JPS6346095B2 - - Google Patents
Info
- Publication number
- JPS6346095B2 JPS6346095B2 JP60091124A JP9112485A JPS6346095B2 JP S6346095 B2 JPS6346095 B2 JP S6346095B2 JP 60091124 A JP60091124 A JP 60091124A JP 9112485 A JP9112485 A JP 9112485A JP S6346095 B2 JPS6346095 B2 JP S6346095B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- och
- solvent
- silica
- silanol oligomer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000002904 solvent Substances 0.000 claims description 17
- 239000007788 liquid Substances 0.000 claims description 14
- SCPYDCQAZCOKTP-UHFFFAOYSA-N silanol Chemical compound [SiH3]O SCPYDCQAZCOKTP-UHFFFAOYSA-N 0.000 claims description 11
- XPDGHGYGTJOTBC-UHFFFAOYSA-N methoxy(methyl)silicon Chemical compound CO[Si]C XPDGHGYGTJOTBC-UHFFFAOYSA-N 0.000 claims description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 5
- 150000001408 amides Chemical class 0.000 claims description 4
- 239000003054 catalyst Substances 0.000 claims description 3
- 238000004519 manufacturing process Methods 0.000 claims description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 24
- 239000000377 silicon dioxide Substances 0.000 description 12
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 9
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 8
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- 125000003545 alkoxy group Chemical group 0.000 description 6
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 238000006460 hydrolysis reaction Methods 0.000 description 5
- 150000004756 silanes Chemical class 0.000 description 5
- 239000000758 substrate Substances 0.000 description 5
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 230000007062 hydrolysis Effects 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 238000009833 condensation Methods 0.000 description 3
- 230000005494 condensation Effects 0.000 description 3
- 238000010304 firing Methods 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 2
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 2
- 239000004327 boric acid Substances 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 235000019441 ethanol Nutrition 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 229910000039 hydrogen halide Inorganic materials 0.000 description 2
- 239000012433 hydrogen halide Substances 0.000 description 2
- 230000001771 impaired effect Effects 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
- 150000004819 silanols Chemical class 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- DLYUQMMRRRQYAE-UHFFFAOYSA-N tetraphosphorus decaoxide Chemical compound O1P(O2)(=O)OP3(=O)OP1(=O)OP2(=O)O3 DLYUQMMRRRQYAE-UHFFFAOYSA-N 0.000 description 2
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 229910002808 Si–O–Si Inorganic materials 0.000 description 1
- 238000000862 absorption spectrum Methods 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 230000001476 alcoholic effect Effects 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 229910052810 boron oxide Inorganic materials 0.000 description 1
- 239000007809 chemical reaction catalyst Substances 0.000 description 1
- 239000000306 component Substances 0.000 description 1
- 238000007334 copolymerization reaction Methods 0.000 description 1
- JKWMSGQKBLHBQQ-UHFFFAOYSA-N diboron trioxide Chemical compound O=BOB=O JKWMSGQKBLHBQQ-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000008030 elimination Effects 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- 238000004817 gas chromatography Methods 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 230000015654 memory Effects 0.000 description 1
- ARYZCSRUUPFYMY-UHFFFAOYSA-N methoxysilane Chemical compound CO[SiH3] ARYZCSRUUPFYMY-UHFFFAOYSA-N 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 125000005372 silanol group Chemical group 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 1
- ZUEKXCXHTXJYAR-UHFFFAOYSA-N tetrapropan-2-yl silicate Chemical compound CC(C)O[Si](OC(C)C)(OC(C)C)OC(C)C ZUEKXCXHTXJYAR-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/28—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material
- C03C17/30—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material with silicon-containing compounds
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Formation Of Insulating Films (AREA)
- Paints Or Removers (AREA)
- Silicon Polymers (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9112485A JPS61250032A (ja) | 1985-04-30 | 1985-04-30 | シラノ−ルオリゴマ−液の製造法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9112485A JPS61250032A (ja) | 1985-04-30 | 1985-04-30 | シラノ−ルオリゴマ−液の製造法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61250032A JPS61250032A (ja) | 1986-11-07 |
| JPS6346095B2 true JPS6346095B2 (de) | 1988-09-13 |
Family
ID=14017773
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9112485A Granted JPS61250032A (ja) | 1985-04-30 | 1985-04-30 | シラノ−ルオリゴマ−液の製造法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61250032A (de) |
Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0791509B2 (ja) * | 1985-12-17 | 1995-10-04 | 住友化学工業株式会社 | 半導体用絶縁膜形成塗布液 |
| US4999397A (en) * | 1989-07-28 | 1991-03-12 | Dow Corning Corporation | Metastable silane hydrolyzates and process for their preparation |
| JPH03221577A (ja) * | 1990-01-26 | 1991-09-30 | Sumitomo Chem Co Ltd | 絶縁膜形成用塗布液 |
| US5332429A (en) * | 1991-05-31 | 1994-07-26 | Minnesota Mining And Manufacturing Company | Method for treating fluoroaluminosilicate glass |
| EP0731982B1 (de) | 1992-07-04 | 1999-12-01 | Trikon Equipments Limited | Behandlungsverfahren für eine halbleiterscheibe. |
| BE1008724A3 (nl) * | 1994-09-27 | 1996-07-02 | Couttenier Andre | Samenstelling voor het beschermen en waterafstotend maken van een siliciumhoudend substraat. |
| JP6599699B2 (ja) | 2014-12-26 | 2019-10-30 | 日東電工株式会社 | 触媒作用を介して結合した空隙構造フィルムおよびその製造方法 |
| JP6563750B2 (ja) | 2014-12-26 | 2019-08-21 | 日東電工株式会社 | 塗料およびその製造方法 |
| JP6612563B2 (ja) | 2014-12-26 | 2019-11-27 | 日東電工株式会社 | シリコーン多孔体およびその製造方法 |
| JP6604781B2 (ja) | 2014-12-26 | 2019-11-13 | 日東電工株式会社 | 積層フィルムロールおよびその製造方法 |
| CN111363472B (zh) * | 2014-12-26 | 2023-07-04 | 日东电工株式会社 | 涂料及其制造方法 |
| JP6713872B2 (ja) | 2015-07-31 | 2020-06-24 | 日東電工株式会社 | 積層フィルム、積層フィルムの製造方法、光学部材、画像表示装置、光学部材の製造方法および画像表示装置の製造方法 |
| JP6713871B2 (ja) | 2015-07-31 | 2020-06-24 | 日東電工株式会社 | 光学積層体、光学積層体の製造方法、光学部材、画像表示装置、光学部材の製造方法および画像表示装置の製造方法 |
| JP6892744B2 (ja) | 2015-08-24 | 2021-06-23 | 日東電工株式会社 | 積層光学フィルム、積層光学フィルムの製造方法、光学部材、および画像表示装置 |
| JP7152130B2 (ja) | 2015-09-07 | 2022-10-12 | 日東電工株式会社 | 低屈折率層、積層フィルム、低屈折率層の製造方法、積層フィルムの製造方法、光学部材および画像表示装置 |
| JP6615552B2 (ja) * | 2015-09-25 | 2019-12-04 | 日本ペイント・オートモーティブコーティングス株式会社 | カチオン電着塗料組成物 |
| EP3178884B1 (de) * | 2015-12-08 | 2018-02-07 | Evonik Degussa GmbH | Wässrige [3-(2,3-dihydroxyprop-1-oxy)propyl]silanololigomere-enthaltende zusammensetzung, verfahren zu deren herstellung und deren verwendung |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5739659A (en) * | 1980-08-21 | 1982-03-04 | Nec Corp | Calling out system for private branch of exchanger |
| JPS58171455A (ja) * | 1982-03-16 | 1983-10-08 | アンステイテユ・ナシヨナル・ド・ルシエルシエ・シミク・アプリケ | 固体表面上で透明被覆またはワニスを作るのに好適な基礎液体組成物 |
| JPS58179232A (ja) * | 1973-10-11 | 1983-10-20 | ゼネラル・エレクトリツク・カンパニイ | 線状ポリシロキサンの製法 |
-
1985
- 1985-04-30 JP JP9112485A patent/JPS61250032A/ja active Granted
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58179232A (ja) * | 1973-10-11 | 1983-10-20 | ゼネラル・エレクトリツク・カンパニイ | 線状ポリシロキサンの製法 |
| JPS5739659A (en) * | 1980-08-21 | 1982-03-04 | Nec Corp | Calling out system for private branch of exchanger |
| JPS58171455A (ja) * | 1982-03-16 | 1983-10-08 | アンステイテユ・ナシヨナル・ド・ルシエルシエ・シミク・アプリケ | 固体表面上で透明被覆またはワニスを作るのに好適な基礎液体組成物 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61250032A (ja) | 1986-11-07 |
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