合に付すことにより、
シリカ粒子が分散された無定形チタニアの薄膜を形成す
る。次いで、チタニアの結晶化温度以上の温度、且つ基
材の軟化点以下の温度に加熱することにより、無定形チ
タニアを結晶性チタニアに相変化させる。 (4)無定形チタニアの前駆体(チタンのアルコキシ
ド、キレート又はアセテートのような有機チタン化合
物、又はTiCl4またはTi(SO4)2のような無機チタ
ン化合物)の溶液に無定形シリカの前駆体(例えば、テ
トラエトキシチタン、テトライソプロポキシチタン、テ
トラn−プロポキシチタン、テトラブトキシチタン、テ
トラメトキシチタン、等のテトラアルコキシシラン、そ
れらの加水分解物であるシラノール、または平均分子量
3000以下のポリシロキサン)を混合し、基材の表面
に塗布する。次いで、これらの前駆体を加水分解と脱水
縮重合に付すことにより、無定形チタニアと無定形シリ
カの混合物からなる薄膜を形成する。次いで、チタニア
の結晶化温度以上の温度、且つ基材の軟化点以下の温度
に加熱することにより、無定形チタニアを結晶性チタニ
アに相変化させる。Application of silica-containing titania is to form a layer of a mixture of titania and silica on the surface to be coated. The ratio of silica to the total of titania and silica is 5 to 90 mol%, preferably 10 to 70 mol%, more preferably 10 to 50 mol%. The following method can be employed for forming the surface layer made of silica-containing titania. (1) A suspension containing particles of anatase type or rutile type titania and particles of silica is applied to a surface to be coated, and fired at a temperature equal to or lower than the softening point of the substrate (object to be coated). (2) Based on a mixture of a precursor of amorphous silica (for example, tetraalkoxysilane such as tetraethoxytitanium, tetraisopropoxytitanium, tetran-propoxytitanium, tetrabutoxytitanium, tetramethoxytitanium, etc.) and crystalline titania sol After applying to the surface of the material and hydrolyzing it as necessary to form silanol, heating at a temperature of about 100 ° C. or more and subjecting the silanol to dehydration polycondensation, the titania is bound with amorphous silica. Obtained surface layer (photocatalytic coating). In particular, if the dehydration condensation polymerization of silanol is performed at a temperature of about 200 ° C. or higher, the degree of polymerization of silanol can be increased, and the alkali resistance performance of the photocatalytic coating can be improved. (3) Dispersing silica particles in a solution of amorphous titania precursor (organic titanium compound such as alkoxide, chelate or acetate of titanium, or inorganic titanium compound such as TiCl 4 or Ti (SO 4 ) 2 ) Is applied to the surface of the base material, and the titanium compound is cooled to room temperature for 20 minutes.
By subjecting it to hydrolysis and dehydration polycondensation at a temperature of 0 ° C.,
A thin film of amorphous titania in which silica particles are dispersed is formed. Next, the amorphous titania is changed into crystalline titania by heating to a temperature higher than the crystallization temperature of titania and lower than the softening point of the substrate. (4) Amorphous titania precursor (organic titanium compound such as alkoxide, chelate or acetate of titanium, or inorganic titanium compound such as TiCl 4 or Ti (SO 4 ) 2 ) in a solution of amorphous titania precursor (For example, tetraalkoxysilanes such as tetraethoxytitanium, tetraisopropoxytitanium, tetran-propoxytitanium, tetrabutoxytitanium, tetramethoxytitanium, etc., silanols which are hydrolysates thereof, or polysiloxanes having an average molecular weight of 3000 or less) And apply to the surface of the substrate. Next, these precursors are subjected to hydrolysis and dehydration condensation polymerization to form a thin film composed of a mixture of amorphous titania and amorphous silica. Next, the amorphous titania is changed into crystalline titania by heating to a temperature higher than the crystallization temperature of titania and lower than the softening point of the substrate.
【0026】酸化錫配合チタニアの塗布は、チタニアと
酸化錫との混合物からなる層を被塗装面に形成すること
である。チタニアと酸化錫との合計に対する酸化錫の割
合は、1〜95モル%、好ましくは1〜50モル%であ
る。また酸化錫配合チタニアからなる表面層の形成方法
には以下の方法を採用することができる。 (1)アナターゼ型又はルチル型チタニアの粒子と酸化
錫の粒子を含む懸濁液を被塗装面に塗布し、基材(被塗
装物)の軟化点以下の温度で焼成する。 (2)無定形チタニアの前駆体(チタンのアルコキシ
ド、キレート又はアセテートのような有機チタン化合
物、又はTiCl4またはTi(SO4)2のような無機チタ
ン化合物)の溶液に酸化錫の粒子を分散させてなる懸濁
液を基材の表面に塗布し、チタン化合物を常温から20
0℃の温度で加水分解と脱水縮重合に付すことにより、
酸化錫粒子が分散された無定形チタニアの薄膜を形成す
る。次いで、チタニアの結晶化温度以上の温度、且つ基
材の軟化点以下の温度に加熱することにより、無定形チ
タニアを結晶性チタニアに相変化させる。The application of titania containing tin oxide is to form a layer of a mixture of titania and tin oxide on the surface to be coated. The ratio of tin oxide to the total of titania and tin oxide is 1 to 95 mol%, preferably 1 to 50 mol%. The following method can be adopted as a method for forming a surface layer made of titania mixed with tin oxide. (1) A suspension containing particles of anatase type or rutile type titania and particles of tin oxide is applied to a surface to be coated, and fired at a temperature equal to or lower than the softening point of the substrate (object to be coated). (2) Dispersion of tin oxide particles in a solution of a precursor of amorphous titania (organic titanium compound such as titanium alkoxide, chelate or acetate, or inorganic titanium compound such as TiCl 4 or Ti (SO 4 ) 2 ) The resulting suspension is applied to the surface of the substrate, and the titanium compound is heated to room temperature for 20 minutes.
By subjecting it to hydrolysis and dehydration polycondensation at a temperature of 0 ° C.,
A thin film of amorphous titania in which tin oxide particles are dispersed is formed. Next, the amorphous titania is changed into crystalline titania by heating to a temperature higher than the crystallization temperature of titania and lower than the softening point of the substrate.
【0027】チタニア含有シリコーン塗料の塗布は、未
硬化の若しくは部分的に硬化したシリコーン(オルガノ
ポリシロキサン)またはシリコーンの前駆体からなる塗
膜形成要素にチタニア(光触媒粒子)を分散させた塗料
を用いる。具体的には、上記塗料を基材の表面に塗布
し、塗膜形成要素を硬化させた後、光触媒を光励起する
と、シリコーン分子の珪素原子に結合した有機基は光触
媒の作用により水酸基に置換され、表面の水に対する接
触角が0°近くになり親水化(超親水化)される。この
方法は、比較的低温で塗膜形成要素を硬化せしめること
ができ、また必要に応じ何度でも塗布することができ、
且つ太陽光でも容易に親水化せしめることができる等の
利点がある。尚、用いる樹脂としては以下のものが挙げ
られる。メチルトリクロルシラン、メチルトリブロムシ
ラン、メチルトリメトキシシラン、メチルトリエトキシ
シラン、メチルトリイソプロポキシシラン、メチルトリ
t−ブトキシシラン、エチルトリクロルシラン、エチル
トリブロムシラン、エチルトリメトキシシラン、エチル
トリエトキシシラン、エチルトリイソプロポキシシラ
ン、エチルトリt−ブトキシシラン、n−プロピルトリ
クロルシラン、n−プロピルトリブロムシラン、n−プ
ロピルトリメトキシシラン、n−プロピルトリエトキシ
シラン、n−プロピルトリイソプロポキシシラン、n−
プロピルトリt−ブトキシシラン、n−ヘキシルトリク
ロルシラン、n−ヘキシルトリブロムシラン、n−ヘキ
シルトリメトキシシラン、n−ヘキシルトリエトキシシ
ラン、n−ヘキシルトリイソプロポキシシラン、n−ヘ
キシルトリt−ブトキシシラン、n−デシルトリクロル
シラン、n−デシルトリブロムシラン、n−デシルトリ
メトキシシラン、n−デシルトリエトキシシラン、n−
デシルトリイソプロポキシシラン、n−デシルトリt−
ブトキシシラン、n−オクタデシルトリクロルシラン、
n−オクタデシルトリブロムシラン、n−オクタデシル
トリメトキシシラン、n−オクタデシルトリエトキシシ
ラン、n−オクタデシルトリイソプロポキシシラン、n
−オクタデシルトリt−ブトキシシラン、フェニルトリ
クロルシラン、フェニルトリブロムシラン、フェニルト
リメトキシシラン、フェニルトリエトキシシラン、フェ
ニルトリイソプロポキシシラン、フェニルトリt−ブト
キシシラン、テトラクロルシラン、テトラブロムシラ
ン、テトラメトキシシラン、テトラエトキシシラン、テ
トライソプロポキシシラン、テトラブトキシシラン、ジ
メトキシジエトキシシラン、ジメチルジクロルシラン、
ジメチルジブロムシラン、ジメチルジメトキシシラン、
ジメチルジエトキシシラン、ジフェニルジクロルシラ
ン、ジフェニルジブロムシラン、ジフェニルジメトキシ
シラン、ジフェニルジエトキシシラン、フェニルメチル
ジクロルシラン、フェニルメチルジブロムシラン、フェ
ニルメチルジメトキシシラン、フェニルメチルジエトキ
シシラン、トリエトキシヒドロシラン、トリブロムヒド
ロシラン、トリメトキシヒドロシラン、イソプロポキシ
ヒドロシラン、トリt−ブトキシヒドロシラン、ビニル
トリクロルシラン、ビニルトリブロムシラン、ビニルト
リメトキシシラン、ビニルトリエトキシシラン、ビニル
トリイソプロポキシシラン、ビニルトリt−ブトキシシ
ラン、トリフルオロプロピルトリクロルシラン、トリフ
ルオロプロピルトリブロムシラン、トリフルオロプロピ
ルトリメトキシシラン、トリフルオロプロピルトリエト
キシシラン、トリフルオロプロピルトリイソプロポキシ
シラン、トリフルオロプロピルトリt−ブトキシシラ
ン、γ−グリシドキシプロピルメチルジメトキシシラ
ン、γ−グリシドキシプロピルメチルジエトキシシラ
ン、γ−グリシドキシプロピルトリメトキシシラン、γ
−グリシドキシプロピルトリエトキシシラン、γ−グリ
シドキシプロピルトリイソプロポキシシラン、γ−グリ
シドキシプロピルトリt−ブトキシシラン、γ−メタア
クリロキシプロピルメチルジメトキシシラン、γ−メタ
アクリロキシプロピルメチルジエトキシシラン、γ−メ
タアクリロキシプロピルトリメトキシシラン、γ−メタ
アクリロキシプロピルトリイソプロポキシシラン、γ−
メタアクリロキシプロピルトリt−ブトキシシラン、γ
−アミノプロピルメチルジメトキシシラン、γ−アミノ
プロピルメチルジエトキシシラン、γ−アミノプロピル
トリメトキシシラン、γ−アミノプロピルトリエトキシ
シラン、γ−アミノプロピルトリイソプロポキシシラ
ン、γ−アミノプロピルトリt−ブトキシシラン、γ−
メルカプトプロピルメチルジメトキシシラン、γ−メル
カプトプロピルメチルジエトキシシラン、γ−メルカプ
トプロピルトリメトキシシラン、γ−メルカプトプロピ
ルトリエトキシシラン、γ−メルカプトプロピルトリイ
ソプロポキシシラン、γ−メルカプトプロピルトリt−
ブトキシシラン、β−(3、4−エポキシシクロヘキシ
ル)エチルトリメトキシシラン、β−(3、4−エポキ
シシクロヘキシル)エチルトリエトキシシラン、及びこ
れらの部分加水分解物若しくはこれらの混合物を使用す
ることができる。The titania-containing silicone coating is applied by using a coating in which titania (photocatalyst particles) is dispersed in a coating film-forming element made of uncured or partially cured silicone (organopolysiloxane) or a precursor of silicone. . Specifically, after the above coating material is applied to the surface of the base material, and after the film-forming element is cured, when the photocatalyst is photoexcited, the organic group bonded to the silicon atom of the silicone molecule is replaced with a hydroxyl group by the action of the photocatalyst. Then, the contact angle of the surface with water becomes close to 0 °, and the surface becomes hydrophilic (super-hydrophilic). This method can cure the film forming element at a relatively low temperature, and can be applied as many times as necessary,
In addition, there is an advantage that it can be easily made hydrophilic even by sunlight. The following resins can be used as the resin. Methyltrichlorosilane, methyltribromosilane, methyltrimethoxysilane, methyltriethoxysilane, methyltriisopropoxysilane, methyltri-t-butoxysilane, ethyltrichlorosilane, ethyltribromosilane, ethyltrimethoxysilane, ethyltriethoxysilane, Ethyltriisopropoxysilane, ethyltri-t-butoxysilane, n-propyltrichlorosilane, n-propyltribromosilane, n-propyltrimethoxysilane, n-propyltriethoxysilane, n-propyltriisopropoxysilane, n-
Propyltri-t-butoxysilane, n-hexyltrichlorosilane, n-hexyltribromosilane, n-hexyltrimethoxysilane, n-hexyltriethoxysilane, n-hexyltriisopropoxysilane, n-hexyltrit-butoxysilane, n-decyltrichlorosilane, n-decyltribromosilane, n-decyltrimethoxysilane, n-decyltriethoxysilane, n-
Decyltriisopropoxysilane, n-decyltri-t-
Butoxysilane, n-octadecyltrichlorosilane,
n-octadecyltribromosilane, n-octadecyltrimethoxysilane, n-octadecyltriethoxysilane, n-octadecyltriisopropoxysilane, n
-Octadecyltri-t-butoxysilane, phenyltrichlorosilane, phenyltribromosilane, phenyltrimethoxysilane, phenyltriethoxysilane, phenyltriisopropoxysilane, phenyltri-t-butoxysilane, tetrachlorosilane, tetrabromosilane, tetramethoxy Silane, tetraethoxysilane, tetraisopropoxysilane, tetrabutoxysilane, dimethoxydiethoxysilane, dimethyldichlorosilane,
Dimethyldibromosilane, dimethyldimethoxysilane,
Dimethyldiethoxysilane, diphenyldichlorosilane, diphenyldibromosilane, diphenyldimethoxysilane, diphenyldiethoxysilane, phenylmethyldichlorosilane, phenylmethyldibromosilane, phenylmethyldimethoxysilane, phenylmethyldiethoxysilane, triethoxyhydrosilane , Tribromohydrosilane, trimethoxyhydrosilane, isopropoxyhydrosilane, tri-t-butoxyhydrosilane, vinyltrichlorosilane, vinyltribromosilane, vinyltrimethoxysilane, vinyltriethoxysilane, vinyltriisopropoxysilane, vinyltrit-butoxysilane, Trifluoropropyltrichlorosilane, trifluoropropyltribromosilane, trifluoropropyltrimethoxysilane , Trifluoropropyltriethoxysilane, trifluoropropyltriisopropoxysilane, trifluoropropyltri-t-butoxysilane, γ-glycidoxypropylmethyldimethoxysilane, γ-glycidoxypropylmethyldiethoxysilane, γ-glycid Xypropyltrimethoxysilane, γ
-Glycidoxypropyltriethoxysilane, γ-glycidoxypropyltriisopropoxysilane, γ-glycidoxypropyltri-t-butoxysilane, γ-methacryloxypropylmethyldimethoxysilane, γ-methacryloxypropylmethyldi Ethoxysilane, γ-methacryloxypropyltrimethoxysilane, γ-methacryloxypropyltriisopropoxysilane, γ-
Methacryloxypropyltri-t-butoxysilane, γ
-Aminopropylmethyldimethoxysilane, γ-aminopropylmethyldiethoxysilane, γ-aminopropyltrimethoxysilane, γ-aminopropyltriethoxysilane, γ-aminopropyltriisopropoxysilane, γ-aminopropyltrit-butoxysilane , Γ-
Mercaptopropylmethyldimethoxysilane, γ-mercaptopropylmethyldiethoxysilane, γ-mercaptopropyltrimethoxysilane, γ-mercaptopropyltriethoxysilane, γ-mercaptopropyltriisopropoxysilane, γ-mercaptopropyltrit-
Butoxysilane, β- (3,4-epoxycyclohexyl) ethyltrimethoxysilane, β- (3,4-epoxycyclohexyl) ethyltriethoxysilane, and their partial hydrolysates or mixtures thereof can be used. .
【0028】シリコーン樹脂膜の良好な硬度と平滑性を
確保するためには、3次元架橋型シロキサンを10モル
%以上含有させるのが好ましい。更に良好な硬度と平滑
性を確保しながら樹脂膜の十分な可撓性を提供するため
には、2次元架橋型シロキサンを60モル%以下含有さ
せるのが好ましい。また、シリコーン分子の珪素原子に
結合した有機基が光励起により水酸基に置換される速度
を速めるには、シリコーン分子の珪素原子に結合する有
機基がn−プロピル基若しくはフェニル基からなるシリ
コーンを使用するのが好ましい。シロキサン結合を有す
るシリコーンに替えて、シラザン結合を有するオルガノ
ポリシラザン化合物を使用することもできる。In order to secure good hardness and smoothness of the silicone resin film, it is preferable to contain 10 mol% or more of the three-dimensional crosslinked siloxane. In order to provide sufficient flexibility of the resin film while securing good hardness and smoothness, it is preferable to contain 60 mol% or less of the two-dimensional crosslinked siloxane. In order to increase the rate at which the organic group bonded to the silicon atom of the silicone molecule is replaced with a hydroxyl group by photoexcitation, use is made of a silicone in which the organic group bonded to the silicon atom of the silicone molecule is an n-propyl group or a phenyl group. Is preferred. An organopolysilazane compound having a silazane bond can be used instead of the silicone having a siloxane bond.
【0029】[0029]
(実施例1)施釉タイル表面にアンモニア解膠型の酸化
チタンゾル(石原産業製STS−11)を5.6μmo
l/cm2塗布し、880℃で焼成した。(Example 1) Ammonia peptization type titanium oxide sol (STS-11 manufactured by Ishihara Sangyo) was applied on the surface of the glazed tile in an amount of 5.6 μmo.
It was applied at 1 / cm 2 and baked at 880 ° C.
【0030】(実施例2)施釉タイル表面にアンモニア
解膠型の酸化チタンゾル(石原産業製STS−11)と
シリカゾルとを固形分重量比で80:20で混合し、こ
の混合物をを5.6μmol/cm2塗布し、880℃
で焼成した。Example 2 Ammonia deflocculating titanium oxide sol (STS-11 manufactured by Ishihara Sangyo) and silica sol were mixed at a solid content weight ratio of 80:20 on the surface of the glazed tile, and 5.6 μmol of this mixture was added. / Cm 2 application, 880 ℃
It was baked in.
【0031】(実施例3)施釉タイル表面にアンモニア
解膠型の酸化チタンゾル(石原産業製STS−11)を
10.0μmol/cm2塗布し、880℃で焼成し
た。Example 3 Ammonia deflocculating titanium oxide sol (STS-11 manufactured by Ishihara Sangyo Co., Ltd.) was applied on the surface of the glazed tile at 10.0 μmol / cm 2 and baked at 880 ° C.
【0032】(実施例4)施釉タイル表面にアンモニア
解膠型の酸化チタンゾル(石原産業製STS−11)と
を11.2μmol/cm2塗布し、880℃で焼成し
た。その後、酸化チタン膜の上にカルシウム金属濃度5
0μmol/gの硝酸カルシウム水溶液を塗布し、カル
シウムを固定した。Example 4 11.2 μmol / cm 2 of ammonia-peptized titanium oxide sol (STS-11 manufactured by Ishihara Sangyo Co., Ltd.) was applied to the surface of the glazed tile and baked at 880 ° C. Then, a calcium metal concentration of 5 on the titanium oxide film.
An aqueous calcium nitrate solution of 0 μmol / g was applied to fix calcium.
【0033】(実施例5)施釉タイル表面にアンモニア
解膠型の酸化チタンゾル(石原産業製STS−11)を
11.2μmol/cm2塗布し、880℃で焼成し
た。その後、実施例4のカルシウムの代りにカリウムを
固定した。(Example 5) 11.2 μmol / cm 2 of an ammonia-peptizing titanium oxide sol (STS-11 manufactured by Ishihara Sangyo Co., Ltd.) was applied to the surface of the glazed tile and baked at 880 ° C. Then, potassium was fixed instead of calcium in Example 4.
【0034】(実施例6)施釉タイル表面にアンモニア
解膠型の酸化チタンゾル(石原産業製STS−11)を
11.2μmol/cm2塗布し、880℃で焼成し
た。その後、実施例4のカルシウムの代りにナトリウム
を固定した。(Example 6) 11.2 μmol / cm 2 of ammonia peptization type titanium oxide sol (STS-11 manufactured by Ishihara Sangyo Co., Ltd.) was applied to the surface of the glazed tile and baked at 880 ° C. Then, sodium was fixed instead of calcium in Example 4.
【0035】(実施例7)施釉タイル表面にアンモニア
解膠型の酸化チタンゾル(石原産業製STS−11)を
11.2μmol/cm2塗布し、880℃で焼成し
た。その後、実施例4のカルシウムの代りにマグネシウ
ムを固定した。(Example 7) 11.2 μmol / cm 2 of ammonia peptization type titanium oxide sol (STS-11 manufactured by Ishihara Sangyo Co., Ltd.) was applied to the surface of the glazed tile and baked at 880 ° C. Then, magnesium was fixed instead of calcium in Example 4.
【0036】(実施例8)施釉タイル表面にアンモニア
解膠型の酸化チタンゾル(石原産業製STS−11)を
11.2μmol/cm2塗布し、880℃で焼成し
た。その後、実施例4のカルシウムの代りにリチウムを
固定した。(Example 8) Ammonia deflocculating titanium oxide sol (STS-11 manufactured by Ishihara Sangyo Co., Ltd.) was applied on the surface of the glazed tile in an amount of 11.2 µmol / cm 2 and baked at 880 ° C. Then, lithium was fixed instead of calcium in Example 4.
【0037】(実施例9)施釉タイル表面にアンモニア
解膠型の酸化チタンゾル(石原産業製STS−11)を
11.2μmol/cm2塗布し、880℃で焼成し
た。その後、実施例4のカルシウムの代りに亜鉛を固定
した。(Example 9) 11.2 μmol / cm 2 of ammonia-peptized titanium oxide sol (STS-11 manufactured by Ishihara Sangyo Co., Ltd.) was applied to the surface of the glazed tile and baked at 880 ° C. Then, instead of calcium in Example 4, zinc was fixed.
【0038】(実施例10)施釉タイル表面にアンモニ
ア解膠型の酸化チタンゾル(石原産業製STS−11)
を1.0μmol/cm2塗布し、880℃で焼成し
た。(Example 10) Ammonia deflocculating titanium oxide sol (STS-11 manufactured by Ishihara Sangyo) was applied to the surface of the glazed tile.
Was applied at 1.0 μmol / cm 2 and baked at 880 ° C.
【0039】(比較例1)施釉タイル表面にアンモニア
解膠型の酸化チタンゾル(石原産業製STS−11)を
11.2μmol/cm2塗布し、880℃で焼成し
た。(Comparative Example 1) 11.2 μmol / cm 2 of ammonia peptization type titanium oxide sol (STS-11 manufactured by Ishihara Sangyo Co., Ltd.) was applied to the surface of the glazed tile and baked at 880 ° C.
【0040】(比較例2)施釉タイル表面にアンモニア
解膠型の酸化チタンゾル(石原産業製STS−11)を
11.2μmol/cm2塗布し、880℃で焼成し
た。この後、酢酸銅を塗布し、0.5mW/cm2のB
LBランプで光還元固定した。(Comparative Example 2) 11.2 μmol / cm 2 of ammonia peptization type titanium oxide sol (STS-11 manufactured by Ishihara Sangyo Co., Ltd.) was applied on the surface of the glazed tile and baked at 880 ° C. After this, copper acetate is applied and B of 0.5 mW / cm2 is applied.
It was fixed by photoreduction with an LB lamp.
【0041】上記各実施例と比較例の、鉄イオン着色性
(色差ΔE)、水との接触角、水との接触角の維持性、
疎水汚れ除去性及び親水汚れ除去性について試験した結
果を以下の(表)に示す。尚、鉄イオン着色性は0.5
mW/cm2のBLBランプを照射する前と10日間照
射した後の色差変化を測定した。Iron ion colorability (color difference ΔE), contact angle with water, maintainability of contact angle with water in each of the above Examples and Comparative Examples,
The results of the tests for hydrophobic stain removability and hydrophilic stain removability are shown in the following (Table). The iron ion coloring property is 0.5.
The change in color difference was measured before irradiation with the mW / cm 2 BLB lamp and after irradiation for 10 days.
【0042】[0042]
【表】 【table】
【0043】[0043]
【発明の効果】以上に説明した如く本発明によれば、部
材の表面に光触媒粒子を含む表面層を形成したので、紫
外線等が照射されるだけで表面層は親水性を呈し、その
結果部材表面に汚れが付着しにくくなる。また、付着し
た汚れも水洗いよって簡単に落とすことができ、雨に寄
る自浄効果も期待できる。そして、本発明によれば表面
層中に添加する光触媒粒子の単位面積当りの量を制限す
るか、或いは光触媒の親水性を阻害せずに表面層の光還
元能力を抑制する物質を添加したので、鉄イオンとの反
応による着色を防止しつつ親水性を維持することができ
る。As described above, according to the present invention, since the surface layer containing the photocatalyst particles is formed on the surface of the member, the surface layer exhibits hydrophilicity only by being irradiated with ultraviolet rays or the like, and as a result, the member is formed. It is difficult for dirt to adhere to the surface. In addition, the attached dirt can be easily removed by washing with water, and the self-cleaning effect due to rain can be expected. Then, according to the present invention, the amount of the photocatalyst particles added to the surface layer per unit area is limited, or a substance that suppresses the photoreduction ability of the surface layer without inhibiting the hydrophilicity of the photocatalyst is added. In addition, hydrophilicity can be maintained while preventing coloration due to reaction with iron ions.
【図1】光触媒粒子を含有するシリコーン樹脂表面に親
水性が付与される過程を説明した図FIG. 1 is a diagram illustrating a process of imparting hydrophilicity to the surface of a silicone resin containing photocatalyst particles.
【図2】光触媒粒子からなる表面層に親水性が付与され
る過程を説明した図FIG. 2 is a diagram illustrating a process of imparting hydrophilicity to a surface layer made of photocatalytic particles.
Claims (6)
たは光触媒粒子を含有する表面層が形成され、この表面
層は前記光触媒粒子のバンドギャップエネルギよりも高
いエネルギの光を照射することで親水性を呈し、また表
面層の光還元能力を色差変化(ΔE)で表わすと、2p
pmの鉄イオン含有水中に部材を浸漬し、表面層に光触
媒粒子のバンドギャップエネルギよりも高いエネルギの
光を、単位時間当りのフォトン密度で1×1015/se
c・cm2となる条件で、積算フォトン密度で8×10
19/cm2照射したときに、ΔE≦1であることを特徴
とする防汚性部材。1. A surface layer comprising photocatalyst particles or a surface layer containing photocatalyst particles is formed on the surface of a member, and the surface layer is hydrophilic by irradiating with light having an energy higher than the bandgap energy of the photocatalyst particles. And the photoreduction ability of the surface layer is represented by a color difference change (ΔE), 2p
By immersing the member in water containing iron ions of pm, the surface layer is irradiated with light having an energy higher than the band gap energy of the photocatalyst particles at a photon density of 1 × 10 15 / se.
8 × 10 in integrated photon density under the condition of c · cm 2.
An antifouling member, wherein ΔE ≦ 1 when irradiated with 19 / cm 2 .
前記光触媒粒子は酸化チタンであり、また光触媒粒子の
バンドギャップエネルギよりも高いエネルギの光は波長
400nm以下の紫外線であることを特徴とする防汚性
部材。2. The antifouling member according to claim 1,
The antifouling member, wherein the photocatalyst particles are titanium oxide, and the light having energy higher than the bandgap energy of the photocatalyst particles is ultraviolet rays having a wavelength of 400 nm or less.
部材において、この防汚性部材には前記表面層の親水性
を阻害せずに表面層の光還元能力を抑制する物質が添加
されていることを特徴とする防汚性部材。3. The antifouling member according to claim 1 or 2, wherein the antifouling member contains a substance that inhibits the photoreduction ability of the surface layer without inhibiting the hydrophilicity of the surface layer. An antifouling member characterized by being added.
前記表面層の光還元能力を抑制する物質は、アルカリ金
属、アルカリ土類金属、アルミナ、シリカ、ジルコニ
ア、酸化アンチモン、無定形型酸化チタン、含水酸化チ
タン、アルミニウム、マンガンの少なくとも1種である
ことを特徴とする防汚性部材。4. The antifouling member according to claim 3,
The substance that suppresses the photoreduction ability of the surface layer is at least one of alkali metal, alkaline earth metal, alumina, silica, zirconia, antimony oxide, amorphous titanium oxide, hydrous titanium oxide, aluminum and manganese. An antifouling member characterized by.
部材において、前記表面層の光還元能力を抑制する物質
は、表面層自体に添加されるか、表面層の下地層または
表面層の上に形成される被覆層中に添加されることを特
徴とする防汚性部材。5. The antifouling member according to claim 3 or 4, wherein the substance that suppresses the photoreduction ability of the surface layer is added to the surface layer itself, or an underlayer or surface of the surface layer. An antifouling member, which is added in a coating layer formed on a layer.
材において、前記表面層中の光触媒粒子の含有量は単位
面積当り10μmol/cm2以下であることを特徴と
する防汚性部材。6. The antifouling member according to claim 1, wherein the content of the photocatalyst particles in the surface layer is 10 μmol / cm 2 or less per unit area. Element.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13782996A JP3189682B2 (en) | 1995-12-22 | 1996-05-31 | Antifouling material |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7-354649 | 1995-12-22 | ||
JP35464995 | 1995-12-22 | ||
JP13782996A JP3189682B2 (en) | 1995-12-22 | 1996-05-31 | Antifouling material |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2000247609A Division JP2001122679A (en) | 1995-12-22 | 2000-08-17 | Antifouling tile |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH09225388A true JPH09225388A (en) | 1997-09-02 |
JP3189682B2 JP3189682B2 (en) | 2001-07-16 |
Family
ID=18438979
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JP2000181284A Pending JP2001048679A (en) | 1995-12-22 | 2000-06-16 | Photocatalytic hydrophilic tile and its production |
JP2000181286A Expired - Lifetime JP3414367B2 (en) | 1995-12-22 | 2000-06-16 | Building materials for exterior walls |
JP2000227055A Withdrawn JP2001089752A (en) | 1995-12-22 | 2000-07-27 | Member capable of obtaining hydrophilic nature in accordance with photoexcitation of optical semiconductor and manufacturing method thereof |
JP2000227056A Pending JP2001129916A (en) | 1995-12-22 | 2000-07-27 | Photocatalytic hydrophilic member |
JP2000247609A Pending JP2001122679A (en) | 1995-12-22 | 2000-08-17 | Antifouling tile |
JP2001140242A Pending JP2002030258A (en) | 1995-12-22 | 2001-05-10 | Coated material and method for coating |
JP2002020533A Expired - Fee Related JP3882625B2 (en) | 1995-12-22 | 2002-01-29 | Sound insulation wall and cleaning method for sound insulation wall |
JP2002244772A Pending JP2003113345A (en) | 1995-12-22 | 2002-08-26 | Antistatic coating composition |
Family Applications Before (8)
Application Number | Title | Priority Date | Filing Date |
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JP8083499A Pending JPH09231821A (en) | 1995-12-22 | 1996-04-05 | Luminaire and method for maintaining illuminance |
JP13408196A Expired - Lifetime JP3385850B2 (en) | 1995-12-22 | 1996-04-19 | Composite material with hydrophilicity |
JP10079496A Expired - Lifetime JP3740736B2 (en) | 1995-12-22 | 1996-04-23 | HEAT EXCHANGER AND HEAT EXCHANGER OPERATION METHOD |
JP15017196A Expired - Lifetime JP3760509B2 (en) | 1995-12-22 | 1996-05-22 | Greenhouse ceiling and its condensation prevention method |
JP8150410A Pending JPH09225263A (en) | 1995-12-22 | 1996-05-23 | Air pollutant removing filter, air pollutant removing fan and ventilator using the fan |
JP8156383A Pending JPH09231849A (en) | 1995-12-22 | 1996-05-29 | Insulator and dirt preventing method therefore |
JP8136777A Pending JPH09227178A (en) | 1995-12-22 | 1996-05-30 | Laminated glass and its production |
JP13653596A Expired - Lifetime JP3339304B2 (en) | 1995-12-22 | 1996-05-30 | Painted object and painting method |
Family Applications After (62)
Application Number | Title | Priority Date | Filing Date |
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JP8168643A Pending JPH09232096A (en) | 1995-12-22 | 1996-06-06 | Electrification preventing method, and electrification preventive composite material |
JP8145265A Pending JPH09225276A (en) | 1995-12-22 | 1996-06-07 | Separating membrane and formation of surface layer to separating membrane |
JP8168662A Pending JPH09225389A (en) | 1995-12-22 | 1996-06-10 | Method for making member hydrophilic and preventing deterioration by ultraviolet ray, hydrophilic ultraviolet resistant member and its manufacture |
JP8158518A Pending JPH09225021A (en) | 1995-12-22 | 1996-06-19 | Medical material |
JP8195184A Expired - Lifetime JP3003581B2 (en) | 1995-12-22 | 1996-06-20 | A member that exhibits hydrophilicity in response to optical excitation of an optical semiconductor |
JP8272815A Pending JPH09224957A (en) | 1995-12-22 | 1996-09-06 | Laser beam focusing lens, dentistry and oral surgery treatment device using the same, and preventing device of laser beam irregular reflection due to stuck waterdrop |
JP8272814A Pending JPH09226041A (en) | 1995-12-22 | 1996-09-06 | Member for preventing attachment of condensation water drop and method for preventing attachment of condensation water drop of the member |
JP8272808A Pending JPH09229724A (en) | 1995-12-22 | 1996-09-07 | Non-fogging cover for instrument panel of motorcycle, motorcycle equipped with the cover, and fogging-preventing method for the cover |
JP27280996A Expired - Fee Related JP3588202B2 (en) | 1995-12-22 | 1996-09-07 | Anti-fog road mirror and its anti-fog method |
JP8238927A Pending JPH09227159A (en) | 1995-12-22 | 1996-09-10 | Front and rear window glass of vehicle |
JP8275189A Pending JPH09231807A (en) | 1995-12-22 | 1996-09-10 | Vehicle headlight cover, vehicle with it, and its defogging method |
JP27519096A Expired - Lifetime JP3277983B2 (en) | 1995-12-22 | 1996-09-10 | Outdoor display panel and its cleaning method |
JP8281220A Expired - Lifetime JP3003593B2 (en) | 1995-12-22 | 1996-09-17 | Photocatalytic hydrophilic member |
JP28122196A Expired - Lifetime JP3743075B2 (en) | 1995-12-22 | 1996-09-17 | Antifogging dental mirror and antifogging method |
JP8281224A Pending JPH09228134A (en) | 1995-12-22 | 1996-09-17 | Antifogging helmet shield and antifogging method |
JP8281222A Pending JPH09230106A (en) | 1995-12-22 | 1996-09-17 | Anti-fogging camera filter and its anti-fogging method |
JP8281225A Pending JPH09230107A (en) | 1995-12-22 | 1996-09-17 | Anti-fogging glass lens and its anti-fogging method |
JP8281223A Expired - Lifetime JP3063968B2 (en) | 1995-12-22 | 1996-09-17 | Anti-fog vehicle mirror, automobile equipped with the same, anti-fog film for vehicle mirror and anti-fog method for vehicle mirror |
JP8282806A Pending JPH09228057A (en) | 1995-12-22 | 1996-09-18 | Wheel and its cleaning method |
JP8282810A Pending JPH09228545A (en) | 1995-12-22 | 1996-09-18 | Glass block and its cleaning method |
JP8282807A Pending JPH09224874A (en) | 1995-12-22 | 1996-09-18 | Water-closet bowl made of resin |
JP8282809A Pending JPH09230108A (en) | 1995-12-22 | 1996-09-18 | Anti-fogging plastic lens and its anti-fogging method |
JP28281296A Expired - Lifetime JP3612896B2 (en) | 1995-12-22 | 1996-09-18 | Exterior wall building materials and methods for cleaning them |
JP8282805A Pending JPH09231499A (en) | 1995-12-22 | 1996-09-18 | Light source cover for traffic signal, traffic signal with it, and cleaning method for light source cover for traffic signal |
JP08282811A Expired - Fee Related JP3075195B2 (en) | 1995-12-22 | 1996-09-18 | Anti-fog wash mirror, vanity table provided with the same, anti-fog film for wash mirror and anti-fog method for wash mirror |
JP8246180A Pending JPH09230493A (en) | 1995-12-22 | 1996-09-18 | Camera |
JP8282808A Pending JPH09228765A (en) | 1995-12-22 | 1996-09-18 | Blind and manufacture thereof |
JP28453496A Expired - Lifetime JP3173391B2 (en) | 1995-12-22 | 1996-09-19 | Hydrophilic film, and method for producing and using the same |
JP8284532A Pending JPH09227805A (en) | 1995-12-22 | 1996-09-19 | Photocatalytic hydrophilic coating composition |
JP8284533A Pending JPH09227161A (en) | 1995-12-22 | 1996-09-19 | Pane, film for applying thereto and antifogging and cleaning thereof |
JP28579796A Expired - Lifetime JP3697795B2 (en) | 1995-12-22 | 1996-09-20 | Display and cleaning method thereof |
JP28895696A Expired - Fee Related JP3588206B2 (en) | 1995-12-22 | 1996-09-25 | Self-cleaning road decorative panel, and method of cleaning road decorative panel |
JP28895596A Expired - Lifetime JP3774955B2 (en) | 1995-12-22 | 1996-09-25 | Self-cleaning handrail and handrail cleaning method |
JP28895496A Expired - Fee Related JP3588205B2 (en) | 1995-12-22 | 1996-09-25 | Self-cleaning guard fence and method of cleaning guard fence |
JP8291006A Pending JPH09229767A (en) | 1995-12-22 | 1996-09-26 | Pyroelectric infrared detector |
JP8291005A Pending JPH09230031A (en) | 1995-12-22 | 1996-09-26 | Inter-vehicle distance detecting device and automobile having it |
JP8291007A Pending JPH09225054A (en) | 1995-12-22 | 1996-09-26 | Gas mask and storing device for gas mask |
JP8297248A Pending JPH09227169A (en) | 1995-12-22 | 1996-10-18 | Transfer sheet, and transferring of photocatalytic and hydrophilic thin film |
JP8298234A Pending JPH09226531A (en) | 1995-12-22 | 1996-10-22 | Rainy weather visibility securable vehicular mirror, automobile and two wheeler having it |
JP8298237A Pending JPH09229546A (en) | 1995-12-22 | 1996-10-22 | Door for refrigerated showcase having see-through ensuring property |
JP8298236A Pending JPH09227162A (en) | 1995-12-22 | 1996-10-22 | Vehicle pane for securing rainy weather view, and automobile mounted therewith |
JP8298235A Pending JPH09230119A (en) | 1995-12-22 | 1996-10-22 | Road mirror for assuring visual field in rainy weather |
JP8306997A Pending JPH09226060A (en) | 1995-12-22 | 1996-11-01 | Lid for heating container having fog resistance |
JP8307000A Pending JPH09224800A (en) | 1995-12-22 | 1996-11-01 | Glassware and water-washing method |
JP8323516A Pending JPH09241038A (en) | 1995-12-22 | 1996-11-19 | Photocatalytic hydrophilic member and its production |
JP8340470A Pending JPH09225387A (en) | 1995-12-22 | 1996-12-05 | Hydrophilic member and method to make surface of member hydrophilic |
JP34047196A Expired - Lifetime JP3303696B2 (en) | 1995-12-22 | 1996-12-05 | Photocatalytic hydrophilic coating composition |
JP34047296A Expired - Fee Related JP3348613B2 (en) | 1995-12-22 | 1996-12-05 | Photocatalytic hydrophilic coating composition |
JP08344585A Expired - Lifetime JP3141802B2 (en) | 1995-12-22 | 1996-12-09 | Hydrophilic member and method for maintaining hydrophilicity |
JP23956899A Expired - Lifetime JP3613085B2 (en) | 1995-12-22 | 1999-08-26 | Photocatalytic hydrophilic member |
JP23956799A Expired - Lifetime JP3613084B2 (en) | 1995-12-22 | 1999-08-26 | A member that exhibits hydrophilicity in response to photoexcitation of an optical semiconductor |
JP34300999A Expired - Fee Related JP3844182B2 (en) | 1995-12-22 | 1999-12-02 | Hydrophilic film and method for producing and using the same |
JP2000180301A Expired - Lifetime JP3414365B2 (en) | 1995-12-22 | 2000-06-15 | Building materials for exterior walls |
JP2000181287A Expired - Fee Related JP3465664B2 (en) | 1995-12-22 | 2000-06-16 | Building materials for exterior walls |
JP2000181284A Pending JP2001048679A (en) | 1995-12-22 | 2000-06-16 | Photocatalytic hydrophilic tile and its production |
JP2000181286A Expired - Lifetime JP3414367B2 (en) | 1995-12-22 | 2000-06-16 | Building materials for exterior walls |
JP2000227055A Withdrawn JP2001089752A (en) | 1995-12-22 | 2000-07-27 | Member capable of obtaining hydrophilic nature in accordance with photoexcitation of optical semiconductor and manufacturing method thereof |
JP2000227056A Pending JP2001129916A (en) | 1995-12-22 | 2000-07-27 | Photocatalytic hydrophilic member |
JP2000247609A Pending JP2001122679A (en) | 1995-12-22 | 2000-08-17 | Antifouling tile |
JP2001140242A Pending JP2002030258A (en) | 1995-12-22 | 2001-05-10 | Coated material and method for coating |
JP2002020533A Expired - Fee Related JP3882625B2 (en) | 1995-12-22 | 2002-01-29 | Sound insulation wall and cleaning method for sound insulation wall |
JP2002244772A Pending JP2003113345A (en) | 1995-12-22 | 2002-08-26 | Antistatic coating composition |
Country Status (1)
Country | Link |
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JP (71) | JPH09231821A (en) |
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JPH08313705A (en) * | 1995-05-22 | 1996-11-29 | Seiko Epson Corp | Anti-clouding article and its production |
JP3127827B2 (en) * | 1995-06-14 | 2001-01-29 | 東陶機器株式会社 | Anti-fog seal |
US6228480B1 (en) * | 1995-06-19 | 2001-05-08 | Nippon Soda Co., Ltd. | Photocatalyst-carrying structure and photocatalyst coating material |
JPH0990889A (en) * | 1995-09-27 | 1997-04-04 | Toshiba Lighting & Technol Corp | Sign body and externally illuminated sign device |
JPH09173783A (en) * | 1995-10-27 | 1997-07-08 | Matsushita Electric Ind Co Ltd | Sheet glass and resin plate and their production and method for removing contaminant |
JP4237830B2 (en) * | 1995-12-20 | 2009-03-11 | 日本曹達株式会社 | Photocatalyst-carrying lighting fixture |
JPH09231821A (en) * | 1995-12-22 | 1997-09-05 | Toto Ltd | Luminaire and method for maintaining illuminance |
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1996
- 1996-04-05 JP JP8083499A patent/JPH09231821A/en active Pending
- 1996-04-19 JP JP13408196A patent/JP3385850B2/en not_active Expired - Lifetime
- 1996-04-23 JP JP10079496A patent/JP3740736B2/en not_active Expired - Lifetime
- 1996-05-22 JP JP15017196A patent/JP3760509B2/en not_active Expired - Lifetime
- 1996-05-23 JP JP8150410A patent/JPH09225263A/en active Pending
- 1996-05-29 JP JP8156383A patent/JPH09231849A/en active Pending
- 1996-05-30 JP JP8136777A patent/JPH09227178A/en active Pending
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- 1996-05-31 JP JP13782996A patent/JP3189682B2/en not_active Ceased
- 1996-06-06 JP JP8168643A patent/JPH09232096A/en active Pending
- 1996-06-07 JP JP8145265A patent/JPH09225276A/en active Pending
- 1996-06-10 JP JP8168662A patent/JPH09225389A/en active Pending
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- 1996-06-20 JP JP8195184A patent/JP3003581B2/en not_active Expired - Lifetime
- 1996-09-06 JP JP8272815A patent/JPH09224957A/en active Pending
- 1996-09-06 JP JP8272814A patent/JPH09226041A/en active Pending
- 1996-09-07 JP JP8272808A patent/JPH09229724A/en active Pending
- 1996-09-07 JP JP27280996A patent/JP3588202B2/en not_active Expired - Fee Related
- 1996-09-10 JP JP8238927A patent/JPH09227159A/en active Pending
- 1996-09-10 JP JP8275189A patent/JPH09231807A/en active Pending
- 1996-09-10 JP JP27519096A patent/JP3277983B2/en not_active Expired - Lifetime
- 1996-09-17 JP JP8281220A patent/JP3003593B2/en not_active Expired - Lifetime
- 1996-09-17 JP JP28122196A patent/JP3743075B2/en not_active Expired - Lifetime
- 1996-09-17 JP JP8281224A patent/JPH09228134A/en active Pending
- 1996-09-17 JP JP8281222A patent/JPH09230106A/en active Pending
- 1996-09-17 JP JP8281225A patent/JPH09230107A/en active Pending
- 1996-09-17 JP JP8281223A patent/JP3063968B2/en not_active Expired - Lifetime
- 1996-09-18 JP JP8282806A patent/JPH09228057A/en active Pending
- 1996-09-18 JP JP8282810A patent/JPH09228545A/en active Pending
- 1996-09-18 JP JP8282807A patent/JPH09224874A/en active Pending
- 1996-09-18 JP JP8282809A patent/JPH09230108A/en active Pending
- 1996-09-18 JP JP28281296A patent/JP3612896B2/en not_active Expired - Lifetime
- 1996-09-18 JP JP8282805A patent/JPH09231499A/en active Pending
- 1996-09-18 JP JP08282811A patent/JP3075195B2/en not_active Expired - Fee Related
- 1996-09-18 JP JP8246180A patent/JPH09230493A/en active Pending
- 1996-09-18 JP JP8282808A patent/JPH09228765A/en active Pending
- 1996-09-19 JP JP28453496A patent/JP3173391B2/en not_active Expired - Lifetime
- 1996-09-19 JP JP8284532A patent/JPH09227805A/en active Pending
- 1996-09-19 JP JP8284533A patent/JPH09227161A/en active Pending
- 1996-09-20 JP JP28579796A patent/JP3697795B2/en not_active Expired - Lifetime
- 1996-09-25 JP JP28895696A patent/JP3588206B2/en not_active Expired - Fee Related
- 1996-09-25 JP JP28895596A patent/JP3774955B2/en not_active Expired - Lifetime
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- 1996-09-26 JP JP8291006A patent/JPH09229767A/en active Pending
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- 1996-10-22 JP JP8298234A patent/JPH09226531A/en active Pending
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- 1996-11-01 JP JP8306997A patent/JPH09226060A/en active Pending
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- 1996-11-19 JP JP8323516A patent/JPH09241038A/en active Pending
- 1996-12-05 JP JP8340470A patent/JPH09225387A/en active Pending
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1999
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2000
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2001
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2002
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