JPH0435061B2 - - Google Patents

Info

Publication number
JPH0435061B2
JPH0435061B2 JP59252630A JP25263084A JPH0435061B2 JP H0435061 B2 JPH0435061 B2 JP H0435061B2 JP 59252630 A JP59252630 A JP 59252630A JP 25263084 A JP25263084 A JP 25263084A JP H0435061 B2 JPH0435061 B2 JP H0435061B2
Authority
JP
Japan
Prior art keywords
parts
type epoxy
equivalent
epoxy resin
resin composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59252630A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61130946A (ja
Inventor
Katsushige Tsukada
Noboru Sugasawa
Nobuyuki Hayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Corp
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP59252630A priority Critical patent/JPS61130946A/ja
Publication of JPS61130946A publication Critical patent/JPS61130946A/ja
Publication of JPH0435061B2 publication Critical patent/JPH0435061B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Manufacturing Of Printed Wiring (AREA)
JP59252630A 1984-11-29 1984-11-29 感光性樹脂組成物 Granted JPS61130946A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59252630A JPS61130946A (ja) 1984-11-29 1984-11-29 感光性樹脂組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59252630A JPS61130946A (ja) 1984-11-29 1984-11-29 感光性樹脂組成物

Publications (2)

Publication Number Publication Date
JPS61130946A JPS61130946A (ja) 1986-06-18
JPH0435061B2 true JPH0435061B2 (enrdf_load_stackoverflow) 1992-06-09

Family

ID=17240029

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59252630A Granted JPS61130946A (ja) 1984-11-29 1984-11-29 感光性樹脂組成物

Country Status (1)

Country Link
JP (1) JPS61130946A (enrdf_load_stackoverflow)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61200536A (ja) * 1985-03-01 1986-09-05 Hitachi Chem Co Ltd 感光性組成物
JPS61264341A (ja) * 1985-05-20 1986-11-22 Hitachi Chem Co Ltd 感光性樹脂組成物
JPS61264340A (ja) * 1985-05-20 1986-11-22 Hitachi Chem Co Ltd 感光性樹脂組成物
JPH083632B2 (ja) * 1986-04-21 1996-01-17 日立化成工業株式会社 感光性エレメント
JPH05114673A (ja) * 1991-10-23 1993-05-07 Nikko Kyodo Co Ltd Ｔａｂ用テ−プキヤリア製造裏止め剤
JP2008145707A (ja) * 2006-12-08 2008-06-26 Hitachi Chem Co Ltd 感光性樹脂組成物、感光性フィルム、永久マスクレジスト及びその製造方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2557408C2 (de) * 1975-12-19 1983-08-25 Bayer Ag, 5090 Leverkusen Verfahren zur Herstellung eines in organischen Lösungsmitteln löslichen, vernetzbaren Acryloyl- und/oder Methacryloylgruppen und Carboxylgruppen enthaltenden Urethanharzes und seine Verwendung
JPS5923723B2 (ja) * 1980-09-19 1984-06-04 日立化成工業株式会社 感光性樹脂組成物および感光性エレメント
JPS60188413A (ja) * 1984-03-09 1985-09-25 Toyobo Co Ltd 光重合性樹脂組成物
JPS60195171A (ja) * 1984-03-19 1985-10-03 Mitsubishi Rayon Co Ltd 紫外線硬化型インキ組成物

Also Published As

Publication number Publication date
JPS61130946A (ja) 1986-06-18

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