JPS5534276A - Preparation of coating liquid for silica-based film formation - Google Patents
Preparation of coating liquid for silica-based film formationInfo
- Publication number
- JPS5534276A JPS5534276A JP10826678A JP10826678A JPS5534276A JP S5534276 A JPS5534276 A JP S5534276A JP 10826678 A JP10826678 A JP 10826678A JP 10826678 A JP10826678 A JP 10826678A JP S5534276 A JPS5534276 A JP S5534276A
- Authority
- JP
- Japan
- Prior art keywords
- coating liquid
- acid
- alcohol
- silica
- reaction
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Paints Or Removers (AREA)
- Silicon Polymers (AREA)
Abstract
PURPOSE: To obtain the title coating liquid capable of affording smooth and uniform films free from any pinhole, highly resistant to wear and chemicals, by reaction of a mixture of an alkoxysilane, an organic carboxylic acid, and an alcohol, in the presence of a specific accelerator.
CONSTITUTION: A mixture consisting of (A) 1 mole of an alkoxysilane, (B) 2W5 moles of an organic carboxylic acid such as glacial acetic acid, oxalic acid, etc., and (C) 2W10 moles of an alcohol such as methyl alcohol, ethyl alcohol, etc., is incorporated with (D) 0.001W1.0wt%, based on the component (A), of a halogen- free in organic acid (a reaction accelerator) such as sulfric, nitric, phosphoric acid, etc. The resulting system is made to react to a stage where the contents of the components (A) and (B) have reduced to 20wt% or less, based on their original amounts, respectively. An organic solvent is subsequently added to the reaction mixture obtained to adjust so that a concentration calcurated in terms of silica in the system falls in 1W20wt%, followed by filtration through a 0.1W1.0μ-sized filter, thus obtaining the objective coating liquid.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10826678A JPS5534276A (en) | 1978-09-04 | 1978-09-04 | Preparation of coating liquid for silica-based film formation |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10826678A JPS5534276A (en) | 1978-09-04 | 1978-09-04 | Preparation of coating liquid for silica-based film formation |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13922083A Division JPS608263B2 (en) | 1983-07-29 | 1983-07-29 | Manufacturing method of coating liquid for silica film formation |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5534276A true JPS5534276A (en) | 1980-03-10 |
| JPS5634234B2 JPS5634234B2 (en) | 1981-08-08 |
Family
ID=14480283
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10826678A Granted JPS5534276A (en) | 1978-09-04 | 1978-09-04 | Preparation of coating liquid for silica-based film formation |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5534276A (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58189263A (en) * | 1982-04-28 | 1983-11-04 | Hitachi Chem Co Ltd | Coating fluid for sio2 film formation |
| JPS6381132A (en) * | 1987-09-10 | 1988-04-12 | Agency Of Ind Science & Technol | Hydrolyzing method for alkoxysilane |
| JPH021778A (en) * | 1988-02-02 | 1990-01-08 | Hitachi Chem Co Ltd | Coating liquid for forming oxide coating film and production of oxide coating film |
| JP2015028145A (en) * | 2013-06-27 | 2015-02-12 | 信越化学工業株式会社 | Composition for forming coating type bpsg film, substrate having film formed from the composition, and patterning process using the composition |
| JP2016074774A (en) * | 2014-10-03 | 2016-05-12 | 信越化学工業株式会社 | Coating type composition for forming bpsg film, substrate, and method for forming pattern |
| JP2016074772A (en) * | 2014-10-03 | 2016-05-12 | 信越化学工業株式会社 | Coating type composition for forming silicon containing film, substrate, and pattern formation method |
-
1978
- 1978-09-04 JP JP10826678A patent/JPS5534276A/en active Granted
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58189263A (en) * | 1982-04-28 | 1983-11-04 | Hitachi Chem Co Ltd | Coating fluid for sio2 film formation |
| JPS6358867B2 (en) * | 1982-04-28 | 1988-11-17 | ||
| JPS6381132A (en) * | 1987-09-10 | 1988-04-12 | Agency Of Ind Science & Technol | Hydrolyzing method for alkoxysilane |
| JPH0217573B2 (en) * | 1987-09-10 | 1990-04-20 | Kogyo Gijutsuin | |
| JPH021778A (en) * | 1988-02-02 | 1990-01-08 | Hitachi Chem Co Ltd | Coating liquid for forming oxide coating film and production of oxide coating film |
| JPH0559154B2 (en) * | 1988-02-02 | 1993-08-30 | Hitachi Chemical Co Ltd | |
| JP2015028145A (en) * | 2013-06-27 | 2015-02-12 | 信越化学工業株式会社 | Composition for forming coating type bpsg film, substrate having film formed from the composition, and patterning process using the composition |
| JP2016074774A (en) * | 2014-10-03 | 2016-05-12 | 信越化学工業株式会社 | Coating type composition for forming bpsg film, substrate, and method for forming pattern |
| JP2016074772A (en) * | 2014-10-03 | 2016-05-12 | 信越化学工業株式会社 | Coating type composition for forming silicon containing film, substrate, and pattern formation method |
| US9902875B2 (en) | 2014-10-03 | 2018-02-27 | Shin-Etsu Chemical Co., Ltd. | Composition for forming a coating type BPSG film, substrate, and patterning process |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5634234B2 (en) | 1981-08-08 |
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