DE68918124D1 - Beschichtungsflüssigkeit zur Herstellung einer Oxidschicht. - Google Patents

Beschichtungsflüssigkeit zur Herstellung einer Oxidschicht.

Info

Publication number
DE68918124D1
DE68918124D1 DE68918124T DE68918124T DE68918124D1 DE 68918124 D1 DE68918124 D1 DE 68918124D1 DE 68918124 T DE68918124 T DE 68918124T DE 68918124 T DE68918124 T DE 68918124T DE 68918124 D1 DE68918124 D1 DE 68918124D1
Authority
DE
Germany
Prior art keywords
producing
oxide layer
coating liquid
coating
liquid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE68918124T
Other languages
English (en)
Other versions
DE68918124T2 (de
Inventor
Hiroyuki Yamazaki Wo Morishima
Shun-Ichiro Yamazaki Uchimura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Corp
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Publication of DE68918124D1 publication Critical patent/DE68918124D1/de
Application granted granted Critical
Publication of DE68918124T2 publication Critical patent/DE68918124T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
    • C23C18/1208—Oxides, e.g. ceramics
    • C23C18/1212—Zeolites, glasses

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Paints Or Removers (AREA)
  • Formation Of Insulating Films (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
  • Silicon Polymers (AREA)
  • Local Oxidation Of Silicon (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
DE1989618124 1988-02-02 1989-01-31 Beschichtungsflüssigkeit zur Herstellung einer Oxidschicht. Expired - Fee Related DE68918124T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2237088 1988-02-02

Publications (2)

Publication Number Publication Date
DE68918124D1 true DE68918124D1 (de) 1994-10-20
DE68918124T2 DE68918124T2 (de) 1995-02-23

Family

ID=12080747

Family Applications (1)

Application Number Title Priority Date Filing Date
DE1989618124 Expired - Fee Related DE68918124T2 (de) 1988-02-02 1989-01-31 Beschichtungsflüssigkeit zur Herstellung einer Oxidschicht.

Country Status (3)

Country Link
EP (1) EP0327311B1 (de)
JP (1) JPH021778A (de)
DE (1) DE68918124T2 (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110289204A (zh) * 2018-03-19 2019-09-27 株式会社理光 氧化物绝缘体膜形成用涂布液

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* Cited by examiner, † Cited by third party
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JPH02258839A (ja) * 1989-03-31 1990-10-19 Fuji Xerox Co Ltd 無機・有機複合材料の製造方法
JP2576065B2 (ja) * 1989-03-31 1997-01-29 富士ゼロックス株式会社 半導電性重合体組成物
JPH02258841A (ja) * 1989-03-31 1990-10-19 Fuji Xerox Co Ltd 無機・有機複合材料の製造方法
JP2576066B2 (ja) * 1989-03-31 1997-01-29 富士ゼロックス株式会社 半導電性重合体組成物
BE1008162A5 (fr) * 1989-09-27 1996-02-06 Air Prod & Chem Produits manufactures carbones et procede pour les produire.
DE4018984A1 (de) * 1990-06-13 1991-12-19 Wacker Chemitronic Verfahren zur herstellung lagerstabiler oberflaechen von polierten siliciumscheiben
JP2739916B2 (ja) * 1992-02-18 1998-04-15 キヤノン株式会社 光学素子製造用ガラスブランク及びこれを用いた光学素子の製造方法
DE4225106C2 (de) * 1992-07-30 1995-10-05 Heraeus Kulzer Gmbh Verfahren und Vorrichtung zur Herstellung eines Metall-Kunststoff-Verbundes
AU3460095A (en) * 1994-06-30 1996-01-25 Hitachi Chemical Company, Ltd. Material for forming silica-base coated insulation film, process for producing the material, silica-base insulation film, semiconductor device, and process for producing the device
DE19714949A1 (de) * 1997-04-10 1998-10-15 Inst Neue Mat Gemein Gmbh Verfahren zum Versehen einer metallischen Oberfläche mit einer glasartigen Schicht
JP4499907B2 (ja) * 2000-12-07 2010-07-14 富士化学株式会社 無機高分子化合物の製造方法、無機高分子化合物、および無機高分子化合物膜
US7015061B2 (en) 2004-08-03 2006-03-21 Honeywell International Inc. Low temperature curable materials for optical applications
US20060057418A1 (en) 2004-09-16 2006-03-16 Aeromet Technologies, Inc. Alluminide coatings containing silicon and yttrium for superalloys and method of forming such coatings
US9133718B2 (en) 2004-12-13 2015-09-15 Mt Coatings, Llc Turbine engine components with non-aluminide silicon-containing and chromium-containing protective coatings and methods of forming such non-aluminide protective coatings
PL1831428T3 (pl) * 2004-12-13 2012-03-30 Mt Coatings Llc Elementy silnika turbinowego z nie-aluminidowymi powłokami ochronnymi zawierającymi krzem oraz chrom i sposoby wytwarzania takich nie-aluminidowych powłok ochronnych
KR20070108658A (ko) * 2006-05-08 2007-11-13 유영선 반도체 장치의 절연막 형성용 도포액 조성물의 제조방법 및제조된 도포액 조성물
CN101501139B (zh) * 2006-08-04 2011-08-17 陶氏康宁公司 硅氧烷树脂和硅氧烷组合物
US8557877B2 (en) 2009-06-10 2013-10-15 Honeywell International Inc. Anti-reflective coatings for optically transparent substrates
RU2444540C1 (ru) * 2010-10-21 2012-03-10 Общество с ограниченной ответственностью "Пента-91" Способ получения полиметаллосилоксанов
EP2661648A1 (de) * 2011-01-05 2013-11-13 Dow Corning Corporation Polyheterosiloxane für materialien mit hohem brechungsindex
RU2453550C1 (ru) * 2011-03-09 2012-06-20 Федеральное государственное унитарное предприятие "Государственный ордена Трудового Красного Знамени научно-исследовательский институт химии и технологии элементоорганических соединений" (ФГУП ГНИИХТЭОС) Способ получения иттрийсодержащих органоалюмоксансилоксанов, связующие и пропиточные композиции на их основе
US8864898B2 (en) 2011-05-31 2014-10-21 Honeywell International Inc. Coating formulations for optical elements
GB2496708A (en) * 2011-11-17 2013-05-22 Dow Corning Solvent-borne scratch resistant coating compositions containing polymetallosiloxanes
JP6015389B2 (ja) 2012-11-30 2016-10-26 株式会社リコー 電界効果型トランジスタ、表示素子、画像表示装置、及びシステム
WO2016167892A1 (en) 2015-04-13 2016-10-20 Honeywell International Inc. Polysiloxane formulations and coatings for optoelectronic applications

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3847583A (en) * 1969-08-13 1974-11-12 Jenaer Glaswerk Schott & Gen Process for the manufacture of multi-component substances
FR2123652A5 (de) * 1970-02-19 1972-09-15 Ibm
IN152814B (de) * 1978-08-08 1984-04-14 Westinghouse Electric Corp
JPS5534276A (en) * 1978-09-04 1980-03-10 Tokyo Denshi Kagaku Kabushiki Preparation of coating liquid for silica-based film formation
JPS5638472A (en) * 1979-09-06 1981-04-13 Tokyo Denshi Kagaku Kabushiki Formation of silica coating
US4318939A (en) * 1980-08-21 1982-03-09 Western Electric Co., Incorporated Stabilized catalyzed organopolysiloxanes
JPS60258477A (ja) * 1984-06-02 1985-12-20 Nippon Steel Corp 珪素鋼板の絶縁皮膜の形成方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110289204A (zh) * 2018-03-19 2019-09-27 株式会社理光 氧化物绝缘体膜形成用涂布液
CN110289204B (zh) * 2018-03-19 2023-08-15 株式会社理光 氧化物绝缘体膜形成用涂布液

Also Published As

Publication number Publication date
EP0327311A2 (de) 1989-08-09
JPH021778A (ja) 1990-01-08
EP0327311B1 (de) 1994-09-14
DE68918124T2 (de) 1995-02-23
JPH0559154B2 (de) 1993-08-30
EP0327311A3 (en) 1990-08-01

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee