JPH0559154B2 - - Google Patents

Info

Publication number
JPH0559154B2
JPH0559154B2 JP1022041A JP2204189A JPH0559154B2 JP H0559154 B2 JPH0559154 B2 JP H0559154B2 JP 1022041 A JP1022041 A JP 1022041A JP 2204189 A JP2204189 A JP 2204189A JP H0559154 B2 JPH0559154 B2 JP H0559154B2
Authority
JP
Japan
Prior art keywords
film
oxide film
solution
coating liquid
present
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP1022041A
Other languages
English (en)
Japanese (ja)
Other versions
JPH021778A (ja
Inventor
Hiroyuki Morishima
Shunichiro Uchimura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Corp
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP1022041A priority Critical patent/JPH021778A/ja
Publication of JPH021778A publication Critical patent/JPH021778A/ja
Publication of JPH0559154B2 publication Critical patent/JPH0559154B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
    • C23C18/1208—Oxides, e.g. ceramics
    • C23C18/1212—Zeolites, glasses

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Ceramic Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Paints Or Removers (AREA)
  • Silicon Polymers (AREA)
  • Local Oxidation Of Silicon (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
  • Formation Of Insulating Films (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
JP1022041A 1988-02-02 1989-01-31 半導体の表面保護又は層間絶縁用酸化物被膜形成用塗布液および酸化物被膜の製造法 Granted JPH021778A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1022041A JPH021778A (ja) 1988-02-02 1989-01-31 半導体の表面保護又は層間絶縁用酸化物被膜形成用塗布液および酸化物被膜の製造法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2237088 1988-02-02
JP63-22370 1988-02-02
JP1022041A JPH021778A (ja) 1988-02-02 1989-01-31 半導体の表面保護又は層間絶縁用酸化物被膜形成用塗布液および酸化物被膜の製造法

Publications (2)

Publication Number Publication Date
JPH021778A JPH021778A (ja) 1990-01-08
JPH0559154B2 true JPH0559154B2 (enrdf_load_stackoverflow) 1993-08-30

Family

ID=12080747

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1022041A Granted JPH021778A (ja) 1988-02-02 1989-01-31 半導体の表面保護又は層間絶縁用酸化物被膜形成用塗布液および酸化物被膜の製造法

Country Status (3)

Country Link
EP (1) EP0327311B1 (enrdf_load_stackoverflow)
JP (1) JPH021778A (enrdf_load_stackoverflow)
DE (1) DE68918124T2 (enrdf_load_stackoverflow)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2576065B2 (ja) * 1989-03-31 1997-01-29 富士ゼロックス株式会社 半導電性重合体組成物
JPH02258841A (ja) * 1989-03-31 1990-10-19 Fuji Xerox Co Ltd 無機・有機複合材料の製造方法
JP2576066B2 (ja) * 1989-03-31 1997-01-29 富士ゼロックス株式会社 半導電性重合体組成物
JPH02258839A (ja) * 1989-03-31 1990-10-19 Fuji Xerox Co Ltd 無機・有機複合材料の製造方法
BE1008162A5 (fr) * 1989-09-27 1996-02-06 Air Prod & Chem Produits manufactures carbones et procede pour les produire.
DE4018984A1 (de) * 1990-06-13 1991-12-19 Wacker Chemitronic Verfahren zur herstellung lagerstabiler oberflaechen von polierten siliciumscheiben
JP2739916B2 (ja) * 1992-02-18 1998-04-15 キヤノン株式会社 光学素子製造用ガラスブランク及びこれを用いた光学素子の製造方法
DE4225106C2 (de) * 1992-07-30 1995-10-05 Heraeus Kulzer Gmbh Verfahren und Vorrichtung zur Herstellung eines Metall-Kunststoff-Verbundes
WO1996000758A1 (en) * 1994-06-30 1996-01-11 Hitachi Chemical Company, Ltd. Material for forming silica-base coated insulation film, process for producing the material, silica-base insulation film, semiconductor device, and process for producing the device
DE19714949A1 (de) * 1997-04-10 1998-10-15 Inst Neue Mat Gemein Gmbh Verfahren zum Versehen einer metallischen Oberfläche mit einer glasartigen Schicht
JP4499907B2 (ja) * 2000-12-07 2010-07-14 富士化学株式会社 無機高分子化合物の製造方法、無機高分子化合物、および無機高分子化合物膜
US7015061B2 (en) 2004-08-03 2006-03-21 Honeywell International Inc. Low temperature curable materials for optical applications
US20060057418A1 (en) 2004-09-16 2006-03-16 Aeromet Technologies, Inc. Alluminide coatings containing silicon and yttrium for superalloys and method of forming such coatings
PL3095895T3 (pl) * 2004-12-13 2019-10-31 Mt Coatings Llc Elementy metalowe z powłokami ochronnymi zawierającymi krzem i sposoby wytwarzania takich powłok ochronnych
US9133718B2 (en) 2004-12-13 2015-09-15 Mt Coatings, Llc Turbine engine components with non-aluminide silicon-containing and chromium-containing protective coatings and methods of forming such non-aluminide protective coatings
KR20070108658A (ko) * 2006-05-08 2007-11-13 유영선 반도체 장치의 절연막 형성용 도포액 조성물의 제조방법 및제조된 도포액 조성물
KR20090034953A (ko) * 2006-08-04 2009-04-08 다우 코닝 코포레이션 실리콘 수지 및 실리콘 조성물
US8557877B2 (en) 2009-06-10 2013-10-15 Honeywell International Inc. Anti-reflective coatings for optically transparent substrates
RU2444540C1 (ru) * 2010-10-21 2012-03-10 Общество с ограниченной ответственностью "Пента-91" Способ получения полиметаллосилоксанов
EP2661648A1 (en) 2011-01-05 2013-11-13 Dow Corning Corporation Polyheterosiloxanes for high refractive index materials
RU2453550C1 (ru) * 2011-03-09 2012-06-20 Федеральное государственное унитарное предприятие "Государственный ордена Трудового Красного Знамени научно-исследовательский институт химии и технологии элементоорганических соединений" (ФГУП ГНИИХТЭОС) Способ получения иттрийсодержащих органоалюмоксансилоксанов, связующие и пропиточные композиции на их основе
US8864898B2 (en) 2011-05-31 2014-10-21 Honeywell International Inc. Coating formulations for optical elements
GB2496708A (en) * 2011-11-17 2013-05-22 Dow Corning Solvent-borne scratch resistant coating compositions containing polymetallosiloxanes
JP6015389B2 (ja) 2012-11-30 2016-10-26 株式会社リコー 電界効果型トランジスタ、表示素子、画像表示装置、及びシステム
US10544329B2 (en) 2015-04-13 2020-01-28 Honeywell International Inc. Polysiloxane formulations and coatings for optoelectronic applications
CN110289204B (zh) * 2018-03-19 2023-08-15 株式会社理光 氧化物绝缘体膜形成用涂布液

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3847583A (en) * 1969-08-13 1974-11-12 Jenaer Glaswerk Schott & Gen Process for the manufacture of multi-component substances
FR2123652A5 (enrdf_load_stackoverflow) * 1970-02-19 1972-09-15 Ibm
IN152814B (enrdf_load_stackoverflow) * 1978-08-08 1984-04-14 Westinghouse Electric Corp
JPS5534276A (en) * 1978-09-04 1980-03-10 Tokyo Denshi Kagaku Kabushiki Preparation of coating liquid for silica-based film formation
JPS5638472A (en) * 1979-09-06 1981-04-13 Tokyo Denshi Kagaku Kabushiki Formation of silica coating
US4318939A (en) * 1980-08-21 1982-03-09 Western Electric Co., Incorporated Stabilized catalyzed organopolysiloxanes
JPS60258477A (ja) * 1984-06-02 1985-12-20 Nippon Steel Corp 珪素鋼板の絶縁皮膜の形成方法

Also Published As

Publication number Publication date
EP0327311A3 (en) 1990-08-01
DE68918124T2 (de) 1995-02-23
EP0327311B1 (en) 1994-09-14
JPH021778A (ja) 1990-01-08
EP0327311A2 (en) 1989-08-09
DE68918124D1 (de) 1994-10-20

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