JPH0562732B2 - - Google Patents

Info

Publication number
JPH0562732B2
JPH0562732B2 JP60107786A JP10778685A JPH0562732B2 JP H0562732 B2 JPH0562732 B2 JP H0562732B2 JP 60107786 A JP60107786 A JP 60107786A JP 10778685 A JP10778685 A JP 10778685A JP H0562732 B2 JPH0562732 B2 JP H0562732B2
Authority
JP
Japan
Prior art keywords
parts
equivalent
acid
photosensitive resin
resin composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60107786A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61264340A (ja
Inventor
Katsushige Tsukada
Noboru Sugasawa
Nobuyuki Hayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Corp
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP10778685A priority Critical patent/JPS61264340A/ja
Publication of JPS61264340A publication Critical patent/JPS61264340A/ja
Publication of JPH0562732B2 publication Critical patent/JPH0562732B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/22—Secondary treatment of printed circuits
    • H05K3/28—Applying non-metallic protective coatings
    • H05K3/285—Permanent coating compositions
    • H05K3/287—Photosensitive compositions
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/46—Manufacturing multilayer circuits
    • H05K3/4644—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
    • H05K3/4673—Application methods or materials of intermediate insulating layers not specially adapted to any one of the previous methods of adding a circuit layer
    • H05K3/4676—Single layer compositions

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
JP10778685A 1985-05-20 1985-05-20 感光性樹脂組成物 Granted JPS61264340A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10778685A JPS61264340A (ja) 1985-05-20 1985-05-20 感光性樹脂組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10778685A JPS61264340A (ja) 1985-05-20 1985-05-20 感光性樹脂組成物

Publications (2)

Publication Number Publication Date
JPS61264340A JPS61264340A (ja) 1986-11-22
JPH0562732B2 true JPH0562732B2 (enrdf_load_stackoverflow) 1993-09-09

Family

ID=14467986

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10778685A Granted JPS61264340A (ja) 1985-05-20 1985-05-20 感光性樹脂組成物

Country Status (1)

Country Link
JP (1) JPS61264340A (enrdf_load_stackoverflow)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH083632B2 (ja) * 1986-04-21 1996-01-17 日立化成工業株式会社 感光性エレメント
JPH0814697B2 (ja) * 1987-05-12 1996-02-14 日立化成工業株式会社 感光性樹脂組成物
IL94474A (en) * 1989-06-09 1993-07-08 Morton Int Inc Photoimageable compositions
JP4839710B2 (ja) * 2004-08-09 2011-12-21 三菱化学株式会社 感光性樹脂組成物、カラーフィルタ及び液晶表示装置
JP2016041778A (ja) * 2014-08-14 2016-03-31 株式会社巴川製紙所 保護フィルム、フィルム積層体および偏光板
WO2016088540A1 (ja) * 2014-12-05 2016-06-09 三井金属鉱業株式会社 導電性組成物並びに配線基板及びその製造方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2557408C2 (de) * 1975-12-19 1983-08-25 Bayer Ag, 5090 Leverkusen Verfahren zur Herstellung eines in organischen Lösungsmitteln löslichen, vernetzbaren Acryloyl- und/oder Methacryloylgruppen und Carboxylgruppen enthaltenden Urethanharzes und seine Verwendung
JPS5923723B2 (ja) * 1980-09-19 1984-06-04 日立化成工業株式会社 感光性樹脂組成物および感光性エレメント
JPS60188413A (ja) * 1984-03-09 1985-09-25 Toyobo Co Ltd 光重合性樹脂組成物
JPS60195171A (ja) * 1984-03-19 1985-10-03 Mitsubishi Rayon Co Ltd 紫外線硬化型インキ組成物
JPS61130946A (ja) * 1984-11-29 1986-06-18 Hitachi Chem Co Ltd 感光性樹脂組成物
JPS61200536A (ja) * 1985-03-01 1986-09-05 Hitachi Chem Co Ltd 感光性組成物
JPS61264341A (ja) * 1985-05-20 1986-11-22 Hitachi Chem Co Ltd 感光性樹脂組成物

Also Published As

Publication number Publication date
JPS61264340A (ja) 1986-11-22

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term