EP0327311B1 - Beschichtungsflüssigkeit zur Herstellung einer Oxidschicht - Google Patents

Beschichtungsflüssigkeit zur Herstellung einer Oxidschicht Download PDF

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Publication number
EP0327311B1
EP0327311B1 EP19890300927 EP89300927A EP0327311B1 EP 0327311 B1 EP0327311 B1 EP 0327311B1 EP 19890300927 EP19890300927 EP 19890300927 EP 89300927 A EP89300927 A EP 89300927A EP 0327311 B1 EP0327311 B1 EP 0327311B1
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EP
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Prior art keywords
coating
och3
forming
oxide
ch3si
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Expired - Lifetime
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EP19890300927
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English (en)
French (fr)
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EP0327311A3 (en
EP0327311A2 (de
Inventor
Hiroyuki Yamazaki Works Of Morishima
Shun-Ichiro Yamazaki Works Of Uchimura
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Showa Denko Materials Co ltd
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Hitachi Chemical Co Ltd
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
    • C23C18/1208—Oxides, e.g. ceramics
    • C23C18/1212—Zeolites, glasses

Definitions

  • This invention relates to a coating fluid for forming an oxide coating which is thermally stable and has good coating properties and a method for forming an oxide coating using the same.
  • EP-A-0008215 discloses a method of preparing alkoxide coatings on substrates.
  • a clear solution is prepared by reacting metal alkoxides with a mixture of critical amounts of water and/or acid in an alcohol diluted medium.
  • the alkoxides can be Ti(OR)4 or Ta(OR)5, or Si(OR)4 in admixture with these alkoxides.
  • the coatings are deposited by applying the alkoxide solution to the substrate then heating the coating at over 350°C.
  • US-A-3847,583 discloses a process for producing glassy, crystalline or glassy crystalline oxide multi-component substances, which are produced without going through a molten phase.
  • An alkali or alkali earth metal compound and at least one other metal compound, both dissolved in an organic solvent are reacted in the solvent, the solvent is evaporated to form a precipitate, and the precipitate is heated to form the multi-component substance.
  • These compositions are applied as coatings to substrates e.g. glasses.
  • the present invention provides a coating fluid for forming an oxide coating on a substrate, which comprises a reaction product obtained by subjecting: (A) a silane compound expressed by the formula RmSi(OR) 4-m wherein R represents an alkyl group of 1 to 4 carbon atoms or an aryl group and m represents an integer of 0 to 2 and (B) an organic metal compound expressed by the formula M(OR') n wherein M represents a atom, R' represents an alkyl group of 1 to 4 carbon atoms or an aryl group and n represents a valence of the atom, to hydrolysis and condensation by the use of a catalyst in the presence of a solvent, characterised in that the atom is selected from magnesium, boron, phosphorous, zirconium, yttrium or barium.
  • the present invention also provides a process for forming a coating oxide on a substrate which comprises A process for forming a coating oxide on a substrate which comprises a step of coating a coating fluid on a substrate, said coating fluid comprising a reaction product obtained by subjecting (A) a silane compound expressed by the formula RmSi(OR) 4-m wherein R represents an alkyl group of 1 to 4 carbon atoms or an aryl group and m represents an integer of 0 to 2 and (B) an organic compound expressed by the formula M(OR') n wherein M represents a atom, R' represents an alkyl group of 1 to 4 carbon atoms or an aryl group and n represents a valence of the atom, to hydrolysis and condensation by the use of a catalyst in the presence of a solvent; and a step of calcining said coated substrate at a temperature of 400-800°C: characterised in that the atom is selected from magnesium, boron, phosphorous, zirconium, yttrium
  • the silane compound used in the present invention is expressed by the formula RmSi(OR) 4-m and its concrete examples are tetrafunctional silanes such as Si(OCH3)4, Si(OC2H5)4, Si(OC3H7), etc., trifunctional silanes such as CH3Si(OCH3)3, CH3Si(OC2H5)3, CH3Si(OC3H7)3, C2H5Si(OCH3)3, C6H5Si(OCH3)3, CH3Si(OC6H5)3, etc.
  • tetrafunctional silanes such as Si(OCH3)4, Si(OC2H5)4, Si(OC3H7), etc.
  • trifunctional silanes such as CH3Si(OCH3)3, CH3Si(OC2H5)3, CH3Si(OC3H7)3, C2H5Si(OCH3)3, C6H5Si(OCH3)3, CH3Si(OC6H5)3, etc.
  • alkoxysilanes such as (CH3)2Si(OCH3)2, (CH3)2Si(OC2H5)2, (CH3)2Si(OC3H7)2, (C2H5)2Si(OCH3)2, (C6H5)2Si(OCH3)2, (CH3)2Si(OC6H5)2, etc.
  • alkoxysilanes may be used singly or in admixture of two or more members thereof.
  • the organic metal compound used in the present invention is expressed by the formula M(OR') n and its concrete examples are B(O i-C3H7)3, Mg(OC3H7)2, P(O i-C3H7)3, etc. These metal compounds may be used singly or in admixture of two or more members thereof. Further, the above-mentioned R and R' may be the same or different.
  • the proportions of the silane compound and the organic metal compound used in the present invention it is preferred in the aspects of coating properties, carbon residue, etc. that the proportion of the silane compound be in the range of 70 to 90% by mol and that of the organic metal compound be in the range of 10 to 30% by mol.
  • the silane compound is preferred to be a tetrafunctional silane Si(OR)4 singly or a mixture of 20 to 40% by mol of a tetrafunctional silane Si(OR)4, 20 to 60% by mol of a trifunctional silane RSi(OR)3 and 0 to 40% by mol of a bifunctional silane R2Si(OR)2.
  • amide solvents such as N,N-dimethylformamides which do not react with alkyl groups or aryl groups,alcohol solvents which have the same carbon atoms as those of the alkyl or aryl group in the silane compound, etc. are preferably used in the aspect of coating properties. These solvents may be used in admixture.
  • reaction catalyst used in the present invention are inorganic acids such as hydrochloric acid, sulfuric acid, phosphoric acid, boric acid, hydrofluoric acid, etc., oxides such as phosphorus pentoxide, boron oxide and organic acids such as oxalic acid, etc.
  • the quantity of the catalyst added is preferably in the range of 0.1 to 5% by weight based on the total weight of the silane and the organic metal compound.
  • the coating fluid of the present invention is obtained by subjecting the silane compound and the organic metal compound to hydrolysis and condensation by the use of a catalyst as described above in the presence of a solvent. Further, the thermal expansion coefficient of the oxide coating obtained using the resulting solution can be optinally varied by selecting the kind and quantity of the organic metal compound.
  • the coating fluid is coated on the surface of a substrate such as silicon, glass, ceramics, aluminium, etc. by means of spinner, brush, spray, etc., followed by drying usually at 50 to 200°C, preferably 100 to 150°C and then calcining usually at 400 to 800°C, preferably 400 to 500°C.
  • the oxide coating obtained using the coating fluid of the present invention is smaller in the carbon content than oxide coatings obtained using conventional silanol condensates, and an oxide of e.g. Mg, P, Zr, Y, or Ba is contained therein as a second component to form a reaction product with SiO2, whereby the resulting coating is thermally stable and good coating properties is obtained.
  • an oxide of e.g. Mg, P, Zr, Y, or Ba is contained therein as a second component to form a reaction product with SiO2, whereby the resulting coating is thermally stable and good coating properties is obtained.
  • Si(OCH3)4 (51g), CH3Si(OCH3)3 (45g), (CH3)2Si(OCH3)2 (12g), B(O i-C3H7)3 (31g) and Mg(OC3H7)2 (10g) were dissolved in a mixed solvent of N,N-dimethylformamide (160g) and methanol (40g), followed by adding to the solution, a solution (55g) of oxalic acid (0.6g) in water and subjecting the mixture to hydrolysis and condensation to prepare a solution of the reaction product.
  • This solution was coated on a Si wafer by means of a spinner at 3,000 rpm, followed by drying at 150°C for one hour and then calcining in an electric oven at 400°C for one hour to obtain a colorless, transparent silica coating without any crack.
  • the coating thickness of the silica coating was measured by means of a surface roughness meter (TALYSTEP, trademark of product made by RANK TAYLOR HOBSON Co. LTD.) to give 0.7 ⁇ m. Further, when the inflared absorption spectra of the coating was measured by means of an inflared spectrophotometer, absorptions of Mg-O and B-O bonds were observed besides Si-O-Si absorption; thus it was confirmed that the coating was a complete oxide coating. Further, when the oxide coating was treated by means of a barrel type oxygen plasma ashing device (PR-501A, tradename of product made by Yamato Kagaku Co. LTD.) at 400W for 20 minutes, no crack was observed in the coating.
  • PR-501A barrel type oxygen plasma ashing device
  • thermophysical tester TMA 8,150 type, tradename of product made by Rigaku Denki Co. LTD.
  • Si(OC2H5)4 (145g), P(OC3H7)3 (41g) and Mg(OC3H7)2 (14g) were dissolved in ethyl alcohol (300g), followed by adding to the solution, a solution (66g) of oxalic acid (0.8g) in water and subjecting the mixture to hydrolysis and condensation to prepare a solution of the reaction product.
  • Example 2 When the solution was coated onto a Si wafer, followed by drying and calcining under the same conditions as in Example 1 to obtain a colorless, transparent silica coating having a coating thickness of 0.5 ⁇ m and no crack. Further, when coating of the above solution was carried out on a Si wafer having an aluminum pattern deposited thereon under the same conditions as in Example 1, a colorless, transparent oxide coating without any crack was obtained.
  • Si(OC2H5)4(69g), CH3Si(OC2H5)3 (59g), (CH3)2Si(OC2H5)2 (31g) and B(O i-C3H7)3 (31g) were dissolved in a mixed solvent of ethanol (26g) and N,N-dimethylformamide (105g), followed by adding to the solution, a solution of oxalic acid (0.6g) in water (56g) and subjecting the mixture to hydrolysis and condensation to prepare a solution of the reaction product.
  • Si(OCH3)4 (51g), CH3Si(OCH3)3 (30g), C6H5Si(OCH3)3 (22g), (CH3)2Si(OCH3)2 (12g), B(O i-C3H7)3 (31g) and Mg(OC3H7)2 (10g) were dissolved in diethylene glycol diethyl ether (200g), followed by adding to the solution, a solution (55g) of phosphoric acid (0.5g) in water and subjecting the mixture to hydrolysis and condensation to prepare a solution of the reaction product.
  • This solution was coated on a Si wafer and a Si wafer having an aluminum pattern deposited thereon, followed by drying and calcining under the same conditions as in Example 1 to obtain a colorless, transparent oxide coating having a coating thickness of 0.8 ⁇ m without any crack.
  • Si(OC2H5)4 35g was dissolved in a mixed solvent of ethanol (64g) and ethyl acetate (26g), followed by adding to the solution, a solution of oxalic acid (0.5g) in water (12g), followed by subjecting the mixture to hydrolysis and condensation to prepare a silanol oligomer solution.
  • Si(OCH3)4 (17g), CH3Si(OCH3)3 (25g) and (CH3)2Si(OCH3)2 (5g) were dissolved in a mixed solvent of N,N-dimethylformamide (48g) and methanol (6g), followed by adding to the solution, a solution of phosphoric acid (0.5g) in water (20g) and subjecting the mixture to hydrolysis and condensation to prepare a silanol oligomer solution.
  • the coating fluid for forming an oxide coating of the present invention is thermally stable and superior in the coating properties; hence cracks do not occur in the oxide coating of even about 1.5 ⁇ m or more formed on the surface of a substrate using the coating fluid.
  • the coating fluid for forming an oxide coating of the present invention is effective for coating electronic parts, particularly coating for step-covering on multilevel inter connection of semiconductors, planarizing the element surface of magnetic bubble domain memory, etc.
  • the present invention aims to provide a coating fluid for forming an oxide coating having overcome the above-mentioned drawbacks of the prior art and having a good thermal stability and superior coating properties.
  • the inventors of the present Invention have made extensive research in order to achieve the above-mentioned aims and as a result have noted that in order to form an oxide coating without any cracks on a substrate such as silicon, aluminum, etc. and further without any occurrence of cracks even at the time of the subsequent oxidizing step such as oxygen plasma treatment, it is necessary to use a coating fluid satisfying conditions of (1) reducing the strain of curing shrinkage at the time of calcination, (2) bringing the thermal expansion coefficient of the coating close to that of the substrate, and (3) making the carbon content in the coating very low or nil and such a coating fluid is obtained by subjecting a specified compound to hydrolysis and condensation by the use of a catalyst in the presence of a solvent; thus we have achieved the present invention.

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  • Engineering & Computer Science (AREA)
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  • Physics & Mathematics (AREA)
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  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
  • Silicon Polymers (AREA)
  • Local Oxidation Of Silicon (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
  • Formation Of Insulating Films (AREA)

Claims (10)

  1. Beschichtungsflüssigkeit zur Bildung einer Oxidschicht auf einem Substrat, welche ein Reaktionsprodukt enthält, das erhalten wird, indem
    (A) eine Silanverbindung, welche durch die Formel RmSi(OR)4-m ausgedrückt wird,
    worin R eine Alkylgruppe mit 1 bis 4 Kohlenstoffatomen oder eine Arylgruppe und m eine ganze Zahl zwischen 0 und 2 bedeutet, und
    (B) eine organische Verbindung, die durch die Formel M(OR')n ausgedrückt wird,
    worin M ein Atom, R' eine Alkylgruppe mit 1 bis 4 Kohlenstoffatomen oder eine Arylgruppe und n die Wertigkeit des Atoms bedeutet,
    der Hydrolyse und Kondensation durch die Verwendung eines Katalysators in der Anwesenheit eines Lösungsmittels unterworfen wird,
    dadurch gekennzeichnet, daß das Atom ausgewählt ist aus Magnesium, Bor, Phosphor, Zirkonium, Yttrium oder Barium.
  2. Beschichtungsflüssigkeit zur Bildung einer Oxidschicht auf einem Substrat nach Anspruch 1, bei der die Silanverbindung ausgewählt ist aus Si(OC₂H₅)₄, Si(OC₃H₇), CH₃Si(OCH₃)₃, CH₃Si(OC₂H₅)₃, CH₃Si(OC₃H₇)₃, C₂H₅Si(OCH₃)₃, C₆H₅Si(OCH₃)₃, CH₃Si(OC₆H₅)₃, (CH₃)₂Si(OCH₃)₂, (CH₃)₂Si(OC₂H₅)₂, (CH₃)₂Si(OC₃H₇)₂, (C₂H₅)₂Si(OCH₃)₂, (C₆H₅)₂Si(OCH₃)₂ und (CH₃)₂Si(OC₆H₅)₂.
  3. Beschichtungsflüssigkeit zur Bildung einer Oxidschicht auf einem Substrat nach Anspruch 1, bei der die organische Verbindung hergestellt ist aus
  4. Beschichtungsflüssigkeit zur Bildung einer Oxidschicht auf einem Substrat nach Anspruch 1, bei der der Anteil der Silanverbindung im Bereich von 70 bis 90 Mol-% und derjenige der organischen Verbindung im Bereich von 10 bis 30 Mol-% liegt.
  5. Beschichtungsflüssigkeit zur Bildung einer Oxidschicht auf einem Substrat nach Anspruch 4, bei der die Silanverbindung aus einem tetrafunktionellen Silan oder einer Mischung von zwischen 20 und 40 Mol-% eines tetrafunktionellen Silans, zwischen 20 und 60 Mol-% eines trifunktionellen Silans und zwischen 0 und 40 Mol-% eines bifunktionellen Silans besteht.
  6. Beschichtungsflüssigkeit zur Bildung einer Oxidschicht auf einem Substrat nach Anspruch 1, bei der das Lösungsmittel ausgewählt ist aus Amiden und Alkoholen.
  7. Beschichtungsflüssigkeit zur Bildung einer Oxidschicht auf einem Substrat nach Anspruch 1, bei der der Katalysator ausgewählt ist aus Salzsäure, Schwefelsäure, Phosphorsäure, Borsäure, Flußsäure, Phosphorpentoxid, Boroxid und Oxalsäure.
  8. Verfahren zur Bildung einer Oxidschicht auf einem Substrat, welches umfaßt:
    einen Schritt des Aufschichtens einer Beschichtungsflüssigkeit auf ein Substrat, wobei die Beschichtungsflüssigkeit ein Reaktionsprodukt enthält, das erhalten wird, indem (A) eine Silanverbindung, die durch die Formel RmSi(OR)4-m ausgedrückt wird, worin R eine Alkylgruppe mit 1 bis 4 Kohlenstoffatomen oder eine Arylgruppe und m eine ganze Zahl zwischen 0 und 2 bedeutet, und (B) eine organische Verbindung, welche durch die Formel M(OR')n ausgedrückt wird, worin M ein Atom, R' eine Alkylgruppe mit 1 bis 4 Kohlenstoffatomen oder eine Arylgruppe und n eine Wertigkeit des Atoms bedeutet, der Hydrolyse und Kondensation durch die Anwendung eines Katalysators in Anwesenheit eines Lösungsmittels unterworfen wird; und
    einen Schritt des Kalzinierens des beschichteten Trägers bei einer Temperatur von 400 bis 800°C,
    dadurch gekennzeichnet, daß das Atom ausgewählt ist aus Magnesium, Bor, Phosphor, Zirkonium, Yttrium oder Barium;
    und daß vor dem Kalzinierungsschritt ein Schritt zum Trocknen des beschichteten Substrats bei einer Temperatur von 50 bis 200°C durchgeführt wird.
  9. Verfahren zur Bildung einer Oxidschicht auf einem Substrat nach Anspruch 8, bei welchem die Silanverbindung ausgewählt ist aus Si(OC₂H₅)₄, Si(OC₃H₇), CH₃Si(OCH₃)₃, CH₃Si(OC₂H₅)₃, CH₃Si(OC₃H₇)₃, C₂H₅Si(OCH₃)₃, C₆H₅Si(OCH₃)₃, CH₃Si(OC₆H₅)₃, (CH₃)₂Si(OCH₃)₂, (CH₃)₂Si(OC₂H₅)₂, (CH₃)₂Si(OC₃H₇)₂, (C₂H₅)₂Si(OCH₃)₂, (C₆H₅)₂Si(OCH₃)₂ und (CH₃)₂Si(OC₆H₅)₂.
  10. Verfahren zur Bildung einer Oxidschicht auf einem Substrat nach Anspruch 8, bei welchem die Kalzinierungstemperatur im Bereich von 400°C bis 500°C liegt.
EP19890300927 1988-02-02 1989-01-31 Beschichtungsflüssigkeit zur Herstellung einer Oxidschicht Expired - Lifetime EP0327311B1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP22370/88 1988-02-02
JP2237088 1988-02-02

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EP0327311A2 EP0327311A2 (de) 1989-08-09
EP0327311A3 EP0327311A3 (en) 1990-08-01
EP0327311B1 true EP0327311B1 (de) 1994-09-14

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JP (1) JPH021778A (de)
DE (1) DE68918124T2 (de)

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Cited By (5)

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US8557877B2 (en) 2009-06-10 2013-10-15 Honeywell International Inc. Anti-reflective coatings for optically transparent substrates
US8784985B2 (en) 2009-06-10 2014-07-22 Honeywell International Inc. Anti-reflective coatings for optically transparent substrates
RU2453550C1 (ru) * 2011-03-09 2012-06-20 Федеральное государственное унитарное предприятие "Государственный ордена Трудового Красного Знамени научно-исследовательский институт химии и технологии элементоорганических соединений" (ФГУП ГНИИХТЭОС) Способ получения иттрийсодержащих органоалюмоксансилоксанов, связующие и пропиточные композиции на их основе
US8864898B2 (en) 2011-05-31 2014-10-21 Honeywell International Inc. Coating formulations for optical elements
US10544329B2 (en) 2015-04-13 2020-01-28 Honeywell International Inc. Polysiloxane formulations and coatings for optoelectronic applications

Also Published As

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EP0327311A3 (en) 1990-08-01
EP0327311A2 (de) 1989-08-09
JPH021778A (ja) 1990-01-08
DE68918124T2 (de) 1995-02-23
JPH0559154B2 (de) 1993-08-30
DE68918124D1 (de) 1994-10-20

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